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Three research projects are discussed: (1) Effort was concentrated on surface electromagnetic wave studies of metals, dielectrics, semiconductor (small particles), and ferroelectric and magnetic materials. Materials characterization, new physical phenomena, and new communications techniques were sought. (2) Ion implantation can transform crystalline silicon to amorphous silicon. This transformation is being studied by electron spin resonance measurements. Of principle interest has been the determination of the critical ion dose, the lowest dose at which the implanted layer becomes completely amorphous. (3) A study was made of the interface between carbon substrates and nickel films deposited on those substrates. The motivation for this work is the problem of producing graphite fiber-metal composites having high strengths at high temperature (> 1000C) in oxidizing atmospheres.