-
Rigorous model for registration error due to EUV reticle non-flatness and a proposed disposition and compensation technique [6517-58]
British Library Conference Proceedings | 2007| -
Impact of mask error on OPC for 45-nm node [6520-145]
British Library Conference Proceedings | 2007| -
Mask-friendly OPC for a reduced mask cost and writing time [6520-156]
British Library Conference Proceedings | 2007| -
Rework/stripping of multilayer materials for FEOL and BEOL integration using single wafer tool techniques [6519-108]
British Library Conference Proceedings | 2007| -
Shot noise effect on LER and throughput in LEEPL system [6517-91]
British Library Conference Proceedings | 2007| -
A solution for exposure tool optimization at the 65-nm node and beyond [6520-26]
British Library Conference Proceedings | 2007| -
The application of high-refractive index photoresist for 32-nm device level imaging [6519-26]
British Library Conference Proceedings | 2007| -
Assessment of pattern position shift for defocusing in EUV lithography [6517-32]
British Library Conference Proceedings | 2007| -
Marching of the microlithography horses: electron, ion, and photon - past, present, and future (Invited Paper) [6520-01]
British Library Conference Proceedings | 2007| -
Methods for comparative extraction of OPC response [6520-64]
British Library Conference Proceedings | 2007| -
Future directions for CMOS device technology development from a system application perspective (Invited Paper) [6520-02]
British Library Conference Proceedings | 2007| -
Optical lithography: 40 years and holding (Invited Paper) [6520-03]
British Library Conference Proceedings | 2007| -
Quasi-telecentricity: the effects of unbalanced multipole illumination [6520-106]
British Library Conference Proceedings | 2007| -
Precise measurement of process bias and its relation to MEEF [6520-139]
British Library Conference Proceedings | 2007| -
A study of process extension technologies [6519-156]
British Library Conference Proceedings | 2007| -
The tri-lateral challenge of resolution, photospeed, and LER: scaling below 50nm? [6519-32]
British Library Conference Proceedings | 2007| -
Visualizing the impact of the illumination distribution upon imaging, and applying the insights gained [6520-118]
British Library Conference Proceedings | 2007| -
A multi-tiered approach to 193nm immersion defect reduction through track process adjustments [6519-86]
British Library Conference Proceedings | 2007| -
Thin bilayer resists for 193-nm and future photolithography II [6519-126]
British Library Conference Proceedings | 2007|
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