Review of scientific instruments
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
Inhaltsverzeichnis
- 335
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A novel method to characterize photorefractive damage in quasiphase-matched wavelength convertersXu, C. Q. / Okayama, H. / Ogawa, Y. et al. | 2000
- 335
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ARTICLES - OPTICS; ATOMS and MOLECULES; SPECTROSCOPY - A novel method to characterize photorefractive damage in quasiphase-matched wavelength convertersXu, C.Q. et al. | 2000
- 338
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Lossless beam combiners for nearly equal laser frequenciesHaubrich, D. / Dornseifer, M. / Wynands, R. et al. | 2000
- 338
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ARTICLES - OPTICS; ATOMS and MOLECULES; SPECTROSCOPY - Lossless beam combiners for nearly equal laser frequenciesHaubrich, D. et al. | 2000
- 341
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ARTICLES - OPTICS; ATOMS and MOLECULES; SPECTROSCOPY - Laser frequency stabilization using linear magneto-opticsYashchuk, Valeriy V. et al. | 2000
- 341
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Laser frequency stabilization using linear magneto-opticsYashchuk, Valeriy V. / Budker, Dmitry / Davis, John R. et al. | 2000
- 347
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ARTICLES - OPTICS; ATOMS and MOLECULES; SPECTROSCOPY - A laser-locked cavity ring-down spectrometer employing an analog detection schemeSpence, T.G. et al. | 2000
- 347
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A laser-locked cavity ring-down spectrometer employing an analog detection schemeSpence, T. G. / Harb, C. C. / Paldus, B. A. et al. | 2000
- 354
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ARTICLES - OPTICS; ATOMS and MOLECULES; SPECTROSCOPY - Time-correlated photon counting technique robust against multiple photon events using a multianode photomultiplier tubeOhsuka, Shinji et al. | 2000
- 354
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Time-correlated photon counting technique robust against multiple photon events using a multianode photomultiplier tubeOhsuka, Shinji / Ohsugi, Akira / Takamoto, Hisayoshi et al. | 2000
- 361
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ARTICLES - OPTICS; ATOMS and MOLECULES; SPECTROSCOPY - Data acquisition card for fluctuation correlation spectroscopy allowing full access to the detected photon sequenceEid, John S. et al. | 2000
- 361
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Data acquisition card for fluctuation correlation spectroscopy allowing full access to the detected photon sequenceEid, John S. / Mu¨ller, Joachim D. / Gratton, Enrico et al. | 2000
- 369
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Toward the experimental observation of nonlinear effects in laser-electron beam scatteringMatsukado, Koji / Endo, Ichita / Takahashi, Tohru et al. | 2000
- 369
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ARTICLES - CHARGED PARTICLE SOURCES, OPTICS and ACCELERATION - Toward the experimental observation of nonlinear effects in laser-electron beam scatteringMatsukado, Koji et al. | 2000
- 376
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ARTICLES - CHARGED PARTICLE SOURCES, OPTICS and ACCELERATION - Pulsed magnetic quadrupole lenses for high rigidity beamsLi, G. et al. | 2000
- 376
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Pulsed magnetic quadrupole lenses for high rigidity beamsLi, G. / Czok, U. / Kalimov, A. et al. | 2000
- 380
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ARTICLES - CHARGED PARTICLE SOURCES, OPTICS and ACCELERATION - Production of radioactive ion beams using the in-flight techniqueHarss, B. et al. | 2000
- 380
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Production of radioactive ion beams using the in-flight techniqueHarss, B. / Pardo, R. C. / Rehm, K. E. et al. | 2000
- 388
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High current, low pressure plasma cathode electron gunGoebel, Dan M. / Watkins, Ron M. et al. | 2000
- 388
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ARTICLES - CHARGED PARTICLE SOURCES, OPTICS and ACCELERATION - High current, low pressure plasma cathode electron gunGoebel, Dan M. et al. | 2000
- 399
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ARTICLES - NUCLEAR PHYSICS, FUSION and PLASMAS - Pneumatic repetitive injector with a porous pellet generator for steady-state plasma fuelingViniar, I. et al. | 2000
- 399
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Pneumatic repetitive injector with a porous pellet generator for steady-state plasma fuelingViniar, I. / Sudo, S. et al. | 2000
- 403
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Effect of harmonic rf fields on the emissive probe characteristicsLho, T. / Hershkowitz, N. / Kim, G-H. et al. | 2000
- 403
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ARTICLES - NUCLEAR PHYSICS, FUSION and PLASMAS - Effect of harmonic rf fields on the emissive probe characteristicsLho, T. et al. | 2000
- 406
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ARTICLES - BASIC PHENOMENA - Spatio-temporal measurements of Trichel corona discharge using capacitive probe diagnosticGupta, Deepak K. et al. | 2000
- 406
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Spatio-temporal measurements of Trichel corona discharge using capacitive probe diagnosticGupta, Deepak K. / Ramachandran, H. / John, P. I. et al. | 2000
- 413
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Comparison between the discharge development in the two- and three-electrode spark gap switchesGolnabi, Hossein et al. | 2000
- 413
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ARTICLES - BASIC PHENOMENA - Comparison between the discharge development in the two- and three-electrode spark gap switchesGolnabi, Hossein et al. | 2000
- 420
-
ARTICLES - MICROSCOPY and IMAGING - Servomechanism for locking scanning tunneling microscope tip over surface nanostructuresIto, K.J. et al. | 2000
- 420
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Servomechanism for locking scanning tunneling microscope tip over surface nanostructuresIto, K. J. / Uehara, Y. / Ushioda, S. et al. | 2000
- 424
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ARTICLES - MICROSCOPY and IMAGING - A low-temperature ultrahigh vacuum scanning tunneling microscope with a split-coil magnet and a rotary motion stepper motor for high spatial resolution studies of surface magnetismPietzsch, O. et al. | 2000
- 424
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A low-temperature ultrahigh vacuum scanning tunneling microscope with a split-coil magnet and a rotary motion stepper motor for high spatial resolution studies of surface magnetismPietzsch, O. / Kubetzka, A. / Haude, D. et al. | 2000
- 431
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ARTICLES - MICROSCOPY and IMAGING - Variable temperature fluid stage for atomic force microscopyWorkman, R.K. et al. | 2000
- 431
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Variable temperature fluid stage for atomic force microscopyWorkman, R. K. / Manne, S. et al. | 2000
- 437
-
ARTICLES - MICROSCOPY and IMAGING - Dynamics of a plezoelectric tuning fork-optical fiber assembly in a near-field scanning optical microscopeShelimov, Konstantin B. et al. | 2000
- 437
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Dynamics of a piezoelectric tuning fork/optical fiber assembly in a near-field scanning optical microscopeShelimov, Konstantin B. / Davydov, Dmitri N. / Moskovits, Martin et al. | 2000
- 444
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ARTICLES - MICROSCOPY and IMAGING - Real time imaging of two-dimensional charge on dielectric surfacesBudakian, R. et al. | 2000
- 444
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Real time imaging of two-dimensional charge on dielectric surfacesBudakian, R. / Putterman, S. J. et al. | 2000
- 450
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Nuclear magnetic resonance spectrometer with a frequency range extended below the megahertz regionSitnikov, R. / Furo´, I. / Henriksson, U. et al. | 2000
- 450
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ARTICLES - CONDENSED MATTER; MATERIALS - Nuclear magnetic resonance spectrometer with a frequency range extended below the megahertz regionSitnikov, R. et al. | 2000
- 458
-
An efficient 8 T extraction vector magnetometer with sample rotation for routine operationDufeu, D. / Eyraud, E. / Lethuillier, P. et al. | 2000
- 458
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ARTICLES - CONDENSED MATTER; MATERIALS - An efficient 8 T extraction vector magnetometer with sample rotation for routine operationDufeu, D. et al. | 2000
- 462
-
Density-of-states effective mass and scattering parameter measurements by transport phenomena in thin filmsYoung, D. L. / Coutts, T. J. / Kaydanov, V. I. et al. | 2000
- 462
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ARTICLES - CONDENSED MATTER; MATERIALS - Density-of-states effective mass and scattering parameter measurements by transport phenomena in thin filmsYoung, D.L. et al. | 2000
- 467
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ARTICLES - CONDENSED MATTER; MATERIALS - Electron cyclotron resonance plasma source for ion assisted deposition of thin filmsVargheese, K.Deenamma et al. | 2000
- 467
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Electron cyclotron resonance plasma source for ion assisted deposition of thin filmsVargheese, K. Deenamma / Rao, G. Mohan et al. | 2000
- 473
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Measurement of the complex dielectric constant down to helium temperatures. I. Reflection method from 1 MHz to 20 GHz using an open ended coaxial lineMartens, H. C. F. / Reedijk, J. A. / Brom, H. B. et al. | 2000
- 473
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ARTICLES - CONDENSED MATTER; MATERIALS - Measurement of the complex dielectric constant down to helium temperatures. I. Reflection method from 1 MHz to 20 GHz using an open ended coaxial lineMartens, H.C.F. et al. | 2000
- 478
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ARTICLES - CONDENSED MATTER; MATERIALS - Measurement of the complex dielectric constant down to helium temperatures. II. Quasioptical technique from 0.03 to 1 THzReedijk, J.A. et al. | 2000
- 478
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Measurement of the complex dielectric constant down to helium temperatures. II. Quasioptical technique from 0.03 to 1 THzReedijk, J. A. / Martens, H. C. F. / Smits, B. J. G. et al. | 2000
- 482
-
Thermal scanning alternating current susceptometry with multiple pick-up coils for ranging local phenomena in high Tc superconductorsLaiho, R. / La¨hderanta, E. / Bo´di, A. C. et al. | 2000
- 482
-
ARTICLES - CONDENSED MATTER; MATERIALS - Thermal scanning alternating current susceptometry with multiple pick-up coils for ranging local phenomena in high Tc superconductorsLaiho, R. et al. | 2000
- 486
-
ARTICLES - CONDENSED MATTER; MATERIALS - Development and evaluation of an electrically detected magnetic resonance spectrometer operating at 900 MHzSato, Toshiyuki et al. | 2000
- 486
-
Development and evaluation of an electrically detected magnetic resonance spectrometer operating at 900 MHzSato, Toshiyuki / Yokoyama, Hidekatsu / Ohya, Hiroaki et al. | 2000
- 494
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ARTICLES - CONDENSED MATTER; MATERIALS - A technique for preparing submicrometer-size liquid film: Development of a new type of optical cellSakaguchi, Yoshifumi et al. | 2000
- 494
-
A technique for preparing submicrometer-size liquid film: Development of a new type of optical cellSakaguchi, Yoshifumi / Tamura, Kozaburo et al. | 2000
- 499
-
Metallic work function measurement in the range 2–3.3 eV using a blue light-emitting diode sourceSchletti, Reto / Wurz, Peter / Fro¨hlich, Theo et al. | 2000
- 499
-
ARTICLES - CONDENSED MATTER; MATERIALS - Metallic work function measurement in the range 2-3.3 eV using a blue light-emitting diode sourceSchletti, Reto et al. | 2000
- 504
-
A compact ultrahigh-vacuum system for the in situ investigation of III/V semiconductor surfacesGeng, Peter / Ma´rquez, Juan / Geelhaar, Lutz et al. | 2000
- 504
-
ARTICLES - CONDENSED MATTER; MATERIALS - A compact ultrahigh-vacuum system for the in situ investigation of III-V semiconductor surfacesGeng, Peter et al. | 2000
- 509
-
The National Institute of Standards and Technology glow discharge resonance ionization mass spectrometry systemPibida, L. / Hutchinson, J. M. R. / Wen, Jesse et al. | 2000
- 509
-
ARTICLES - CHEMISTRY - The National Institute of Standards and Technology glow discharge resonance ionization mass spectrometry systemPibida, L. et al. | 2000
- 516
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Electrochemical cell system for voltammetry of high purity solventsMay, Michael A. / Gupta, Vijay K. / Hounsokou, Karen et al. | 2000
- 516
-
ARTICLES - CHEMISTRY - Electrochemical cell system for voltammetry of high purity solventsMay, Michael A. et al. | 2000
- 519
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Continuous heatable Langmuir probe for flowing afterglow measurementsLaube´, Sylvain / Mostefaoui, Toufik / Rowe, Bertrand et al. | 2000
- 519
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ARTICLES - CHEMISTRY - Continuous heatable Langmuir probe for flowing afterglow measurementsLaubé, Sylvain et al. | 2000
- 522
-
Phase-sensitive multichannel detection system for chemical and biosensor arrays and fluorescence lifetime-based imagingRabinovich, Emmanuil / O’Brien, Michael J. / Brueck, Steven R. J. et al. | 2000
- 522
-
ARTICLES - BIOLOGY and MEDICINE - Phase-sensitive multichannel detection system for chemical and biosensor arrays and fluorescence lifetime-based imagingRabinovich, Emmanuil et al. | 2000
- 530
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Inflatable belt for the application of electrode arraysSadleir, R. J. / Fox, R. A. / Turner, V. F. et al. | 2000
- 530
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ARTICLES - BIOLOGY and MEDICINE - Inflatable belt for the application of electrode arraysSadleir, R.J. et al. | 2000
- 536
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Laser time-of-flight mass spectrometry for spaceBrinckerhoff, W. B. / Managadze, G. G. / McEntire, R. W. et al. | 2000
- 536
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ARTICLES - GRAVITY; GEOPHYSICS; ASTRONOMY and ASTROPHYSICS - Laser time-of-flight mass spectrometry for spaceBrinckerhoff, W.B. et al. | 2000
- 546
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Long-path monitoring of atmospheric aerosol extinction with an automated laser positioning systemWidada, Wahyu / Kuze, Hiroaki / Xue, Yanqun et al. | 2000
- 546
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ARTICLES - GRAVITY; GEOPHYSICS; ASTRONOMY and ASTROPHYSICS - Long-path monitoring of atmospheric aerosol extinction with an automated laser positioning systemWidada, Wahyu et al. | 2000
- 551
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ARTICLES - ELECTRONICS; ELECTROMAGNETIC TECHNOLOGY; MICROWAVES - Extraction of radio frequency from electromagnetic surface waves guided by metallic stripsFriedman, M. et al. | 2000
- 551
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Extraction of radio frequency from electromagnetic surface waves guided by metallic stripsFriedman, M. et al. | 2000
- 554
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ARTICLES - ELECTRONICS; ELECTROMAGNETIC TECHNOLOGY; MICROWAVES - Compact THz-radiation source consisting of a bulk semiconductor, a mode-locked fiber laser, and a 2 T permanent magnetOno, Shingo et al. | 2000
- 554
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Compact THz-radiation source consisting of a bulk semiconductor, a mode-locked fiber laser, and a 2 T permanent magnetOno, Shingo / Tsukamoto, Takeyo / Sakai, Masahiro et al. | 2000
- 557
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ARTICLES - ELECTRONICS; ELECTROMAGNETIC TECHNOLOGY; MICROWAVES - Very low frequency quadrature oscillatorBayard, J. et al. | 2000
- 557
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Very low frequency quadrature oscillatorBayard, J. et al. | 2000
- 563
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High voltage multichannel wave form generator for liquid crystal researchMatuszczyk, T. / Beccherelli, R. et al. | 2000
- 563
-
ARTICLES - ELECTRONICS; ELECTROMAGNETIC TECHNOLOGY; MICROWAVES - High voltage multichannel wave form generator for liquid crystal researchMatuszczyk, T. et al. | 2000
- 567
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ARTICLES - ELECTRONICS; ELECTROMAGNETIC TECHNOLOGY; MICROWAVES - Eddy current testing probe with dual half-cylindrical coilsBae, Byung-Hoon et al. | 2000
- 567
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Eddy current testing probe with dual half-cylindrical coilsBae, Byung-Hoon / Choi, Jung-Mi / Kim, Soo-Yong et al. | 2000
- 571
-
ARTICLES - ELECTRONICS; ELECTROMAGNETIC TECHNOLOGY; MICROWAVES - Two-dimensional finite element model for a long rectangular eddy current surface coilPtchelintsev, Andrei et al. | 2000
- 571
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Two-dimensional finite element model for a long rectangular eddy current surface coilPtchelintsev, Andrei / de Halleux, Benoit et al. | 2000
- 577
-
Comparison of dc and ac excitation of a sealed CO2 laserLee, Dong-Hoon / Chung, Hyun-Ju / Kim, Hee-Je et al. | 2000
- 577
-
NOTES - Comparison of dc and ac excitation of a sealed CO2 laserLee, Dong-Hoon et al. | 2000
- 579
-
Pulse stretching due to partial temporal overlap of two modes in a TEA CO2 laserNilaya, J. Padma / Biswas, Dhruba J. et al. | 2000
- 579
-
NOTES - Pulse stretching due to partial temporal overlap of two modès in a TEA CO2 laserNilaya, J.Padma et al. | 2000
- 581
-
Versatile sample viewing system with large magnification rangeOcker, K. D. / Thonnard, N. / Joyner, C. F. et al. | 2000
- 581
-
NOTES - Versatile sample viewing system with large magnification rangeOcker, K.D. et al. | 2000
- 583
-
Contact-free determination of ultralow resistances of micron-sized wiresRossmy, T. / Skwirblies, S. / Ko¨tzler, J. et al. | 2000
- 583
-
NOTES - Contact-free determination of ultralow resistances of micron-sized wiresRossmy, T. et al. | 2000
- 585
-
A W–InSb point contact diode for harmonic generation and mixing in the visibleMoretti, A. / Maccioni, E. / Nannizzi, M. et al. | 2000
- 585
-
NOTES - A W-InSb point contact diode for harmonic generation and mixing in the visibleMoretti, A. et al. | 2000
- 587
-
Measuring the Hall weighting function for square and cloverleaf geometriesScherschligt, Julia K. / Koon, Daniel W. et al. | 2000
- 587
-
NOTES - Measuring the Hall weighting function for square and cloverleaf geometriesScherschligt, Julia K. et al. | 2000
- 589
-
A simple technique for height calibration for z piezo with Angstrom resolution of scanning probe microscopesPal, S. / Banerjee, S. et al. | 2000
- 589
-
NOTES - A simple technique for height calibration for z plezo with Angstrom resolution of scanning probe microscopesPal, S. et al. | 2000
- 591
-
A practical all-metal flange-seal for high and low temperaturesMoreh, R. / Finkelstein, Y. et al. | 2000
- 591
-
NOTES - A practical all-metal flange-seal for high and low temperaturesMoreh, R. et al. | 2000
- 593
-
ARTICLES - NEW INSTRUMENTS, MATERIALS, and COMPONENTS New Instruments| 2000
- 596
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ARTICLES - NEW INSTRUMENTS, MATERIALS, and COMPONENTS New Materials and Components| 2000
- 600
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CUMULATIVE AUTHOR INDEX| 2000
- 603
-
Heavy-ion sources: The Star, or the Cinderella, of the ion-implantation firmament? (invited)Freeman, Harry et al. | 2000
- 603
-
PLENARY SESSION - Heavy-ion sources: The Star, or the Cinderella, of the ion-implantation firmament? (invited)Freeman, Harry et al. | 2000
- 612
-
ECR ION SOURCES (I) - The electron cyclotron resonance (1 + n+) systems and the ISOL radioactive beam facilities (invited)Geller, R. et al. | 2000
- 612
-
The electron cyclotron resonance (1+n+) systems and the ISOL radioactive beam facilities (invited)Geller, R. et al. | 2000
- 617
-
Electron cyclotron resonance charge breeder (invited)Sortais, P. / Bruandet, J. F. / Bouly, J. L. et al. | 2000
- 617
-
ECR ION SOURCES (I) - Electron cyclotron resonance charge breeder (invited)Sortais, P. et al. | 2000
- 623
-
ECR ION SOURCES (I) - Role of low charge state ions in electron cyclotron resonance ion source plasmasDrentje, A.G. et al. | 2000
- 623
-
Role of low charge state ions in electron cyclotron resonance ion source plasmasDrentje, A. G. / Girard, A. / Hitz, D. et al. | 2000
- 627
-
The interaction of slow highly charged ions on surfaces (invited)Briand, J.-P. / Giardino, G. / Borsoni, G. et al. | 2000
- 627
-
ECR ION SOURCES (II) - The interaction of slow highly charged ions on surfaces (invited)Briand, J.-P. et al. | 2000
- 631
-
The contribution of the INFN-LNS to the development of electron cyclotron resonance ion sources (invited)Gammino, S. / Ciavola, G. et al. | 2000
- 631
-
ECR ION SOURCES (II) - The contribution of the INFN-LNS to the development of electron cyclotron resonance on sources (invited)Gammino, S. et al. | 2000
- 637
-
Recent performance of Japanese electron cyclotron resonance ion sources (invited)Nakagawa, T. / Yano, Y. et al. | 2000
- 637
-
ECR ION SOURCES (II) - Recent performance of Japanese electron cyclotron resonance ion sources (invited)Nakagawa, T. et al. | 2000
- 643
-
ECR ION SOURCES (II) - Design of an electron cyclotron resonance !on source for the isotope separator and accelerator at TRIUMFYuan, D. et al. | 2000
- 643
-
Design of an electron cyclotron resonance ion source for the isotope separator and accelerator at TRIUMFYuan, D. / Jayamanna, K. / Dombsky, M. et al. | 2000
- 646
-
ECR ION SOURCES (II) - Development of ECR ion sources in China (invited)Zhao, H.W. et al. | 2000
- 646
-
Development of ECR ion sources in China (invited)Zhao, H. W. / Wei, B. W. / Liu, Z. W. et al. | 2000
- 651
-
POSTER SESSION A - I. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production and Extraction - Investigation of different oven types for sample evaporation in the CAPRICE electron cyclotron resonance ion sourceLang, R. et al. | 2000
- 651
-
Investigation of different oven types for sample evaporation in the CAPRICE electron cyclotron resonance ion sourceLang, R. / Bossler, J. / Schulte, H. et al. | 2000
- 654
-
Selective minority-ion heating in the afterglow of an electron cyclotron resonance ion sourceNadzeyka, A. / Meyer, D. / Barzangy, F. et al. | 2000
- 654
-
POSTER SESSION A - I. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production and Extraction - Selective minority-ion heating in the afterglow of an electron cyclotron resonance ion sourceNadzeyka, A. et al. | 2000
- 657
-
Enhanced production of multi-charged ions using pulse-modulated microwave in a 2.45 GHz electron cyclotron resonance sourceKato, Yushi / Kobayashi, Shigeki / Ishii, Shigeyuki et al. | 2000
- 657
-
POSTER SESSION A - I. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production and Extraction - Enhanced production of multi-charged ions using pulse-modulated microwave in a 2.45 GHz electron cyclotron resonance sourceKato, Yushi et al. | 2000
- 660
-
Influence of plasma-wall interaction on high charge state production in electron cyclotron resonance ion sourcesMeyer, D. / Schmitz, H. / Daube, Th. et al. | 2000
- 660
-
POSTER SESSION A - I. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Simulations for ECR Ion Sources - Influence of plasma-wall interaction on high charge state production in electron cyclotron resonance ion sourcesMeyer, D. et al. | 2000
- 663
-
Ionization equilibria and efficiency for electron cyclotron resonance ion sourcesCavenago, M. et al. | 2000
- 663
-
POSTER SESSION A - I. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Simulations for ECR Ion Sources - Ionization equilibria and efficiency for electron cyclotron resonance ion sourcesCavenago, M. et al. | 2000
- 666
-
A one-dimensional axial electron cyclotron resonance source modelEdgell, D. H. / Kim, J. S. / Wong, S. K. et al. | 2000
- 666
-
POSTER SESSION A - I. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Simulations for ECR Ion Sources - A one-dimensional axial electron cyclotron resonance source modelEdgell, D.H. et al. | 2000
- 669
-
POSTER SESSION A - I. FUNDAMENTAL PHENOMENA FOR ION SOURCES - C. Diagnostics and Simulations (Except ECR Sources) - Formation of multi-charged ions and plasma stability at quasigasdynamic plasma confinement in a mirror magnetic trapGolubev, S.V. et al. | 2000
- 669
-
Formation of multi-charged ions and plasma stability at quasigasdynamic plasma confinement in a mirror magnetic trapGolubev, S. V. / Razin, S. V. / Semenov, V. E. et al. | 2000
- 672
-
POSTER SESSION A - I. FUNDAMENTAL PHENOMENA FOR ION SOURCES - C. Diagnostics and Simulations (Except ECR Sources) - On the use of magnetic buckets for ion beam profile tailoringMacGill, R.A. et al. | 2000
- 672
-
On the use of magnetic buckets for ion beam profile tailoringMacGill, R. A. / Vizir, A. / Brown, I. G. et al. | 2000
- 675
-
POSTER SESSION A - I. FUNDAMENTAL PHENOMENA FOR ION SOURCES - C. Diagnostics and Simulations (Except ECR Sources) - An investigation into the mechanism of pseudospark producing metal ion beamsCai, C.G. et al. | 2000
- 675
-
An investigation into the mechanism of pseudospark producing metal ion beamsCai, C. G. / Zhao, W. J. / Yan, S. et al. | 2000
- 678
-
POSTER SESSION A - I. FUNDAMENTAL PHENOMENA FOR ION SOURCES - C. Diagnostics and Simulations (Except ECR Sources) - Approximation of the plasma inhomogeneity by broad-beam measurements and simulationTartz, M. et al. | 2000
- 678
-
Approximation of the plasma inhomogeneity by broad-beam measurements and simulationTartz, M. / Hartmann, E. / Deltschew, R. et al. | 2000
- 681
-
POSTER SESSION A - NOVEL ION SOURCES - A. Electron Beam Ion Sources and Electron Beam Ion Traps - Characteristics of the beam line at the Tokyo electron beam ion trapShimizu, Hiroshi et al. | 2000
- 681
-
Characteristics of the beam line at the Tokyo electron beam ion trapShimizu, Hiroshi / Currell, Frederick J. / Ohtani, Shunsuke et al. | 2000
- 684
-
Injection of various metallic elements into an electron beam ion trap: Techniques needed for systematic investigations of isoelectronic sequencesNakamura, Nobuyuki / Kinugawa, Tohru / Shimizu, Hiroshi et al. | 2000
- 684
-
POSTER SESSION A - NOVEL ION SOURCES - A. Electron Beam Ion Sources and Electron Beam Ion Traps - Injection of various metallic elements into an electron beam ion trap: Techniques needed for systematic investigations of isoelectronic sequencesNakamura, Nobuyuki et al. | 2000
- 687
-
POSTER SESSION A - NOVEL ION SOURCES - A. Electron Beam Ion Sources and Electron Beam Ion Traps - High energy operation of the Tokyo-electron beam ion trap-present statusKuramoto, Hideharu et al. | 2000
- 687
-
High energy operation of the Tokyo-electron beam ion trap/present statusKuramoto, Hideharu / Shimizu, Hiroshi / Nakamura, Nobuyuki et al. | 2000
- 690
-
Highly charged ions produced in a warm electron beam ion trapOvsyannikov, V. P. / Zschornack, G. / Grossmann, F. et al. | 2000
- 690
-
POSTER SESSION A - NOVEL ION SOURCES - A. Electron Beam Ion Sources and Electron Beam Ion Traps - Highly charged ions produced in a warm electron beam ion trapOvsyannikov, V.P. et al. | 2000
- 693
-
POSTER SESSION A - NOVEL ION SOURCES - B. Hydrogen Negative Ion Sources - H- ion source using a localized virtual magnetic filter in the plasma electrode: Type-I localized virtual magnetic filterOka, Y. et al. | 2000
- 693
-
H− ion source using a localized virtual magnetic filter in the plasma electrode: Type-I localized virtual magnetic filterOka, Y. / Kaneko, O. / Tsumori, K. et al. | 2000
- 696
-
A new scheme of direct beam chopping in a negative hydrogen ion sourceShinto, K. / Takagi, A. / Ikegami, K. et al. | 2000
- 696
-
POSTER SESSION A - NOVEL ION SOURCES - B. Hydrogen Negative Ion Sources - A new scheme of direct beam chopping in a negative hydrogen ion sourceShinto, K. et al. | 2000
- 698
-
POSTER SESSION A - NOVEL ION SOURCES - C Vacuum Arc Ion Sources - Axial ion charge state distribution in the vacuum arc plasma jetKeidar, M. et al. | 2000
- 698
-
Axial ion charge state distribution in the vacuum arc plasma jetKeidar, M. / Brown, I. G. / Beilis, I. I. et al. | 2000
- 701
-
POSTER SESSION A - NOVEL ION SOURCES - C Vacuum Arc Ion Sources - Enhanced ion charge states in vacuum arc plasmas using a "current spike" methodBugaev, A.S. et al. | 2000
- 701
-
Enhanced ion charge states in vacuum arc plasmas using a “current spike” methodBugaev, A. S. / Oks, E. M. / Yushkov, G. Yu. et al. | 2000
- 704
-
POSTER SESSION A - NOVEL ION SOURCES - C Vacuum Arc Ion Sources - Very broad vacuum arc ion and plasma sources with extended large area cathodesRyabchikov, A.I. et al. | 2000
- 704
-
Very broad vacuum arc ion and plasma sources with extended large area cathodesRyabchikov, A. I. / Stepanov, I. B. / Dektjarev, S. V. et al. | 2000
- 707
-
Metal vapor vacuum arc ion source development at GSIReich, H. / Spa¨dtke, P. / Oks, E. M. et al. | 2000
- 707
-
POSTER SESSION A - NOVEL ION SOURCES - C Vacuum Arc Ion Sources - Metal vapor vacuum arc ion source development at GSIReich, H. et al. | 2000
- 710
-
POSTER SESSION A - NOVEL ION SOURCES - D. Microwave Ion Sources - Holey-plate ion sourceYoshida, Yoshikazu et al. | 2000
- 710
-
Holey-plate ion sourceYoshida, Yoshikazu et al. | 2000
- 713
-
POSTER SESSION A - NOVEL ION SOURCES - D. Microwave Ion Sources - Improvement of microwave ion source for higher B+ ion currentOkada, M. et al. | 2000
- 713
-
Improvement of microwave ion source for higher B+ ion currentOkada, M. / Sakudo, N. / Hayashi, K. et al. | 2000
- 716
-
POSTER SESSION A - NOVEL ION SOURCES - D. Microwave Ion Sources - Large-area ion source combining microwaves with inductively coupled plasmaOkuji, S. et al. | 2000
- 716
-
Large-area ion source combining microwaves with inductively coupled plasmaOkuji, S. / Sakudo, N. / Hayashi, K. et al. | 2000
- 719
-
POSTER SESSION A - NOVEL ION SOURCES - E. New Concept Ion Sources - Characteristics of ion beams extracted from a compact powdery sample ion sourceWada, M. et al. | 2000
- 719
-
Characteristics of ion beams extracted from a compact powdery sample ion sourceWada, M. / Kasuya, T. / Sasao, M. et al. | 2000
- 722
-
Nanobeam production with the multicusp ion sourceLee, Y. / Ji, Q. / Leung, K. N. et al. | 2000
- 722
-
POSTER SESSION A - NOVEL ION SOURCES - E. New Concept'Ion Sources - Nanobeam production with the multicusp ion sourceLee, Y. et al. | 2000
- 725
-
Criterion for decrease of electric field at ionization point of liquid-metal ion sourcesGotoh, Y. / Tsuji, H. / Ishikawa, J. et al. | 2000
- 725
-
POSTER SESSION A - NOVEL ION SOURCES - E. New Concept'Ion Sources - Criterion for decrease of electric field at ionization point of liquid-metal ion sourcesGotoh, Y. et al. | 2000
- 728
-
Further development of a gaseous ion source based on low-pressure hollow cathode glowVizir, A. V. / Yushkov, G. Yu. / Oks, E. M. et al. | 2000
- 728
-
POSTER SESSION A - NOVEL ION SOURCES - E. New Concept'Ion Sources - Further development of a gaseous ion source based on low-pressure hollow cathode glowVizir, A.V. et al. | 2000
- 731
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Space Propulsion - Electron energy distribution function in a Hall-type thruster (abstract)Bacal, M. et al. | 2000
- 731
-
Electron energy distribution function in a Hall-type thruster (abstract)Bacal, M. / Fedotov, V. Yu. / Guerrini, G. et al. | 2000
- 732
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Space Propulsion - Broad-beam modeling and experiments for electric spacecraft propulsionTartz, M. et al. | 2000
- 732
-
Broad-beam modeling and experiments for electric spacecraft propulsionTartz, M. / Hartmann, E. / Deltschew, R. et al. | 2000
- 735
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. AMS and Surface Analysis - Magnetic field profile dependence of zirconium flux in sputtering ion sourcesSuzuki, T. et al. | 2000
- 735
-
Magnetic field profile dependence of zirconium flux in sputtering ion sourcesSuzuki, T. / Kawai, Y. / Saburi, T. et al. | 2000
- 738
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Neutral Beam Injector for Fusion - Steady state operation of an ampere-class hydrogen negative ion sourceMiyamoto, Naoki et al. | 2000
- 738
-
Steady state operation of an ampere-class hydrogen negative ion sourceMiyamoto, Naoki / Fujiwara, Yukio / Miyamoto, Kenji et al. | 2000
- 741
-
Recovery of cesium in the hydrogen negative ion sourcesBelchenko, Yu. I. / Oka, Y. / Kaneko, O. et al. | 2000
- 741
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Neutral Beam Injector for Fusion - Recovery of cesium in the hydrogen negative ion sourcesBelchenko, Yu I. et al. | 2000
- 744
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Neutral Beam Injector for Fusion - Neutral beams for the International Thermonuclear Experimental ReactorInoue, T. et al. | 2000
- 744
-
Neutral beams for the International Thermonuclear Experimental ReactorInoue, T. / Di Pietro, E. / Mondino, P. L. et al. | 2000
- 747
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Neutral Beam Injector for Fusion - Computational studies on ion source plasmas of the neutral beam injection systemKashiwagi, M. et al. | 2000
- 747
-
Computational studies on ion source plasmas of the neutral beam injection systemKashiwagi, M. / Ido, S. / Okumura, Y. et al. | 2000
- 751
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Neutral Beam Injector for Fusion - Power flow in the negative-Ion based neutral beam injection for JT-60Kuriyama, M. et al. | 2000
- 751
-
Power flow in the negative-ion based neutral beam injection for JT-60Kuriyama, M. / Akino, N. / Ebisawa, N. et al. | 2000
- 755
-
Study of plasma uniformity on JT-60U negative ion sourceKawai, M. / Grisham, L. / Itoh, T. et al. | 2000
- 755
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Neutral Beam Injector for Fusion - Study of plasma uniformity on JT-60U negative ion sourceKawai, M. et al. | 2000
- 758
-
Alice ion source and its high voltage platformCavenago, M. / Kulevoy, T. et al. | 2000
- 758
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - D. Accelerator Injection - Alice ion source and its high voltage platformCavenago, M. et al. | 2000
- 761
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - D. Accelerator Injection - ATLAS 10 GHz electron cyclotron resonance ion source upgrade projectMoehs, D.P. et al. | 2000
- 761
-
ATLAS 10 GHz electron cyclotron resonance ion source upgrade projectMoehs, D. P. / Vondrasek, R. / Pardo, R. C. et al. | 2000
- 764
-
Ion source development for isotope separator on-line based radioactive nuclear beam facility at KEK-TanashiJeong, S. C. / Ishiyama, H. / Ishida, Y. et al. | 2000
- 764
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - D. Accelerator Injection - Ion source development for isotope separator on-line based radioactive nuclear beam facility at KEK-TanashiJeong, S.C. et al. | 2000
- 767
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - D. Accelerator Injection - Proton injector operational results on a high-power continuous-wave radio-frequency quadrupole acceleratorSherman, Joseph D. et al. | 2000
- 767
-
Proton injector operational results on a high-power continuous-wave radio-frequency quadrupole acceleratorSherman, Joseph D. / Bolme, Gerald O. / Hansborough, Lash D. et al. | 2000
- 771
-
TRIPS: The high intensity proton source for the TRASCO projectCelona, L. / Ciavola, G. / Gammino, S. et al. | 2000
- 771
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - D. Accelerator Injection - TRIPS: The high intensity proton source for the TRASCO projectCelona, L. et al. | 2000
- 774
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - D. Accelerator Injection - Status report on electron cyclotron resonance Ion source operation at the Flerov Laboratory of Nuclear Reactions (Joint Institute for Nuclear Research) cyclotronsKutner, V.B. et al. | 2000
- 774
-
Status report on electron cyclotron resonance ion source operation at the Flerov Laboratory of Nuclear Reactions (Joint Institute for Nuclear Research) cyclotronsKutner, V. B. / Bogomolov, S. L. / Efremov, A. A. et al. | 2000
- 777
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - D. Accelerator Injection - A plan for on-line production and acceleration of radioactive isotope beams by use of electron cyclotron resonance ion source NANOGANMatsuta, K. et al. | 2000
- 777
-
A plan for on-line production and acceleration of radioactive isotope beams by use of electron cyclotron resonance ion source NANOGANMatsuta, K. / Fukuda, M. / Mihara, M. et al. | 2000
- 780
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - Molecular ion implanter equipped with liquid-metal alloy ion sourceGotoh, Y. et al. | 2000
- 780
-
Molecular ion implanter equipped with liquid-metal alloy ion sourceGotoh, Y. / Tsuji, H. / Ishikawa, J. et al. | 2000
- 783
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - High current and high intensity pulsed ion-beam sources for combined treatment of materialsRyabchikov, A.I. et al. | 2000
- 783
-
High current and high intensity pulsed ion-beam sources for combined treatment of materialsRyabchikov, A. I. / Petrov, A. V. / Stepanov, I. B. et al. | 2000
- 786
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - The L3A facility at the Vinca Institute: Surface modification of materials, by heavy Ion beams from an electron cyclotron resonance Ion sourceDobrosavljevic, A. et al. | 2000
- 786
-
The L3A facility at the Vincˇa Institute: Surface modification of materials, by heavy ion beams from an electron cyclotron resonance ion sourceDobrosavljevic´, A. / Milosavljevic´, M. / Bibic´, N. et al. | 2000
- 789
-
Specific modification of polysulfone with cluster bombardment with assistance of Ar ion irradiationXu, Guochun / Hibino, Y. / Awazu, K. et al. | 2000
- 789
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - Specific modification of polysulfone with cluster bombardment with assistance of Ar ion irradiationXu, Guochun et al. | 2000
- 793
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - Theoretical analysis of the embedded layer formed by high-energy Au implantation into Si(II)Nakagawa, S.T. et al. | 2000
- 793
-
Theoretical analysis of the embedded layer formed by high-energy Au implantation into Si(II)Nakagawa, S. T. / Nakano, S. / Ogiso, H. et al. | 2000
- 797
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - A negative ion beam application to artificial formation of neuron network in cultureTsuji, Hiroshi et al. | 2000
- 797
-
A negative ion beam application to artificial formation of neuron network in cultureTsuji, Hiroshi / Sato, Hiroko / Baba, Takahiro et al. | 2000
- 800
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - Microwave plasma source for high current ion beam neutralizationKorzec, D. et al. | 2000
- 800
-
Microwave plasma source for high current ion beam neutralizationKorzec, D. / Mu¨ller, A. / Engemann, J. et al. | 2000
- 804
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - Negative-ion implanter for powders and its application to nanometer-sized metal particle formation in the surface of glass beadsTsuji, Hiroshi et al. | 2000
- 804
-
Negative-ion implanter for powders and its application to nanometer-sized metal particle formation in the surface of glass beadsTsuji, Hiroshi / Kido, Shunsuke / Sasaki, Hitoshi et al. | 2000
- 807
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - High current injectors for heavy ion driven inertial fusionKwan, J.W. et al. | 2000
- 807
-
High current injectors for heavy ion driven inertial fusionKwan, J. W. et al. | 2000
- 810
-
Electron beam ion sources in the reflex mode of operation (review and progress report) (invited)Donets, E. D. et al. | 2000
- 810
-
POSTER SESSION A - EBIS AND ION EXTRACTION - Electron beam ion sources in the reflex mode of operation (review and progress report) (invited)Donets, E.D. et al. | 2000
- 816
-
POSTER SESSION A - EBIS AND ION EXTRACTION - Electron beam ion sources and traps (invited)Becker, Reinard et al. | 2000
- 816
-
Electron beam ion sources and traps (invited)Becker, Reinard et al. | 2000
- 820
-
POSTER SESSION A - EBIS AND ION EXTRACTION - Simulation of ion extraction and beam transport (invited)Spädtke, P. et al. | 2000
- 820
-
Simulation of ion extraction and beam transport (invited)Spa¨dtke, P. / Mu¨hle, C. et al. | 2000
- 826
-
POSTER SESSION A - EBIS AND ION EXTRACTION - Status of vacuum arc ion sources (invited) (abstract)Brown, Ian et al. | 2000
- 826
-
Status of vacuum arc ion sources (invited) (abstract)Brown, Ian et al. | 2000
- 827
-
POSTER SESSION A - EBIS AND ION EXTRACTION - Pulsed vacuum-arc ion source operated with a "triggerless" arc initiation methodAnders, A. et al. | 2000
- 827
-
Pulsed vacuum-arc ion source operated with a “triggerless” arc initiation methodAnders, A. / Schein, J. / Qi, N. et al. | 2000
- 830
-
Status and new developments of the high intensity electron cyclotron resonance source light ion continuous wave, and pulsed mode (invited)Lagniel, J.-M. / Beauvais, P.-Y. / Bogard, D. et al. | 2000
- 830
-
POSTER SESSION A - PROTON ION SOURCES AND ECR ION SOURCES (III) - Status and new developments of the high intensity electron cyclotron resonance source light ion continuous wave, and pulsed mode (invited)Lagniel, J.-M. et al. | 2000
- 836
-
POSTER SESSION A - PROTON ION SOURCES AND ECR ION SOURCES (III) - The Frankfurt 200 mA proton sourceHollinger, R. et al. | 2000
- 836
-
The Frankfurt 200 mA proton sourceHollinger, R. / Beller, P. / Volk, K. et al. | 2000
- 839
-
Fundamental aspects of electron cyclotron resonance ion sources: From classical to large superconducting devices (invited)Hitz, Denis / Melin, Ge´rard / Girard, Alain et al. | 2000
- 839
-
POSTER SESSION A - PROTON ION SOURCES AND ECR ION SOURCES (III) - Fundamental aspects of electron cyclotron resonance ion sources: From classical to large superconducting devices (invited)Hitz, Denis et al. | 2000
- 846
-
Dynamic simulations of the interchange instability, ion production, and electron heating processes in an electron cyclotron resonance ion source plasmaNiimura, M. / Lamoureux, M. / Goto, A. et al. | 2000
- 846
-
POSTER SESSION A - PROTON ION SOURCES AND ECR ION SOURCES (III) - Dynamic simulations of the interchange instability, ion production, and electron heating processes in an electron cyclotron resonance ion source plasmaNiimura, M. et al. | 2000
- 850
-
Multicomponent consideration of electron fraction of electron-cyclotron resonance source plasmaShirkov, G. et al. | 2000
- 850
-
POSTER SESSION A - PROTON ION SOURCES AND ECR ION SOURCES (III) - Multicomponent consideration of electron fraction of electron-cyclotron resonance source plasmaShirkov, G. et al. | 2000
- 853
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Selection of the powdery metal hydride best for producing H- by thermal desorptionKawano, H. et al. | 2000
- 853
-
Selection of the powdery metal hydride best for producing H− by thermal desorptionKawano, H. / Tanaka, A. / Sugimoto, S. et al. | 2000
- 856
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Selection of the substrate metal best for thermal positive ionizationKawano, H. et al. | 2000
- 856
-
Selection of the substrate metal best for thermal positive ionizationKawano, H. / Mine, H. / Moriyama, M. et al. | 2000
- 859
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Influence of electron injection on electron cyclotron resonance plasma properties and reflected mode electrons (abstract)Ovsyannikov, V.P. et al. | 2000
- 859
-
Influence of electron injection on electron cyclotron resonance plasma properties and reflected mode electrons (abstract)Ovsyannikov, V. P. / Ullmann, F. / Zschornack, G. et al. | 2000
- 860
-
Production of intense 48Ca ion beam at the U-400 cyclotronKutner, V. B. / Bogomolov, S. L. / Efremov, A. A. et al. | 2000
- 860
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Production of intense 48Ca ion beam at the U-400 cyclotronKutner, V.B. et al. | 2000
- 863
-
Effect of a biased probe on the afterglow operation of an ECR4 ion sourceHill, C. E. / Ku¨chler, D. / Wenander, F. et al. | 2000
- 863
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Effect of a biased probe on the afterglow operation of an ECR4 ion sourceHill, C.E. et al. | 2000
- 866
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Comparison of electron cyclotron resonance plasma characteristics discharged by 7.0, 8.0, and 9.4 GHzKawai, Y. et al. | 2000
- 866
-
Comparison of electron cyclotron resonance plasma characteristics discharged by 7.0, 8.0, and 9.4 GHzKawai, Y. / Saburi, T. / Kim, S-H. et al. | 2000
- 869
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Production of highly charged ions in electron cyclotron resonance ion sources using an electrode in two modesBiri, S. et al. | 2000
- 869
-
Production of highly charged ions in electron cyclotron resonance ion sources using an electrode in two modesBiri, S. / Kene´z, L. / Valek, A. et al. | 2000
- 872
-
Increasing the space-charge limit and other effects of cesium seeding in hydrogen negative ion sourcesWhealton, J. H. / Bacal, M. / Bruneteau, J. et al. | 2000
- 872
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Increasing the space-charge limit and other effects of cesium seeding in hydrogen negative ion sourcesWhealton, J.H. et al. | 2000
- 875
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Simulations - Beam instability excited by the magnetic filterNaitou, Hiroshi et al. | 2000
- 875
-
Beam instability excited by the magnetic filterNaitou, Hiroshi / Ohi, Kazuo / Fukumasa, Osamu et al. | 2000
- 877
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Simulations - Relation between vapor Cs and adsorbed Cs in H- ion sourceOgasawara, M. et al. | 2000
- 877
-
Relation between vapor Cs and adsorbed Cs in H− ion sourceOgasawara, M. / Morishita, T. / Hatayama, A. et al. | 2000
- 880
-
Numerical simulation of cesium cooling effects in H− ion sourceMorishita, T. / Ogasawara, M. / Hatayama, A. et al. | 2000
- 880
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Simulations - Numerical simulation of cesium cooling effects in H- ion sourceMorishita, T. et al. | 2000
- 883
-
Monte Carlo simulation of negative ion production in the negative hydrogen ion sourceUematsu, M. / Morishita, T. / Hatayama, A. et al. | 2000
- 883
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Simulations - Monte Carlo simulation of negative ion production in the negative hydrogen ion sourceUematsu, M. et al. | 2000
- 887
-
Theory and simulations of electron beam ion source in reflex modeDonets, E. D. / Donets, E. E. / Syresin, E. M. et al. | 2000
- 887
-
POSTER SESSION B - 2. NOVEL ION SOURCES - A. Electron Beam Ion Sources - Theory and simulations of electron beam ion source in reflex modeDonets, E.D. et al. | 2000
- 890
-
POSTER SESSION B - 2. NOVEL ION SOURCES - A. Electron Beam Ion Sources - Compact electron-beam ion trap using NdFeB permanent magnetsMotohashi, Kenji et al. | 2000
- 890
-
Compact electron-beam ion trap using NdFeB permanent magnetsMotohashi, Kenji / Moriya, Akihiko / Yamada, Hiroyuki et al. | 2000
- 893
-
POSTER SESSION B - 2. NOVEL ION SOURCES - A. Electron Beam Ion Sources - Status of the Brookhaven National Laboratory high current electron beam ion source test standBeebe, E. et al. | 2000
- 893
-
Status of the Brookhaven National Laboratory high current electron beam ion source test standBeebe, E. / Alessi, J. / Bellavia, S. et al. | 2000
- 896
-
POSTER SESSION B - 2. NOVEL ION SOURCES - A. Electron Beam Ion Sources - A study of electron strings and their use for efficient production of highly charged ionsDonets, E.D. et al. | 2000
- 896
-
A study of electron strings and their use for efficient production of highly charged ionsDonets, E. D. / Donets, D. E. / Donets, E. E. et al. | 2000
- 899
-
Electron cyclotron resonance ion source for high currents of mono- and multicharged ion and general purpose unlimited lifetime application on implantation devicesBieth, C. / Bouly, J. L. / Curdy, J. C. et al. | 2000
- 899
-
POSTER SESSION B - 2. NOVEL ION SOURCES - A. Electron Beam Ion Sources - Electron cyclotron resonance ion source for high currents of mono- and multicharged ion and general purpose unlimited lifetime application on implantation devicesBieth, C. et al. | 2000
- 902
-
New improvements on the Kansas State University cryogenic electron beam ion source, a user facility for low energy, highly charged ionsStockli, M. P. / Carnes, K. / Cocke, C. L. et al. | 2000
- 902
-
POSTER SESSION B - 2. NOVEL ION SOURCES - A. Electron Beam Ion Sources - New improvements on the Kansas State University cryogenic electron beam ion source, a user facility for low energy, highly charged ionsStockli, M.P. et al. | 2000
- 906
-
POSTER SESSION B - 2. NOVEL ION SOURCES - B. ECR Ion Sources - Magnetic field modification of 18 GHz electron cyclotron resonance ion source at the Japan Atomic Energy Research InstituteYokota, W. et al. | 2000
- 906
-
Magnetic field modification of 18 GHz electron cyclotron resonance ion source at the Japan Atomic Energy Research InstituteYokota, W. / Saitoh, Y. / Nara, T. et al. | 2000
- 909
-
Design of electron cyclotron resonance ion source using liquid-helium-free superconducting solenoid coilsKurita, Tetsuro / Nakagawa, Takahide / Kawaguchi, Takeo et al. | 2000
- 909
-
POSTER SESSION B - 2. NOVEL ION SOURCES - B. ECR Ion Sources - Design of electron cyclotron resonance ion source using liquid-helium-free superconducting solenoid coilsKurita, Tetsuro et al. | 2000
- 912
-
POSTER SESSION B - 2. NOVEL ION SOURCES - B. ECR Ion Sources - Time resolved experiments at the Frankfurt 14 GHz electron cyclotron resonance ion sourceRunkel, S. et al. | 2000
- 912
-
Time resolved experiments at the Frankfurt 14 GHz electron cyclotron resonance ion sourceRunkel, S. / Hohn, O. / Stiebing, K. E. et al. | 2000
- 915
-
Progress report on the mVINIS ion sourceDobrosavljevic´, A. / Efremov, A. / Draganic´, I. et al. | 2000
- 915
-
POSTER SESSION B - 2. NOVEL ION SOURCES - B. ECR Ion Sources - Progress report on the mVINIS ion sourceDobrosavljevic, A. et al. | 2000
- 918
-
POSTER SESSION B - 2. NOVEL ION SOURCES - B. ECR Ion Sources - Influence of the secondary electrons emitted by a cylindrical metal-dielectric structure on the Frankfurt 14 GHz electron cyclotron resonance ion source performancesSchächter, L. et al. | 2000
- 918
-
Influence of the secondary electrons emitted by a cylindrical metal-dielectric structure on the Frankfurt 14 GHz electron cyclotron resonance ion source performancesScha¨chter, L. / Stiebing, K. E. / Dobrescu, S. et al. | 2000
- 921
-
Tornado-type closed magnetic trap for an electron cyclotron resonance ion sourceAbramova, K. B. / Smirnov, A. N. / Voronin, A. V. et al. | 2000
- 921
-
POSTER SESSION B - 2. NOVEL ION SOURCES - B. ECR Ion Sources - Tornado-type closed magnetic trap for an electron cyclotron resonance ion sourceAbramova, K.B. et al. | 2000
- 924
-
Status of the CO2 laser ion source at CERNFournier, P. / Gre´goire, G. / Kugler, H. et al. | 2000
- 924
-
POSTER SESSION B - 2. NOVEL ION SOURCES - C. Laser Ion Sources - Status of the CO2 laser ion source at CERNFournier, P. et al. | 2000
- 927
-
Properties of iodine laser-produced stream of multiply charged heavy ions of different elementsLa´ska, L. / Kra´sa, J. / Masˇek, K. et al. | 2000
- 927
-
POSTER SESSION B - 2. NOVEL ION SOURCES - C. Laser Ion Sources - Properties of iodine laser-produced stream of multiply charged heavy ions of different elementsLáska, L. et al. | 2000
- 931
-
POSTER SESSION B - 2. NOVEL ION SOURCES - C. Laser Ion Sources - Energetic-multiple-charged-ion sources on short-laser-pulse irradiated foilsZhidkov, A. et al. | 2000
- 931
-
Energetic-multiple-charged-ion sources on short-laser-pulse irradiated foilsZhidkov, A. / Sasaki, A. / Tajima, T. et al. | 2000
- 935
-
Electron cyclotron resonance negative ion sourceFukumasa, Osamu / Matsumori, Masanori et al. | 2000
- 935
-
POSTER SESSION B - 2. NOVEL ION SOURCES - D. Hydrogen Negative Ion Sources - Electron cyclotron resonance negative ion sourceFukumasa, Osamu et al. | 2000
- 939
-
POSTER SESSION B - 2. NOVEL ION SOURCES - D. Hydrogen Negative Ion Sources - Development of large radio frequency driven negative ion sources for fusionVollmer, O. et al. | 2000
- 939
-
Development of large radio frequency driven negative ion sources for fusionVollmer, O. / Falter, H. / Frank, P. et al. | 2000
- 943
-
Feasibility study of a new negative ion source using a transformer coupled plasma sourceHwang, Y. S. / Lee, G. H. et al. | 2000
- 943
-
POSTER SESSION B - 2. NOVEL ION SOURCES - D. Hydrogen Negative Ion Sources - Feasibility study of a new negative ion source using a transformer coupled plasma sourceHwang, Y.S. et al. | 2000
- 946
-
Efficiency and transient time studies of an electron cyclotron resonance ion source for radioactive ion beam production at ISAC/TRIUMFJayamanna, K. / Yuan, D. / Bishop, D. et al. | 2000
- 946
-
POSTER SESSION B - 2. NOVEL ION SOURCES - E. Microwave Ion Sources - Efficiency and transient time studies of an electron cyclotron resonance ion source for radioactive ion beam production at ISAC-TRIUMFJayamanna, K. et al. | 2000
- 949
-
Laser produced Ag ions for direct implantationWoryna, E. / Wolowski, J. / Kra´likova´, B. et al. | 2000
- 949
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Material Modification - Laser produced Ag ions for direct implantationWoryna, E. et al. | 2000
- 952
-
High-current microwave ion source for wide-energy-range O+ ion implantationTokiguchi, K. / Seki, T. / Ito, J. et al. | 2000
- 952
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Material Modification - High-current microwave ion source for wide-energy-range O+ ion implantationTokiguchi, K. et al. | 2000
- 955
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Material Modification - Production of Ce negative ions in a Cs sputter ion sourceSaitoh, Y. et al. | 2000
- 955
-
Production of Ce negative ions in a Cs sputter ion sourceSaitoh, Y. / Yotsombat, B. / Mizuhashi, K. et al. | 2000
- 958
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Material Modification - Profile control of the large area ribbon beam ion source using 500 MHz ultrahigh frequency dischargeSakai, Shigeki et al. | 2000
- 958
-
Profile control of the large area ribbon beam ion source using 500 MHz ultrahigh frequency dischargeSakai, Shigeki / Takahashi, Masato / Tanjyo, Masayasu et al. | 2000
- 960
-
Change of diborane ion species depending on the magnitude of magnetic field using 100 MHz very high frequency dischargeSakai, Shigeki / Takahashi, Masato / Tanjyo, Masayasu et al. | 2000
- 960
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Material Modification - Change of diborane ion species depending on the magnitude of magnetic field using 100 MHz very high frequency dischargeSakai, Shigeki et al. | 2000
- 963
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Accelerator Injection - Development of high intensity deuteron ion source for the fusion intense neutron sourceKinsho, M. et al. | 2000
- 963
-
Development of high intensity deuteron ion source for the fusion intense neutron sourceKinsho, M. / Sugimoto, M. / Seki, M. et al. | 2000
- 966
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Accelerator Injection - Experiments with a microwave plasma as a cathode for cold or hot reflex discharge ion sourceCojocaru, G. et al. | 2000
- 966
-
Experiments with a microwave plasma as a cathode for cold or hot reflex discharge ion sourceCojocaru, G. et al. | 2000
- 969
-
High-current ion source development for the Korea Multipurpose Accelerator ComplexCho, Y. S. / Choi, B. H. / Hong, I. S. et al. | 2000
- 969
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Accelerator Injection - High-current ion source development for the Korea Multipurpose Accelerator ComplexCho, Y.S. et al. | 2000
- 972
-
Status of the HIMAC pulsed Penning sourceMiyata, T. / Sakamoto, H. / Yamamoto, M. et al. | 2000
- 972
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Accelerator Injection - Status of the HIMAC pulsed Penning sourceMiyata, T. et al. | 2000
- 975
-
Development of a H− ion source for the high intensity proton linac at Japan Atomic Energy Research InstituteOguri, H. / Tomisawa, T. / Kinsho, M. et al. | 2000
- 975
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Accelerator Injection - Development of a H- ion source for the high intensity proton linac at Japan Atomic Energy Research InstituteOguri, H. et al. | 2000
- 978
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Accelerator Injection - Commissioning and initial operation of a radioactive beam ion source at ISACDombsky, M. et al. | 2000
- 978
-
Commissioning and initial operation of a radioactive beam ion source at ISACDombsky, M. / Bishop, D. / Bricault, P. et al. | 2000
- 981
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Medical Treatment - Optimization of the radial magnetic field of an 10 GHz electron cyclotron resonance ion source at the Heavy Ion Medical Accelerator in ChibaKitagawa, A. et al. | 2000
- 981
-
Optimization of the radial magnetic field of an 18 GHz electron cyclotron resonance ion source at the Heavy Ion Medical Accelerator in ChibaKitagawa, A. / Muramatsu, M. / Sekiguchi, M. et al. | 2000
- 984
-
Development of the compact electron cyclotron resonance ion source for heavy-ion therapyMuramatsu, M. / Kitagawa, A. / Sato, S. et al. | 2000
- 984
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Medical Treatment - Development of the compact electron cyclotron resonance ion source for heavy-ion therapyMuramatsu, M. et al. | 2000
- 987
-
Performance test of electron cyclotron resonance ion sources for the Hyogo Ion Beam Medical CenterSawada, K. / Sawada, J. / Sakata, T. et al. | 2000
- 987
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Medical Treatment - Performance test of electron cyclotron resonance ion sources for the Hyogo Ion Beam Medical CenterSawada, K. et al. | 2000
- 990
-
Compact injector with alternating phase focusing–interdigital H-mode linac and superconducting electron cyclotron resonance ion source for heavy ion cancer therapyHayashizaki, Noriyosu / Hattori, Toshiyuki / Matsui, Shinjiro et al. | 2000
- 990
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Medical Treatment - Compact injector with alternating phase focusing-interdigital H-mode linac and superconducting electron cyclotron resonance ion source for heavy ion cancer therapyHayashizaki, Noriyosu et al. | 2000
- 993
-
POSTER SESSION B - 4. APPLICATION OF ION SOURCES AND BEAMS - Initial growth temperature of crystalline SiC by simultaneous irradiation of energetic 28Si- and 12C+Tsubouchi, Nobuteru et al. | 2000
- 993
-
Initial growth temperature of crystalline SiC by simultaneous irradiation of energetic 28Si− and 12C+Tsubouchi, Nobuteru / Chayahara, Akiyoshi / Kinomura, Atsushi et al. | 2000
- 996
-
Preparation of giant magnetostrictive thin film by magnetron and ion beam sputtering processesNakazato, K. / Hashimoto, M. / Uchida, H. et al. | 2000
- 996
-
POSTER SESSION B - 4. APPLICATION OF ION SOURCES AND BEAMS - Preparation of giant magnetostrictive thin film by magnetron and ion beam sputtering processesNakazato, K. et al. | 2000
- 999
-
POSTER SESSION B - 4. APPLICATION OF ION SOURCES AND BEAMS - MgO thin film formation by ion enhanced deposition processesHashimoto, M. et al. | 2000
- 999
-
MgO thin film formation by ion enhanced deposition processesHashimoto, M. / Onozaki, Y. / Uchida, H. et al. | 2000
- 1002
-
Application of compact microwave ion source to low temperature growth of transition metal nitride thin films for vacuum microelectronics devicesGotoh, Y. / Tsuji, H. / Ishikawa, J. et al. | 2000
- 1002
-
POSTER SESSION B - 4. APPLICATION OF ION SOURCES AND BEAMS - Application of compact microwave ion source to low temperature growth of transition metal nitride thin films for vacuum microelectronics devicesGotoh, Y. et al. | 2000
- 1006
-
POSTER SESSION B - 4. APPLICATION OF ION SOURCES AND BEAMS - Experimental study of three-dimensional microfabrication by focused ion beam technologyYongqi, Fu et al. | 2000
- 1006
-
Experimental study of three-dimensional microfabrication by focused ion beam technologyYongqi, Fu / Kok, Ngoi / Bryan, Ann et al. | 2000
- 1009
-
Calibration of etching uniformity for large aperture multilevel diffractive optical element by ion beam etchingFu, Yongqi / Bryan, Ngoi Kok Ann / Shing, Ong Nan et al. | 2000
- 1009
-
POSTER SESSION B - 4. APPLICATION OF ION SOURCES AND BEAMS - Calibration of etching uniformity for large aperture multilevel diffractive optical element by ion beam etchingFu, Yongqi et al. | 2000
- 1012
-
POSTER SESSION B - 4. APPLICATION OF ION SOURCES AND BEAMS - Sputtering and thermal effect during ion microbeam patterning of polymeric filmsEktessabi, A.M. et al. | 2000
- 1012
-
Sputtering and thermal effect during ion microbeam patterning of polymeric filmsEktessabi, A. M. / Sano, T. et al. | 2000
- 1016
-
Microwave ion sources for industrial applications (invited)Sakudo, N. et al. | 2000
- 1016
-
POSTER SESSION B - ION SOURCES FOR IMPLANTATION AND SURFACE MODIFICATION - Microwave ion sources for industrial applications (invited)Sakudo, N. et al. | 2000
- 1023
-
Ion sources for large area processing (invited)Naito, M. / Ando, Y. / Inouchi, Y. et al. | 2000
- 1023
-
POSTER SESSION B - ION SOURCES FOR IMPLANTATION AND SURFACE MODIFICATION - Ion sources for large area processing (invited)Naito, M. et al. | 2000
- 1029
-
POSTER SESSION B - ION SOURCES FOR IMPLANTATION AND SURFACE MODIFICATION - Radio frequency linear ion beam source with 6 cmx66 cm beamSiegfried, D. et al. | 2000
- 1029
-
Radio frequency linear ion beam source with 6 cm×66 cm beamSiegfried, D. / Buchholtz, B. / Burtner, D. et al. | 2000
- 1032
-
The production and use of ultralow energy ion beamsGoldberg, R. D. / Armour, D. G. / van den Berg, J. A. et al. | 2000
- 1032
-
POSTER SESSION B - NEGATIVE ION SOURCES AND ION SOURCES FOR INDUSTRIAL APPLICATIONS - The production and use of ultralow energy ion beamsGoldberg, R.D. et al. | 2000
- 1036
-
Applications of heavy-negative-ion sources for materials science (invited)Ishikawa, Junzo et al. | 2000
- 1036
-
POSTER SESSION B - NEGATIVE ION SOURCES AND ION SOURCES FOR INDUSTRIAL APPLICATIONS - Applications of heavy-negative-ion sources for materials science (invited)Ishikawa, Junzo et al. | 2000
- 1042
-
A 2.45 GHz microwave negative hydrogen ion sourceTakagi, A. / Mori, Y. et al. | 2000
- 1042
-
POSTER SESSION B - NEGATIVE ION SOURCES AND ION SOURCES FOR INDUSTRIAL APPLICATIONS - A 2.45 GHz microwave negative hydrogen ion sourceTakagi, A. et al. | 2000
- 1045
-
POSTER SESSION B - NEGATIVE ION SOURCES AND ION SOURCES FOR INDUSTRIAL APPLICATIONS - Intense pulsed ion beam sources for industrial applicationsZhao, W.J. et al. | 2000
- 1045
-
Intense pulsed ion beam sources for industrial applicationsZhao, W. J. / Remnev, G. E. / Yan, S. et al. | 2000
- 1049
-
POSTER SESSION B - MISCELLANEOUS ION SOURCES AND BEAM TRANSPORT - Ion source of multiply charged C60 fullerene and fullerene linear acceleratorHattori, Toshiyuki et al. | 2000
- 1049
-
Ion source of multiply charged C60 fullerene and fullerene linear acceleratorHattori, Toshiyuki / Hayashizaki, Noriyosu / Matsui, Shinjirou et al. | 2000
- 1052
-
Effects of indirect ionization on the charge state distributions observed with highly charged ion sourcesStockli, M. P. / Lehnert, U. / Becker, R. et al. | 2000
- 1052
-
POSTER SESSION B - MISCELLANEOUS ION SOURCES AND BEAM TRANSPORT - Effects of indirect ionization on the charge state distributions observed with highly charged ion sourcesStockli, M.P. et al. | 2000
- 1056
-
Medical accelerators in Japan (invited)Soga, F. et al. | 2000
- 1056
-
POSTER SESSION B - ION SOURCES FOR MEDICAL APPLICATIONS AND LASER ION SOURCES - Medical accelerators in Japan (invited)Soga, F. et al. | 2000
- 1061
-
POSTER SESSION B - ION SOURCES FOR MEDICAL APPLICATIONS AND LASER ION SOURCES - Status report on electron cyclotron resonance ion sources at the Heavy Ion Medical Accelerator in ChibaKitagawa, A. et al. | 2000
- 1061
-
Status report on electron cyclotron resonance ion sources at the Heavy Ion Medical Accelerator in ChibaKitagawa, A. / Muramatsu, M. / Sekiguchi, M. et al. | 2000
- 1064
-
The application and status of the radio frequency driven multi-cusp ion source (invited)Leung, Ka-Ngo et al. | 2000
- 1064
-
POSTER SESSION B - NEGATIVE ION SOURCES FOR ACCELERATORS AND FUSION (I) - The application and status of the radio frequency driven multi-cusp ion source (invited)Leung, Ka-Ngo et al. | 2000
- 1069
-
POSTER SESSION B - NEGATIVE ION SOURCES FOR ACCELERATORS AND FUSION (I) - Negative ion sources for high energy accelerators (invited)Peters, J. et al. | 2000
- 1069
-
Negative ion sources for high energy accelerators (invited)Peters, J. et al. | 2000
- 1075
-
POSTER SESSION B - NEGATIVE ION SOURCES FOR ACCELERATORS AND FUSION (I) - Performance of the NANOGUNTM electron cyclotron resonance ion source applied for nuclear astrophysicsItahashi, T. et al. | 2000
- 1075
-
Performance of the NANOGUN™ electron cyclotron resonance ion source applied for nuclear astrophysicsItahashi, T. / Kudomi, K. / Kume, K. et al. | 2000
- 1079
-
POSTER SESSION B - NEGATIVE ION SOURCES FOR ACCELERATORS AND FUSION (I) - Hydrogen negative ion source with LaB6 insertsBelchenko, Yu I. et al. | 2000
- 1079
-
Hydrogen negative ion source with LaB6 insertsBelchenko, Yu. I. / Kuznetsov, G. I. / Grigoryev, E. A. et al. | 2000
- 1082
-
POSTER SESSION B - NEGATIVE ION SOURCES FOR ACCELERATORS AND FUSION (I) - Effect of cesium and xenon seeding in negative hydrogen ion sourcesBacal, M. et al. | 2000
- 1082
-
Effect of cesium and xenon seeding in negative hydrogen ion sourcesBacal, M. / Bruneteau, A. M. / Deniset, C. et al. | 2000
- 1086
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Some consequences to ion source behavior of high plasma drift velocityBrown, I.G. et al. | 2000
- 1086
-
Some consequences to ion source behavior of high plasma drift velocityBrown, I. G. / Monteiro, O. R. / Bilek, M. M. M. et al. | 2000
- 1090
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Bipolar extraction neutralization: Time resolved characterizationKorzec, D. et al. | 2000
- 1090
-
Bipolar extraction neutralization: Time resolved characterizationKorzec, D. / Dahlhaus, R. / Engemann, J. et al. | 2000
- 1094
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Numerical simulation and optimization of multicomponent ion beam from RIKEN electron cyclotron resonance ion sourcesAlexandrov, V. et al. | 2000
- 1094
-
Numerical simulation and optimization of multicomponent ion beam from RIKEN electron cyclotron resonance ion sourcesAlexandrov, V. / Nakagawa, T. / Shevtsov, V. et al. | 2000
- 1097
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Aberrations due to solenoid focusing of a multiply charged high-current ion beamGrégoire, G. et al. | 2000
- 1097
-
Aberrations due to solenoid focusing of a multiply charged high-current ion beamGre´goire, G. / Kugler, H. / Lisi, N. et al. | 2000
- 1100
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Diagnostics - Calibration of the Galileo microchannel plates with the Xe2+-Xe13+ and C2+-C6+ ions in the energy range from 0.5 to 150 keV-q (abstract)Mroz, W. et al. | 2000
- 1100
-
Calibration of the Galileo microchannel plates with the Xe2+–Xe13+ and C2+–C6+ ions in the energy range from 0.5 to 150 keV/q (abstract)Mro´z, W. / Sto¨ckli, M. P. / Fry, D. et al. | 2000
- 1101
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Diagnostics - Energy analysis of negative hydrogen ions using detached electronsTakahashi, M. et al. | 2000
- 1101
-
Energy analysis of negative hydrogen ions using detached electronsTakahashi, M. / Yoshimoto, M. / Shinto, K. et al. | 2000
- 1104
-
A comparative study of emittance measurements using different techniquesHamabe, M. / Kuroda, T. / Sasao, M. et al. | 2000
- 1104
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Diagnostics - A comparative study of emittance measurements using different techniquesHamabe, M. et al. | 2000
- 1107
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Diagnostics - Time resolving diagnostic of the compensation process of pulsed ion beams at high-intensity light ion sourceJakob, A. et al. | 2000
- 1107
-
Time resolving diagnostic of the compensation process of pulsed ion beams at high-intensity light ion sourceJakob, A. / Beauvais, P-Y. / Gobin, R. et al. | 2000
- 1110
-
Beam extraction from a compact Ku-band electron cyclotron resonance ion source with double resonance modesTojyo, E. / Oyaizu, M. / Jeong, S. C. et al. | 2000
- 1110
-
POSTER SESSION C - 2. NOVEL ION SOURCES - A. ECR Ion Sources - Beam extraction from a compact Ku-band electron cyclotron resonance ion source with double resonance modesTojyo, E. et al. | 2000
- 1113
-
Design of a small electron cyclotron resonance ion source with partially pulsed magnetic fieldOyaizu, M. / Tojyo, E. / Jeong, S. C. et al. | 2000
- 1113
-
POSTER SESSION C - 2. NOVEL ION SOURCES - A. ECR Ion Sources - Design of a small electron cyclotron resonance ion source with partially pulsed magnetic fieldOyaizu, M. et al. | 2000
- 1116
-
Electron cyclotron resonance ion trap: A hybrid magnetic system with very high mirror ratio for highly charged ion production and trappingBiri, S. / Simons, L. / Hitz, D. et al. | 2000
- 1116
-
POSTER SESSION C - 2. NOVEL ION SOURCES - A. ECR Ion Sources - Electron cyclotron resonance ion trap: A hybrid magnetic system with very high mirror ratio for highly charged ion production and trappingBiri, S. et al. | 2000
- 1119
-
POSTER SESSION C - 2. NOVEL ION SOURCES - A. ECR Ion Sources - Preliminary tests for the electron cyclotron resonance ion source coupled to a laser ion source for charge state enhancement experimentGammino, S. et al. | 2000
- 1119
-
Preliminary tests for the electron cyclotron resonance ion source coupled to a laser ion source for charge state enhancement experimentGammino, S. / Ciavola, G. / Torrisi, L. et al. | 2000
- 1122
-
POSTER SESSION C - 2. NOVEL ION SOURCES - B. Sputter Negative Ion Sources - Energy distribution of negative carbon ion beam extracted from a plasma-sputter-type negative ion sourceOomori, H. et al. | 2000
- 1122
-
Energy distribution of negative carbon ion beam extracted from a plasma-sputter-type negative ion sourceOomori, H. / Kasuya, T. / Wada, M. et al. | 2000
- 1125
-
Negative ion beam production by a microwave ion source equipped with a magnetically separated double plasma cell systemTanaka, M. / Amemiya, K. et al. | 2000
- 1125
-
POSTER SESSION C - 2. NOVEL ION SOURCES - B. Sputter Negative Ion Sources - Negative ion beam production by a microwave ion source equipped with a magnetically separated double plasma cell systemTanaka, M. et al. | 2000
- 1128
-
POSTER SESSION C - 2. NOVEL ION SOURCES - C. New Concept Ion Sources - Ion bombardment-type high frequency metal ion source for compact ion beam deposition apparatusYamashita, Mutsuo et al. | 2000
- 1128
-
Ion bombardment-type high frequency metal ion source for compact ion beam deposition apparatusYamashita, Mutsuo et al. | 2000
- 1131
-
POSTER SESSION C - 2. NOVEL ION SOURCES - C. New Concept Ion Sources - Ion energy width of a dc metal arc plasma under high vacuumTamba, Moritake et al. | 2000
- 1131
-
Ion energy width of a dc metal arc plasma under high vacuumTamba, Moritake / Amemiya, Hiroshi et al. | 2000
- 1134
-
POSTER SESSION C - 2. NOVEL ION SOURCES - C. New Concept Ion Sources - Improvement of the lifetime of radio frequency antenna for plasma generationReijonen, J. et al. | 2000
- 1134
-
Improvement of the lifetime of radio frequency antenna for plasma generationReijonen, J. / Eardley, M. / Gough, R. et al. | 2000
- 1137
-
POSTER SESSION C - 2. NOVEL ION SOURCES - C. New Concept Ion Sources - Beam diagnostics extracted from radio frequency driven ion sourceAbdelaziz, M.E. et al. | 2000
- 1137
-
Beam diagnostics extracted from radio frequency driven ion sourceAbdelaziz, M. E. / Zakhary, S. G. / Ragheb, M. S. et al. | 2000
- 1140
-
Discharge characteristics of a long pulse ion source for the Korea Superconducting Tokamak Advanced Research neutral beam systemOh, B. H. / Kim, K. R. / Choi, B. H. et al. | 2000
- 1140
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Neutral Beam Injector for Fusion - Discharge characteristics of a long pulse ion source for the Korea Superconducting Tokamak Advanced Research neutral beam systemOh, B.H. et al. | 2000
- 1144
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Neutral Beam Injector for Fusion - Development of a steady-state microwave ion source with large spherical electrodes for geometrical focusingKawakami, T. et al. | 2000
- 1144
-
Development of a steady-state microwave ion source with large spherical electrodes for geometrical focusingKawakami, T. / Shimada, T. / Yonezawa, T. et al. | 2000
- 1148
-
Investigation of a radio frequency-driven multicusp ion source of the diagnostic neutral beam for the Hanbit device at Korea Basic Science InstituteYang, H. L. / Yoo, S. J. / Hwang, S. M. et al. | 2000
- 1148
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Neutral Beam Injector for Fusion - Investigation of a radio frequency-driven multicusp ion source of the diagnostic neutral beam for the Hanbit device at Korea Basic Science InstituteYang, H.L. et al. | 2000
- 1151
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Neutral Beam Injector for Fusion - Comparison of H--D- measurement in the magnetically filtered region of the large negative ion sourceHamabe, M. et al. | 2000
- 1151
-
Comparison of H−/D− measurement in the magnetically filtered region of the large negative ion sourceHamabe, M. / Oka, Y. / Osakabe, M. et al. | 2000
- 1154
-
Calculations of stray electron trajectory for designing negative ion accelerators of neutral beam injectorAsano, Shiro / Okuyama, Toshihisa / Suzuki, Yasuo et al. | 2000
- 1154
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Neutral Beam Injector for Fusion - Calculations of stray electron trajectory for designing negative ion accelerators of neutral beam injectorAsano, Shiro et al. | 2000
- 1157
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Production of organosilicon ions for SIC epitaxyKiuchi, Masato et al. | 2000
- 1157
-
Production of organosilicon ions for SiC epitaxyKiuchi, Masato / Matsumoto, Takashi / Mimoto, Kazuhiko et al. | 2000
- 1160
-
Compact microwave ion source for extremely low energy ion irradiation systemGotoh, Y. / Kubo, H. / Tsuji, H. et al. | 2000
- 1160
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Compact microwave ion source for extremely low energy ion irradiation systemGotoh, Y. et al. | 2000
- 1163
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Ion source for ion beam deposition employing a novel electrode assemblyHayes, A.V. et al. | 2000
- 1163
-
Ion source for ion beam deposition employing a novel electrode assemblyHayes, A. V. / Kanarov, V. / Yevtukhov, R. et al. | 2000
- 1168
-
Development and properties of a Freeman-type hybrid ion sourceMatsumoto, T. / Mimoto, K. / Goto, S. et al. | 2000
- 1168
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Development and properties of a Freeman-type hybrid ion sourceMatsumoto, T. et al. | 2000
- 1171
-
Development of a compact multicusp ion source of He+Nishiura, M. / Sasao, M. / Wada, M. et al. | 2000
- 1171
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Development of a compact multicusp ion source of He+Nishiura, M. et al. | 2000
- 1174
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Prolongation of a filament lifetime using SF6 plasma methodOhkoshi, Kiyonori et al. | 2000
- 1174
-
Prolongation of a filament lifetime using SF6 plasma methodOhkoshi, Kiyonori / Saitoh, Yuichi / Kamiya, Tomihiro et al. | 2000
- 1177
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Design and performance of a versatile, cost-effective microwave electron cyclotron resonance plasma source for surface and thin film processingAnton, R. et al. | 2000
- 1177
-
Design and performance of a versatile, cost-effective microwave electron cyclotron resonance plasma source for surface and thin film processingAnton, R. / Wiegner, Th. / Naumann, W. et al. | 2000
- 1181
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - A 13.56 MHz multicusp ion source for high intensity Ar beamBoonyawan, D. et al. | 2000
- 1181
-
A 13.56 MHz multicusp ion source for high intensity Ar beamBoonyawan, D. / Chirapatpimol, N. / Sanguansak, N. et al. | 2000
- 1184
-
Carbon shunting arc and its induced plasmaYukimura, Ken / Yoshioka, Kenji / Tani, Yuji et al. | 2000
- 1184
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Carbon shunting arc and its induced plasmaYukimura, Ken et al. | 2000
- 1187
-
Model for ion extraction from pulsed plasma source for plasma based ion implantation (PBII)Masamune, Sadao / Yukimura, Ken et al. | 2000
- 1187
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Model for ion extraction from pulsed plasma source for plasma based ion implantation (PBII)Masamune, Sadao et al. | 2000
- 1191
-
Matching the injected ion beam into an rf Linac for a high-energy, high-current ion implanterSaadatmand, Kourosh et al. | 2000
- 1191
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Matching the injected ion beam into an rf Linac for a high-energy, high-current ion implanterSaadatmand, Kourosh et al. | 2000
- 1194
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Measurement of the four-dimensional transverse emittance of an ion beamZeinoun, Issam et al. | 2000
- 1194
-
Measurement of the four-dimensional transverse emittance of an ion beamZeinoun, Issam / Benveniste, Victor / Saadatmand, Kourosh et al. | 2000
- 1197
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Study of ion source emittance of an ELS-PIG source used for ion implantationSwenson, D.R. et al. | 2000
- 1197
-
Study of ion source emittance of an ELS-PIG source used for ion implantationSwenson, D. R. / Saadatmand, K. / Zeinoun, I. et al. | 2000
- 1200
-
Electron cyclotron resonance light source assembly—A vacuum-ultraviolet radiation source based on an electron cyclotron resonance plasmaGru¨bling, P. / Hollandt, J. / Ulm, G. et al. | 2000
- 1200
-
POSTER SESSION C - 4. APPLICATIONS OF ION SOURCES AND BEAMS - Electron cyclotron resonance light source assembly -- A vacuum-ultraviolet radiation source based on an electron cyclotron resonance plasmaGrübling, P. et al. | 2000
- 1203
-
POSTER SESSION C - 4. APPLICATIONS OF ION SOURCES AND BEAMS - Studies on enhancement of x-ray flux in the compact electron cyclotron resonance plasma x-ray sourceBaskaran, R. et al. | 2000
- 1203
-
Studies on enhancement of x-ray flux in the compact electron cyclotron resonance plasma x-ray sourceBaskaran, R. / Selvakumaran, T. S. et al. | 2000
- 1206
-
POSTER SESSION C - 4. APPLICATIONS OF ION SOURCES AND BEAMS - Production of multiply charged ion target for photoionization studies using synchrotron radiationOura, Masaki et al. | 2000
- 1206
-
Production of multiply charged ion target for photoionization studies using synchrotron radiationOura, Masaki / Yamaoka, Hitoshi / Kawatsura, Kiyoshi et al. | 2000
- 1210
-
Beam optics in inertial electrostatic confinement fusionOhnishi, Masami / Hoshino, Chikara / Yoshikawa, Kiyoshi et al. | 2000
- 1210
-
POSTER SESSION C - 4. APPLICATIONS OF ION SOURCES AND BEAMS - Beam optics in inertial electrostatic confinement fusionOhnishi, Masami et al. | 2000
- 1213
-
POSTER SESSION C - 4. APPLICATIONS OF ION SOURCES AND BEAMS - Measurements on H- sources for spallation neutron source applicationThomae, R. et al. | 2000
- 1213
-
Measurements on H− sources for spallation neutron source applicationThomae, R. / Gough, R. / Keller, R. et al. | 2000
- 1216
-
Development of a high-current laser ion source for induction acceleratorsYoshida, M. / Hasegawa, J. / Fukata, S. et al. | 2000
- 1216
-
POSTER SESSION C - 4. APPLICATIONS OF ION SOURCES AND BEAMS - Development of a high-current laser ion source for induction acceleratorsYoshida, M. et al. | 2000
- 1219
-
Negative hydrogen ion source for TOKAMAK neutral beam injector (invited)Okumura, Y. / Fujiwara, Y. / Kashiwagi, M. et al. | 2000
- 1219
-
POSTER SESSION C - NEGATIVE ION SOURCES FOR FUSION (II) - Negative hydrogen ion source for TOKAMAK neutral beam injector (invited)Okumura, Y. et al. | 2000
- 1225
-
POSTER SESSION C - NEGATIVE ION SOURCES FOR FUSION (II) - Negative hydrogen ion source development for large helical device neutral beam injector (invited)Takeiri, Y. et al. | 2000
- 1225
-
Negative hydrogen ion source development for large helical device neutral beam injector (invited)Takeiri, Y. / Kaneko, O. / Tsumori, K. et al. | 2000
- 1231
-
Hydrogen negative ion beam acceleration in a multiaperture five-stage electrostatic acceleratorWatanabe, K. / Fujiwara, Y. / Hanada, M. et al. | 2000
- 1231
-
POSTER SESSION C - NEGATIVE ION SOURCES FOR FUSION (II) - Hydrogen negative ion beam acceleration in a multiaperture five-stage electrostatic acceleratorWatanabe, K. et al. | 2000
- 1234
-
Parametric study of negative ion production in cesium seeded hydrogen plasmasFukumasa, Osamu / Monji, Hideki et al. | 2000
- 1234
-
POSTER SESSION C - NEGATIVE ION SOURCES FOR FUSION (III) - Parametric study of negative ion production in cesium seeded hydrogen plasmasFukumasa, Osamu et al. | 2000
- 1237
-
POSTER SESSION C - NEGATIVE ION SOURCES FOR FUSION (III) - Optically pumped polarized H- ion source for RHIC spin projectMori, Y. et al. | 2000
- 1237
-
Optically pumped polarized H− ion source for RHIC spin projectMori, Y. / Ikegami, K. / Takagi, A. et al. | 2000