Laser direct write patterned indium tin oxide films for photomasks and anisotropic resist applications (Englisch)
- Neue Suche nach: Peng, Jun
- Neue Suche nach: Chapman, G.H.
- Neue Suche nach: Tu, Yuqiang
- Neue Suche nach: Peng, Jun
- Neue Suche nach: Chapman, G.H.
- Neue Suche nach: Tu, Yuqiang
In:
Photonics North, ICAPT, Applications of Photonic Technology, Photonic Applications in Astronomy, Biomedicine, Imaging, Materials Processing, and Education, 2004b
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620-631
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2004
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ISBN:
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ISSN:
- Aufsatz (Konferenz) / Print
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Titel:Laser direct write patterned indium tin oxide films for photomasks and anisotropic resist applications
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Beteiligte:
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Erschienen in:
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Verlag:
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Erscheinungsdatum:2004
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Format / Umfang:12 Seiten, 20 Quellen
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ISBN:
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ISSN:
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Coden:
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DOI:
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Medientyp:Aufsatz (Konferenz)
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Format:Print
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Sprache:Englisch
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Schlagwörter:anisotropes Medium , Auger-Effekt , elektrische Leitfähigkeit , Ätzen , Hall-Effekt , Indiumverbindung , Photoablation , Maske , Photolack , Rasterelektronenmikroskopie , Sputterabscheidung , Dünnschicht , chemische Röntgenanalyse , Röntgenbeugung , Photomaske , optische Absorption , Rasterelektronenmikroskop , optische Dichte , 2-Mikrometer-Bereich
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