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The authors recent progress in ion beam polishing has successfully led them to the production of smoooth diamond films. By means of an oxygen ion beam, they have polished a 5 cm diameter, 1 micron rough film gorwn by microwave plasma chemical vapor deposition on silicon. The polished film root-mean-square and peak-to-valley roughness values veraged over 15 points are respectively 5.5 nm and 55.4 nm. Scattering has been decreased to the point where the polished film is transparent at wavelengths above the silicon absorption edge and shows inteference fringes. This suggests that diamond films polished by this process can be used in optical applications. In this articel, the autors describe the polishing technique and present the results obtained by surface profilometry of the polished sample. The main advantages of ion beam polishing over other existing methods lie in the fact that it is a non contact and low temperature technique.