ARTICLES - CONDENSED MATTER; MATERIALS - Metallic work function measurement in the range 2-3.3 eV using a blue light-emitting diode source (Englisch)
- Neue Suche nach: Schletti, Reto
- Neue Suche nach: Schletti, Reto
- Neue Suche nach: Wurz, Peter
- Neue Suche nach: Fröhlich, Theo
In:
Review of scientific instruments
;
71
, 2
; 499-503
;
2000
-
ISSN:
- Aufsatz (Zeitschrift) / Print
-
Titel:ARTICLES - CONDENSED MATTER; MATERIALS - Metallic work function measurement in the range 2-3.3 eV using a blue light-emitting diode source
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Beteiligte:
-
Erschienen in:Review of scientific instruments ; 71, 2 ; 499-503
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Verlag:
- Neue Suche nach: AIP
-
Erscheinungsort:Melville, NY
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Erscheinungsdatum:2000
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ISSN:
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ZDBID:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 50.03 / 33.05 / 30.03
- Weitere Informationen zu Basisklassifikation
- Neue Suche nach: 770/3420
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Schlagwörter:
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Klassifikation:
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Datenquelle:
Inhaltsverzeichnis – Band 71, Ausgabe 2
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- 675
-
An investigation into the mechanism of pseudospark producing metal ion beamsCai, C. G. / Zhao, W. J. / Yan, S. / Le, X. Y. / Han, B. X. / Xue, J. M. / Wang, Y. G. / Jiang, X. L. et al. | 2000
- 678
-
Approximation of the plasma inhomogeneity by broad-beam measurements and simulationTartz, M. / Hartmann, E. / Deltschew, R. / Neumann, H. et al. | 2000
- 678
-
POSTER SESSION A - I. FUNDAMENTAL PHENOMENA FOR ION SOURCES - C. Diagnostics and Simulations (Except ECR Sources) - Approximation of the plasma inhomogeneity by broad-beam measurements and simulationTartz, M. et al. | 2000
- 681
-
POSTER SESSION A - NOVEL ION SOURCES - A. Electron Beam Ion Sources and Electron Beam Ion Traps - Characteristics of the beam line at the Tokyo electron beam ion trapShimizu, Hiroshi et al. | 2000
- 681
-
Characteristics of the beam line at the Tokyo electron beam ion trapShimizu, Hiroshi / Currell, Frederick J. / Ohtani, Shunsuke / Sokell, Emma J. / Yamada, Chikashi / Hirayama, Takato / Sakurai, Makoto et al. | 2000
- 684
-
Injection of various metallic elements into an electron beam ion trap: Techniques needed for systematic investigations of isoelectronic sequencesNakamura, Nobuyuki / Kinugawa, Tohru / Shimizu, Hiroshi / Watanabe, Hirofumi / Ito, Satoshi / Ohtani, Shunsuke / Yamada, Chikashi / Okazaki, Kiyohiko / Sakurai, Makoto / Tarbutt, Michael R. et al. | 2000
- 684
-
POSTER SESSION A - NOVEL ION SOURCES - A. Electron Beam Ion Sources and Electron Beam Ion Traps - Injection of various metallic elements into an electron beam ion trap: Techniques needed for systematic investigations of isoelectronic sequencesNakamura, Nobuyuki et al. | 2000
- 687
-
POSTER SESSION A - NOVEL ION SOURCES - A. Electron Beam Ion Sources and Electron Beam Ion Traps - High energy operation of the Tokyo-electron beam ion trap-present statusKuramoto, Hideharu et al. | 2000
- 687
-
High energy operation of the Tokyo-electron beam ion trap/present statusKuramoto, Hideharu / Shimizu, Hiroshi / Nakamura, Nobuyuki / Currell, Fredric J. / Kato, Daiji / Kinugawa, Tohru / Tong, Xiao M. / Watanabe, Hirofumi / Fukami, Tsunemitsu / Li, Yueming et al. | 2000
- 690
-
POSTER SESSION A - NOVEL ION SOURCES - A. Electron Beam Ion Sources and Electron Beam Ion Traps - Highly charged ions produced in a warm electron beam ion trapOvsyannikov, V.P. et al. | 2000
- 690
-
Highly charged ions produced in a warm electron beam ion trapOvsyannikov, V. P. / Zschornack, G. / Grossmann, F. / Landgraf, S. / Ullmann, F. / Werner, T. et al. | 2000
- 693
-
POSTER SESSION A - NOVEL ION SOURCES - B. Hydrogen Negative Ion Sources - H- ion source using a localized virtual magnetic filter in the plasma electrode: Type-I localized virtual magnetic filterOka, Y. et al. | 2000
- 693
-
H− ion source using a localized virtual magnetic filter in the plasma electrode: Type-I localized virtual magnetic filterOka, Y. / Kaneko, O. / Tsumori, K. / Takeiri, Y. / Osakabe, M. / Kawamoto, T. / Asano, E. / Akiyama, R. et al. | 2000
- 696
-
A new scheme of direct beam chopping in a negative hydrogen ion sourceShinto, K. / Takagi, A. / Ikegami, K. / Mori, Y. et al. | 2000
- 696
-
POSTER SESSION A - NOVEL ION SOURCES - B. Hydrogen Negative Ion Sources - A new scheme of direct beam chopping in a negative hydrogen ion sourceShinto, K. et al. | 2000
- 698
-
POSTER SESSION A - NOVEL ION SOURCES - C Vacuum Arc Ion Sources - Axial ion charge state distribution in the vacuum arc plasma jetKeidar, M. et al. | 2000
- 698
-
Axial ion charge state distribution in the vacuum arc plasma jetKeidar, M. / Brown, I. G. / Beilis, I. I. et al. | 2000
- 701
-
Enhanced ion charge states in vacuum arc plasmas using a “current spike” methodBugaev, A. S. / Oks, E. M. / Yushkov, G. Yu. / Anders, A. / Brown, I. G. et al. | 2000
- 701
-
POSTER SESSION A - NOVEL ION SOURCES - C Vacuum Arc Ion Sources - Enhanced ion charge states in vacuum arc plasmas using a "current spike" methodBugaev, A.S. et al. | 2000
- 704
-
Very broad vacuum arc ion and plasma sources with extended large area cathodesRyabchikov, A. I. / Stepanov, I. B. / Dektjarev, S. V. / Lukonin, E. I. / Shulepov, I. A. et al. | 2000
- 704
-
POSTER SESSION A - NOVEL ION SOURCES - C Vacuum Arc Ion Sources - Very broad vacuum arc ion and plasma sources with extended large area cathodesRyabchikov, A.I. et al. | 2000
- 707
-
POSTER SESSION A - NOVEL ION SOURCES - C Vacuum Arc Ion Sources - Metal vapor vacuum arc ion source development at GSIReich, H. et al. | 2000
- 707
-
Metal vapor vacuum arc ion source development at GSIReich, H. / Spa¨dtke, P. / Oks, E. M. et al. | 2000
- 710
-
Holey-plate ion sourceYoshida, Yoshikazu et al. | 2000
- 710
-
POSTER SESSION A - NOVEL ION SOURCES - D. Microwave Ion Sources - Holey-plate ion sourceYoshida, Yoshikazu et al. | 2000
- 713
-
POSTER SESSION A - NOVEL ION SOURCES - D. Microwave Ion Sources - Improvement of microwave ion source for higher B+ ion currentOkada, M. et al. | 2000
- 713
-
Improvement of microwave ion source for higher B+ ion currentOkada, M. / Sakudo, N. / Hayashi, K. / Ikenaga, N. / Okuji, S. / Onogawa, T. / Maesaka, T. / Nishiyama, Y. / Takahashi, M. / Ito, S. et al. | 2000
- 716
-
POSTER SESSION A - NOVEL ION SOURCES - D. Microwave Ion Sources - Large-area ion source combining microwaves with inductively coupled plasmaOkuji, S. et al. | 2000
- 716
-
Large-area ion source combining microwaves with inductively coupled plasmaOkuji, S. / Sakudo, N. / Hayashi, K. / Okada, M. / Onogawa, T. / Maesaka, T. / Nishiyama, Y. / Toyoda, K. / Yashima, S. / Ishida, T. et al. | 2000
- 719
-
POSTER SESSION A - NOVEL ION SOURCES - E. New Concept Ion Sources - Characteristics of ion beams extracted from a compact powdery sample ion sourceWada, M. et al. | 2000
- 719
-
Characteristics of ion beams extracted from a compact powdery sample ion sourceWada, M. / Kasuya, T. / Sasao, M. / Kawano, H. et al. | 2000
- 722
-
Nanobeam production with the multicusp ion sourceLee, Y. / Ji, Q. / Leung, K. N. / Zahir, N. et al. | 2000
- 722
-
POSTER SESSION A - NOVEL ION SOURCES - E. New Concept'Ion Sources - Nanobeam production with the multicusp ion sourceLee, Y. et al. | 2000
- 725
-
Criterion for decrease of electric field at ionization point of liquid-metal ion sourcesGotoh, Y. / Tsuji, H. / Ishikawa, J. et al. | 2000
- 725
-
POSTER SESSION A - NOVEL ION SOURCES - E. New Concept'Ion Sources - Criterion for decrease of electric field at ionization point of liquid-metal ion sourcesGotoh, Y. et al. | 2000
- 728
-
Further development of a gaseous ion source based on low-pressure hollow cathode glowVizir, A. V. / Yushkov, G. Yu. / Oks, E. M. et al. | 2000
- 728
-
POSTER SESSION A - NOVEL ION SOURCES - E. New Concept'Ion Sources - Further development of a gaseous ion source based on low-pressure hollow cathode glowVizir, A.V. et al. | 2000
- 731
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Space Propulsion - Electron energy distribution function in a Hall-type thruster (abstract)Bacal, M. et al. | 2000
- 731
-
Electron energy distribution function in a Hall-type thruster (abstract)Bacal, M. / Fedotov, V. Yu. / Guerrini, G. / Ivanov, A. A. / Vesselovzorov, A. N. et al. | 2000
- 732
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Space Propulsion - Broad-beam modeling and experiments for electric spacecraft propulsionTartz, M. et al. | 2000
- 732
-
Broad-beam modeling and experiments for electric spacecraft propulsionTartz, M. / Hartmann, E. / Deltschew, R. / Neumann, H. et al. | 2000
- 735
-
Magnetic field profile dependence of zirconium flux in sputtering ion sourcesSuzuki, T. / Kawai, Y. / Saburi, T. / Fujii, Y. / Kitayama, N. et al. | 2000
- 735
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. AMS and Surface Analysis - Magnetic field profile dependence of zirconium flux in sputtering ion sourcesSuzuki, T. et al. | 2000
- 738
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Neutral Beam Injector for Fusion - Steady state operation of an ampere-class hydrogen negative ion sourceMiyamoto, Naoki et al. | 2000
- 738
-
Steady state operation of an ampere-class hydrogen negative ion sourceMiyamoto, Naoki / Fujiwara, Yukio / Miyamoto, Kenji / Okumura, Yoshikazu et al. | 2000
- 741
-
Recovery of cesium in the hydrogen negative ion sourcesBelchenko, Yu. I. / Oka, Y. / Kaneko, O. / Takeiri, Y. / Krivenko, A. S. / Osakabe, M. / Tsumori, K. / Asano, E. / Kawamoto, T. / Akiyama, R. et al. | 2000
- 741
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Neutral Beam Injector for Fusion - Recovery of cesium in the hydrogen negative ion sourcesBelchenko, Yu I. et al. | 2000
- 744
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Neutral Beam Injector for Fusion - Neutral beams for the International Thermonuclear Experimental ReactorInoue, T. et al. | 2000
- 744
-
Neutral beams for the International Thermonuclear Experimental ReactorInoue, T. / Di Pietro, E. / Mondino, P. L. / Bayetti, P. / Hemsworth, R. S. / Massmann, P. / Fujiwara, Y. / Hanada, M. / Miyamoto, K. / Okumura, Y. et al. | 2000
- 747
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Neutral Beam Injector for Fusion - Computational studies on ion source plasmas of the neutral beam injection systemKashiwagi, M. et al. | 2000
- 747
-
Computational studies on ion source plasmas of the neutral beam injection systemKashiwagi, M. / Ido, S. / Okumura, Y. et al. | 2000
- 751
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Neutral Beam Injector for Fusion - Power flow in the negative-Ion based neutral beam injection for JT-60Kuriyama, M. et al. | 2000
- 751
-
Power flow in the negative-ion based neutral beam injection for JT-60Kuriyama, M. / Akino, N. / Ebisawa, N. / Grisham, L. / Hikita, S. / Honda, A. / Itoh, T. / Kawai, M. / Kazawa, M. / Kusaka, M. et al. | 2000
- 755
-
Study of plasma uniformity on JT-60U negative ion sourceKawai, M. / Grisham, L. / Itoh, T. / Kazawa, M. / Kuriyama, M. / Mogaki, K. / Okumura, Y. / Watanabe, K. et al. | 2000
- 755
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Neutral Beam Injector for Fusion - Study of plasma uniformity on JT-60U negative ion sourceKawai, M. et al. | 2000
- 758
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - D. Accelerator Injection - Alice ion source and its high voltage platformCavenago, M. et al. | 2000
- 758
-
Alice ion source and its high voltage platformCavenago, M. / Kulevoy, T. et al. | 2000
- 761
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - D. Accelerator Injection - ATLAS 10 GHz electron cyclotron resonance ion source upgrade projectMoehs, D.P. et al. | 2000
- 761
-
ATLAS 10 GHz electron cyclotron resonance ion source upgrade projectMoehs, D. P. / Vondrasek, R. / Pardo, R. C. / Xie, D. et al. | 2000
- 764
-
Ion source development for isotope separator on-line based radioactive nuclear beam facility at KEK-TanashiJeong, S. C. / Ishiyama, H. / Ishida, Y. / Kawakami, H. / Kawashima, H. / Miyatake, H. / Mizutani, S. / Oyaizu, M. / Takaku, S. / Tojyo, E. et al. | 2000
- 764
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - D. Accelerator Injection - Ion source development for isotope separator on-line based radioactive nuclear beam facility at KEK-TanashiJeong, S.C. et al. | 2000
- 767
-
Proton injector operational results on a high-power continuous-wave radio-frequency quadrupole acceleratorSherman, Joseph D. / Bolme, Gerald O. / Hansborough, Lash D. / Hardek, Thomas W. / Kerstiens, Debora M. / Meyer, Earl A. / Schneider, J. David / Smith, H. Vernon / Stettler, Matthew W. / Stevens, Ralph R. et al. | 2000
- 767
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - D. Accelerator Injection - Proton injector operational results on a high-power continuous-wave radio-frequency quadrupole acceleratorSherman, Joseph D. et al. | 2000
- 771
-
TRIPS: The high intensity proton source for the TRASCO projectCelona, L. / Ciavola, G. / Gammino, S. / Gobin, R. / Ferdinand, R. et al. | 2000
- 771
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - D. Accelerator Injection - TRIPS: The high intensity proton source for the TRASCO projectCelona, L. et al. | 2000
- 774
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - D. Accelerator Injection - Status report on electron cyclotron resonance Ion source operation at the Flerov Laboratory of Nuclear Reactions (Joint Institute for Nuclear Research) cyclotronsKutner, V.B. et al. | 2000
- 774
-
Status report on electron cyclotron resonance ion source operation at the Flerov Laboratory of Nuclear Reactions (Joint Institute for Nuclear Research) cyclotronsKutner, V. B. / Bogomolov, S. L. / Efremov, A. A. / Lebedev, A. N. / Loginov, V. N. / Yazvitsky, N. Yu. et al. | 2000
- 777
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - D. Accelerator Injection - A plan for on-line production and acceleration of radioactive isotope beams by use of electron cyclotron resonance ion source NANOGANMatsuta, K. et al. | 2000
- 777
-
A plan for on-line production and acceleration of radioactive isotope beams by use of electron cyclotron resonance ion source NANOGANMatsuta, K. / Fukuda, M. / Mihara, M. / Minamisono, T. / Mizobuchi, A. / Kitagawa, A. / Hattori, T. / Sasaki, M. / Kaminaka, S. / Hashimoto, K. et al. | 2000
- 780
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - Molecular ion implanter equipped with liquid-metal alloy ion sourceGotoh, Y. et al. | 2000
- 780
-
Molecular ion implanter equipped with liquid-metal alloy ion sourceGotoh, Y. / Tsuji, H. / Ishikawa, J. et al. | 2000
- 783
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - High current and high intensity pulsed ion-beam sources for combined treatment of materialsRyabchikov, A.I. et al. | 2000
- 783
-
High current and high intensity pulsed ion-beam sources for combined treatment of materialsRyabchikov, A. I. / Petrov, A. V. / Stepanov, I. B. / Shulepov, I. A. / Tolmachjeva, V. G. et al. | 2000
- 786
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - The L3A facility at the Vinca Institute: Surface modification of materials, by heavy Ion beams from an electron cyclotron resonance Ion sourceDobrosavljevic, A. et al. | 2000
- 786
-
The L3A facility at the Vincˇa Institute: Surface modification of materials, by heavy ion beams from an electron cyclotron resonance ion sourceDobrosavljevic´, A. / Milosavljevic´, M. / Bibic´, N. / Efremov, A. et al. | 2000
- 789
-
Specific modification of polysulfone with cluster bombardment with assistance of Ar ion irradiationXu, Guochun / Hibino, Y. / Awazu, K. / Tanihara, M. / Imanishi, Y. et al. | 2000
- 789
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - Specific modification of polysulfone with cluster bombardment with assistance of Ar ion irradiationXu, Guochun et al. | 2000
- 793
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - Theoretical analysis of the embedded layer formed by high-energy Au implantation into Si(II)Nakagawa, S.T. et al. | 2000
- 793
-
Theoretical analysis of the embedded layer formed by high-energy Au implantation into Si(II)Nakagawa, S. T. / Nakano, S. / Ogiso, H. / Iwaki, M. / Hashimoto, M. / Eckstein, W. et al. | 2000
- 797
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - A negative ion beam application to artificial formation of neuron network in cultureTsuji, Hiroshi et al. | 2000
- 797
-
A negative ion beam application to artificial formation of neuron network in cultureTsuji, Hiroshi / Sato, Hiroko / Baba, Takahiro / Gotoh, Yasuhito / Ishikawa, Junzo et al. | 2000
- 800
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - Microwave plasma source for high current ion beam neutralizationKorzec, D. et al. | 2000
- 800
-
Microwave plasma source for high current ion beam neutralizationKorzec, D. / Mu¨ller, A. / Engemann, J. et al. | 2000
- 804
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - Negative-ion implanter for powders and its application to nanometer-sized metal particle formation in the surface of glass beadsTsuji, Hiroshi et al. | 2000
- 804
-
Negative-ion implanter for powders and its application to nanometer-sized metal particle formation in the surface of glass beadsTsuji, Hiroshi / Kido, Shunsuke / Sasaki, Hitoshi / Gotoh, Yasuhito / Ishikawa, Junzo et al. | 2000
- 807
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - High current injectors for heavy ion driven inertial fusionKwan, J.W. et al. | 2000
- 807
-
High current injectors for heavy ion driven inertial fusionKwan, J. W. et al. | 2000
- 810
-
POSTER SESSION A - EBIS AND ION EXTRACTION - Electron beam ion sources in the reflex mode of operation (review and progress report) (invited)Donets, E.D. et al. | 2000
- 810
-
Electron beam ion sources in the reflex mode of operation (review and progress report) (invited)Donets, E. D. et al. | 2000
- 816
-
Electron beam ion sources and traps (invited)Becker, Reinard et al. | 2000
- 816
-
POSTER SESSION A - EBIS AND ION EXTRACTION - Electron beam ion sources and traps (invited)Becker, Reinard et al. | 2000
- 820
-
POSTER SESSION A - EBIS AND ION EXTRACTION - Simulation of ion extraction and beam transport (invited)Spädtke, P. et al. | 2000
- 820
-
Simulation of ion extraction and beam transport (invited)Spa¨dtke, P. / Mu¨hle, C. et al. | 2000
- 826
-
POSTER SESSION A - EBIS AND ION EXTRACTION - Status of vacuum arc ion sources (invited) (abstract)Brown, Ian et al. | 2000
- 826
-
Status of vacuum arc ion sources (invited) (abstract)Brown, Ian et al. | 2000
- 827
-
Pulsed vacuum-arc ion source operated with a “triggerless” arc initiation methodAnders, A. / Schein, J. / Qi, N. et al. | 2000
- 827
-
POSTER SESSION A - EBIS AND ION EXTRACTION - Pulsed vacuum-arc ion source operated with a "triggerless" arc initiation methodAnders, A. et al. | 2000
- 830
-
POSTER SESSION A - PROTON ION SOURCES AND ECR ION SOURCES (III) - Status and new developments of the high intensity electron cyclotron resonance source light ion continuous wave, and pulsed mode (invited)Lagniel, J.-M. et al. | 2000
- 830
-
Status and new developments of the high intensity electron cyclotron resonance source light ion continuous wave, and pulsed mode (invited)Lagniel, J.-M. / Beauvais, P.-Y. / Bogard, D. / Bourdelle, G. / Charruau, G. / Delferrie`re, O. / De Menezes, D. / France, A. / Ferdinand, R. / Gauthier, Y. et al. | 2000
- 836
-
The Frankfurt 200 mA proton sourceHollinger, R. / Beller, P. / Volk, K. / Weber, M. / Klein, H. et al. | 2000
- 836
-
POSTER SESSION A - PROTON ION SOURCES AND ECR ION SOURCES (III) - The Frankfurt 200 mA proton sourceHollinger, R. et al. | 2000
- 839
-
POSTER SESSION A - PROTON ION SOURCES AND ECR ION SOURCES (III) - Fundamental aspects of electron cyclotron resonance ion sources: From classical to large superconducting devices (invited)Hitz, Denis et al. | 2000
- 839
-
Fundamental aspects of electron cyclotron resonance ion sources: From classical to large superconducting devices (invited)Hitz, Denis / Melin, Ge´rard / Girard, Alain et al. | 2000
- 846
-
Dynamic simulations of the interchange instability, ion production, and electron heating processes in an electron cyclotron resonance ion source plasmaNiimura, M. / Lamoureux, M. / Goto, A. / Yano, Y. et al. | 2000
- 846
-
POSTER SESSION A - PROTON ION SOURCES AND ECR ION SOURCES (III) - Dynamic simulations of the interchange instability, ion production, and electron heating processes in an electron cyclotron resonance ion source plasmaNiimura, M. et al. | 2000
- 850
-
Multicomponent consideration of electron fraction of electron-cyclotron resonance source plasmaShirkov, G. et al. | 2000
- 850
-
POSTER SESSION A - PROTON ION SOURCES AND ECR ION SOURCES (III) - Multicomponent consideration of electron fraction of electron-cyclotron resonance source plasmaShirkov, G. et al. | 2000
- 853
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Selection of the powdery metal hydride best for producing H- by thermal desorptionKawano, H. et al. | 2000
- 853
-
Selection of the powdery metal hydride best for producing H− by thermal desorptionKawano, H. / Tanaka, A. / Sugimoto, S. / Iseki, T. / Zhu, Y. / Wada, M. / Sasao, M. et al. | 2000
- 856
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Selection of the substrate metal best for thermal positive ionizationKawano, H. et al. | 2000
- 856
-
Selection of the substrate metal best for thermal positive ionizationKawano, H. / Mine, H. / Moriyama, M. / Tanigawa, M. / Zhu, Y. et al. | 2000
- 859
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Influence of electron injection on electron cyclotron resonance plasma properties and reflected mode electrons (abstract)Ovsyannikov, V.P. et al. | 2000
- 859
-
Influence of electron injection on electron cyclotron resonance plasma properties and reflected mode electrons (abstract)Ovsyannikov, V. P. / Ullmann, F. / Zschornack, G. et al. | 2000
- 860
-
Production of intense 48Ca ion beam at the U-400 cyclotronKutner, V. B. / Bogomolov, S. L. / Efremov, A. A. / Lebedev, A. N. / Lebedev, V. Ya. / Loginov, V. N. / Yakushev, A. B. / Yazvitsky, N. Yu. et al. | 2000
- 860
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Production of intense 48Ca ion beam at the U-400 cyclotronKutner, V.B. et al. | 2000
- 863
-
Effect of a biased probe on the afterglow operation of an ECR4 ion sourceHill, C. E. / Ku¨chler, D. / Wenander, F. / Wolf, B. H. et al. | 2000
- 863
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Effect of a biased probe on the afterglow operation of an ECR4 ion sourceHill, C.E. et al. | 2000
- 866
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Comparison of electron cyclotron resonance plasma characteristics discharged by 7.0, 8.0, and 9.4 GHzKawai, Y. et al. | 2000
- 866
-
Comparison of electron cyclotron resonance plasma characteristics discharged by 7.0, 8.0, and 9.4 GHzKawai, Y. / Saburi, T. / Kim, S-H. / Fujii, Y. / Suzuki, T. et al. | 2000
- 869
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Production of highly charged ions in electron cyclotron resonance ion sources using an electrode in two modesBiri, S. et al. | 2000
- 869
-
Production of highly charged ions in electron cyclotron resonance ion sources using an electrode in two modesBiri, S. / Kene´z, L. / Valek, A. / Nakagawa, T. / Kidera, M. / Yano, Y. et al. | 2000
- 872
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Increasing the space-charge limit and other effects of cesium seeding in hydrogen negative ion sourcesWhealton, J.H. et al. | 2000
- 872
-
Increasing the space-charge limit and other effects of cesium seeding in hydrogen negative ion sourcesWhealton, J. H. / Bacal, M. / Bruneteau, J. / Raridon, R. J. et al. | 2000
- 875
-
Beam instability excited by the magnetic filterNaitou, Hiroshi / Ohi, Kazuo / Fukumasa, Osamu et al. | 2000
- 875
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Simulations - Beam instability excited by the magnetic filterNaitou, Hiroshi et al. | 2000
- 877
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Simulations - Relation between vapor Cs and adsorbed Cs in H- ion sourceOgasawara, M. et al. | 2000
- 877
-
Relation between vapor Cs and adsorbed Cs in H− ion sourceOgasawara, M. / Morishita, T. / Hatayama, A. et al. | 2000
- 880
-
Numerical simulation of cesium cooling effects in H− ion sourceMorishita, T. / Ogasawara, M. / Hatayama, A. et al. | 2000
- 880
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Simulations - Numerical simulation of cesium cooling effects in H- ion sourceMorishita, T. et al. | 2000
- 883
-
Monte Carlo simulation of negative ion production in the negative hydrogen ion sourceUematsu, M. / Morishita, T. / Hatayama, A. / Sakurabayashi, T. / Ogasawara, M. et al. | 2000
- 883
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Simulations - Monte Carlo simulation of negative ion production in the negative hydrogen ion sourceUematsu, M. et al. | 2000
- 887
-
POSTER SESSION B - 2. NOVEL ION SOURCES - A. Electron Beam Ion Sources - Theory and simulations of electron beam ion source in reflex modeDonets, E.D. et al. | 2000
- 887
-
Theory and simulations of electron beam ion source in reflex modeDonets, E. D. / Donets, E. E. / Syresin, E. M. et al. | 2000
- 890
-
POSTER SESSION B - 2. NOVEL ION SOURCES - A. Electron Beam Ion Sources - Compact electron-beam ion trap using NdFeB permanent magnetsMotohashi, Kenji et al. | 2000
- 890
-
Compact electron-beam ion trap using NdFeB permanent magnetsMotohashi, Kenji / Moriya, Akihiko / Yamada, Hiroyuki / Tsurubuchi, Seiji et al. | 2000
- 893
-
POSTER SESSION B - 2. NOVEL ION SOURCES - A. Electron Beam Ion Sources - Status of the Brookhaven National Laboratory high current electron beam ion source test standBeebe, E. et al. | 2000
- 893
-
Status of the Brookhaven National Laboratory high current electron beam ion source test standBeebe, E. / Alessi, J. / Bellavia, S. / Hershcovitch, A. / Kponou, A. / Lockey, R. / Pikin, A. / Prelec, K. / Stein, P. / Kuznetsov, G. et al. | 2000
- 896
-
POSTER SESSION B - 2. NOVEL ION SOURCES - A. Electron Beam Ion Sources - A study of electron strings and their use for efficient production of highly charged ionsDonets, E.D. et al. | 2000
- 896
-
A study of electron strings and their use for efficient production of highly charged ionsDonets, E. D. / Donets, D. E. / Donets, E. E. / Salnikov, V. V. / Shutov, V. B. / Syresin, E. M. / Bjorkhage, M. / Carle, P. / Liljeby, L. / Rensfelt, K.-G. et al. | 2000
- 899
-
POSTER SESSION B - 2. NOVEL ION SOURCES - A. Electron Beam Ion Sources - Electron cyclotron resonance ion source for high currents of mono- and multicharged ion and general purpose unlimited lifetime application on implantation devicesBieth, C. et al. | 2000
- 899
-
Electron cyclotron resonance ion source for high currents of mono- and multicharged ion and general purpose unlimited lifetime application on implantation devicesBieth, C. / Bouly, J. L. / Curdy, J. C. / Kantas, S. / Sortais, P. / Sole, P. / Vieux-Rochaz, J. L. et al. | 2000
- 902
-
New improvements on the Kansas State University cryogenic electron beam ion source, a user facility for low energy, highly charged ionsStockli, M. P. / Carnes, K. / Cocke, C. L. / DePaola, B. D. / Ehrenreich, T. / Fehrenbach, C. / Fry, D. / Gibson, P. E. / Kelly, S. / Lehnert, U. et al. | 2000
- 902
-
POSTER SESSION B - 2. NOVEL ION SOURCES - A. Electron Beam Ion Sources - New improvements on the Kansas State University cryogenic electron beam ion source, a user facility for low energy, highly charged ionsStockli, M.P. et al. | 2000
- 906
-
POSTER SESSION B - 2. NOVEL ION SOURCES - B. ECR Ion Sources - Magnetic field modification of 18 GHz electron cyclotron resonance ion source at the Japan Atomic Energy Research InstituteYokota, W. et al. | 2000
- 906
-
Magnetic field modification of 18 GHz electron cyclotron resonance ion source at the Japan Atomic Energy Research InstituteYokota, W. / Saitoh, Y. / Nara, T. / Ishii, Y. / Arakawa, K. et al. | 2000
- 909
-
Design of electron cyclotron resonance ion source using liquid-helium-free superconducting solenoid coilsKurita, Tetsuro / Nakagawa, Takahide / Kawaguchi, Takeo / Lee, Sang-Moo et al. | 2000
- 909
-
POSTER SESSION B - 2. NOVEL ION SOURCES - B. ECR Ion Sources - Design of electron cyclotron resonance ion source using liquid-helium-free superconducting solenoid coilsKurita, Tetsuro et al. | 2000
- 912
-
Time resolved experiments at the Frankfurt 14 GHz electron cyclotron resonance ion sourceRunkel, S. / Hohn, O. / Stiebing, K. E. / Schempp, A. / Schmidt-Bo¨cking, H. / Mironov, V. / Shirkov, G. et al. | 2000
- 912
-
POSTER SESSION B - 2. NOVEL ION SOURCES - B. ECR Ion Sources - Time resolved experiments at the Frankfurt 14 GHz electron cyclotron resonance ion sourceRunkel, S. et al. | 2000
- 915
-
POSTER SESSION B - 2. NOVEL ION SOURCES - B. ECR Ion Sources - Progress report on the mVINIS ion sourceDobrosavljevic, A. et al. | 2000
- 915
-
Progress report on the mVINIS ion sourceDobrosavljevic´, A. / Efremov, A. / Draganic´, I. / Dekic´, S. / Stalevski, T. et al. | 2000
- 918
-
POSTER SESSION B - 2. NOVEL ION SOURCES - B. ECR Ion Sources - Influence of the secondary electrons emitted by a cylindrical metal-dielectric structure on the Frankfurt 14 GHz electron cyclotron resonance ion source performancesSchächter, L. et al. | 2000
- 918
-
Influence of the secondary electrons emitted by a cylindrical metal-dielectric structure on the Frankfurt 14 GHz electron cyclotron resonance ion source performancesScha¨chter, L. / Stiebing, K. E. / Dobrescu, S. / Badescu-Singureanu, Al. I. / Runkel, S. / Hohn, O. / Schmidt, L. / Schempp, A. / Schmidt-Bo¨cking, H. et al. | 2000
- 921
-
Tornado-type closed magnetic trap for an electron cyclotron resonance ion sourceAbramova, K. B. / Smirnov, A. N. / Voronin, A. V. / Zorin, V. G. et al. | 2000
- 921
-
POSTER SESSION B - 2. NOVEL ION SOURCES - B. ECR Ion Sources - Tornado-type closed magnetic trap for an electron cyclotron resonance ion sourceAbramova, K.B. et al. | 2000
- 924
-
Status of the CO2 laser ion source at CERNFournier, P. / Gre´goire, G. / Kugler, H. / Haseroth, H. / Lisi, N. / Meyer, C. / Ostroumov, P. / Schnuriger, J.-C. / Scrivens, R. / Rodriguez, F. Varela et al. | 2000
- 924
-
POSTER SESSION B - 2. NOVEL ION SOURCES - C. Laser Ion Sources - Status of the CO2 laser ion source at CERNFournier, P. et al. | 2000
- 927
-
POSTER SESSION B - 2. NOVEL ION SOURCES - C. Laser Ion Sources - Properties of iodine laser-produced stream of multiply charged heavy ions of different elementsLáska, L. et al. | 2000
- 927
-
Properties of iodine laser-produced stream of multiply charged heavy ions of different elementsLa´ska, L. / Kra´sa, J. / Masˇek, K. / Pfeifer, M. / Rohlena, K. / Kra´likova´, B. / Ska´la, J. / Woryna, E. / Parys, P. / Wolowski, J. et al. | 2000
- 931
-
POSTER SESSION B - 2. NOVEL ION SOURCES - C. Laser Ion Sources - Energetic-multiple-charged-ion sources on short-laser-pulse irradiated foilsZhidkov, A. et al. | 2000
- 931
-
Energetic-multiple-charged-ion sources on short-laser-pulse irradiated foilsZhidkov, A. / Sasaki, A. / Tajima, T. et al. | 2000
- 935
-
Electron cyclotron resonance negative ion sourceFukumasa, Osamu / Matsumori, Masanori et al. | 2000
- 935
-
POSTER SESSION B - 2. NOVEL ION SOURCES - D. Hydrogen Negative Ion Sources - Electron cyclotron resonance negative ion sourceFukumasa, Osamu et al. | 2000
- 939
-
Development of large radio frequency driven negative ion sources for fusionVollmer, O. / Falter, H. / Frank, P. / Heinemann, B. / Kraus, W. / Massmann, P. / McNeely, P. / Riedl, R. / Speth, E. / Trainham, R. et al. | 2000
- 939
-
POSTER SESSION B - 2. NOVEL ION SOURCES - D. Hydrogen Negative Ion Sources - Development of large radio frequency driven negative ion sources for fusionVollmer, O. et al. | 2000
- 943
-
Feasibility study of a new negative ion source using a transformer coupled plasma sourceHwang, Y. S. / Lee, G. H. et al. | 2000
- 943
-
POSTER SESSION B - 2. NOVEL ION SOURCES - D. Hydrogen Negative Ion Sources - Feasibility study of a new negative ion source using a transformer coupled plasma sourceHwang, Y.S. et al. | 2000
- 946
-
Efficiency and transient time studies of an electron cyclotron resonance ion source for radioactive ion beam production at ISAC/TRIUMFJayamanna, K. / Yuan, D. / Bishop, D. / Dale, D. / Dombsky, M. / Kuo, T. / Kadantsev, S. / Keitel, R. / Louie, D. / McDonald, M. et al. | 2000
- 946
-
POSTER SESSION B - 2. NOVEL ION SOURCES - E. Microwave Ion Sources - Efficiency and transient time studies of an electron cyclotron resonance ion source for radioactive ion beam production at ISAC-TRIUMFJayamanna, K. et al. | 2000
- 949
-
Laser produced Ag ions for direct implantationWoryna, E. / Wolowski, J. / Kra´likova´, B. / Kra´sa, J. / La´ska, L. / Pfeifer, M. / Rohlena, K. / Ska´la, J. / Perˇina, V. / Boody, F. P. et al. | 2000
- 949
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Material Modification - Laser produced Ag ions for direct implantationWoryna, E. et al. | 2000
- 952
-
High-current microwave ion source for wide-energy-range O+ ion implantationTokiguchi, K. / Seki, T. / Ito, J. / Sato, T. / Mera, K. et al. | 2000
- 952
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Material Modification - High-current microwave ion source for wide-energy-range O+ ion implantationTokiguchi, K. et al. | 2000
- 955
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Material Modification - Production of Ce negative ions in a Cs sputter ion sourceSaitoh, Y. et al. | 2000
- 955
-
Production of Ce negative ions in a Cs sputter ion sourceSaitoh, Y. / Yotsombat, B. / Mizuhashi, K. / Tajima, S. et al. | 2000
- 958
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Material Modification - Profile control of the large area ribbon beam ion source using 500 MHz ultrahigh frequency dischargeSakai, Shigeki et al. | 2000
- 958
-
Profile control of the large area ribbon beam ion source using 500 MHz ultrahigh frequency dischargeSakai, Shigeki / Takahashi, Masato / Tanjyo, Masayasu et al. | 2000
- 960
-
Change of diborane ion species depending on the magnitude of magnetic field using 100 MHz very high frequency dischargeSakai, Shigeki / Takahashi, Masato / Tanjyo, Masayasu et al. | 2000
- 960
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Material Modification - Change of diborane ion species depending on the magnitude of magnetic field using 100 MHz very high frequency dischargeSakai, Shigeki et al. | 2000
- 963
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Accelerator Injection - Development of high intensity deuteron ion source for the fusion intense neutron sourceKinsho, M. et al. | 2000
- 963
-
Development of high intensity deuteron ion source for the fusion intense neutron sourceKinsho, M. / Sugimoto, M. / Seki, M. / Oguri, H. / Okumura, Y. et al. | 2000
- 966
-
Experiments with a microwave plasma as a cathode for cold or hot reflex discharge ion sourceCojocaru, G. et al. | 2000
- 966
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Accelerator Injection - Experiments with a microwave plasma as a cathode for cold or hot reflex discharge ion sourceCojocaru, G. et al. | 2000
- 969
-
High-current ion source development for the Korea Multipurpose Accelerator ComplexCho, Y. S. / Choi, B. H. / Hong, I. S. / Hwang, Y. S. et al. | 2000
- 969
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Accelerator Injection - High-current ion source development for the Korea Multipurpose Accelerator ComplexCho, Y.S. et al. | 2000
- 972
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Accelerator Injection - Status of the HIMAC pulsed Penning sourceMiyata, T. et al. | 2000
- 972
-
Status of the HIMAC pulsed Penning sourceMiyata, T. / Sakamoto, H. / Yamamoto, M. / Okada, T. / Kobayasi, C. / Honda, Y. / Fujimoto, T. / Takasugi, W. / Yokoyama, T. / Kageyama, Y. et al. | 2000
- 975
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Accelerator Injection - Development of a H- ion source for the high intensity proton linac at Japan Atomic Energy Research InstituteOguri, H. et al. | 2000
- 975
-
Development of a H− ion source for the high intensity proton linac at Japan Atomic Energy Research InstituteOguri, H. / Tomisawa, T. / Kinsho, M. / Okumura, Y. / Mizumoto, M. et al. | 2000
- 978
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Accelerator Injection - Commissioning and initial operation of a radioactive beam ion source at ISACDombsky, M. et al. | 2000
- 978
-
Commissioning and initial operation of a radioactive beam ion source at ISACDombsky, M. / Bishop, D. / Bricault, P. / Dale, D. / Hurst, A. / Jayamanna, K. / Keitel, R. / Olivo, M. / Schmor, P. / Stanford, G. et al. | 2000
- 981
-
Optimization of the radial magnetic field of an 18 GHz electron cyclotron resonance ion source at the Heavy Ion Medical Accelerator in ChibaKitagawa, A. / Muramatsu, M. / Sekiguchi, M. / Yamada, S. / Jincho, K. / Okada, T. / Yamamoto, M. / Biri, S. / Uno, K. et al. | 2000
- 981
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Medical Treatment - Optimization of the radial magnetic field of an 10 GHz electron cyclotron resonance ion source at the Heavy Ion Medical Accelerator in ChibaKitagawa, A. et al. | 2000
- 984
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Medical Treatment - Development of the compact electron cyclotron resonance ion source for heavy-ion therapyMuramatsu, M. et al. | 2000
- 984
-
Development of the compact electron cyclotron resonance ion source for heavy-ion therapyMuramatsu, M. / Kitagawa, A. / Sato, S. / Sato, Y. / Yamada, S. / Hattori, T. / Shibuya, S. et al. | 2000
- 987
-
Performance test of electron cyclotron resonance ion sources for the Hyogo Ion Beam Medical CenterSawada, K. / Sawada, J. / Sakata, T. / Uno, K. / Okanishi, K. / Harada, H. / Itano, A. / Higashi, A. / Akagi, T. / Yamada, S. et al. | 2000
- 987
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Medical Treatment - Performance test of electron cyclotron resonance ion sources for the Hyogo Ion Beam Medical CenterSawada, K. et al. | 2000
- 990
-
Compact injector with alternating phase focusing–interdigital H-mode linac and superconducting electron cyclotron resonance ion source for heavy ion cancer therapyHayashizaki, Noriyosu / Hattori, Toshiyuki / Matsui, Shinjiro / Tomizawa, Hiromitsu / Yoshida, Toru / Isokawa, Katsushi / Kitagawa, Atsushi / Muramatsu, Masayuki / Yamada, Satoru / Okamura, Masahiro et al. | 2000
- 990
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Medical Treatment - Compact injector with alternating phase focusing-interdigital H-mode linac and superconducting electron cyclotron resonance ion source for heavy ion cancer therapyHayashizaki, Noriyosu et al. | 2000
- 993
-
Initial growth temperature of crystalline SiC by simultaneous irradiation of energetic 28Si− and 12C+Tsubouchi, Nobuteru / Chayahara, Akiyoshi / Kinomura, Atsushi / Horino, Yuji et al. | 2000
- 993
-
POSTER SESSION B - 4. APPLICATION OF ION SOURCES AND BEAMS - Initial growth temperature of crystalline SiC by simultaneous irradiation of energetic 28Si- and 12C+Tsubouchi, Nobuteru et al. | 2000
- 996
-
Preparation of giant magnetostrictive thin film by magnetron and ion beam sputtering processesNakazato, K. / Hashimoto, M. / Uchida, H. / Matsumura, Y. et al. | 2000
- 996
-
POSTER SESSION B - 4. APPLICATION OF ION SOURCES AND BEAMS - Preparation of giant magnetostrictive thin film by magnetron and ion beam sputtering processesNakazato, K. et al. | 2000
- 999
-
POSTER SESSION B - 4. APPLICATION OF ION SOURCES AND BEAMS - MgO thin film formation by ion enhanced deposition processesHashimoto, M. et al. | 2000
- 999
-
MgO thin film formation by ion enhanced deposition processesHashimoto, M. / Onozaki, Y. / Uchida, H. / Matsumura, Y. et al. | 2000
- 1002
-
Application of compact microwave ion source to low temperature growth of transition metal nitride thin films for vacuum microelectronics devicesGotoh, Y. / Tsuji, H. / Ishikawa, J. et al. | 2000
- 1002
-
POSTER SESSION B - 4. APPLICATION OF ION SOURCES AND BEAMS - Application of compact microwave ion source to low temperature growth of transition metal nitride thin films for vacuum microelectronics devicesGotoh, Y. et al. | 2000
- 1006
-
Experimental study of three-dimensional microfabrication by focused ion beam technologyYongqi, Fu / Kok, Ngoi / Bryan, Ann / Hung, N. P. / Shing, Ong Nan et al. | 2000
- 1006
-
POSTER SESSION B - 4. APPLICATION OF ION SOURCES AND BEAMS - Experimental study of three-dimensional microfabrication by focused ion beam technologyYongqi, Fu et al. | 2000
- 1009
-
Calibration of etching uniformity for large aperture multilevel diffractive optical element by ion beam etchingFu, Yongqi / Bryan, Ngoi Kok Ann / Shing, Ong Nan et al. | 2000
- 1009
-
POSTER SESSION B - 4. APPLICATION OF ION SOURCES AND BEAMS - Calibration of etching uniformity for large aperture multilevel diffractive optical element by ion beam etchingFu, Yongqi et al. | 2000
- 1012
-
Sputtering and thermal effect during ion microbeam patterning of polymeric filmsEktessabi, A. M. / Sano, T. et al. | 2000
- 1012
-
POSTER SESSION B - 4. APPLICATION OF ION SOURCES AND BEAMS - Sputtering and thermal effect during ion microbeam patterning of polymeric filmsEktessabi, A.M. et al. | 2000
- 1016
-
Microwave ion sources for industrial applications (invited)Sakudo, N. et al. | 2000
- 1016
-
POSTER SESSION B - ION SOURCES FOR IMPLANTATION AND SURFACE MODIFICATION - Microwave ion sources for industrial applications (invited)Sakudo, N. et al. | 2000
- 1023
-
POSTER SESSION B - ION SOURCES FOR IMPLANTATION AND SURFACE MODIFICATION - Ion sources for large area processing (invited)Naito, M. et al. | 2000
- 1023
-
Ion sources for large area processing (invited)Naito, M. / Ando, Y. / Inouchi, Y. / Tanaka, H. / Miyamoto, N. et al. | 2000
- 1029
-
POSTER SESSION B - ION SOURCES FOR IMPLANTATION AND SURFACE MODIFICATION - Radio frequency linear ion beam source with 6 cmx66 cm beamSiegfried, D. et al. | 2000
- 1029
-
Radio frequency linear ion beam source with 6 cm×66 cm beamSiegfried, D. / Buchholtz, B. / Burtner, D. / Foster, W. et al. | 2000
- 1032
-
POSTER SESSION B - NEGATIVE ION SOURCES AND ION SOURCES FOR INDUSTRIAL APPLICATIONS - The production and use of ultralow energy ion beamsGoldberg, R.D. et al. | 2000
- 1032
-
The production and use of ultralow energy ion beamsGoldberg, R. D. / Armour, D. G. / van den Berg, J. A. / Cook, C. E. A. / Whelan, S. / Zhang, S. / Knorr, N. / Foad, M. A. / Ohno, H. et al. | 2000
- 1036
-
Applications of heavy-negative-ion sources for materials science (invited)Ishikawa, Junzo et al. | 2000
- 1036
-
POSTER SESSION B - NEGATIVE ION SOURCES AND ION SOURCES FOR INDUSTRIAL APPLICATIONS - Applications of heavy-negative-ion sources for materials science (invited)Ishikawa, Junzo et al. | 2000
- 1042
-
A 2.45 GHz microwave negative hydrogen ion sourceTakagi, A. / Mori, Y. et al. | 2000
- 1042
-
POSTER SESSION B - NEGATIVE ION SOURCES AND ION SOURCES FOR INDUSTRIAL APPLICATIONS - A 2.45 GHz microwave negative hydrogen ion sourceTakagi, A. et al. | 2000
- 1045
-
POSTER SESSION B - NEGATIVE ION SOURCES AND ION SOURCES FOR INDUSTRIAL APPLICATIONS - Intense pulsed ion beam sources for industrial applicationsZhao, W.J. et al. | 2000
- 1045
-
Intense pulsed ion beam sources for industrial applicationsZhao, W. J. / Remnev, G. E. / Yan, S. / Opekounov, M. S. / Le, X. Y. / Matvienko, V. M. / Han, B. X. / Xue, J. M. / Wang, Y. G. et al. | 2000
- 1049
-
POSTER SESSION B - MISCELLANEOUS ION SOURCES AND BEAM TRANSPORT - Ion source of multiply charged C60 fullerene and fullerene linear acceleratorHattori, Toshiyuki et al. | 2000
- 1049
-
Ion source of multiply charged C60 fullerene and fullerene linear acceleratorHattori, Toshiyuki / Hayashizaki, Noriyosu / Matsui, Shinjirou / Tomizawa, Hiromitsu / Yoshida, Toru / Gates, Stephen John / Sasa, Kimikazu / Majima, Satoshi / Isokawa, Katsushi / Ito, Takashi et al. | 2000
- 1052
-
Effects of indirect ionization on the charge state distributions observed with highly charged ion sourcesStockli, M. P. / Lehnert, U. / Becker, R. / Delferriere, O. / Gebel, Th. / Ullmann, F. / Kobayashi, N. / Matsumoto, J. et al. | 2000
- 1052
-
POSTER SESSION B - MISCELLANEOUS ION SOURCES AND BEAM TRANSPORT - Effects of indirect ionization on the charge state distributions observed with highly charged ion sourcesStockli, M.P. et al. | 2000
- 1056
-
Medical accelerators in Japan (invited)Soga, F. et al. | 2000
- 1056
-
POSTER SESSION B - ION SOURCES FOR MEDICAL APPLICATIONS AND LASER ION SOURCES - Medical accelerators in Japan (invited)Soga, F. et al. | 2000
- 1061
-
POSTER SESSION B - ION SOURCES FOR MEDICAL APPLICATIONS AND LASER ION SOURCES - Status report on electron cyclotron resonance ion sources at the Heavy Ion Medical Accelerator in ChibaKitagawa, A. et al. | 2000
- 1061
-
Status report on electron cyclotron resonance ion sources at the Heavy Ion Medical Accelerator in ChibaKitagawa, A. / Muramatsu, M. / Sekiguchi, M. / Yamada, S. / Jincho, K. / Okada, T. / Yamamoto, M. / Hattori, T. / Biri, S. / Baskaran, R. et al. | 2000
- 1064
-
The application and status of the radio frequency driven multi-cusp ion source (invited)Leung, Ka-Ngo et al. | 2000
- 1064
-
POSTER SESSION B - NEGATIVE ION SOURCES FOR ACCELERATORS AND FUSION (I) - The application and status of the radio frequency driven multi-cusp ion source (invited)Leung, Ka-Ngo et al. | 2000
- 1069
-
Negative ion sources for high energy accelerators (invited)Peters, J. et al. | 2000
- 1069
-
POSTER SESSION B - NEGATIVE ION SOURCES FOR ACCELERATORS AND FUSION (I) - Negative ion sources for high energy accelerators (invited)Peters, J. et al. | 2000
- 1075
-
Performance of the NANOGUN™ electron cyclotron resonance ion source applied for nuclear astrophysicsItahashi, T. / Kudomi, K. / Kume, K. / Takahisa, K. / Yoshida, S. / Ejiri, H. / Toki, H. / Nagai, Y. / Ohsumi, H. / Komori, M. et al. | 2000
- 1075
-
POSTER SESSION B - NEGATIVE ION SOURCES FOR ACCELERATORS AND FUSION (I) - Performance of the NANOGUNTM electron cyclotron resonance ion source applied for nuclear astrophysicsItahashi, T. et al. | 2000
- 1079
-
POSTER SESSION B - NEGATIVE ION SOURCES FOR ACCELERATORS AND FUSION (I) - Hydrogen negative ion source with LaB6 insertsBelchenko, Yu I. et al. | 2000
- 1079
-
Hydrogen negative ion source with LaB6 insertsBelchenko, Yu. I. / Kuznetsov, G. I. / Grigoryev, E. A. et al. | 2000
- 1082
-
POSTER SESSION B - NEGATIVE ION SOURCES FOR ACCELERATORS AND FUSION (I) - Effect of cesium and xenon seeding in negative hydrogen ion sourcesBacal, M. et al. | 2000
- 1082
-
Effect of cesium and xenon seeding in negative hydrogen ion sourcesBacal, M. / Bruneteau, A. M. / Deniset, C. / Elizarov, L. I. / Sube, F. / Tontegode, A. Y. / Whealton, J. H. et al. | 2000
- 1086
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Some consequences to ion source behavior of high plasma drift velocityBrown, I.G. et al. | 2000
- 1086
-
Some consequences to ion source behavior of high plasma drift velocityBrown, I. G. / Monteiro, O. R. / Bilek, M. M. M. / Keidar, M. / Oks, E. M. / Vizir, A. et al. | 2000
- 1090
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Bipolar extraction neutralization: Time resolved characterizationKorzec, D. et al. | 2000
- 1090
-
Bipolar extraction neutralization: Time resolved characterizationKorzec, D. / Dahlhaus, R. / Engemann, J. et al. | 2000
- 1094
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Numerical simulation and optimization of multicomponent ion beam from RIKEN electron cyclotron resonance ion sourcesAlexandrov, V. et al. | 2000
- 1094
-
Numerical simulation and optimization of multicomponent ion beam from RIKEN electron cyclotron resonance ion sourcesAlexandrov, V. / Nakagawa, T. / Shevtsov, V. / Shirkov, G. et al. | 2000
- 1097
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Aberrations due to solenoid focusing of a multiply charged high-current ion beamGrégoire, G. et al. | 2000
- 1097
-
Aberrations due to solenoid focusing of a multiply charged high-current ion beamGre´goire, G. / Kugler, H. / Lisi, N. / Schnuriger, J.-C. / Scrivens, R. / Tambini, J. et al. | 2000
- 1100
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Diagnostics - Calibration of the Galileo microchannel plates with the Xe2+-Xe13+ and C2+-C6+ ions in the energy range from 0.5 to 150 keV-q (abstract)Mroz, W. et al. | 2000
- 1100
-
Calibration of the Galileo microchannel plates with the Xe2+–Xe13+ and C2+–C6+ ions in the energy range from 0.5 to 150 keV/q (abstract)Mro´z, W. / Sto¨ckli, M. P. / Fry, D. / Prokopiuk, A. / Walch, B. et al. | 2000
- 1101
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Diagnostics - Energy analysis of negative hydrogen ions using detached electronsTakahashi, M. et al. | 2000
- 1101
-
Energy analysis of negative hydrogen ions using detached electronsTakahashi, M. / Yoshimoto, M. / Shinto, K. / Takagi, A. / Ikegami, K. / Mori, Y. et al. | 2000
- 1104
-
A comparative study of emittance measurements using different techniquesHamabe, M. / Kuroda, T. / Sasao, M. / Nishiura, M. / Wada, M. / Guharay, S. K. et al. | 2000
- 1104
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Diagnostics - A comparative study of emittance measurements using different techniquesHamabe, M. et al. | 2000
- 1107
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Diagnostics - Time resolving diagnostic of the compensation process of pulsed ion beams at high-intensity light ion sourceJakob, A. et al. | 2000
- 1107
-
Time resolving diagnostic of the compensation process of pulsed ion beams at high-intensity light ion sourceJakob, A. / Beauvais, P-Y. / Gobin, R. / Klein, H. / LeMaire, J-L. / LeRoy, P-A. / Pozimski, J. et al. | 2000
- 1110
-
Beam extraction from a compact Ku-band electron cyclotron resonance ion source with double resonance modesTojyo, E. / Oyaizu, M. / Jeong, S. C. / Ishiyama, H. / Ishida, Y. / Kawakami, H. / Miyatake, H. / Katayama, I. / Nomura, T. et al. | 2000
- 1110
-
POSTER SESSION C - 2. NOVEL ION SOURCES - A. ECR Ion Sources - Beam extraction from a compact Ku-band electron cyclotron resonance ion source with double resonance modesTojyo, E. et al. | 2000
- 1113
-
Design of a small electron cyclotron resonance ion source with partially pulsed magnetic fieldOyaizu, M. / Tojyo, E. / Jeong, S. C. / Ishiyama, H. / Miyatake, H. / Ishida, Y. / Kawakami, H. / Katayama, I. / Nomura, T. et al. | 2000
- 1113
-
POSTER SESSION C - 2. NOVEL ION SOURCES - A. ECR Ion Sources - Design of a small electron cyclotron resonance ion source with partially pulsed magnetic fieldOyaizu, M. et al. | 2000
- 1116
-
POSTER SESSION C - 2. NOVEL ION SOURCES - A. ECR Ion Sources - Electron cyclotron resonance ion trap: A hybrid magnetic system with very high mirror ratio for highly charged ion production and trappingBiri, S. et al. | 2000
- 1116
-
Electron cyclotron resonance ion trap: A hybrid magnetic system with very high mirror ratio for highly charged ion production and trappingBiri, S. / Simons, L. / Hitz, D. et al. | 2000
- 1119
-
Preliminary tests for the electron cyclotron resonance ion source coupled to a laser ion source for charge state enhancement experimentGammino, S. / Ciavola, G. / Torrisi, L. / Celona, L. / Wolowski, J. / Woryna, E. / Parys, P. / La`ska, L. / Kra`sa, J. / Shirkov, G. D. et al. | 2000
- 1119
-
POSTER SESSION C - 2. NOVEL ION SOURCES - A. ECR Ion Sources - Preliminary tests for the electron cyclotron resonance ion source coupled to a laser ion source for charge state enhancement experimentGammino, S. et al. | 2000
- 1122
-
POSTER SESSION C - 2. NOVEL ION SOURCES - B. Sputter Negative Ion Sources - Energy distribution of negative carbon ion beam extracted from a plasma-sputter-type negative ion sourceOomori, H. et al. | 2000
- 1122
-
Energy distribution of negative carbon ion beam extracted from a plasma-sputter-type negative ion sourceOomori, H. / Kasuya, T. / Wada, M. / Horino, Y. / Tsubouchi, N. et al. | 2000
- 1125
-
Negative ion beam production by a microwave ion source equipped with a magnetically separated double plasma cell systemTanaka, M. / Amemiya, K. et al. | 2000
- 1125
-
POSTER SESSION C - 2. NOVEL ION SOURCES - B. Sputter Negative Ion Sources - Negative ion beam production by a microwave ion source equipped with a magnetically separated double plasma cell systemTanaka, M. et al. | 2000
- 1128
-
POSTER SESSION C - 2. NOVEL ION SOURCES - C. New Concept Ion Sources - Ion bombardment-type high frequency metal ion source for compact ion beam deposition apparatusYamashita, Mutsuo et al. | 2000
- 1128
-
Ion bombardment-type high frequency metal ion source for compact ion beam deposition apparatusYamashita, Mutsuo et al. | 2000
- 1131
-
POSTER SESSION C - 2. NOVEL ION SOURCES - C. New Concept Ion Sources - Ion energy width of a dc metal arc plasma under high vacuumTamba, Moritake et al. | 2000
- 1131
-
Ion energy width of a dc metal arc plasma under high vacuumTamba, Moritake / Amemiya, Hiroshi et al. | 2000
- 1134
-
POSTER SESSION C - 2. NOVEL ION SOURCES - C. New Concept Ion Sources - Improvement of the lifetime of radio frequency antenna for plasma generationReijonen, J. et al. | 2000
- 1134
-
Improvement of the lifetime of radio frequency antenna for plasma generationReijonen, J. / Eardley, M. / Gough, R. / Keller, R. / Leung, K. / Thomae, R. / Pickard, D. / Williams, M. D. et al. | 2000
- 1137
-
POSTER SESSION C - 2. NOVEL ION SOURCES - C. New Concept Ion Sources - Beam diagnostics extracted from radio frequency driven ion sourceAbdelaziz, M.E. et al. | 2000
- 1137
-
Beam diagnostics extracted from radio frequency driven ion sourceAbdelaziz, M. E. / Zakhary, S. G. / Ragheb, M. S. et al. | 2000
- 1140
-
Discharge characteristics of a long pulse ion source for the Korea Superconducting Tokamak Advanced Research neutral beam systemOh, B. H. / Kim, K. R. / Choi, B. H. et al. | 2000
- 1140
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Neutral Beam Injector for Fusion - Discharge characteristics of a long pulse ion source for the Korea Superconducting Tokamak Advanced Research neutral beam systemOh, B.H. et al. | 2000
- 1144
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Neutral Beam Injector for Fusion - Development of a steady-state microwave ion source with large spherical electrodes for geometrical focusingKawakami, T. et al. | 2000
- 1144
-
Development of a steady-state microwave ion source with large spherical electrodes for geometrical focusingKawakami, T. / Shimada, T. / Yonezawa, T. / Ueda, Y. / Nishikawa, M. et al. | 2000
- 1148
-
Investigation of a radio frequency-driven multicusp ion source of the diagnostic neutral beam for the Hanbit device at Korea Basic Science InstituteYang, H. L. / Yoo, S. J. / Hwang, S. M. / Chung, K. H. et al. | 2000
- 1148
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Neutral Beam Injector for Fusion - Investigation of a radio frequency-driven multicusp ion source of the diagnostic neutral beam for the Hanbit device at Korea Basic Science InstituteYang, H.L. et al. | 2000
- 1151
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Neutral Beam Injector for Fusion - Comparison of H--D- measurement in the magnetically filtered region of the large negative ion sourceHamabe, M. et al. | 2000
- 1151
-
Comparison of H−/D− measurement in the magnetically filtered region of the large negative ion sourceHamabe, M. / Oka, Y. / Osakabe, M. / Takeiri, Y. / Tsumori, K. / Kaneko, O. et al. | 2000
- 1154
-
Calculations of stray electron trajectory for designing negative ion accelerators of neutral beam injectorAsano, Shiro / Okuyama, Toshihisa / Suzuki, Yasuo / Kaneko, Osamu et al. | 2000
- 1154
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Neutral Beam Injector for Fusion - Calculations of stray electron trajectory for designing negative ion accelerators of neutral beam injectorAsano, Shiro et al. | 2000
- 1157
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Production of organosilicon ions for SIC epitaxyKiuchi, Masato et al. | 2000
- 1157
-
Production of organosilicon ions for SiC epitaxyKiuchi, Masato / Matsumoto, Takashi / Mimoto, Kazuhiko / Takeuchi, Takae / Goto, Seiichi et al. | 2000
- 1160
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Compact microwave ion source for extremely low energy ion irradiation systemGotoh, Y. et al. | 2000
- 1160
-
Compact microwave ion source for extremely low energy ion irradiation systemGotoh, Y. / Kubo, H. / Tsuji, H. / Ishikawa, J. et al. | 2000
- 1163
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Ion source for ion beam deposition employing a novel electrode assemblyHayes, A.V. et al. | 2000
- 1163
-
Ion source for ion beam deposition employing a novel electrode assemblyHayes, A. V. / Kanarov, V. / Yevtukhov, R. / Hegde, H. / Druz, B. / Yakovlevitch, D. / Cheesman, W. / Mirkov, V. et al. | 2000
- 1168
-
Development and properties of a Freeman-type hybrid ion sourceMatsumoto, T. / Mimoto, K. / Goto, S. / Ohba, M. / Agawa, Y. / Kiuchi, M. et al. | 2000
- 1168
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Development and properties of a Freeman-type hybrid ion sourceMatsumoto, T. et al. | 2000
- 1171
-
Development of a compact multicusp ion source of He+Nishiura, M. / Sasao, M. / Wada, M. / Hamabe, M. / Kuroda, T. / Guharay, S. K. et al. | 2000
- 1171
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Development of a compact multicusp ion source of He+Nishiura, M. et al. | 2000
- 1174
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Prolongation of a filament lifetime using SF6 plasma methodOhkoshi, Kiyonori et al. | 2000
- 1174
-
Prolongation of a filament lifetime using SF6 plasma methodOhkoshi, Kiyonori / Saitoh, Yuichi / Kamiya, Tomihiro / Sakai, Takuro / Tajima, Satoshi et al. | 2000
- 1177
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Design and performance of a versatile, cost-effective microwave electron cyclotron resonance plasma source for surface and thin film processingAnton, R. et al. | 2000
- 1177
-
Design and performance of a versatile, cost-effective microwave electron cyclotron resonance plasma source for surface and thin film processingAnton, R. / Wiegner, Th. / Naumann, W. / Liebmann, M. / Klein, Chr. / Bradley, Chr. et al. | 2000
- 1181
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - A 13.56 MHz multicusp ion source for high intensity Ar beamBoonyawan, D. et al. | 2000
- 1181
-
A 13.56 MHz multicusp ion source for high intensity Ar beamBoonyawan, D. / Chirapatpimol, N. / Sanguansak, N. / Vilaithong, T. et al. | 2000
- 1184
-
Carbon shunting arc and its induced plasmaYukimura, Ken / Yoshioka, Kenji / Tani, Yuji et al. | 2000
- 1184
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Carbon shunting arc and its induced plasmaYukimura, Ken et al. | 2000
- 1187
-
Model for ion extraction from pulsed plasma source for plasma based ion implantation (PBII)Masamune, Sadao / Yukimura, Ken et al. | 2000
- 1187
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Model for ion extraction from pulsed plasma source for plasma based ion implantation (PBII)Masamune, Sadao et al. | 2000
- 1191
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Matching the injected ion beam into an rf Linac for a high-energy, high-current ion implanterSaadatmand, Kourosh et al. | 2000
- 1191
-
Matching the injected ion beam into an rf Linac for a high-energy, high-current ion implanterSaadatmand, Kourosh et al. | 2000
- 1194
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Measurement of the four-dimensional transverse emittance of an ion beamZeinoun, Issam et al. | 2000
- 1194
-
Measurement of the four-dimensional transverse emittance of an ion beamZeinoun, Issam / Benveniste, Victor / Saadatmand, Kourosh / Swenson, David et al. | 2000
- 1197
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Study of ion source emittance of an ELS-PIG source used for ion implantationSwenson, D.R. et al. | 2000
- 1197
-
Study of ion source emittance of an ELS-PIG source used for ion implantationSwenson, D. R. / Saadatmand, K. / Zeinoun, I. et al. | 2000
- 1200
-
Electron cyclotron resonance light source assembly—A vacuum-ultraviolet radiation source based on an electron cyclotron resonance plasmaGru¨bling, P. / Hollandt, J. / Ulm, G. et al. | 2000
- 1200
-
POSTER SESSION C - 4. APPLICATIONS OF ION SOURCES AND BEAMS - Electron cyclotron resonance light source assembly -- A vacuum-ultraviolet radiation source based on an electron cyclotron resonance plasmaGrübling, P. et al. | 2000
- 1203
-
POSTER SESSION C - 4. APPLICATIONS OF ION SOURCES AND BEAMS - Studies on enhancement of x-ray flux in the compact electron cyclotron resonance plasma x-ray sourceBaskaran, R. et al. | 2000
- 1203
-
Studies on enhancement of x-ray flux in the compact electron cyclotron resonance plasma x-ray sourceBaskaran, R. / Selvakumaran, T. S. et al. | 2000
- 1206
-
POSTER SESSION C - 4. APPLICATIONS OF ION SOURCES AND BEAMS - Production of multiply charged ion target for photoionization studies using synchrotron radiationOura, Masaki et al. | 2000
- 1206
-
Production of multiply charged ion target for photoionization studies using synchrotron radiationOura, Masaki / Yamaoka, Hitoshi / Kawatsura, Kiyoshi / Hayaishi, Tatsuji / Kimata, Junichi / Kojima, Takao M. / Kimura, Masahiro / Sekioka, Tsuguhisa / Terasawa, Mititaka et al. | 2000
- 1210
-
POSTER SESSION C - 4. APPLICATIONS OF ION SOURCES AND BEAMS - Beam optics in inertial electrostatic confinement fusionOhnishi, Masami et al. | 2000
- 1210
-
Beam optics in inertial electrostatic confinement fusionOhnishi, Masami / Hoshino, Chikara / Yoshikawa, Kiyoshi / Masuda, Kai / Yamamoto, Yasushi et al. | 2000
- 1213
-
Measurements on H− sources for spallation neutron source applicationThomae, R. / Gough, R. / Keller, R. / Leitner, M. / Leung, K. / Meyer, D. / Williams, M. et al. | 2000
- 1213
-
POSTER SESSION C - 4. APPLICATIONS OF ION SOURCES AND BEAMS - Measurements on H- sources for spallation neutron source applicationThomae, R. et al. | 2000
- 1216
-
Development of a high-current laser ion source for induction acceleratorsYoshida, M. / Hasegawa, J. / Fukata, S. / Oguri, Y. / Ogawa, M. / Nakajima, M. / Horioka, K. / Shiho, M. et al. | 2000
- 1216
-
POSTER SESSION C - 4. APPLICATIONS OF ION SOURCES AND BEAMS - Development of a high-current laser ion source for induction acceleratorsYoshida, M. et al. | 2000
- 1219
-
Negative hydrogen ion source for TOKAMAK neutral beam injector (invited)Okumura, Y. / Fujiwara, Y. / Kashiwagi, M. / Kitagawa, T. / Miyamoto, K. / Morishita, T. / Hanada, M. / Takayanagi, T. / Taniguchi, M. / Watanabe, K. et al. | 2000
- 1219
-
POSTER SESSION C - NEGATIVE ION SOURCES FOR FUSION (II) - Negative hydrogen ion source for TOKAMAK neutral beam injector (invited)Okumura, Y. et al. | 2000
- 1225
-
POSTER SESSION C - NEGATIVE ION SOURCES FOR FUSION (II) - Negative hydrogen ion source development for large helical device neutral beam injector (invited)Takeiri, Y. et al. | 2000
- 1225
-
Negative hydrogen ion source development for large helical device neutral beam injector (invited)Takeiri, Y. / Kaneko, O. / Tsumori, K. / Oka, Y. / Osakabe, M. / Ikeda, K. / Asano, E. / Kawamoto, T. / Akiyama, R. et al. | 2000
- 1231
-
Hydrogen negative ion beam acceleration in a multiaperture five-stage electrostatic acceleratorWatanabe, K. / Fujiwara, Y. / Hanada, M. / Kashiwagi, M. / Kitagawa, T. / Miyamoto, K. / Morishita, T. / Okumura, Y. / Takayanagi, T. / Taniguchi, M. et al. | 2000
- 1231
-
POSTER SESSION C - NEGATIVE ION SOURCES FOR FUSION (II) - Hydrogen negative ion beam acceleration in a multiaperture five-stage electrostatic acceleratorWatanabe, K. et al. | 2000
- 1234
-
Parametric study of negative ion production in cesium seeded hydrogen plasmasFukumasa, Osamu / Monji, Hideki et al. | 2000
- 1234
-
POSTER SESSION C - NEGATIVE ION SOURCES FOR FUSION (III) - Parametric study of negative ion production in cesium seeded hydrogen plasmasFukumasa, Osamu et al. | 2000
- 1237
-
POSTER SESSION C - NEGATIVE ION SOURCES FOR FUSION (III) - Optically pumped polarized H- ion source for RHIC spin projectMori, Y. et al. | 2000
- 1237
-
Optically pumped polarized H− ion source for RHIC spin projectMori, Y. / Ikegami, K. / Takagi, A. / Zelenski, A. N. / Dutto, G. / Kadantsev, S. / Levy, C. D. P. / Wight, G. W. / Alessi, J. / Okamura, M. et al. | 2000