Real-time x-ray scattering study of sputter-deposited LaNiO3 thin films on Si substrates (Englisch)
- Neue Suche nach: Lee, Hsin-Yi
- Neue Suche nach: Lee, Chih-Hao
- Neue Suche nach: Liang, Keng-S.
- Neue Suche nach: Wu, Tai-Bor
- Neue Suche nach: Lee, Hsin-Yi
- Neue Suche nach: Lee, Chih-Hao
- Neue Suche nach: Liang, Keng-S.
- Neue Suche nach: Wu, Tai-Bor
In:
Symposium U, In Situ Process Diagnostics and Modelling, 1999, MRS Spring Meeting, 1999
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153-158
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1999
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ISBN:
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ISSN:
- Aufsatz (Konferenz) / Print
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Titel:Real-time x-ray scattering study of sputter-deposited LaNiO3 thin films on Si substrates
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Weitere Titelangaben:Echtzeit-Röntgenbeugungsuntersuchung an gesputterten LaNiO3 Dünnschichten auf Si-Substrat
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Beteiligte:Lee, Hsin-Yi ( Autor:in ) / Lee, Chih-Hao ( Autor:in ) / Liang, Keng-S. ( Autor:in ) / Wu, Tai-Bor ( Autor:in )
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Erschienen in:Materials Research Society Symposium - Proceedings ; 569 ; 153-158
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Verlag:
- Neue Suche nach: Materials Research Society (MRS)
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Erscheinungsort:Warrendale
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Erscheinungsdatum:1999
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Format / Umfang:6 Seiten, 28 Quellen
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ISBN:
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ISSN:
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Coden:
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Medientyp:Aufsatz (Konferenz)
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Format:Print
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis Konferenzband
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
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Real-Time X-ray Scattering Study of Sputter-Deposited LaNiO~3 Thin Films on Si SubstratesLee, H.-Y. / Lee, C.-H. / Liang, K. S. / Wu, T.-B. / Materials Research Society et al. | 1999
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Modelling and Validation of Sensor and Actuator Dynamics for, and Real-Time Feedback Control of, Thermal Chlorine Etching of Gallium ArsenideRosen, I. G. / Parent, T. / Mancera, R. / Chen, P. / Materials Research Society et al. | 1999
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In Situ Design of Experiments for a Reactive Ion Etching ProcessGalarza, C. G. / Klimecky, P. / Khargonekar, P. P. / Terry, F. L. / Materials Research Society et al. | 1999
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Remote True Temperature Pyrometry of Si Wafers: Theoretical and Practical ConsiderationsGlazman, E. / Glazman, A. / Thon, A. / Materials Research Society et al. | 1999
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in Situ Diagnostics of Methane/Hydrogen Plasma Interactions With Si(100)Duan, H. L. / Bent, S. F. / Materials Research Society et al. | 1999
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Study of Natural Oxidation of Ultra-Thin Aluminum Layers With In Situ Resistance MeasurementFery, C. / Bailey, W. E. / Yamada, K. / Wang, S. X. / Materials Research Society et al. | 1999
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In Situ Spectroscopy of Ion-Induced Photon Emission During Metal Nanoparticle Formation in Silica Glass With High-Flux Cu^- ImplantationLay, T. T. / Amekura, H. / Takeda, Y. / Kishimoto, N. / Materials Research Society et al. | 1999