Erscheinungsjahr
Format
Lizenz
Synonyme wurden verwendet für: resists
Suche ohne Synonyme: keywords:("resists")
Verwendete Synonyme:
- abdeckmittel
- cover resists
-
High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results
Freier ZugriffDOAJ | 2020|Schlagwörter: chemically amplified resists, inorganic resists, main chain scission resists -
Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma
American Institute of Physics | 2010|Schlagwörter: silicon-containing resists, tri-layer resists, multi-layer resists -
Modification of thiol-derived self-assembling monolayers by electron and x-ray irradiation: Scientific and lithographic aspects
American Institute of Physics | 2002|Schlagwörter: resists -
Modeling and simulation of chemically amplified electron beam, x-ray, and EUV resist processes
American Institute of Physics | 2004|Schlagwörter: resists -
Quantification of line-edge roughness of photoresists. II. Scaling and fractal analysis and the best roughness descriptors
American Institute of Physics | 2003|Schlagwörter: resists -
Nanometer-period gratings in hydrogen silsesquioxane fabricated by electron beam lithography
American Institute of Physics | 2003|Schlagwörter: resists -
Room-temperature nanoimprint and nanotransfer printing using hydrogen silsequioxane
American Institute of Physics | 2003|Schlagwörter: resists -
Scanning thermal lithography: Maskless, submicron thermochemical patterning of photoresist by ultracompliant probes
American Institute of Physics | 2004|Schlagwörter: resists -
Effective repair to ultra-low-k dielectric material (k∼2.0) by hexamethyldisilazane treatment
American Institute of Physics | 2002|Schlagwörter: resists -
Quantification of line-edge roughness of photoresists. I. A comparison between off-line and on-line analysis of top-down scanning electron microscopy images
American Institute of Physics | 2003|Schlagwörter: resists -
Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes
American Institute of Physics | 2004|Schlagwörter: resists -
Relation between spatial resolution and reaction mechanism of chemically amplified resists for electron beam lithography
American Institute of Physics | 2003|Schlagwörter: resists -
Why optical lithography will live forever
American Institute of Physics | 2003|Schlagwörter: resists -
Fabrication of high-numerical-aperture phase zone plates with a single lithography exposure and no etching
American Institute of Physics | 2003|Schlagwörter: resists -
Effect of developer molecular size on roughness of dissolution front in electron-beam resist
American Institute of Physics | 2004|Schlagwörter: resists -
Transient temperature measurements of resist heating using nanothermocouples
American Institute of Physics | 2003|Schlagwörter: resists -
Fracture toughness of a hybrid‐rubber‐modified epoxy. I. Synergistic toughening
Wiley | 2012|Schlagwörter: resists -
Three-dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations
American Institute of Physics | 1998|Schlagwörter: resists -
Acid–base reactions in a positive tone chemically amplified photoresist and their effect on imaging
American Institute of Physics | 2004|Schlagwörter: resists -
Influence of polymer phase separation on roughness of resist features
American Institute of Physics | 2004|Schlagwörter: resists
Meine Suche schicken an (beta)
Schicken Sie ihre Suchanfrage (Suchterm ohne Filter) an andere Datenbanken, Portale und Kataloge, um ggf. weitere interessante Treffer zu finden:
Dimensions ist eine Datenbank für Abstracts und Zitate, die Informationen zu Forschungsförderungen mit daraus resultierenden Veröffentlichungen, Studien und Patenten verknüpft.
Im TIB AV-Portal können audiovisuelle Medien aus Wissenschaft und Lehre recherchiert und eigene wissenschaftliche Videos publiziert werden.
Im FID move kann nach fachspezifischer Literatur, Forschungsdaten und weitere Informationen aus der Mobilitäts- und Verkehrsforschung gesucht werden.
Der Open Research Knowledge Graph liefert strukturiert beschriebene Forschungsinhalte und macht diese vergleichbar.
Frei zugänglicher Ausschnitt der Verbunddatenbank K10plus des GBV und des SWB mit für die Fernleihe und Direktlieferdienste relevanten Materialien.