Magnetron sputtering modes during pulsed deposition process determined by the analysis of power supply parameter (Englisch)
- Neue Suche nach: Krówka, K.
- Neue Suche nach: Krówka, K.
- Neue Suche nach: Wiatrowski, A.
- Neue Suche nach: Posadowski, W.M.
In:
Thin solid films
;
520
, 12
; 4127-4131
;
2012
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:Magnetron sputtering modes during pulsed deposition process determined by the analysis of power supply parameter
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Beteiligte:
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Erschienen in:Thin solid films ; 520, 12 ; 4127-4131
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Erscheinungsort:Amsterdam [u.a.] Elsevier
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Erscheinungsdatum:2012
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ISSN:
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ZDBID:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 33.68
- Weitere Informationen zu Basisklassifikation
- Neue Suche nach: 535/3485
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Datenquelle:
Inhaltsverzeichnis – Band 520, Ausgabe 12
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