The leveling of mask and wafer in proximity nanolithography using fringe pattern phase analysis (Englisch)
- Neue Suche nach: Xu, Feng
- Neue Suche nach: Zhou, Shaolin
- Neue Suche nach: Hu, Song
- Neue Suche nach: Xu, Feng
- Neue Suche nach: Zhou, Shaolin
- Neue Suche nach: Hu, Song
In:
Optik
;
125
, 13
;
3176-3180
;
2014
-
ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:The leveling of mask and wafer in proximity nanolithography using fringe pattern phase analysis
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Beteiligte:
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Erschienen in:Optik ; 125, 13 ; 3176-3180
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Verlag:
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Erscheinungsdatum:2014
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Format / Umfang:5 Seiten, 9 Quellen
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ISSN:
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Coden:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 125, Ausgabe 13
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- IFC
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editorial board| 2014