Erscheinungsjahr
Medientyp
Fach
Sprache
Synonyme wurden verwendet für: Food • Food Science • Science
Suche ohne Synonyme: journal:(Journal of Food Science)
Verwendete Synonyme:
- lebensmittel
- nahrung
- nahrung fur menschen
- nahrungsmittel
Verwendete Synonyme:
- diet
- lebensmittelforschung
- lebensmittelherstellung
- lebensmitteltechnik
- lebensmitteltechnologie
- lebensmittelwissenschaft
Verwendete Synonyme:
- burgerliche wissenschaft
- wissenschaft
- wissenschaften
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Practical guides for x-ray photoelectron spectroscopy (XPS): Interpreting the carbon 1s spectrum
American Institute of Physics | 2021| -
XPS guide: Charge neutralization and binding energy referencing for insulating samples
Freier ZugriffAmerican Institute of Physics | 2020| -
Practical guides for x-ray photoelectron spectroscopy: Quantitative XPS
Freier ZugriffAmerican Institute of Physics | 2020| -
Assessment of the frequency and nature of erroneous x-ray photoelectron spectroscopy analyses in the scientific literature
Freier ZugriffAmerican Institute of Physics | 2020| -
X-ray photoelectron spectroscopy: A perspective on quantitation accuracy for composition analysis of homogeneous materials
Freier ZugriffAmerican Institute of Physics | 2020| -
Misconceptions in interpretation of nitrogen chemistry from x-ray photoelectron spectra
Freier ZugriffAmerican Institute of Physics | 2020| -
Consistency and reproducibility in atomic layer deposition
Freier ZugriffAmerican Institute of Physics | 2020| -
Practical guide for inelastic mean free paths, effective attenuation lengths, mean escape depths, and information depths in x-ray photoelectron spectroscopy
American Institute of Physics | 2020| -
Introductory guide to backgrounds in XPS spectra and their impact on determining peak intensities
American Institute of Physics | 2020| -
Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
American Institute of Physics | 2020| -
Practical guide to the use of backgrounds in quantitative XPS
Freier ZugriffAmerican Institute of Physics | 2021| -
High-temperature low-pressure chemical vapor deposition of β-Ga2O3
American Institute of Physics | 2020| -
Practical guides for x-ray photoelectron spectroscopy: Analysis of polymers
American Institute of Physics | 2020| -
Many routes to ferroelectric HfO2: A review of current deposition methods
American Institute of Physics | 2022| -
The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
American Institute of Physics | 2020| -
Next generation nanopatterning using small molecule inhibitors for area-selective atomic layer deposition
Freier ZugriffAmerican Institute of Physics | 2021| -
Guide to making XPS measurements on nanoparticles
Freier ZugriffAmerican Institute of Physics | 2020| -
Optimization of HiPIMS discharges: The selection of pulse power, pulse length, gas pressure, and magnetic field strength
American Institute of Physics | 2020| -
Thermal atomic layer etching of silicon nitride using an oxidation and “conversion etch” mechanism
American Institute of Physics | 2020| -
New strategies for conformal, superconformal, and ultrasmooth films by low temperature chemical vapor deposition
American Institute of Physics | 2020| -
Modeling of an atmospheric pressure plasma-liquid anodic interface: Solvated electrons and silver reduction
American Institute of Physics | 2020| -
Sample handling, preparation and mounting for XPS and other surface analytical techniques
American Institute of Physics | 2020| -
Introduction to topical collection: Reproducibility challenges and solutions with a focus on guides to XPS analysis
Freier ZugriffAmerican Institute of Physics | 2021| -
Plasma etching of wide bandgap and ultrawide bandgap semiconductors
Freier ZugriffAmerican Institute of Physics | 2020| -
Uranium and arsenic unregulated water issues on Navajo lands
Freier ZugriffAmerican Institute of Physics | 2020| -
High responsivity solar-blind metal-semiconductor-metal photodetector based on α-Ga2O3
American Institute of Physics | 2021| -
Effect of vacuum heat treatment on the oxidation kinetics of freestanding nanostructured NiCoCrAlY coatings deposited by high-velocity oxy-fuel spraying
American Institute of Physics | 2020| -
Self-healing ceramic coatings that operate in extreme environments: A review
American Institute of Physics | 2020| -
Role of consistent terminology in XPS reproducibility
Freier ZugriffAmerican Institute of Physics | 2020| -
Reduction of unintentional Si doping in β-Ga2O3 grown via plasma-assisted molecular beam epitaxy
American Institute of Physics | 2020| -
Atomic layer deposition of a uniform thin film on two-dimensional transition metal dichalcogenides
Freier ZugriffAmerican Institute of Physics | 2020| -
HfxZr1 − xO2 thin films for semiconductor applications: An Hf- and Zr-ALD precursor comparison
American Institute of Physics | 2020| -
Systematic compositional analysis of sputter-deposited boron-containing thin films
American Institute of Physics | 2021| -
Effect of crystallinity on thermal atomic layer etching of hafnium oxide, zirconium oxide, and hafnium zirconium oxide
American Institute of Physics | 2020| -
Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
American Institute of Physics | 2020| -
Chemically vapor deposited polymer nanolayers for rapid and controlled permeation of molecules and ions
American Institute of Physics | 2020| -
Manipulation of thin silver film growth on weakly interacting silicon dioxide substrates using oxygen as a surfactant
American Institute of Physics | 2020| -
Effect of probe geometry during measurement of >100 A Ga2O3 vertical rectifiers
American Institute of Physics | 2021| -
Heteroepitaxial growth of β-Ga2O3 films on SiC via molecular beam epitaxy
American Institute of Physics | 2020| -
Electron emission from particles strongly affects the electron energy distribution in dusty plasmas
American Institute of Physics | 2020| -
Structure evolution and mechanical properties of hard tantalum diboride films
American Institute of Physics | 2020| -
Etch selectivity during plasma-assisted etching of SiO2 and SiNx: Transitioning from reactive ion etching to atomic layer etching
American Institute of Physics | 2020|
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