Pore Ordering in Anodically Oxidized Aluminum Thin Films (Englisch)
- Neue Suche nach: Behnke, J.
- Neue Suche nach: Ruythooren, W.
- Neue Suche nach: Sands, T.
- Neue Suche nach: Electrochemical Society; Electrodeposition Division
- Neue Suche nach: Behnke, J.
- Neue Suche nach: Ruythooren, W.
- Neue Suche nach: Sands, T.
- Neue Suche nach: Paunovic, M.
- Neue Suche nach: Scherson, D. A.
- Neue Suche nach: Electrochemical Society; Electrodeposition Division
In:
Electrochemically deposited thin films
;
206-217
;
1997
-
ISBN:
- Aufsatz (Konferenz) / Print
-
Titel:Pore Ordering in Anodically Oxidized Aluminum Thin Films
-
Beteiligte:Behnke, J. ( Autor:in ) / Ruythooren, W. ( Autor:in ) / Sands, T. ( Autor:in ) / Paunovic, M. / Scherson, D. A. / Electrochemical Society; Electrodeposition Division
-
Kongress:Symposium; 3rd, Electrochemically deposited thin films ; 1996 ; San Antonio; TX
-
Erschienen in:Electrochemically deposited thin films ; 206-217PROCEEDINGS- ELECTROCHEMICAL SOCIETY PV ; 96-19 ; 206-217
-
Verlag:
- Neue Suche nach: The Society
-
Erscheinungsdatum:01.01.1997
-
Format / Umfang:12 pages
-
ISBN:
-
Medientyp:Aufsatz (Konferenz)
-
Format:Print
-
Sprache:Englisch
-
Schlagwörter:
-
Datenquelle:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Inhaltsverzeichnis Konferenzband
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 3
-
Statistical Aspects of Electrochemical 2D Nucleation and GrowthStaikov, G. / Lorenz, W. J. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 21
-
Electrocrystallization of Metals on High Tc Superconductor and Semiconductor SurfacesPotzschke, R. T. / Froese, A. / Wiesbeck, W. / Staikov, G. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 33
-
Epitaxial CdSe Films Chemically Deposited on InP Single Crystals. Influence of the Growth MechanismCachet, H. / Cortes, R. / Froment, M. / Maurin, G. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 46
-
Tapping Mode Atomic Force Microscopy Analysis of Electroless-Deposition ProcessHomma, T. / Tanabe, M. / Suzuki, M. / Osaka, T. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 55
-
Electrodeposition Kinetics of Nickel Thin Films from a Nickel Sulfamate Bath Containing Copper SulfateMyung, N. / Sumodjo, P. T. A. / Nobe, K. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 71
-
A New Solid State Electrodeposition Technique-Polarized Electrochemical Vapor DepositionTang, E. Z. / Etsell, T. H. / Ivey, D. G. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 83
-
Electrochemistry of Sulfur Adlayers on Ag(111), (100), and (100)Hatchett, D. W. / White, H. S. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 91
-
Surface Development During Electroless Copper DepositionWeber, C. J. / Pickering, H. W. / Weil, K. G. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 103
-
Ionic Mass Transfer Rate Associated with Electrodeposition of CdTe FilmFukunaka, Y. / Izuo, S. / Asaki, Z. / Nakahiro, Y. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 115
-
Deposition of Sn from Fluoride Solutions on Pd Predeposited Si(100) SubstrateLongo, C. / Sumodjo, P. T. A. / Sanz, F. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 125
-
Differences between n and p-Type Substrates in the Electrochemical Platinum Deposition on SiliconGorostiza, P. / Diaz, R. / Sanz, F. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 136
-
Electrodeposition of Copper under Micrograviti ConditionsFukunaka, Y. / Okano, K. / Tomii, Y. / Asaki, Z. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 136
-
Electrodeposition of copper under microgravity conditionsFukunaka, Y. / Okano, K. / Tomii, Y. / Asaki, Z. / Kuribayashi, K. et al. | 1997
- 150
-
Mathematical Modeling in Electrochemistry (An Overview)Schlesinger, M. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 160
-
Microstructural Aspects of Metal and Alloy Films Fabricated Electrochemically or by Sputter DepositionLandolt, D. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 171
-
Electrochemical Stepwise Formation of Metal Phases of Different DimensionalityLorenz, U. W. J. / Staikov, G. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 184
-
Preparation and Properties of High Resistivity Electroless NiP FilmsIizuka, A. / Higashikawa, T. / Osaka, T. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 194
-
Factors Influencing the Stability and Kinetics of Hydrous Ir Oxide FilmsBock, C. / Birss, V. I. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 206
-
Pore ordering in anodically oxidized aluminium thin filmsBehnke, J. / Ruythooren, W. / Sands, T. et al. | 1997
- 206
-
Pore Ordering in Anodically Oxidized Aluminum Thin FilmsBehnke, J. / Ruythooren, W. / Sands, T. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 218
-
Characterization of NiFe Multilayers Plated in an Oscillating FlowLeith, S. D. / Schwartz, D. T. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 227
-
Effect of Amines on the Electrodeposition of Ni-Fe AlloysHarris, T. M. / Clair, J. L. St. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 239
-
Aqueous Electrodeposition of Rare Earth Thin Film Alloys With Ferrous MetalsChen, L. / Schwartz, M. / Nobe, K. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 248
-
Composite Films of Copper/Boron Nitride and Nickel/Boron NitrideHepel, M. / Tannehill, T. / Baxter, C. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 271
-
Conformal Electroless Copper Deposition for sub-0.5 m Interconnect Wiring of Very High Aspect RatioLopatin, S. / Shacham-Diamond, Y. / Dubin, V. M. / Vasudev, P. K. / Electrochemical Society; Electrodeposition Division et al. | 1997
- 289
-
Process development and reliablility study of GFPdNi finish for SC packagingBoguslavsky, I. / Abys, J.A. et al. | 1997
- 289
-
Process Development and Reliability Study of GFPdNi Finish for SC PackagingBoguslavsky, I. / Abys, J. A. / Electrochemical Society; Electrodeposition Division et al. | 1997