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All-reflective, unobscured optical designs were developed to help to identify a candidate first generation system to be used in soft x-ray projection lithography. The resolution goal for all designs was 0.1 micron or better at a design wavelength of 13 nm. Different design aspects including usable field size, image distortion, number of mirrors, telecentricity, surface shape (spherical versus aspheric), and system packaging were explored. Trade-off studies between systems requiring scanning and full format non-scanning systems were made. The tolerance sensitivity analysis for a representative design demonstrated that as-built performance will be driven by the mirror surface irregularity tolerance; we will briefly discuss the required tolerance levels.