Influence of Substrate Temperature on Diamond Synthesis in a Supersonic Hydrogen Arcjet (Englisch)
- Neue Suche nach: Loh, M. H.
- Neue Suche nach: Cappelli, M. A.
- Neue Suche nach: Electrochemical Society
- Neue Suche nach: Loh, M. H.
- Neue Suche nach: Cappelli, M. A.
- Neue Suche nach: Electrochemical Society
In:
Spring Meeting
1
;
413
;
1995
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ISBN:
- Aufsatz (Konferenz) / Print
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Titel:Influence of Substrate Temperature on Diamond Synthesis in a Supersonic Hydrogen Arcjet
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Beteiligte:
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Kongress:187th Meeting, Spring Meeting ; 1995 ; Reno; NV
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Erschienen in:Spring Meeting , 1 ; 413
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Verlag:
- Neue Suche nach: The Society
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Erscheinungsdatum:01.01.1995
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Format / Umfang:413 pages
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ISBN:
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Medientyp:Aufsatz (Konferenz)
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Format:Print
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Inhaltsverzeichnis Konferenzband
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 1
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New High Voltage Cathode Materials for Rechargeable Lithium BatteriesFey, G. T. K. / Wu, C. S. / Yang, S. M. / Dahn, J. R. / Electrochemical Society et al. | 1995
- 2
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Electrochemical Studies of Bare and Copper Coated LaNi~4~.~2~7Sn~0~.~2~4 Electrodes in Alkaline SolutionPopov, B. N. / Zheng, G. / White, R. E. / Electrochemical Society et al. | 1995
- 4
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Electrochemical Determination of the Diffusion Coefficient of Hydrogen Through a LaNi~4~.~2~5Al~0~.~7~5 Electrode in Alkaline SolutionZheng, G. / Popov, B. N. / White, R. E. / Electrochemical Society et al. | 1995
- 6
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Effect of Cell Temperature on the Electrochemical Performance of Metal Hydride ElectrodesZhang, W. / Kumar, M. P. S. / Srinivasan, S. / Electrochemical Society et al. | 1995
- 8
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A General Discharge Model for the Nickel/Metal Hydride Battery SystemPaxton, B. / Newman, J. / Electrochemical Society et al. | 1995
- 9
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Synthesis and Electrochemical Studies of Spinel Phase LiMn~2O~4 and LiM~Mn~2~-~O~4 (M=Co, Ni) Prepared by the Pechini ProcessLiu, W. / Davis, P. / Chaput, F. / Dunn, B. / Electrochemical Society et al. | 1995
- 11
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Testing of a Refuelable Zinc-Air Bus BatteryCooper, J. F. / Fleming, D. / Koopman, R. / Hargrove, D. / Electrochemical Society et al. | 1995
- 13
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The Zero Emission Vehicle as Symbol - Evidence Suggesting an Organizational and Political Function of the California Air Resources Board's Electric Vehicle RegulationPaxton, B. / Electrochemical Society et al. | 1995
- 15
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Conductivity in the Poly(ethylene oxide) Mixed Salt Complexes PEO~x[LiN(S~2CF~3)~2]~y [LiSO~3C~8F~1~7]~xNafshun, R. / Lerner, M. / Electrochemical Society et al. | 1995
- 17
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Study of the Li/Poly[oxymethylene-oligo(oxyethylene)] Interface: Comparison of Linear, Cross-Linked, and Cross-Linked/Methylated Electrolyte FilmsSloop, S. E. / Lerner, M. M. / Electrochemical Society et al. | 1995
- 19
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Electrochemical Impedance Spectroscopic Study in Proton Exchange Membrane Fuel CellsLee, S.-M. / Hirano, S. / Srinivasan, S. / Electrochemical Society et al. | 1995
- 21
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Water Profile Determination across a Polymer Electrolyte during the Operation of a Hydrogen/Oxygen Proton Exchange Membrane Fuel CellMosdale, R. / Gebel, G. / Pineri, M. / Electrochemical Society et al. | 1995
- 23
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Effect of Platinum Concentration on Proton Exchange Membrane Fuel Cell PerformanceMosdale, R. / Srinivasan, S. / Electrochemical Society et al. | 1995
- 25
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Specific Surface Area Measurement of Lithium Anode in Lithium Secondary BatteriesSaito, K. / Arakawa, M. / Tobishima, S. / Yamaki, J. / Electrochemical Society et al. | 1995
- 27
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Lithium Anode Studies in a Tetrafluoroborate Molten Salt ElectrolyteFuller, J. / Osteryoung, R. A. / Carlin, R. T. / Electrochemical Society et al. | 1995
- 28
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Corrosion Current Maps of AB~5 Electrode SurfacesZhang, W. / Kumar, M. P. S. / Srinivasan, S. / Mukerjee, S. / Electrochemical Society et al. | 1995
- 30
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Electrochemical Deposition of Bi~2Te~3 Thin Films for Thermoelectric Device ApplicationsRyan, M. A. / Williams, R. M. / Electrochemical Society et al. | 1995
- 31
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A Simplified Two-Dimensional Model of Lead-Acid Cell DischargeSemenko, M. G. / Semenenko, V. I. / Electrochemical Society et al. | 1995
- 33
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Electrochemical Applications of Carbonaceous MaterialsKinoshita, K. / Chu, X. / Electrochemical Society et al. | 1995
- 34
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Carbon Filaments for Electrochemical ApplicationsChung, D. D. L. / Shui, X. / Frysz, C. A. / Electrochemical Society et al. | 1995
- 35
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Electrochemical and Physico-chemical Characterization of Randomly Oriented Graphite ElectrodesLavoie, M.-A. / Regisseur, F. / Belanger, D. / Champagne, G. Y. / Electrochemical Society et al. | 1995
- 37
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Improving the Electrochemical Performance of Carbons by Surface TreatmentsChung, D. D. L. / Shui, X. / Frysz, C. A. / Electrochemical Society et al. | 1995
- 38
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Oxygen Reduction on Carbonaceous Materials in Alkaline ElectrolyteChu, X. / Markovic, N. / Kinoshita, K. / Ross, P. / Electrochemical Society et al. | 1995
- 40
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Review of Processes for the Production of Mixtures of Caustic Soda and Hydrogen Peroxide via the Reduction of OxygenFoller, P. C. / Electrochemical Society et al. | 1995
- 42
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Bromine/Bromide Ion Redox Reaction on Carbon Electrodes with a High Surface AreaShindo, K. / Hirai, T. / Electrochemical Society et al. | 1995
- 44
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Superior Corrosion Resistance of Diamond Thin Film Electrodes in Acidic Fluoride MediaSwain, G. M. / Alesham, S. / Chambers, F. / Granger, M. / Electrochemical Society et al. | 1995
- 45
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Synthesis and Characterization of New Carbon Electrodes for Secondary Lithium BatteriesSandi, G. / Winans, R. E. / Carrado, K. A. / Electrochemical Society et al. | 1995
- 46
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Characterization of Lithium Intercalation-Deintercalation in Disordered Carbon Materials as Anodes for Lithium Ion CellsSatoh, A. / Takami, N. / Hara, M. / Ohsaki, T. / Electrochemical Society et al. | 1995
- 48
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Electrochemical Intercalation of Lithium in Different Origin of Carbon Materials Use as Negative Electrode for Lithium-Ion Type BatteriesZaghib, K. / Tatsumi, K. / Imamura, T. / Sawada, Y. / Electrochemical Society et al. | 1995
- 50
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Rate Effect on Lithium-Ion Graphite Electrode PerformanceTran, T. S. / Feikert, J. H. / Kinoshita, K. / Electrochemical Society et al. | 1995
- 52
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The Influence of Structural Parameters on Lithium Storage Capacity of Mesocarbon Microbeads at Several Current DensitiesTatsumi, K. / Imamura, T. / Zaghib, K. / Iwashita, N. / Electrochemical Society et al. | 1995
- 53
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Periodic Behavior in the Iron/Sulfuric Acid SystemRush, B. / Newman, J. / Electrochemical Society et al. | 1995
- 55
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Characterization of Corrosion Phenomena Using the Electrochemical Noise Resistance and the Pitting IndexKelly, R. G. / Yuan, J. / Hudson, J. L. / Inman, M. E. / Electrochemical Society et al. | 1995
- 56
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Nonlinear Potential and Current Oscillations on Irradiated and Unirradiated Type 304SS in Chloride SolutionSikora, J. / Sikora, E. / Macdonald, D. D. / Electrochemical Society et al. | 1995
- 57
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Aperiodic Oscillatory Behavior of Fe-Ni Alloys in Concentrated Chloride SolutionsChen, L. / Shen, D. H. / Nobe, B. K. / Nobe, K. / Electrochemical Society et al. | 1995
- 58
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An In Situ Small Angle Neutron Scattering Investigation of Ag~0~.~7Au~0~.~3 DealloyingCorcoran, S. G. / Wiesler, D. / Barker, J. / Sieradzki, K. / Electrochemical Society et al. | 1995
- 59
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Microstructure and De-Alloying Kinetics of Zinc-Nickel Alloy ElectrodepositsNakamaru, H. / Newman, R. C. / Electrochemical Society et al. | 1995
- 60
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X-Ray Studies of Iron Dissolution Through Passive Films on Fe-Cr AlloysDavenport, A. J. / Simmonds, M. P. / Ryan, M. P. / Newman, R. C. / Electrochemical Society et al. | 1995
- 61
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Effect of Grain Boundary Orientation on the Sensitization of Austenitic Stainless SteelDevine, T. M. / Kavner, A. / Electrochemical Society et al. | 1995
- 62
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Propagation Behavior of Crevice Corrosion under Metal-Glass Crevice for High Purity 18Cr-14Ni Steel in 3% NaCl SolutionShinohara, T. / Chen, P. / Tsujikawa, S. / Electrochemical Society et al. | 1995
- 64
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A Metastable Pit Growth Front on Heat-Tinted Stainless SteelPistorius, P. C. / Electrochemical Society et al. | 1995
- 66
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Corrosion in Supercritical Aqueous Systems and the Density of SolventKriksunov, L. B. / Macdonald, D. D. / Electrochemical Society et al. | 1995
- 68
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Influence of a Corrosive Environment on the Fatigue Behavior of 2024 Aluminum Alloy Investigated by In Situ Atomic Force MicroscopyKowal, K. / Deluccia, J. J. / Josefowicz, J. Y. / Laird, C. / Electrochemical Society et al. | 1995
- 70
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Influence of Alloying Elements on the Corrosion of Aluminum in Alkaline SolutionKoroleva, E. V. / Thompson, G. E. / Hollrigl, G. / Bloeck, M. / Electrochemical Society et al. | 1995
- 72
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Tunnel Shapes in DC Etching of AluminumGoad, D. / Electrochemical Society et al. | 1995
- 73
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Tunneling Corrosion of Aluminum: The Intelligent PitNewman, R. C. / Electrochemical Society et al. | 1995
- 74
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Synchrotron X-Ray Scattering Techniques for In Situ Studies of Corrosion-Passivation Phenomena in MetalsMelendres, C. A. / Electrochemical Society et al. | 1995
- 76
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Surface Enhanced Raman Spectroelectrochemical Studies of the Corrosion Films on Iron in Aqueous Carbonate SolutionsSimpson, L. J. / Melendres, C. A. / Electrochemical Society et al. | 1995
- 78
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Transient Behavior of Passive Film on TungstenSikora, E. / Macdonald, D. D. / Sikora, J. / Electrochemical Society et al. | 1995
- 79
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XPS Analysis of Segregation of Alloying Elements in Passive SystemsZhang, L. / Macdonald, D. D. / Electrochemical Society et al. | 1995
- 80
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Metal Oxide Film Formation/Reduction: A QCMB and Impedance InvestigationBirss, V. I. / Chan, M. / Phan, T. / Vanysek, P. / Electrochemical Society et al. | 1995
- 81
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On the Kinetics for Passive Film Growth: Comparison of the Modified High Field Model and the Point Defect ModelZhang, L. / Macdonald, D. D. / Electrochemical Society et al. | 1995
- 83
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Breakdown and Reformation of Surface Films on Ti in Halide SolutionsChen, L. / Williamson, J. J. / Nobe, K. / Electrochemical Society et al. | 1995
- 84
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Controlled Hydrodynamic Electrochemical Studies in High-Temperature Aqueous SystemsBertuch, A. F. / Lvov, S. N. / Macdonald, D. D. / Electrochemical Society et al. | 1995
- 85
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Modeling the Electronic Structure of the Passive Film on Tungsten from Capacitance MeasurementsSikora, E. / Sikora, J. / Macdonald, D. D. / Electrochemical Society et al. | 1995
- 86
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About the Role of the Chemical Composition and the Structure of Surface Layers - Products Interaction of Metal with an Aggressive Media - in Electrochemical Corrosion of Carbon SteelEnikeev, E. K. / Panov, M. K. / Feoktistov, A. K. / Krasheninnikova, I. M. / Electrochemical Society et al. | 1995
- 88
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The Influence of Surface States on the Electrochemical Behavior of Passive ZincIsmail, K. M. / Macdonald, D. D. / Electrochemical Society et al. | 1995
- 90
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The Transpassive Behavior of the Anodic Film of Fe-Cr Alloys in Acidic Aqueous MediaBrookes, H. C. / Tonkinson, C. / Electrochemical Society et al. | 1995
- 91
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Initiation of Corrosion Pits at Inclusions on Stainless SteelAlkire, R. C. / Ke, R. / Electrochemical Society et al. | 1995
- 93
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Hydride Formation In Occluded Cells on a Magnesium Anode SurfaceNazarov, A. P. / Yurasova, T. A. / Electrochemical Society et al. | 1995
- 94
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STM Investigation of BTA on Cu(111) and (110) SurfacesPickering, H. W. / Cho, K. H. / Kishimoto, J. / Hashizume, T. / Electrochemical Society et al. | 1995
- 95
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SERS Study of Carbon Steel in CO~2-Saturated Brine with Comments on the Action of InhibitorsOblonsky, L. J. / Devine, T. M. / Chesnut, G. R. / Electrochemical Society et al. | 1995
- 96
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Resistance Corrosion of Zinc with Lead Chloride and Polyethylene GlycolZhang, S. T. / Huang, Z. Q. / Li, M. J. / Electrochemical Society et al. | 1995
- 98
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Reaction of Scandia with NaVO~3-V~2O~5 MeltsJones, R. L. / Reidy, R. F. / Electrochemical Society et al. | 1995
- 99
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Pitting of Rapidly Solidified Neodymium-Iron-Boron (Nd-Fe-B) Permanent MagnetsAttanasio, S. A. / Latanision, R. M. / Electrochemical Society et al. | 1995
- 101
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Effect of Cold Work and Recrystallization Processes on Oxidation of Chromium SteelZimina, T. / Racoch, A. / Sirotkina, A. / Oshe, E. / Electrochemical Society et al. | 1995
- 103
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Electrochemical Measurements of Polymer Coatings under PressureMacQueen, R. C. / Miron, R. R. / Granata, R. D. / Electrochemical Society et al. | 1995
- 105
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Study of Cathodic Behavior of Iron Using Potential Pulse TechniqueChebotareva, N. / Mikhailovsky, U. / Electrochemical Society et al. | 1995
- 106
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Cathodic Reactions and Interactions Between Iron and Hydrogen in the Presence of Oxygen-Containing OxidantsMaksaeva, L. B. / Marshakov, A. I. / Mikhailovski, Y. N. / Electrochemical Society et al. | 1995
- 107
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Effect of Organosilanes on Anticorrosion Properties and Cathodic Delamination Stability of Polymeric CoatingsPetrunin, M. A. / Nazarov, A. P. / Electrochemical Society et al. | 1995
- 108
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Evaluation of Nonchromate Inhibiting Pigments for Steel and Aluminum AlloysKendig, M. / Cunningham, M. / Jeanjaquet, S. / Electrochemical Society et al. | 1995
- 110
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The Application of Selected Nuclear-Based Methods for the Understanding of Hexavalent Chromium Protection in Aluminum CorrosionWieckowski, A. / Electrochemical Society et al. | 1995
- 111
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^2^7Al NMR Study of Porous Anodized AluminumDavenport, A. J. / Grey, C. P. / French, G. / Electrochemical Society et al. | 1995
- 112
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Corrosion Protection of Aluminum-Matrix Composites by AnodizationChung, D. D. L. / Hou, J. / Electrochemical Society et al. | 1995
- 113
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A Review of Mechanisms of Chromate Treatment of Aluminum and Modeling of Related Interfacial Chemical ProcessesIsaacs, H. S. / Feldberg, S. / Davenport, A. J. / Aldykiewicz, A. J. / Electrochemical Society et al. | 1995
- 114
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Nonchromate Transition Metal Conversion Coatings for Aluminum AlloysBailin, L. J. / Electrochemical Society et al. | 1995
- 115
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The Purpose of Hydrotalcite Coated Aluminum to Sealing with Transition Metal Salt SolutionsBuchheit, P. G. / Martinez, M. A. / Electrochemical Society et al. | 1995
- 117
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Corrosion Protection of High-Copper Aluminum Alloys Using Chromate-Free ProcessesMansfeld, F. / Wang, Y. / Electrochemical Society et al. | 1995
- 119
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Performance of Chromate Conversion Coating Alternatives over Aluminum Substrates in Nonaerospace ApplicationsAult, J. P. / Cramer, K. / Evans, M. / Electrochemical Society et al. | 1995
- 121
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Critical Issues in Chromate ReplacementMacdonald, D. D. / Electrochemical Society et al. | 1995
- 122
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Issues Related to Chromium ReplacementJanata, J. / Baer, D. R. / Bierwagen, G. P. / Birnbaum, H. K. / Electrochemical Society et al. | 1995
- 124
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A Multistep Supervisory Controller for Photolithographic OperationsSpanos, C. J. / Ma, S.-Y. / Electrochemical Society et al. | 1995
- 126
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Nonlinear Run-to-Run Control for Rapid Thermal Processing with Unmeasured Variable EstimationZafiriou, E. / Chiou, H.-W. / Adomaitis, R. A. / Electrochemical Society et al. | 1995
- 128
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Artificial Neural Network Model-Based Run-to-Run Process ControllerWang, X. A. / Mahajan, R. L. / Electrochemical Society et al. | 1995
- 130
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Demonstration of a Process-Independent Run-to-Run ControllerTelfeyan, R. / Moyne, J. / Hurwitz, A. / Taylor, J. / Electrochemical Society et al. | 1995
- 132
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Modeling of Plasma Etch Dynamics Using Linear and Nonlinear ModelsBushman, S. / Karjala, T. W. / Himmelblau, D. M. / Trachtenberg, I. / Electrochemical Society et al. | 1995
- 133
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Modeling of Transport Phenomena and Detailed Chemistry in Tungsten Chemical Vapor DepositionKleijn, C. R. / Kuylaars, K. J. / Van der Akker, H. E. A. / Electrochemical Society et al. | 1995
- 134
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Development of RTP-Control with Monte Carlo SimulationKersch, A. / Electrochemical Society et al. | 1995
- 136
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Process Models for Process Control in Semiconductor ProcessingMeyyappan, M. / Govindan, T. R. / Buggeln, R. / DeJong, F. / Electrochemical Society et al. | 1995
- 138
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A Reduced Fluid-Dynamical Discharge Model for Applications in Technology-Oriented CADBrinkmann, R. P. / Furst, R. / Werner, C. / Hierlemann, M. / Electrochemical Society et al. | 1995
- 140
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CVD TiN Process Modeling for Contact/Via BarriersParanjpe, A. / IslamRaja, M. / Electrochemical Society et al. | 1995
- 142
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Thermophoretic Force on Particles in Low Pressure Processing ReactorsChio, S. J. / Rader, D. J. / Geller, A. S. / Electrochemical Society et al. | 1995
- 144
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Charging of Microfeatures by Radio Frequency SheathsDalvie, M. / Vahedi, V. / Hamaguchi, S. / Electrochemical Society et al. | 1995
- 145
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Grain Oriented Thin Film Microstructure SimulationFriedrich, L. / Robbie, K. / Dew, S. / Brett, M. / Electrochemical Society et al. | 1995
- 147
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One Approach to Combining Equipment Scale and Feature Scale ModelsGobbert, M. / Cale, T. / Ringhofer, C. / Electrochemical Society et al. | 1995
- 148
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In Situ Real Time Diagnostics of Surfaces during Plasma Processing: A ReviewAydil, E. S. / Electrochemical Society et al. | 1995
- 150
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A Method to Determine the Infrared Optical Constants and Thickness of a Thin Film from a Single Reflectance SpectrumMorrison, P. W. / Electrochemical Society et al. | 1995
- 151
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Normal Incidence Reflectance: A Robust Tool for In Situ Real-Time Measurement of Growth Rates and Optical Constants of CVD-Grown Semiconductor Thin FilmsBreiland, W. C. / Brannan, T. M. / Chui, H. C. / Hammons, B. E. / Electrochemical Society et al. | 1995
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Characterizations of Metallic and Organic Contamination on Silicon Surfaces and the Influence of the Contaminants on Gate Oxide QualityLiu, X. / Irene, E. A. / Electrochemical Society et al. | 1995
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A Neural Network Model of a Contact Plasma Etch ProcessRietman, E. A. / Electrochemical Society et al. | 1995
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Real-Time Optical Diagnostics for 0.25 m Gate Etching Process Control: Optical Emission, Full Wafer Interferometry, and UV-Visible EllipsometryLee, J. T. C. / Maynard, H. L. / Blayo, N. / Ibbatson, D. E. / Electrochemical Society et al. | 1995
- 157
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Application of Raman Spectroscopy for SC-1 Processing Bath Concentration ControlPelletier, M. J. / Carpio, R. / Davis, K. L. / Electrochemical Society et al. | 1995
- 159
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The Dependence of Bulk Defects on the Axial Temperature Gradient of Silicon Crystals during Czochralski GrowthAmmon, W. V. / Dornberger, E. / Oelkrug, H. / Weidner, H. / Electrochemical Society et al. | 1995
- 161
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Temperature Control in RTP Using Reduction of Equipment ModelsSchafbauer, T. / Kersch, A. / Electrochemical Society et al. | 1995
- 163
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Phenomenological Modeling for Real-Time Feedback Control of RTEChandhok, M. / Hanish, P. D. / Grizzle, J. W. / Electrochemical Society et al. | 1995
- 165
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Process Control for Design-Coupled ManufacturingLemnios, Z. J. / Electrochemical Society et al. | 1995
- 166
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Integrated Process Monitoring, Control, and Diagnostics of Semiconductor Manufacturing Wet Etch/Clean Spray ToolsAllen, M. / Luca, S. / Lee, P. / Seaton, J. / Electrochemical Society et al. | 1995
- 168
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Sensor Development and Process Control for Chemical-Mechanical Planarization of Multilevel Interconnect DevicesHu, A. / Dun, H.-P. / Renteln, P. / Sachs, E. / Electrochemical Society et al. | 1995
- 170
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Optimal Control for LPCVDCale, T. S. / Crouch, P. E. / Song, L. / Tsakalis, K. S. / Electrochemical Society et al. | 1995
- 171
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Sensor Information from a Lam 9600 Metal Etch ProcessBarna, G. G. / Buck, D. W. / Butler, S. W. / Splichal, M. / Electrochemical Society et al. | 1995
- 173
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Characteristics of ICP in Ar and Cl~2 Plasmas and Application to Cu EtchingSeo, S.-H. / Kim, J.-H. / Chang, H.-Y. / Electrochemical Society et al. | 1995
- 174
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Determination of F Radical Atom Distribution by Plasma Parameter Normalization in Electron Cyclotron Resonance SF~6 PlasmaKim, Y.-J. / Lee, P.-W. / Chang, C. S. / Chang, H.-Y. / Electrochemical Society et al. | 1995
- 176
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Investigation of Plasma Etch Chemistry Using ICP SpectroscopyMautz, K. E. / Electrochemical Society et al. | 1995
- 177
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On In Situ Etch Rate Extraction from Interferometric SignalsWong, K. S. / Boning, D. S. / Electrochemical Society et al. | 1995
- 179
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Molecular Beam Mass Spectrometry of the Thermal Decomposition of TetraethoxysilaneWierda, C. A. / Zachariah, M. R. / Burgess, D. R. F. / Electrochemical Society et al. | 1995
- 180
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Real-Time Equipment, Process and Wafer State Sensing of PolySi RTCVD from SiH~4 Using Mass SpectrometryTedder, L. L. / Rubloff, G. W. / Electrochemical Society et al. | 1995
- 181
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Mechanistic Investigations of Titanium Nitride CVDAllendorf, M. D. / Larson, R. S. / Melius, C. F. / Outka, D. A. / Electrochemical Society et al. | 1995
- 182
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Spatiotemporal Structure of ICP Reactor in Two-Dimensional ModelKamimura, K. / Makabe, T. / Nakagami, S. / Nakano, N. / Electrochemical Society et al. | 1995
- 184
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Simulation of Low Pressure Plasma Reactors on a Massively Parallel Supercomputer Using the Direct Simulation Monte Carlo (DSMC) MethodBartel, T. / Johannes, J. E. / Lymberopoulos, D. P. / Wise, R. S. / Electrochemical Society et al. | 1995
- 186
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Modeling of Neutral Effects in a High Density Etching PlasmaBukowski, J. D. / Stewart, R. A. / Vitelle, P. / Graves, D. B. / Electrochemical Society et al. | 1995
- 187
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Simulations of Real-Time Two-Coil Control of an Inductively Coupled Plasma Source for Etching ApplicationsVentzek, P. L. G. / Yamada, N. / Kitamori, K. / Sakai, Y. / Electrochemical Society et al. | 1995
- 189
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Modeling and Simulation of Two-Dimensional Reactive Plasma Flow in Inductively Coupled ReactorsEconomou, D. J. / Lymberopoulos, D. P. / Electrochemical Society et al. | 1995
- 191
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Modeling of a Two-Dimensional RF DischargeWilcoxson, M. / Manousiouthakis, V. / Electrochemical Society et al. | 1995
- 193
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SiO~2 Deposition on the Wafer in a High Density Plasma Deposition ReactorSelitser, S. / Fry, H. W. / Electrochemical Society et al. | 1995
- 195
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Chemistry Modeling in Downstream Etch Systems from the Plasma Source to the Etch ChamberMeeks, E. / Shon, J. W. / Vosen, S. R. / Larson, R. / Electrochemical Society et al. | 1995
- 196
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Modeling of BPSG Chemical Downstream Etch Process in the Batch Reactor: Taper Contact Etch ProcessMocala, K. J. / Electrochemical Society et al. | 1995
- 198
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Model-Based Control of Rapid Thermal ProcessesEdgar, T. F. / Electrochemical Society et al. | 1995
- 199
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Improving RIE Process Robustness via Real-Time Feedback ControlGrizzle, J. W. / Elta, M. E. / Freudenberg, J. S. / Khargonekar, P. P. / Electrochemical Society et al. | 1995
- 201
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Application of Sampling Quadruple Mass Spectrometry to Multivariable Process ControlGreve, D. W. / Cheng, X. / Knight, T. J. / Krogh, B. H. / Electrochemical Society et al. | 1995
- 203
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Ellipsometry-Based Control of III-V MBE GrowthCelii, F. / Kao, Y.-C. / Katz, A. / Moise, T. / Electrochemical Society et al. | 1995
- 205
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Model Based Training of a Neural Network End-Point Detector for Plasma Etch ApplicationsMundt, R. / Electrochemical Society et al. | 1995
- 206
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Finding Plasma Etching Endpoint by Monitoring RF Power Systems with an Artificial Neural NetworkMaynard, H. / Rietman, E. / Lee, J. T. C. / Ibbotson, D. / Electrochemical Society et al. | 1995
- 208
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Real Time Intrusive Optical Emission Spectroscopy for Process ControlLee, P.-W. / Kim, Y.-J. / Seo, S.-H. / Kim, J.-H. / Electrochemical Society et al. | 1995
- 210
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Characterization of Plasma Surface Charging Using a Real-Time On-Wafer ProbeMa, S. / McVittie, J. P. / Electrochemical Society et al. | 1995
- 211
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Improved Within-Wafer Uniformity Through the Use of Maximum-Likelihood Estimation of the Mean and Covariance SurfacesDavis, J. C. / Hughes-Oliver, J. / Gyurcsik, R. S. / Lu, J. C. / Electrochemical Society et al. | 1995
- 213
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Failure Analysis of 4-Kilo-Bit Polycrystalline-Silicon Gate Complementary Metal Oxide Semiconductor Field Effect Transistor Static Random Access Memory (TC5514AP) Silicon Die Chips Through the Observation of Digitally Expressed Fail Bit Pattern on a Cathode Ray TubeSaito, Y. / Electrochemical Society et al. | 1995
- 214
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(BFH^+) Contamination of Phosphorus Ion ImplantsHeden, C. / Ho, K. / Pong, R. / Weisenberger, W. / Electrochemical Society et al. | 1995
- 216
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Multivariate Classification of BPSG Thin Films Using Mahalanobis DistancesZhang, S. / Franke, J. E. / Niemczyk, T. M. / Haaland, D. M. / Electrochemical Society et al. | 1995
- 218
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Effect of Hydroxylamine Chemistry on Polymer Removal for Submicron Via ResistanceNguyen, T. T. / Kirk, S. J. / Electrochemical Society et al. | 1995
- 220
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Growth Kinetics of Silicon-Oxynitrides Formed by Furnace Oxidation of Si in N~2O AmbientBhat, M. / Jia, H. H. / Kwong, D. L. / Electrochemical Society et al. | 1995
- 222
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Diagnostics and Poly-Si Gate Process Development at New Microwave Coupled Plasma Source Etching SystemHoffman, P. J. / Heinrich, F. / Renner, S. / Deutschmann, L. / Electrochemical Society et al. | 1995
- 224
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Production of High Density Plasma on the Substrate in a Helicon Source and Application to the Deposition of SiFO Film with Low Dielectric ConstantKim, J.-H. / Seo, S.-H. / Chang, H.-Y. / Electrochemical Society et al. | 1995
- 226
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Application of Laser Irradiation for Control of Cd~xHg~1~-~xTe Semiconductor ParametersGnatyuk, V. A. / Borshch, V. V. / Kopishinska, O. P. / Tarasevich, A. A. / Electrochemical Society et al. | 1995
- 228
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Reliability of Thin Oxide Films for Ultra-Large-Scale IntegrationKimura, M. / Electrochemical Society et al. | 1995
- 230
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Low Electric Field Time-Dependent Dielectric Breakdown for BEOL Capacitor ApplicationsNguyen, D. B. / Wachnik, R. A. / Rathore, H. S. / Kane, T. / Electrochemical Society et al. | 1995
- 232
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Temperature Dependence of Breakdown in the Trap Creation Region for SiO~2 Thicknesses in the Range of 6-12 nmAbadeer, B. / Larosa, G. / Hueckel, G. / Acovic, A. / Electrochemical Society et al. | 1995
- 234
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Optimization of Thin Oxide ProcessTai, S.-S. / Electrochemical Society et al. | 1995
- 236
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Accelerated Testing for Stress Voiding in Multilayered MetallizationSullivan, T. / Bouldin, D. / Yao, D. / Electrochemical Society et al. | 1995
- 237
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Stress-Voiding and Electromigration Reliability of Interconnects in ULSI-CircuitsKorhonen, M. A. / Li, C.-Y. / Electrochemical Society et al. | 1995
- 238
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Microstructural Implications for Thermally Induced Effects and Electromigration in Thin Film InterconnectsRajan, K. / Electrochemical Society et al. | 1995
- 240
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Corrosion Characteristics of Blanket, Stacked, and Patterned Al-Cu Thin Films Used for Submicron MetallizationCarpio, R. / Chan, T. / Von Meurs, R. / Electrochemical Society et al. | 1995
- 242
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Thermal Stress Characteristics and Void Formation in Al(Cu) InterconnectsHo, P. S. / Yeo, I.-S. / Jawarani, D. / Anderson, S. G. / Electrochemical Society et al. | 1995
- 243
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The Design of a Test Chip for a Sematech Program to Standardize Electromigration TestingSmall, M. / Harward, M. / Zhao, B. / Electrochemical Society et al. | 1995
- 245
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The Importance of the Threshold Current For Electromigration Design RulesBaerg, B. / Electrochemical Society et al. | 1995
- 247
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Roles of WSi and TiN on Via Electromigration Resistance in Aluminum-Based InterconnectionsYamaha, T. / Naito, M. / Hotta, T. / Electrochemical Society et al. | 1995
- 249
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Electromigration Performance in Al Layered Interconnects Using Ti and/or TiN LayersHashimoto, K. / Kageyama, M. / Touchi, K. / Onoda, H. / Electrochemical Society et al. | 1995
- 251
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The Effect of Test Structure and Stress Condition on Electromigration FailureKawasaki, H. / Lee, C. / Pintchovski, F. / Electrochemical Society et al. | 1995
- 253
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Behavior of Silver Coated Particles under Elevated Temperatures and Humid ConditionsDjokic, S. S. / Lepard, R. H. / Dubois, M. L. / Currie, J. C. / Electrochemical Society et al. | 1995
- 254
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Electromigration under AC Current StressHu, C. / Cheung, N. / Tao, J. / Electrochemical Society et al. | 1995
- 255
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Electromigration Drift Velocity in Al and Cu InterconnectionsHu, C.-K. / Lee, K. Y. / Lee, K. L. / Cabral, C. / Electrochemical Society et al. | 1995
- 257
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Cu Atom Redistribution and Electromigration Resistance of AlCu Lines after Aging TreatmentNogami, T. / Nemoto, T. / Electrochemical Society et al. | 1995
- 259
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Improvement in Electromigration of AlSiCu Reflowed on Recessed W-PlugKakuhara, Y. / Yamada, Y. / Kikkawa, T. / Huo, D. T.-C. / Electrochemical Society et al. | 1995
- 261
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Spectral Emissivity of Liquid SiTakasuka, E. / Tokizaki, E. / Terashima, K. / Kimura, S. / Electrochemical Society et al. | 1995
- 263
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Scalar Transport Due to the Turbulent Effect in the Czochralski Silicon MeltChung, S.-I. / Izunome, K. / Togawa, S. / Kawanishi, S. / Electrochemical Society et al. | 1995
- 265
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Direct Observation of Oxygen Distribution in Quenched Si Melt near Solid-Liquid Interface during CZ Crystal GrowthKawanishi, S. / Togawa, S. / Izunome, K. / Terashima, K. / Electrochemical Society et al. | 1995
- 267
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Photoluminescence D-Lines Spectra in Heat-Treated Czochralski Silicon CrystalCho, K. H. / Lee, J. Y. / Jeon, H. I. / Suh, E.-K. / Electrochemical Society et al. | 1995
- 269
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Competitive Analysis of 200 mm Epitaxial Silicon WafersHuff, H. R. / Goodall, R. K. / Bhat, V. / Electrochemical Society et al. | 1995
- 271
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Application of Chemical Mechanical Planarization for Mesa Isolation in Silicon on InsulatorAli, I. / Joyner, K. / Roy, S. / Shinn, G. / Electrochemical Society et al. | 1995
- 273
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Effects of Substrate Oxygen Content on Leakage of Switching NPN Transistors and DiodesChiou, H.-D. / Shumate, J. / Holly, C. / Raslan, A. / Electrochemical Society et al. | 1995
- 274
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Growth of Lateral Limited SiGe Films on the Si(100) Mesa Substrate by RTP/VLP-CVDZhang, R. / Huang, H. B. / Shi, Y. / Gu, S. L. / Electrochemical Society et al. | 1995
- 275
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The Effect of Preannealing on Anodic Aluminum Oxide Formed on Al Thin FilmsChang, P.-H. / Chiu, R.-L. / Tung, C.-H. / Electrochemical Society et al. | 1995
- 277
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Agglomeration of TiSi~2 after Densification Process and Its Effects on Barrier QualityHarel, O. / Electrochemical Society et al. | 1995
- 278
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Plasma Enhanced Chemical Vapor Deposition of Molybdenum, Molybdenum Carbide, and Oxide in Thin FilmsChen, B. / Selman, J. R. / Electrochemical Society et al. | 1995
- 280
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The Deposition of Noble Metals from Buffered Oxide Etchants onto Silicon Surfaces - A Morphological StudyYoneshige, K. K. / Parks, H. G. / Helms, C. R. / Halepete, S. / Electrochemical Society et al. | 1995
- 282
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The Effects of Ion Beam Mixing on Titanium Silicide Formation in Submicron CMOS DevicesChonko, M. A. / Sitaram, A. R. / Honcik, C. / Somero, B. M. / Electrochemical Society et al. | 1995
- 284
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Reduction of Surface Residues Seen after Metal Etch ProcessingMautz, K. E. / Electrochemical Society et al. | 1995
- 285
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Thermodynamics and Kinetics of Hydrogen Evolution in Hydrogenated Amorphous Silicon FilmsChung, D. D. L. / Sridhar, N. / Anderson, W. A. / Coleman, J. / Electrochemical Society et al. | 1995
- 286
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Polycrystalline Silicon Films of High Photoresponse, Obtained by Vacuum Annealing of Aluminum Capped Hydrogenated Amorphous Silicon FilmsChung, D. D. L. / Sridhar, N. / Anderson, W. A. / Coleman, J. / Electrochemical Society et al. | 1995
- 287
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Development of a Manufacturable MERIE Polysilicon Etch ProcessAlzaben, T. / Mautz, K. E. / Electrochemical Society et al. | 1995
- 289
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The Ultimate Gate Oxide ThinnessKar, S. / Electrochemical Society et al. | 1995
- 291
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BPSG Stability Layer for High Dopant BPSG FilmsFry, H. W. / Fernandes, N. I. / Electrochemical Society et al. | 1995
- 293
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Characterization of Oxygen-Enriched TEOS FilmsDeCrosta, D. A. / Hackenberg, J. J. / Linn, J. H. / Electrochemical Society et al. | 1995
- 294
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Extending SOG Based Planarization to Sub-Half Micron TechnologyBothra, S. / Weling, M. / Electrochemical Society et al. | 1995
- 296
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An Application of Virtual Wafer Modeling to an Advanced 0.45 m CMOS TechnologyGardner, M. / Kadoch, D. / Electrochemical Society et al. | 1995
- 297
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Role of Rapid Isothermal Processing as a Low Temperature Processing Technique in Silicon Integrated Circuits ManufacturingSingh, R. / Sharangapani, R. / Gong, C. / Alamgir, S. / Electrochemical Society et al. | 1995
- 298
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A Statistical Analysis of High Tc SuperconductorsChow, C. C. / Electrochemical Society et al. | 1995
- 299
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On the Role of Surface Diffusion in Diamond GrowthFrenklach, M. / Skokov, S. / Weiner, B. / Electrochemical Society et al. | 1995
- 300
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Phase Diagram Calculations of Nonequilibrium Stationary States for CVD Diamond GrowthWang, J.-T. / Zheng, P.-J. / Electrochemical Society et al. | 1995
- 301
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Variational Transition State Theory Rate Constants for Methyl Radical Recombination with Diamond SurfacesHarrington, J. / Jeffries, J. B. / Smith, G. P. / Electrochemical Society et al. | 1995
- 302
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Molecular Dynamics Simulations of Ultrathin Amorphous Carbon FilmsPhilpott, M. R. / Glosli, J. N. / Belak, J. / Electrochemical Society et al. | 1995
- 303
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Models of Transport, Gas-Phase, and Surface Chemistry in Diamond Chemical Vapor DepositionColtrin, M. E. / Dandy, D. S. / Electrochemical Society et al. | 1995
- 304
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A Reverse Monte Carlo Modeling Study of Diamond-Like CarbonRigden, J. S. / Newport, R. J. / Electrochemical Society et al. | 1995
- 305
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Local Density Functional Modeling of Diamond Growth and GraphitizationHeggie, M. I. / Latham, C. D. / Jones, R. / Briddon, P. / Electrochemical Society et al. | 1995
- 306
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Studies of Heteroepitaxial Nucleation and Growth of Diamond on SiliconJiang, X. / Paul, M. / Klages, C.-P. / Jia, C. L. / Electrochemical Society et al. | 1995
- 307
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Crystallization of Diamond by the Chemical Transport ReactionSpitsyn, B. V. / Electrochemical Society et al. | 1995
- 308
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Mechanisms for the Bias-Enhanced Nucleation of DiamondMcGinnis, S. P. / Kelly, M. A. / Hagstrom, S. B. / Electrochemical Society et al. | 1995
- 309
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From Crystals of Naphthalene to Crystals of Diamond: Kinetics and MechanismVoronov, O. A. / Rakhmanina, A. V. / Electrochemical Society et al. | 1995
- 310
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The Role of Carbonaceous Precursors during Diamond NucleationSheldon, B. W. / Boekenhauer, R. E. / Nijhawan, S. / Electrochemical Society et al. | 1995
- 311
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Chemical Vapor Deposition of Diamond: Effect of Process Variables on Growth Rate and QualityAngus, J. C. / Cassidy, W. D. / Kovach, C. S. / Roozbehani, G. / Electrochemical Society et al. | 1995
- 312
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Local Monitoring of Diamond Nucleation DensityObraztsov, A. N. / Timoshenko, V. Y. / Electrochemical Society et al. | 1995
- 313
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Nucleation and Initial Growth Stages of Diamond in CVD: A Theoretical ApproachLiu, H. / Dandy, D. S. / Electrochemical Society et al. | 1995
- 314
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Homoepitaxial Growth of Diamond Thin Films on the Misoriented (001) SubstratesLee, N. / Badzian, A. / Electrochemical Society et al. | 1995
- 315
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Titanium as a Potential Heteroepitaxial Substrate for DiamondMcClure, M. T. / Wolter, S. D. / Glass, J. T. / Stoner, B. R. / Electrochemical Society et al. | 1995
- 317
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Chemical Vapor Deposition of Diamond Using Fullerenes for Diamond Nucleation and Growth PrecursorsPan, C. / Withers, J. C. / Stoessel, C. H. / Loutfy, R. O. / Electrochemical Society et al. | 1995
- 318
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Effect of the Silicon Substrate Orientation and Pretreatment on the Nucleation and Adhesion of CVD Diamond FilmsBorges, C. F. M. / Schelz, S. / Martinu, L. / Moisan, M. / Electrochemical Society et al. | 1995
- 320
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Process Parameter Dependence of the Morphology of Diamond Films on Graphite FibersShah, S. I. / Waite, M. M. / Electrochemical Society et al. | 1995
- 321
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The Initial Stages of Diamond Growth on Si(100) Studied by Conventional and Cross-Sectional Micro-Raman SpectroscopyWerninghaus, T. / Laufer, S. / Hinneberg, H.-J. / Zahn, D. R. T. / Electrochemical Society et al. | 1995
- 322
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Morphological Control of Homoepitaxial Diamond: Its Correlation to Texture in Polycrystalline Diamond FilmsYee, A. L. / Ong, H. / Chang, R. P. H. / Electrochemical Society et al. | 1995
- 323
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Deposition of Diamond-Like Carbon Cubic Boron Nitride and Bias-Enhanced Nucleation of Diamond as a Subplantation ProcessRobertson, J. / Electrochemical Society et al. | 1995
- 324
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Laser-Based Synthesis of Diamond at Low TemperaturesSubramaniam, V. V. / Rebello, J. H. D. / Electrochemical Society et al. | 1995
- 325
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Optimization Techniques in DC Arcjet Diamond Chemical Vapor DepositionWeimer, W. A. / Reeve, S. W. / Dandy, D. S. / Electrochemical Society et al. | 1995
- 326
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Enhanced Deposition Rate of CVD Diamond in a DC Arcjet with a Secondary DischargeBaldwin, S. K. / Owano, T. G. / Kruger, C. H. / Electrochemical Society et al. | 1995
- 327
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Diamond Deposition from Acetylene-Oxygen FlamesSchermer, J. J. / Giling, L. J. / Electrochemical Society et al. | 1995
- 329
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Effects of Flame Speed and Stoichiometry on Low Pressure Combustion Diamond GrowthKim, J. / Cappelli, M. A. / Electrochemical Society et al. | 1995
- 330
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Alternative Fuels for Combustion Synthesis of DiamondShin, H. S. / Goodwin, D. G. / Electrochemical Society et al. | 1995
- 332
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Effect of Oxygen on High Temperature Deposition of Diamond by Microwave PlasmaChein, T. / Tzeng, Y. / Electrochemical Society et al. | 1995
- 333
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Deposition of Diamond from Plasma Jet Including Dichlorobenzene as Carbon SourceKotaki, T. / Horii, N. / Isono, H. / Matsumoto, O. / Electrochemical Society et al. | 1995
- 334
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Impurity Effects in the Cyclic Deposition of Diamond FilmsHoward, W. / Spear, K. / Frenklach, M. / Electrochemical Society et al. | 1995
- 335
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Diamond Deposition Using a Planar Radio Frequency Inductively Coupled PlasmaBozeman, S. P. / Tucker, D. A. / Stoner, B. R. / Hooke, W. M. / Electrochemical Society et al. | 1995
- 337
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Preparation of Diamond Films by CVD Including the Use of Halogens and InterhalogensShamir, J. / Electrochemical Society et al. | 1995
- 338
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CVD Diamond Deposition on Ce-TZP CeramicsCorat, E. J. / Do Carmo, M. / Nono, A. / Trava-Airoldi, V. J. / Electrochemical Society et al. | 1995
- 339
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The Role of Microwave Power in the Plasma-Chemical Vapor Deposition of DiamondFox, C. A. / McMaster, M. C. / Hsu, W. L. / Kelly, M. A. / Electrochemical Society et al. | 1995
- 340
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Diamond Shaping and Polishing by Chemical ReactionsJin, S. / Zhu, W. / Tiefel, T. H. / Electrochemical Society et al. | 1995
- 342
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Electrochemical Formation and Surface Modification of Freestanding Homoepitaxial Diamond FilmsPehrsson, P. / Marchywka, M. / Butler, J. E. / Electrochemical Society et al. | 1995
- 343
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CVD Diamond Films Etching in ECR DischargeSuetin, N. V. / Gulyaev, K. S. / Kovalev, A. S. / Rakhimov, A. T. / Electrochemical Society et al. | 1995
- 344
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Cubic Boron Nitride and Carbon Nitride Films: Recent DevelopmentsRichter, F. / Electrochemical Society et al. | 1995
- 346
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Advances in Understanding How Cubic BN Films Form by Ion-Assisted DepositionMirkarimi, P. B. / Medlin, D. L. / McCarty, K. F. / Barbour, J. C. / Electrochemical Society et al. | 1995
- 348
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Mass Separated Ion Beam Deposition: A Unique Technique to Grow DLC, c-BN, and CN FilmsRonning, C. / Hofsass, H. / Electrochemical Society et al. | 1995
- 349
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Growth and Nucleation Mechanisms of c-BN Films Deposited with Inductively Coupled Plasma CVDKuhr, M. / Reinke, S. / Kulisch, W. / Electrochemical Society et al. | 1995
- 350
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Amorphous C-N and SiC-N Films: Properties and ApplicationsOng, H. / Yee, A. L. / Xiong, F. / Chang, R. P. H. / Electrochemical Society et al. | 1995
- 351
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Intrinsic Strain and Flexural Strength of CVD DiamondKlein, C. A. / Hallock, R. B. / Miller, R. P. / Electrochemical Society et al. | 1995
- 353
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Hypervelocity Impact Tests on Polycrystalline Diamond Deposited over Silicon SubstratesRamesham, R. / Hill, D. / Best, S. / Rose, M. F. / Electrochemical Society et al. | 1995
- 355
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Carbon-Graphite-Like Friction Behavior of Polycrystalline Diamond Sliding Against Itself in VacuumGardos, M. N. / Ravi, K. V. / Electrochemical Society et al. | 1995
- 356
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Mechanical Characterization of Diamond-Coated MetalsDrory, M. D. / Electrochemical Society et al. | 1995
- 357
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Aspects of Characterization of Diamond Coatings on Cutting ToolsBhat, D. G. / Malshe, A. P. / Sung, C. / Electrochemical Society et al. | 1995
- 358
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Growth and Characterization of Microwave Plasma CVD Diamond Using CO+H~2, CH~4+H~2+O~2, CO+N~2, and CORamesham, R. / Rose, M. F. / Askew, R. F. / Electrochemical Society et al. | 1995
- 360
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Cutting of Diamond Coated Molybdenum by Wire Electric Discharge MachineRamesham, R. / Askev, R. F. / Rose, M. F. / Sirois, D. L. / Electrochemical Society et al. | 1995
- 362
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Transformation of Monoatomic Step on (100) Diamond SurfacesSkokov, S. / Weiner, B. / Frenklach, M. / Electrochemical Society et al. | 1995
- 363
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The Radiation Damage Inflicted on CVD Diamond by Doses of up to 6 X 10^1^4 High Energy Neutrons cm^-^2Mainwood, A. / Allers, L. / Hassard, J. F. / Howard, A. S. / Electrochemical Society et al. | 1995
- 364
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HFCVD of Diamond at Low Substrate and Low Filament TemperaturesLi, Z. / Clausing, R. E. / Shaw, R. W. / Feigerle, C. / Electrochemical Society et al. | 1995
- 366
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Photo-Hall Effect and Photoconductivity of Polycrystalline Undoped CVD-DiamondErmakov, M. G. / Vedeneev, A. S. / Ermakova, O. N. / Sokolina, G. A. / Electrochemical Society et al. | 1995
- 367
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Controllable Electronic Properties of Diamond-Like Atomic-Scale Composite (DLASC) Films and DLASC/Si InterfaceDorfman, B. / Polyakov, V. / Rukovishnikov, A. / Abraizov, M. / Electrochemical Society et al. | 1995
- 368
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The Formation of Cubic Boron Nitride and Silicon Carbide Layers on SiliconFriedrich, M. / Hahn, J. / Laufer, S. / Richter, F. / Electrochemical Society et al. | 1995
- 369
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The Effect of RF Power on the Growth of c-BN Films on Nickel SubstratesChen, G. / Guo, Y. / Li, G. / Song, Z. / Electrochemical Society et al. | 1995
- 371
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HREELS of the Oxidized Diamond (100) SurfacePehrsson, P. / Electrochemical Society et al. | 1995
- 372
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Chemistry and the Electronic Properties of Low-Index Diamond SurfacesPehrsson, P. / Potochnik, S. J. / Butler, J. E. / Electrochemical Society et al. | 1995
- 373
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Atomic Force Microscopic Characterization of Twinning Morphology in CVD Diamond FilmsWang, L. / Angus, J. C. / Argoitia, A. / Kump, K. / Electrochemical Society et al. | 1995
- 375
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Depth-Resolved Residual Stress Measurements in Homoepitaxial Diamond Films Grown by Chemical Vapor DepositionAger, J. W. / Plano, M. A. / Moyer, D. / Electrochemical Society et al. | 1995
- 377
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A Study of Diffusion Lengths on Diamond and Gallium Nitride MaterialsCropper, A. D. / Moore, D. J. / Scott, C. J. / Binari, S. / Electrochemical Society et al. | 1995
- 378
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Raman Spectroscopy of Annealed Amorphous Hydrogenated and Fluorinated Carbon FilmsMuller, U. / Hauert, R. / Oral, B. / Tobler, M. / Electrochemical Society et al. | 1995
- 379
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Diamond for High Temperature Pressure SensorDavidson, J. L. / Wur, D. / Kang, W. P. / Beetz, C. / Electrochemical Society et al. | 1995
- 380
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Silicon-Based Contacts on Homoepitaxial Diamond FilmsVespan, A. / Ebert, W. / Borst, T. H. / Pitter, M. / Electrochemical Society et al. | 1995
- 382
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Relationship Between Raman Spectra and [H] and [CH~3] for Diamond FilmsPrawer, S. / Harris, S. J. / Electrochemical Society et al. | 1995
- 383
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Effect of Additives and hBN Structure on the cBN Growth at HP/HTDinca, G. / Georgeoni, P. / Baluta, G. / Calu, G. / Electrochemical Society et al. | 1995
- 384
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Structure of Highly Oriented Polycrystalline Diamond Films Grown on Si(001)Tachibana, T. / Hayashi, K. / Kobashi, K. / Electrochemical Society et al. | 1995
- 386
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Effects of Surface Treatments on the Current-Voltage Characteristics of Metal/Intrinsic Diamond/Semiconducting Diamond DiodesMiyata, K. / Nishimura, K. / Kobashi, K. / Electrochemical Society et al. | 1995
- 388
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The Physical Properties of c-BN Films Obtained in RF-Plasma with Additional Ion StimulationGerasimovich, S. S. / Sleptsov, V. V. / Teryoshin, S. A. / Electrochemical Society et al. | 1995
- 389
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Time-of-Flight Experiments for DLC FilmsStrzelecki, W. / Staryga, E. / Mycielski, W. / Electrochemical Society et al. | 1995
- 390
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Low-Temperature Synthesis of Cubic Boron Nitride and Diamond Under High Pressure C~2B~1~0H~1~2 and CN~5H~3 as SpeciesVoronov, O. A. / Kashevarova, L. S. / Electrochemical Society et al. | 1995
- 391
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The Effect of Hydrogen on the Surface Electrical Conductivity of Diamond (110)Mackey, B. L. / Russell, J. N. / Pehrsson, P. E. / Butler, J. E. / Electrochemical Society et al. | 1995
- 392
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In Situ Surface Roughness Measurements during PECVD Diamond Film GrowthZuiker, C. D. / Gruen, D. M. / Krauss, A. R. / Electrochemical Society et al. | 1995
- 393
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Optical Diagnostics for Temperature Measurement in a Diamond CVD ReactorJeffries, J. B. / Brinkman, E. A. / Electrochemical Society et al. | 1995
- 394
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In Situ X-Ray Investigation of DLC Film Properties during Growth and Etching ProcessesBaranov, A. M. / Sleptsov, V. V. / Teryoshin, S. A. / Mikhailov, I. F. / Electrochemical Society et al. | 1995
- 395
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Forced Diffusion of Boron and Lithium in DiamondPopovici, G. / Sung, T. / Prelas, M. A. / Khasawinah, S. / Electrochemical Society et al. | 1995
- 396
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Etching of Diamond Wafers with Electron-Cyclotron-Resonance PlasmasChakraborty, R. N. / Reinhard, D. K. / Goldman, P. D. / Electrochemical Society et al. | 1995
- 398
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Surface and Bulk Effects in Ion Assisted Cubic Boron Nitride (c-BN) GrowthReinke, S. / Kuhr, M. / Kulisch, W. / Electrochemical Society et al. | 1995
- 399
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Non-Maxwellian EEDF in a Microwave PlasmaGordon, M. H. / Kelkar, U. / Electrochemical Society et al. | 1995
- 400
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Deposition and Stress Measurements of HFCVD Diamond Coating on Tool InsertsTaher, M. / Schultz, J. / Malshe, A. P. / Nasrazadani, S. / Electrochemical Society et al. | 1995
- 401
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Large Area Diamond Film Deposition for Multichip ModulesBrown, W. D. / Beera, R. / Haque, S. / Naseem, H. A. / Electrochemical Society et al. | 1995
- 402
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Decomposition of Diborane and Ammonia on Ni(100) SurfacesGreve, D. W. / Desrosiers, R. M. / Gellman, A. J. / McFadden, C. F. / Electrochemical Society et al. | 1995
- 404
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X-Ray Diffraction ImagingBlack, D. / Burdette, H. / Linares, R. / Doering, P. / Electrochemical Society et al. | 1995
- 405
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Shallow Angle X-Ray Diffraction from In Situ Diamond Thin FilmsRigden, J. S. / Newport, R. J. / Electrochemical Society et al. | 1995
- 406
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Two-Dimensional Model of HFCVD ReactorSuetin, N. V. / Mankelevich, Y. A. / Rakhimov, A. T. / Vagin, V. P. / Electrochemical Society et al. | 1995
- 407
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Surface Characterization of Hexagonal and Cubic Boron Nitride FilmsSene, G. / Bouchier, D. / Ilias, S. / Djouadi, M. A. / Electrochemical Society et al. | 1995
- 408
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Cubic Lattice Parameter of Nitrogen Doped DiamondVoronov, O. A. / Rakhamanina, A. V. / Khlybov, E. P. / Electrochemical Society et al. | 1995
- 409
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Study of Diamond Peculiarities and Production of the Monocrystal InstrumentTimofeev, V. E. / Popov, I. Y. / Zasimova, N. S. / Saparin, G. V. / Electrochemical Society et al. | 1995
- 410
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Properties of Hydrogenated Tetrahedral Amorphous CarbonWeiler, M. / Robertson, J. / Sattel, S. / Jung, K. / Electrochemical Society et al. | 1995
- 411
-
Field Induced Transformation of DLC Films Deposited by DC Plasma TechniqueYalamanchi, R. S. / Thutupalli, G. K. M. / Sankara Reddy, K. S. / Satyam, M. / Electrochemical Society et al. | 1995
- 412
-
Equilibrium Constants of Naphthalene Decomposition ReactionsYakovlev, E. N. / Voronov, O. A. / Electrochemical Society et al. | 1995
- 413
-
Influence of Substrate Temperature on Diamond Synthesis in a Supersonic Hydrogen ArcjetLoh, M. H. / Cappelli, M. A. / Electrochemical Society et al. | 1995
- 414
-
Measurement Techniques and Results for the Thermal Conductivity of CVD DiamondGraebner, J. E. / Electrochemical Society et al. | 1995
- 416
-
Measurement of Electrical Properties of Undoped Diamond Films Between Room Temperature and 1000CVandersande, J. W. / Zoltan, L. D. / Electrochemical Society et al. | 1995
- 417
-
The Relationship of Voids and Hydrogen Content to the Thermal Conductivity of Polycrystalline DiamondGleason, K. K. / McNamara, K. M. / Scruggs, B. E. / Electrochemical Society et al. | 1995
- 419
-
Measurement of the Change in Diamond's Refractive Index with Temperature and of the Etching Rate of Diamond by the KrF (248 nm) Excimer LaserHauge, R. H. / Patterson, M. J. / Margrave, J. L. / Ball, Z. / Electrochemical Society et al. | 1995
- 420
-
Process of Epitaxial Joining to Fabricate Large-Area Diamond Single CrystalMalta, D. P. / Posthill, J. B. / Hudson, G. C. / Thomas, R. E. / Electrochemical Society et al. | 1995
- 421
-
Recent Observations of Microcavities in CVD Diamond: Their Effects on MCM ProcessingMalshe, A. P. / Glezen, J. G. / Naseem, H. A. / Brown, W. D. / Electrochemical Society et al. | 1995
- 422
-
Negative Electron Affinity DiamondPate, B. B. / Bandis, C. / Haggerty, D. / Electrochemical Society et al. | 1995
- 423
-
Electron Field Emission Characteristics of CVD DiamondZhu, W. / Kochanski, G. P. / Jin, S. / Seibles, L. / Electrochemical Society et al. | 1995
- 425
-
CVD Diamond: A Unique Dielectric, Semiconductor, and Thermal Conductor for Electronic ApplicationsDavidson, J. L. / Brown, W. D. / Dismukes, J. P. / Electrochemical Society et al. | 1995
- 426
-
Diamond Electronics: Now or Never?Buckley-Golder, I. M. / Chaliker, P. R. / Johnston, C. / Electrochemical Society et al. | 1995
- 427
-
Silicon-Diamond Interface Band StructureObraztsov, A. N. / Guseva, M. B. / Petrukhin, A. G. / Petrov, A. V. / Electrochemical Society et al. | 1995
- 428
-
Photoconductive Spectroscopy of CVD DiamondAllers, L. / Collins, A. T. / Electrochemical Society et al. | 1995
- 429
-
Strategies for CVD Diamond Cost ReductionSinger, A. T. / Goodwin, D. G. / Electrochemical Society et al. | 1995
- 430
-
Microwave Deposition Reactors for Commercial CVD Diamond ApplicationsSevillano, E. / Casey, J. A. / Gat, R. / Jin, S. / Electrochemical Society et al. | 1995
- 431
-
Device Simulations of Diamond FETs with MES, p^+ip^+ and "-Doped" Structures in Comparison with SiC MESFETNishimura, K. / Miyata, K. / Kobashi, K. / Electrochemical Society et al. | 1995
- 433
-
Thin Film Diamond Diode Chemical Gas SensorGurbuz, Y. / Kang, W. P. / Davidson, J. L. / Wu, D. / Electrochemical Society et al. | 1995
- 435
-
High Power Electron Beam Activated Diamond SwitchesLin, S.-H. / Sverdrup, L. H. / Electrochemical Society et al. | 1995
- 437
-
Diamond-Like Carbon Films for High Temperature Electronic ApplicationsKosel, P. B. / Wu, D. / Kosel, O. P. / Carr, S. F. / Electrochemical Society et al. | 1995
- 438
-
The Use of Diamond and Diamond-Like Carbon Coatings for Corrosion ProtectionNatishan, P. M. / McCafferty, E. / Glesener, J. / Morrish, A. A. / Electrochemical Society et al. | 1995
- 440
-
Process Modeling and Process Control Needs for Process Synthesis for ULSI DevicesHosack, H. H. / Electrochemical Society et al. | 1995
- 442
-
Influence of Fluorine Implant on the Transient Enhanced Diffusion of Boron: Determination of Process Modeling ParametersVuong, H.-H. / Gossmann, H.-J. / Rafferty, C. S. / Luftman, H. S. / Electrochemical Society et al. | 1995
- 444
-
Modeling of Low Thermal Budget Redistribution of Arsenic in Silicon: Dynamic ClusteringMathiot, D. / Scheiblin, P. / Electrochemical Society et al. | 1995
- 446
-
Computationally Efficient Model for Dopant Precipitating KineticsClejan, I. / Dunham, S. T. / Electrochemical Society et al. | 1995
- 448
-
A Two-Dimensional Model for Strain from Dislocation Loops in Ion-Implanted SiliconChaudhry, S. / Thompson, R. H. / Jones, K. S. / Law, M. E. / Electrochemical Society et al. | 1995
- 450
-
Modeling of Notching Caused by Aspect Ratio Dependant Charging during HDP EtchingMcVittie, J. / Hane, M. / Kinosita, T. / Electrochemical Society et al. | 1995
- 452
-
Issues and Challenges in MOSFET Scaling below 0.6 Microns for ULSI TechnologyTasch, A. F. / Electrochemical Society et al. | 1995
- 454
-
A 47 GHz f~ SiHBT with an Emitter of c-Si/Very Thin a-SiCx Double LayerKondo, M. / Shiba, T. / Tamaki, Y. / Nakamura, T. / Electrochemical Society et al. | 1995
- 456
-
A 0.25 m MOSFET Technology Using In Situ Rapid Thermal Gate DielectricsZhang, K. / Osburn, C. M. / Hames, G. / Parker, C. / Electrochemical Society et al. | 1995
- 458
-
Practical Technology of Ta~2O~5 Stacked Capacitors for ULSI DRAMsSuzuki, H. / Kamiyami, S. / Sakao, M. / Takaishi, Y. / Electrochemical Society et al. | 1995
- 460
-
Spatial Variation in Point Defect Concentrations and Their Impact on Submicron Device StructureDunham, S. T. / Agarwal, A. M. / Electrochemical Society et al. | 1995
- 462
-
Geometry Dependence of Void Formation in Deep Submicron Poly-Buffered LOCOS Isolation Structures: Experimental Evidence of the Stress-Relaxation ModelSmeys, P. / Griffin, P. B. / Saraswat, K. C. / Electrochemical Society et al. | 1995
- 464
-
TEOS/Ozone APCVD Thin SiO~2 for Sub 0.5 m LDD Spacer ApplicationsMoinpour, M. / Lu, W.-J. / Sadjadi, R. / Li, J. / Electrochemical Society et al. | 1995
- 466
-
Materials Challenges for ULSIKimerling, L. C. / Electrochemical Society et al. | 1995
- 467
-
Self-Limited Fractional Atomic-Layer Etching of SiMatsuura, T. / Suzue, K. / Murota, J. / Sawada, Y. / Electrochemical Society et al. | 1995
- 469
-
H-Passivation of Si(100) Surfaces: Correlation with Ion Beam Characterization (Elastic Recoil and Nuclear Resonance) and Atomic Force MicroscopyAtluri, V. / Herbots, N. / Whaley, S. / Bhagvat, S. / Electrochemical Society et al. | 1995
- 471
-
Effects of the Chlorine Concentration in the Anneal Ambient on the Contamination and Surface Microroughness in SIMOXAnc, M. J. / Krull, W. A. / Alles, M. A. / Electrochemical Society et al. | 1995
- 473
-
Dopant Diffusion in Si(100) Delta-Doping Superlattices during Thermal Nitridation and Native Si Point Defect PropertiesMogi, T. K. / Thompson, M. O. / Gossmann, H.-J. / Eaglesham, D. J. / Electrochemical Society et al. | 1995
- 475
-
Enhanced Segregation Gettering of Iron in Silicon by Boron Ion-ImplantationBenton, J. / Stolk, P. A. / Eaglesham, D. J. / Jacobson, D. C. / Electrochemical Society et al. | 1995
- 476
-
Applications of Carrier Lifetime and Diffusion Length MeasurementsBullis, W. M. / Huff, H. R. / Electrochemical Society et al. | 1995
- 477
-
Influence of Vacuum Annealing on Native Si Point DefectsGossmann, H.-J. / Mogi, T. K. / Stolk, P. A. / Eaglesham, D. J. / Electrochemical Society et al. | 1995
- 479
-
The Effect of Temperature on Electron Capture Cross Sections and Densities in X-Ray Irradiated Gate Field Effect TransistorsKim, H. S. / Reisman, A. / Williams, C. K. / Brush, H. / Electrochemical Society et al. | 1995
- 481
-
Analysis of Silicon Damage and Surface Contamination Caused by Oxide EtchingReinhart, K. / Busch, E. / Kelso, S. / Electrochemical Society et al. | 1995
- 483
-
TDS Study on the Corrosion Suppression Mechanism after Aluminum Etching by O~2+H~2O Downstream AshingKojiri, H. / Nakamura, M. / Electrochemical Society et al. | 1995
- 485
-
Silicon Oxidation Inhibition after NF~3/Ar RIE in the Presence of PhotoresistTsuchiaki, M. / Ohiwa, T. / Takato, H. / Watanabe, T. / Electrochemical Society et al. | 1995
- 487
-
Conditioning of Silicon Surface after RIE Using O~2 and NF~3 Remote PlasmaHwang, D. / Ruzyllo, J. / Grant, R. / Mount, D. / Electrochemical Society et al. | 1995
- 488
-
Reduction of Charge-Up Damage in Magnetron RIEYoshida, Y. / Electrochemical Society et al. | 1995
- 490
-
Plasma Etch of Titanium and Titanium OxideKuo, Y. / Electrochemical Society et al. | 1995
- 492
-
Investigation of Undesirable Film Deposition in Contacts during Contact EtchWeling, M. / Gabriel, C. / Electrochemical Society et al. | 1995
- 494
-
Low Dielectric Dow Cyclotene 3022 (BCB) Etch for Multilevel Interconnection IntegrationLii, Y. T. / Wetzel, J. / Electrochemical Society et al. | 1995
- 496
-
Highly Anisotropic Silicon RIE for Nanofabrication with Fluorine only Containing GasesGrigoropoulos, S. / Gogolides, E. / Nassiopoulos, A. G. / Electrochemical Society et al. | 1995
- 498
-
Selective Remote Plasma Etching of Si~3N~4 Over SiO~2 at Elevated TemperatureStaffa, J. / Luther, B. / Ruzyllo, J. / Grant, R. / Electrochemical Society et al. | 1995
- 499
-
Process Integration of Chemical Mechanical PolishingPerry, K. A. / Electrochemical Society et al. | 1995
- 500
-
A One-Step Shallow Trench Global Planarization Process Using Chemical Mechanical PolishingBoyd, J. M. / Ellul, J. P. / Electrochemical Society et al. | 1995
- 502
-
Optimization of a Chemical Mechanical Polishing Process for Dielectric PlanarizationWeling, M. / Drill, C. / Electrochemical Society et al. | 1995
- 504
-
Prevention of Charging Damage to Gate Oxide during Intermetal Oxide Deposition by HDP CVDBothra, S. / Gabriel, C. / Electrochemical Society et al. | 1995
- 506
-
Improved Gap-Filling Capability of Fluorine-Doped PECVD Silicon Oxide Thin FilmMizuno, S. / Verma, A. / Lee, P. / Nguyen, B. / Electrochemical Society et al. | 1995
- 508
-
Gap Fill and Film Reflow Capability of Subatmospheric Chemical Vapor Deposition (SACVD) Borophosphosilicate GlassRobles, S. / Russel, K. / Galiano, M. / Siva, V. / Electrochemical Society et al. | 1995
- 510
-
Integration of BPSG in a 0.25 m DRAM ProcessGambino, J. / Jaso, M. / Aochi, H. / Tsunashima, Y. / Electrochemical Society et al. | 1995
- 512
-
GCMS and FTIR Studies of By-Product Inhibited Growth and the Rate-Limiting Step in TEOS-Based SiO~2CVDBartram, M. E. / Moffat, H. K. / Electrochemical Society et al. | 1995
- 514
-
Dielectric Constant and Stability of Fluorine Doped PECVD Silicon Oxide Thin FilmsMizuno, S. / Verma, A. / Tran, H. / Lee, P. / Electrochemical Society et al. | 1995
- 516
-
Measurement of Silicon Particules Laser Surface Scanning and Angle-Resolved Light ScatteringHuff, H. R. / Goodall, R. K. / Williams, E. / Woo, K.-S. / Electrochemical Society et al. | 1995
- 518
-
Copper Adsorption at a Silicon Surface from HF SolutionTurner, J. E. / Miyazaki, K. / Fukazawa, Y. / Muraoka, H. / Electrochemical Society et al. | 1995
- 520
-
A Point-of-Use Purification Method of HF Chemicals for VLSI ManufacturingYamamoto, K. / Shimono, T. / Okada, T. / Kawazawa, Y. / Electrochemical Society et al. | 1995
- 522
-
Comparison of Automated Testing Methods for Plasma Charging Induced DamageAbdel-Ati, W. L. N. / Ma, S. / Yang, T.-C. / McVittie, J. P. / Electrochemical Society et al. | 1995
- 524
-
Analysis of Within-Run Process Variations Using Automated Wafer-Position Tracking in WorkstreamLing, Z.-M. / Pak, J. / Beckage, P. / Lin, Y.-T. / Electrochemical Society et al. | 1995
- 526
-
Thin Gate Dielectrics for ULSI: RTO or Furnace?Green, M. L. / Electrochemical Society et al. | 1995
- 527
-
The Effect of Carbon in Silicon on Oxidation Kinetics and Silicon Dioxide IntegrityRidley, R. / Brozek, T. / Ruzyllo, J. / Electrochemical Society et al. | 1995
- 528
-
Effect of H~2 Annealing on Oxide Integrity ImprovementPark, J.-G. / Rozgonyi, G. A. / Ushio, S. / Cho, K.-C. / Electrochemical Society et al. | 1995
- 530
-
Gate Oxide Integrity in DRAM Devices: D-defect Effects in CZ SiPark, J.-G. / Rozgonyi, G. A. / Lee, C.-S. / Choi, S.-P. / Electrochemical Society et al. | 1995
- 532
-
Formation of High Quality Thin Stacked Oxynitride Gate Dielectrics by In Situ Rapid Thermal MultiprocessingBhat, M. / Cho, T. H. / Yan, J. / Han, L. K. / Electrochemical Society et al. | 1995
- 534
-
High Quality Oxynitride Gate Dielectrics Prepared by Reoxidation of NH~3-Nitrided SiO~2 in N~2O AmbientHan, L. K. / Kim, J. / Yoon, G. W. / Bhat, M. / Electrochemical Society et al. | 1995
- 535
-
Process Dependence of MOSFET Performance and Reliability with N~2O-Based Furnace-Grown Gate OxidesHan, L. K. / Wang, H. H. / Kim, J. / Yoon, G. W. / Electrochemical Society et al. | 1995
- 536
-
Resistivity Reduction of Thin Polycrystalline Silicon Films Crystallized from In Situ Phosphorus-Doped Amorphous Silicon Deposited Using Silane or DisilaneOguro, S. / Shishiguchi, S. / Arai, K. / Electrochemical Society et al. | 1995
- 538
-
Super Self-Aligned Ultrashallow Junction Formation/Selective Si~1~-~xGe~x CVD in Deep-Submicron MOSFETs FabricationGoto, K. / Murota, J. / Honma, F. / Matsuura, T. / Electrochemical Society et al. | 1995
- 540
-
Formation of Deep Submicrometer Cobalt Silicided Poly Gate Using Bilayer ProcessesWang, Q. F. / Lauwers, A. / Deweerdt, B. / Veerbeeck, R. / Electrochemical Society et al. | 1995
- 542
-
Determination of Epitaxial Layer Growth Processes by In Situ Synchotron X-Ray Topography and DiffractionCullis, A. G. / Barnett, S. J. / Keir, A. M. / Johnson, A. D. / Electrochemical Society et al. | 1995
- 544
-
Rapid, Routine, Nondestructive Screening of III-V Substrate Wafers Using X-Ray TopographyBassignana, I. C. / Macquistan, D. A. / Young, M. C. / Electrochemical Society et al. | 1995
- 546
-
Study of Residual Strains and Dislocation Density in Semiconducting Crystal Wafers by Means of Bragg Angle MappingFerrari, C. / Electrochemical Society et al. | 1995
- 547
-
X-Ray Diffraction Imaging of ZnSeBlack, D. / Burdette, H. / Cantwell, G. / Electrochemical Society et al. | 1995
- 548
-
Nano-Scale Imaging of Compositional, Defect and Dopant Distributions in Semiconductor Laser HeterostructuresHull, R. / Electrochemical Society et al. | 1995
- 550
-
Nano and Micro Characterization of III-V-Compound Material by Dedicated Scanning MicroscopyBalk, L. J. / Electrochemical Society et al. | 1995
- 551
-
Low Temperature Near Field Optical Spectroscopy Device StructuresHarris, T. D. / Electrochemical Society et al. | 1995
- 552
-
Applications of Atomic Force Microscopy for Compared Semiconductor MaterialsLuftman, H. S. / Electrochemical Society et al. | 1995
- 553
-
GaAs Integrated Circuit Process Characterization and Nondestructive Process Monitoring by Atomic Force MicroscopyBaca, A. G. / Howard, A. J. / Shul, R. J. / Zolper, J. C. / Electrochemical Society et al. | 1995
- 554
-
Cathodoluminescence Imaging and Spectroscopy of Low-Dimensional StructuresGustafsson, A. / Samuelson, L. / Kapon, E. / Bonard, J.-M. / Electrochemical Society et al. | 1995
- 556
-
Substrate and Epilayer Homogeneity: Their Role in Compound Semiconductor Device ProductionMoore, C. / Hennessy, J. / Electrochemical Society et al. | 1995
- 557
-
Use of Photoluminescence, Mesa Width, and Chip Test Mapping to Determine the Effect of Mesa Width on Laser PerformanceLevkoff, J. / Palin, M. G. / Grim-Bogdan, K. A. / Electrochemical Society et al. | 1995
- 559
-
Nondestructive Characterization of n-AlGaAs/GaAs Heterojunction Structures Using PhotoellipsometryWong, C. C. / Saitoh, T. / Xiong, Y.-M. / Electrochemical Society et al. | 1995
- 561
-
Photoellipsometry Analysis of Doped GaAsKobayashi, K. / Wong, C. C. / Saitoh, T. / Xiong, Y.-M. / Electrochemical Society et al. | 1995
- 563
-
The Economics of SOI Material ChoicesCraven, R. A. / Downey, W. P. / Electrochemical Society et al. | 1995
- 564
-
SIMOX Technology and Applications to Wafer BondingAuberton-Herve, A. J. / Barge, T. / Aspar, B. / Electrochemical Society et al. | 1995
- 566
-
High Volume Manufacturability of SOI Bonded WafersEaster, W. G. / Goodwin, C. A. / Hsieh, C. M. / Shanaman, R. H. / Electrochemical Society et al. | 1995
- 568
-
Recent Advances in Thinning of Bonded SOI Wafers by Plasma Assisted Chemical EtchingMumola, P. B. / Gardopee, G. J. / Electrochemical Society et al. | 1995
- 569
-
SOI for Next Generation High Performance MicroprocessorsShahidi, G. G. / Electrochemical Society et al. | 1995
- 570
-
High Performance Bipolar SOI TechnologyIkeda, T. / Watanabe, K. / Yamaguchi, H. / Nishizawa, H. / Electrochemical Society et al. | 1995
- 571
-
A Fully Oxide Isolated Bipolar Transistor Integrated Circuit ProcessGoody, S. B. / Saul, P. H. / Electrochemical Society et al. | 1995
- 573
-
High Voltage SOI TechnologyNakagawa, A. / Funaki, H. / Omura, I. / Electrochemical Society et al. | 1995
- 575
-
A Comparison of Bipolar Devices on Bonded and Trenched Wafers with Junction and Trench Isolated Bulk WafersDeCourcey, M. / Alderman, J. C. / Blackstone, S. / Gamble, H. / Electrochemical Society et al. | 1995
- 577
-
High-Resolution Flat-Panel Displays Using Silicon-on-Insulator Materials TechnologyDolny, G. / Ipri, A. C. / Hsuch, F.-L. / Stewart, R. G. / Electrochemical Society et al. | 1995
- 579
-
Epitaxial Layer Transfer by Bond and Etchback of Porous SiYonehara, T. / Sakaguchi, K. / Sato, N. / Electrochemical Society et al. | 1995
- 581
-
Bonded SOI with Buried Silicide LayersWilson, R. / Quinn, C. / McDonnell, B. / Blackstone, S. / Electrochemical Society et al. | 1995
- 583
-
High Temperature Metallic Joints Produced at Low Process Temperature for Stress ReductionLee, C. C. / Chen, Y.-C. / Matijasevic, G. / Electrochemical Society et al. | 1995
- 584
-
Characterization of Thin SOI LayersBengtsson, S. / Electrochemical Society et al. | 1995
- 586
-
Strain Sources in Bond and Etchback Silicon-on-InsulatorEgloff, R. / Letavic, T. / Merchant, S. / Greenberg, B. / Electrochemical Society et al. | 1995
- 587
-
Investigation of the Electrical Properties of Bonded Silicon-on-Insulator WafersBailey, P. T. / Jin, G. / Armstrong, B. M. / Gamble, H. S. / Electrochemical Society et al. | 1995
- 589
-
Characterization of the Crystalline Quality of Silicon Layer in Bonded SOI Silicon MaterialWijaranakula, W. / Gupta, D. C. / Electrochemical Society et al. | 1995
- 590
-
Microstructure of Bonded SOI FilmsNayar, V. / Keir, A. M. / Abe, T. / Electrochemical Society et al. | 1995
- 592
-
Mechanical Thinning for SOIBlackstone, S. / Hahn, P. / Electrochemical Society et al. | 1995
- 593
-
Oxygen Precipitate Distribution in Bonded SOI WafersOkonogi, K. / Kikuchi, H. / Arai, K. / Electrochemical Society et al. | 1995
- 595
-
Chemical Free Wafer Bonding of Silicon to Glass and SapphireFarrens, S. / Smith, J. / Electrochemical Society et al. | 1995
- 596
-
Reduction of Flow Pattern Defect Density in the Wafer Bonding ProcessAbe, T. / Electrochemical Society et al. | 1995
- 597
-
Process Design of Low Temperature Wafer BondingTong, Q.-Y. / Gosele, U. / Electrochemical Society et al. | 1995
- 599
-
Probing the Interface of Bonded Silicon Wafers with Infrared SpectroscopyChabal, Y. J. / Feijoo, D. / Christman, S. B. / Goodwin, C. A. / Electrochemical Society et al. | 1995
- 600
-
Boron Present in the Interface of Bonded SOI Wafers and Its Protection MethodMitani, K. / Katayama, M. / Nakazawa, K. / Electrochemical Society et al. | 1995
- 601
-
Mechanical Considerations for Direct Wafer BondingBower, R. W. / Sundararaman, R. / Chan, W. / Watt, V. H. C. / Electrochemical Society et al. | 1995
- 602
-
Effects of Different Prebonding Cleaning Procedures on the Buried Oxide in Bond and Etchback Silicon on Insulator MaterialsEricsson, P. / Bengtsson, S. / Electrochemical Society et al. | 1995
- 604
-
The Influence of Surface Micro-Roughness on BondabilityBergh, M. / Bengtsson, S. / Andersson, M. O. / Electrochemical Society et al. | 1995
- 606
-
Monolithically Integrated Detector Arrays by Wafer BondingKing, E. E. / Holland, S. / Wang, J. J. / Beuville, E. / Electrochemical Society et al. | 1995
- 608
-
Silicon Wafer Bonding Via Designed MonolayersSteinkirchner, J. / Martini, T. / Gosele, U. / Electrochemical Society et al. | 1995
- 610
-
What Determines the Bonding Speed in Silicon Wafer Bonding?Martini, T. / Schmidt, E. / Mack, S. / Stenzel, H. / Electrochemical Society et al. | 1995
- 612
-
Thermally Induced Bend Change of Anodically Bonded Silicon and Pyrex WafersHarz, M. / Bruckner, W. / Electrochemical Society et al. | 1995
- 614
-
Thick Wafer BondingTong, Q.-Y. / Gosele, U. / Electrochemical Society et al. | 1995
- 616
-
Modification of Silicon Surfaces with H~2SO~4:H~2O~2:HF for Wafer Bonding ApplicationsLjungberg, K. / Jansson, U. / Bengtsson, S. / Soderbarg, A. / Electrochemical Society et al. | 1995
- 618
-
Technical Challenges of Precision Production Wafer Bonding in Controlled EnvironmentsReyerse, C. C. A. / Electrochemical Society et al. | 1995
- 619
-
A van der Waals Force Model of Bonded SubstratesFarrens, S. / Dekker, J. / Electrochemical Society et al. | 1995
- 621
-
An AFM Study on the Roughness of Silicon Wafers Correlated with Direct Wafer BondingRoberds, B. / Farrens, S. / Electrochemical Society et al. | 1995
- 623
-
Buried Metallic Layers with Silicon Direct BondingGoh, W. L. / Campbell, D. L. / Armstrong, B. M. / Gamble, H. S. / Electrochemical Society et al. | 1995
- 625
-
Misorientation-Induced Defects at Bonded Si-Si Wafer Interfaces: Structural and Electrical InvestigationsLaporte, A. / Sarrabayrouse, G. / Benamara, M. / Claverie, A. / Electrochemical Society et al. | 1995
- 627
-
A Thin SOI Process Using a Bonding and Etchback Method Without Epitaxial GrowthUnno, H. / Imai, K. / Electrochemical Society et al. | 1995
- 629
-
Characterization of PN Junction Leakage Current in Bonded SOI WafersHasegawa, H. / Murakami, Y. / Kawai, Y. / Morita, E. / Electrochemical Society et al. | 1995
- 631
-
SOI Wafers for Crystalline SiC and GaN GrowthGuarin, F. / Iyer, S. S. / Yang, Z. / Wang, W. / Electrochemical Society et al. | 1995
- 633
-
Direct Bonding of LPCVD Silicon Oxide Thin Films Deposited from N~2O and SiH~4Watt, V. H. C. / Bower, R. / Sundararaman, R. / Chan, W. / Electrochemical Society et al. | 1995
- 634
-
Precision Pressure Sensors with Anodically Bonded Backing PlatesHorning, R. / Glenn, M. / Yeh, T. / Electrochemical Society et al. | 1995
- 635
-
Analysis of Process-Induced Stresses in Lateral Trench Isolation Structures for High Voltage Devices in Bonded SOI WafersBaumgart, H. / Letavic, T. J. / De Wolf, I. / Maes, H. E. / Electrochemical Society et al. | 1995
- 637
-
Low Temperature Adhesion Bonding MethodsBooth, D. / Hunt, C. E. / Brown, W. E. / Stover, R. J. / Electrochemical Society et al. | 1995
- 638
-
A Commodity Analogue Process Based on Bonded WaferMcStay, K. / Smoot, F. / Hariton, D. / Egan, K. / Electrochemical Society et al. | 1995
- 639
-
"Lord Raleigh's Ghost" or a Short History of Wafer BondingGosele, U. / Electrochemical Society et al. | 1995
- 640
-
Bonding of Structured WafersBaumann, H. / Mack, S. / Munzel, H. / Electrochemical Society et al. | 1995
- 641
-
Micromechanical Structures Fabricated by Silicon Fusion Bonding and Deep Negative Ion EtchingLogan, J. / Petersen, K. / Klassen, E. / Noworolski, M. / Electrochemical Society et al. | 1995
- 642
-
Sacrificial Wafer Bonding: An Addition to the Micromachining TechniquesSpiering, V. L. / Berenschot, J. W. / Elwenspoek, M. / Fluitman, J. M. J. / Electrochemical Society et al. | 1995
- 644
-
The Application of Silicon Wafer Bonding to Micromachined DevicesSchmidt, M. A. / Electrochemical Society et al. | 1995
- 645
-
Fabrication of a High-Sensitivity Pressure Sensor with Nitride Membranes and Single Crystal Piezoresistors Using Wafer Bond and EtchbackDesmond, C. / Mlcak, R. / Franz, D. / Electrochemical Society et al. | 1995
- 647
-
Selective Au-Si Eutectic Bonding for Si-Based MEMS ApplicationsLee, A. P. / Lehew, S. / Yu, C. / Ciarlo, D. R. / Electrochemical Society et al. | 1995
- 649
-
An Investigation of Corner Rounding to Strengthen Silicon Micromachining Pressure Sensor for Fusion Bonded WafersChan, W. / Sooriakumar, K. / Bartholomew, K. / Savage, T. S. / Electrochemical Society et al. | 1995
- 651
-
Direct Bonding of InP to Different Materials for Optical DevicesWada, H. / Kamijoh, T. / Electrochemical Society et al. | 1995
- 653
-
Bonding of InP to GaAs Substrate by Wafer Fusing and Its Applications to Long Wavelength DetectorsTan, I.-H. / Murtaza, S. S. / Bowers, J. E. / Hu, E. L. / Electrochemical Society et al. | 1995
- 655
-
Direct Wafer Bonding Technique of Ferroelectric Single CrystalsTomita, Y. / Sugimoto, M. / Eda, K. / Electrochemical Society et al. | 1995
- 657
-
Application of Direct Bonding to the Fabrication of Si/ZnS Composite Infrared WindowsFeng, T. / Tong, Q.-Y. / Askinazi, J. / Gosele, U. M. / Electrochemical Society et al. | 1995
- 659
-
Anodic Wafer BondingObermeier, E. / Electrochemical Society et al. | 1995
- 661
-
Characterization of the Direct Bonding of Silicon Wafers after Treatment in Dilute HF SolutionsOkada, C. / Kawai, Y. / Morita, E. / Saitou, Y. / Electrochemical Society et al. | 1995
- 663
-
Ion Drift Behavior in Borosilicate Glasses during Anodic Bonding to Silicon or MetalsLange, K. / Grigull, S. / Harz, M. / Kreissig, U. / Electrochemical Society et al. | 1995
- 665
-
Interface Strength Characterization of Bonded WafersPetzold, M. / Busch, M. / Abe, T. / Reiche, M. / Electrochemical Society et al. | 1995
- 667
-
Surface Morphology and Electroluminescence of Porous Silicon Layer Prepared on P-Type Silicon with Electrochemical Etching in HF Aqueous SolutionsShigyou, K. / Seo, M. / Azumi, K. / Takahashi, H. / Electrochemical Society et al. | 1995
- 669
-
Photoluminescence Studies of Thermally Impurity Diffused Porous Silicon LayersSundaram, K. B. / Ali, S. A. / Peale, R. E. / McClintic, W. A. / Electrochemical Society et al. | 1995
- 671
-
Luminescence from Silicon Nanostructures Fabricated by Conventional Lithographic and Reactive Ion Etching TechniquesNassiopoulos, A. G. / Grigoropoulos, S. / Gogolides, E. / Papadimitriou, D. / Electrochemical Society et al. | 1995
- 673
-
Porous Gallium Phosphide Photoelectrodes with Near-Unity Quantum Yield for Light Absorbed in the Indirect Optical TransitionErne, B. H. / Vanmaekelbergh, D. / Kelly, J. J. / Electrochemical Society et al. | 1995
- 674
-
Optoelectrochemistry and Nanocrystalline Semiconductor ElectrodesFitzmaurice, D. / Enright, B. / Electrochemical Society et al. | 1995
- 675
-
Charge Transport Nanoporous-Nanocrystalline TiO~2 Film ElectrodesLindquist, S.-E. / Electrochemical Society et al. | 1995
- 676
-
Photoinduced Charge Transfer Reactions at Nanocrystalline TiO~2 FilmsAugustynski, J. / Carroy, A. / Wahl, A. / Electrochemical Society et al. | 1995
- 678
-
Photoresponse and Stability of Pyrolytically Prepared n-TiO~2 SemiconductorKhan, S. U. M. / Akikusa, J. / Electrochemical Society et al. | 1995
- 680
-
Investigation of Nanocrystalline TiO/Ti Electrodes by Means of Impedance SpectroscopyKedzierzawski, P. / Dolata, M. / Augustynski, J. / Electrochemical Society et al. | 1995
- 682
-
Surface Modification of Nanocrystalline TiO~2 Electrodes: Applications in Electrochromic Devices and PhotoelectrocatalysisHagfeldt, A. / Walder, L. / Graetzel, M. / Electrochemical Society et al. | 1995
- 683
-
Electron Injection Rates in Sensitized Nanostructured TiO~2 Photovoltaic CellsHeimer, T. / Meyer, G. J. / Electrochemical Society et al. | 1995
- 684
-
A Novel Dye Sensitized TiO~2 Photovoltaic Cell Using Polymer Gel ElectrolyteCao, F. / Searson, P. C. / Electrochemical Society et al. | 1995
- 686
-
Intensity Modulated Photocurrent Spectroscopy on Nanostructured TiO~2 Solar CellsOskam, G. / Cao, F. / Searson, P. C. / Electrochemical Society et al. | 1995
- 687
-
Efficient Ruthenium Diimine Modified Nanocrystalline TiO~2 PhotoanodesMeyer, G. J. / Heimer, T. / Electrochemical Society et al. | 1995
- 688
-
Nanocrystalline SnO~2 Films Modified with Thiazine and Oxazine Dye AggregatesKamat, P. V. / Liu, D. / Electrochemical Society et al. | 1995
- 689
-
Relative Roles of Surface Area and Crystallite Size in Photocatalytic Ability of TiO~2Kelly, S. / Tomkiewicz, M. / Shen, W. M. / Electrochemical Society et al. | 1995
- 690
-
Li Insertion into Spin Coated V~2O~5 Xerogel Thin FilmsReynard, M. / Le, D. B. / Passerini, S. / Smyrl, W. H. / Electrochemical Society et al. | 1995
- 691
-
Charge Injection into Small Semiconductor ParticlesMeisel, D. / Lawless, D. / Luangdilok, C. / Cook, A. R. / Electrochemical Society et al. | 1995
- 693
-
Overlayer Formation in the n-CdSe/[Fe(CN)~6]^4^-^/^3^- Photoelectrochemical SystemDe Tacconi, N. R. / Rajeshwar, K. / Myung, N. / Electrochemical Society et al. | 1995
- 695
-
High Efficiency Photo-Hole Injection from Cyanine Dyes into CoSCNi: Prospective p-Type Material for a Dye-Sensitized p-n HeterojunctionO'Regan, B. / Schwartz, D. T. / Electrochemical Society et al. | 1995
- 696
-
Preparation of Nanocomposites by Latex-Colloid InteractionOriakhi, C. / Lerner, M. / Electrochemical Society et al. | 1995
- 698
-
Nanocomposition of PPV and Poly(p-phenoxyphenylene Sulfide)Oriakhi, C. / Lerner, M. / Electrochemical Society et al. | 1995
- 700
-
Electrodeposition of Cu-Ni MultilayersMoffat, T. P. / Electrochemical Society et al. | 1995
- 701
-
Processing and Properties of Electrodeposited Cu-Co Multilayered NanowiresNagodawithana, K. / Searson, P. C. / Liu, K. / Chien, C. L. / Electrochemical Society et al. | 1995
- 702
-
Corrosion Evaluation of Electroplated Bulk Nanocrystalline NickelWang, S. / Rofagha, R. / Roberge, P. R. / Erb, U. / Electrochemical Society et al. | 1995
- 703
-
Processing and Mechanical Behavior of Electrodeposited Ni-Al~2O~3 Nanocomposite Thin FilmsCammarata, R. R. / Oberle, R. R. / Scanlon, M. R. / Searson, P. C. / Electrochemical Society et al. | 1995
- 704
-
Electrochemical Fabrication of Metal and Semiconductor NanowiresMoskovits, M. / Al Mawlawi, D. / Douketis, C. / Bigioni, T. / Electrochemical Society et al. | 1995
- 706
-
Transport Applications of SOFCsYamazaki, Y. / Yamada, K. / Mizusaki, J. / Yokokawa, H. / Electrochemical Society et al. | 1995
- 707
-
Oxygen Reduction at the Interface LaMnO~3/YSZ Prepared by Vapor Phase ProcessesTakehara, Z. / Ioroi, T. / Uchimoto, Y. / Ogumi, Z. / Electrochemical Society et al. | 1995
- 709
-
In Situ Oxidation of Nickel and Cobalt in Molten Li + K and Na + K Carbonate EutecticTomczyk, P. / Sato, H. / Yamada, K. / Nishimi, T. / Electrochemical Society et al. | 1995
- 711
-
Influence of CO~2 on Oxygen Reduction in Molten Li + Na Carbonate EutecticTomczyk, P. / Electrochemical Society et al. | 1995
- 713
-
The Fundamentals of Fuel Cell ModelingStandaert, F. / Hemmes, K. / Woudstra, N. / Electrochemical Society et al. | 1995
- 714
-
Microelectrode Investigation of the Oxygen Permeation in Different Proton Exchange MembranesBuchi, F. N. / Wakizoe, M. / Srinivasan, S. / Electrochemical Society et al. | 1995
- 716
-
Solid-State NMR Characterization of H~3PO~4-Doped Polybenzimidazole Polymer Electrolyte Fuel Cell MembranesWasmus, S. / Savinell, R. F. / Moaddel, H. / Litt, M. H. / Electrochemical Society et al. | 1995
- 718
-
In Situ Membrane Resistance Measurements in PEFC as an Indication of Inhomogeneous Water Distribution in the MembraneRota, M. / Buchi, F. N. / Scherer, G. G. / Electrochemical Society et al. | 1995
- 719
-
Membrane Development for PEFC at PSIRota, M. / Brack, H. P. / Buchi, F. N. / Scherer, G. G. / Electrochemical Society et al. | 1995
- 720
-
Effect of Ethylene Carbonate on the Electrochemical Properties of Lithium Salt-Poly(Ethylene Oxide) Polymer ElectrolyteDo, J.-S. / Chang, C.-P. / Lee, T.-J. / Electrochemical Society et al. | 1995
- 722
-
Direct Electro-Oxidation of Dimethoxymethane, Trimethoxymethane, and Trioxane and Their Application in Fuel CellsNarayanan, S. R. / Vamos, E. / Surampudi, S. / Frank, H. / Electrochemical Society et al. | 1995
- 724
-
New Results on the Electrocatalytic Oxidation of Small Organic Molecules on Dispersed Platinum-Modified ElectrodesLeger, J.-M. / Napporn, T. / Laborde, H. / Lamy, C. / Electrochemical Society et al. | 1995
- 725
-
Electro-oxidation of H~2, CO, and H~2/CO Mixtures on Well-Characterized Pt-Ru and Pt-Sn Rotating Disk Electrodes at 62CGasteiger, H. A. / Markovic, N. M. / Ross, P. N. / Electrochemical Society et al. | 1995
- 727
-
CO and Methanol Oxidation on Smooth and High Area Pt, Pt-Ru, Pt-Sn ElectrodesMorimoto, Y. / Yeager, E. B. / Electrochemical Society et al. | 1995
- 729
-
Ligand or Bifunctional Effect? Ru as a Promotor for the Electro-oxidation of Small Organic Molecules over PtFrelink, T. / Cox, A. P. / Visscher, W. / Van Veen, J. A. R. / Electrochemical Society et al. | 1995
- 731
-
Macrocyclic Redox Promoters for Direct Methanol Fuel Cells. Part ISarangapani, S. / Electrochemical Society et al. | 1995
- 733
-
Macrocyclic Redox Promoters for Direct Methanol Fuel Cells. Part IISarangapani, S. / Morriseau, B. / Electrochemical Society et al. | 1995
- 735
-
Direct Methanol Fuel Cells with Polymeric Membrane ElectrolytesWilson, M. / Bett, J. A. S. / Ren, X. / Uribe, F. / Electrochemical Society et al. | 1995
- 736
-
DMFC Stack Test ResultsMaricle, D. L. / Murach, B. L. / Electrochemical Society et al. | 1995
- 738
-
Comparison of Electrolyte Materials for Use in Direct Methanol Oxidation Fuel CellsKosek, J. A. / Cropley, C. C. / Wilson, G. / LaConti, A. B. / Electrochemical Society et al. | 1995
- 740
-
Methanol Oxidation on High Surface Area Pt-Ru CatalystsWilson, M. / Uribe, F. / Gottesfeld, S. / Bett, J. / Electrochemical Society et al. | 1995
- 742
-
In Situ X-Ray Absorption Spectroscopy of Methanol Oxidation on Carbon-Supported Pt/Ru ClustersSwider, K. E. / Pandya, K. I. / Kowalak, A. D. / Hagans, P. L. / Electrochemical Society et al. | 1995
- 743
-
XAS Studies of Modified Pt Electrocatalysts for Methanol OxidationMcBreen, J. / Mukerjee, S. / Electrochemical Society et al. | 1995
- 744
-
Pt/Ru Alloys, Electrocatalytic Activity, and X-Ray Absorption Spectroscopic Structure StudiesO'Grady, W. E. / Swider, K. E. / Pandya, K. I. / Kowalak, A. D. / Electrochemical Society et al. | 1995
- 746
-
Electrochemical Oxidation of Methanol on a Carbon Supported Quaternary Pt-Ru-Sn-W CatalystArico, A. S. / Poltarzewski, Z. / Kim, H. / Giordano, N. / Electrochemical Society et al. | 1995
- 748
-
Multipurpose Electrochemical Mass Spectrometry: A Powerful Method for the Study of Fuel Cell ReactionsWasmus, S. / Savinell, R. F. / Electrochemical Society et al. | 1995
- 750
-
Physicochemical Investigations of CO and Ch~3OH Oxidations on Various Platinum Ruthenium ElectrodesKabbabi, A. / Durand, R. / Faure, R. / Leger, J. M. / Electrochemical Society et al. | 1995
- 752
-
Reaction Kinetics for CO and CO~2 on Polycrystalline PlatinumBellows, R. / Marucchi-Soos, E. / Electrochemical Society et al. | 1995
- 753
-
Oxidation of Methanol on Platinum Without Interference by Chemisorbed COWieckowski, A. / Chrzanowski, W. / Herrero, E. / Electrochemical Society et al. | 1995
- 755
-
Quartz Crystal Microbalance Studies of Methanol Oxidation at PlatinumCheek, G. T. / O'Grady, W. E. / Electrochemical Society et al. | 1995
- 756
-
The Importance of Surface Heterogeneity in Electrocatalytic SystemsBurke, L. D. / Electrochemical Society et al. | 1995
- 757
-
Electrode Development for a Low Temperature Direct Methanol Solid Oxide Fuel CellDoshi, R. / Krumpelt, M. / Electrochemical Society et al. | 1995
- 758
-
Microwave Subsystems Developed Through the Consortium for Superconducting ElectronicsRalston, R. W. / Electrochemical Society et al. | 1995
- 760
-
High Temperature Superconducting Microwave Filters and AntennasNagai, Y. / Suzuki, N. / Electrochemical Society et al. | 1995
- 762
-
HTS Coils for Magnetic-Resonance InstrumentsWithers, R. S. / Kotsubo, V. / Brey, W. / Wong, W.-H. / Electrochemical Society et al. | 1995
- 764
-
Tuneable Microwave Resonators Based on Sputtered Tl-Ba-Ca-Cu-O and Ba-Sr-Ti-O Thin FilmsHermann, A. M. / Naziripour, A. / Mueller, C. / Electrochemical Society et al. | 1995
- 765
-
Recent Progress in Low-T~c Circuit Fabrication Technology and Future ProspectsBhushan, M. / Electrochemical Society et al. | 1995
- 766
-
SQUIDs for MagnetometryKetchen, M. B. / Kirtley, J. R. / Electrochemical Society et al. | 1995
- 768
-
New Ultrafast Superconductor Digital ElectronicsLikharev, K. K. / Electrochemical Society et al. | 1995
- 769
-
Space Qualified Hybrid Superconductor/Semiconductor Planar Oscillator CircuitMiranda, F. A. / Chorey, C. M. / Bhasin, K. B. / Electrochemical Society et al. | 1995
- 771
-
The High Temperature Superconductivity Space Experiment: A Status ReportNisenoff, M. / Gubser, G. U. / Wolf, S. A. / Ritter, R. C. / Electrochemical Society et al. | 1995