An international journal devoted to Vacuum, Surfaces, and Films (Englisch)
In:
Journal of vacuum science and technology / A
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24
, 1
;
2006
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:An international journal devoted to Vacuum, Surfaces, and Films
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Erschienen in:
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Verlag:
- Neue Suche nach: Inst.
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Erscheinungsort:New York, NY
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Erscheinungsdatum:2006
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ISSN:
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ZDBID:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 52.78 / 33.09
- Weitere Informationen zu Basisklassifikation
- Neue Suche nach: 770/3422
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Schlagwörter:
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Klassifikation:
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Datenquelle:
Inhaltsverzeichnis – Band 24, Ausgabe 1
Zeige alle Jahrgänge und Ausgaben
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 1
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Etching of ruthenium coatings in - and -containing plasmasHsu, C. C. / Coburn, J. W. / Graves, D. B. et al. | 2006
- 9
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Free molecular background flow in a vacuum chamber equipped with two-sided pumpsCai, Chunpei / Boyd, Iain D. / Sun, Quanhua et al. | 2006
- 20
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Investigation of reaction with sputtered amorphous thin film on substrateQu, Xin-Ping / Duan, Peng / Wu, Yan-Qing / Chen, Tao / Wang, Guang-Wei / Ru, Guo-Ping / Li, Bing-Zong et al. | 2006
- 25
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Control of plasma flux composition incident on films during reactive magnetron sputtering and the effect on film microstructureMuratore, C. / Walton, S. G. / Leonhardt, D. / Fernsler, R. F. et al. | 2006
- 30
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Plasma etching of at elevated temperatures in chlorine-based chemistryHélot, M. / Chevolleau, T. / Vallier, L. / Joubert, O. / Blanquet, E. / Pisch, A. / Mangiagalli, P. / Lill, T. et al. | 2006
- 41
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Effectiveness of dilute plasmas in removing boron from Si after etching of films in plasmasWang, C. / Donnelly, V. M. et al. | 2006
- 45
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Ion-surface interactions on at the radiofrequency-powered electrode in low-pressure plasmas: Ex situ spectroscopic ellipsometry and Monte Carlo simulation studyAmassian, A. / Desjardins, P. / Martinu, L. et al. | 2006
- 55
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Optical depth profiling of strontium titanate and electro-optic lanthanum-modified lead zirconium titanate multilayer structures for active waveguide applicationsAmassian, A. / Gaidi, M. / Chaker, M. / Martinu, L. et al. | 2006
- 65
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Electrical properties of indium-tin oxide films deposited on nonheated substrates using a planar-magnetron sputtering system and a facing-targets sputtering systemIwase, Hideo / Hoshi, Youichi / Kameyama, Makoto et al. | 2006
- 70
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SiC formation by molecules as a precursor: A synchrotron-radiation photoemission study of the carbonization processCheng, C.-P. / Pi, T.-W. / Ouyang, C.-P. / Wen, J.-F. et al. | 2006
- 74
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Study of annealed Co thin films deposited by ion beam sputteringSharma, A. / Brajpuriya, R. / Tripathi, S. / Chaudhari, S. M. et al. | 2006
- 78
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Ge interactions on surfaces and kinetically driven patterning of Ge nanocrystals onStanley, Scott K. / Joshi, Sachin V. / Banerjee, Sanjay K. / Ekerdt, John G. et al. | 2006
- 84
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Rapid thermal oxidation of Ge-rich heterolayersBera, M. K. / Chakraborty, S. / Das, R. / Dalapati, G. K. / Chattopadhyay, S. / Samanta, S. K. / Yoo, W. J. / Chakraborty, A. K. / Butenko, Y. / Šiller, L. et al. | 2006
- 91
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Ultrasensitive leak detection during ultrahigh vacuum evacuation by quadrupole mass spectrometerChen, Xu / Huang, Tianbin / Wang, Ligong / Jin, Qiji / Cha, Liangzhen et al. | 2006
- 95
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How deposition parameters control growth dynamics of deposited by hot-wire chemical vapor depositionMoutinho, H. R. / To, B. / Jiang, C.-S. / Xu, Y. / Nelson, B. P. / Teplin, C. W. / Jones, K. M. / Perkins, J. / Al-Jassim, M. M. et al. | 2006
- 103
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Low-resistivity atomic-layer-deposited- with atomic-layer-deposited-/physical-vapor-deposited-Ta multilayer structure for multilevel Cu damascene interconnectFuruya, Akira / Ohtsuka, Nobuyuki / Ohashi, Naofumi / Kondo, Seiichi / Ogawa, Shinichi et al. | 2006
- 106
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High-rate deposition of MgO by reactive ac pulsed magnetron sputtering in the transition modeKupfer, H. / Kleinhempel, R. / Richter, F. / Peters, C. / Krause, U. / Kopte, T. / Cheng, Y. et al. | 2006
- 114
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Spectroscopic study of gas and surface phase chemistries of plasmas in an inductively coupled modified gaseous electronics conference reactorZhou, Baosuo / Joseph, Eric A. / Overzet, Lawrence J. / Goeckner, Matthew J. et al. | 2006
- 126
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In situ Fourier transform infrared characterization of the plasma chemistry in varying pulsed cycles of a 1,3-butadiene discharge in an inductively coupled gaseous electronics conference cellJindal, A. K. / Prengler, A. J. / Overzet, L. J. / Goeckner, M. J. et al. | 2006
- 133
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Effects of , , and Ar plasma treatments on the removal of crystallized filmChen, Jinghao / Yoo, Won Jong / Chan, Daniel S. H. et al. | 2006
- 141
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Influence of excitonic singlet-triplet splitting on the photoluminescence of multiple quantum wells fabricated by remote plasma-enhanced chemical-vapor depositionRölver, R. / Först, M. / Winkler, O. / Spangenberg, B. / Kurz, H. et al. | 2006
- 146
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Optimization of multilayer wear-resistant thin films using finite element analysis on stiff and compliant substratesa)Lakkaraju, R. K. / Bobaru, F. / Rohde, S. L. et al. | 2006
- 146
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Optimization of multilayer wear-resistant thin films using finite element analysis on stiff and compliant substratesLakkaraju, R.K. et al. | 2006
- 156
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Conduction anisotropy in porous thin films with chevron microstructuresVick, D. et al. | 2006
- 156
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Conduction anisotropy in porous thin films with chevron microstructuresa)Vick, D. / Brett, M. J. et al. | 2006
- 165
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Characterization of low dielectric constant plasma polymer films deposited by plasma-enhanced chemical vapor deposition using decamethyl-cyclopentasiloxane and cyclohexane as the precursorsYang, Jaeyoung / Lee, Sungwoo / Park, Hyoungsun / Jung, Donggeun / Chae, Heeyeop et al. | 2006
- 170
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Effect of assistant rf field on phase composition of iron nitride film prepared by magnetron sputtering processLi, W.L. et al. | 2006
- 170
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Effect of assistant rf field on phase composition of iron nitride film prepared by magnetron sputtering processa)Li, W. L. / Zheng, F. / Fei, W. D. et al. | 2006
- 174
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Effects of Al content on grain growth of solid solution (Ti,AI)N filmsLiu, Z.-J. et al. | 2006
- 174
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Effects of Al content on grain growth of solid solution (Ti,Al)N filmsLiu, Z.-J. / Shen, Y. G. et al. | 2006
- 178
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CUMULATIVE AUTHOR INDEX| 2006
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An international journal devoted to Vacuum, Surfaces, and Films| 2006
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Information for Contributors| 2006