Analysis of a TEOS/Oxygen Plasma: Influence of Energy and Particle Flux on the Deposition Parameters (Englisch)
- Neue Suche nach: da Silva, M. L. P.
- Neue Suche nach: da Silva, A. N. R.
- Neue Suche nach: Santiago-Aviles, J. J.
- Neue Suche nach: MRS
- Neue Suche nach: da Silva, M. L. P.
- Neue Suche nach: da Silva, A. N. R.
- Neue Suche nach: Santiago-Aviles, J. J.
- Neue Suche nach: Jones, A. C.
- Neue Suche nach: MRS
In:
Chemical processing of dielectrics, insulators and electronic ceramics
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63-68
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2000
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ISBN:
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ISSN:
- Aufsatz (Konferenz) / Print
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Titel:Analysis of a TEOS/Oxygen Plasma: Influence of Energy and Particle Flux on the Deposition Parameters
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Beteiligte:da Silva, M. L. P. ( Autor:in ) / da Silva, A. N. R. ( Autor:in ) / Santiago-Aviles, J. J. ( Autor:in ) / Jones, A. C. / MRS
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Kongress:Symposium, Chemical processing of dielectrics, insulators and electronic ceramics ; 1999 ; Boston, MA
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Erschienen in:MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS ; 606 ; 63-68
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Verlag:
- Neue Suche nach: Materials Research Society
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Erscheinungsort:Warrendale, Pa.
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Erscheinungsdatum:01.01.2000
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Format / Umfang:6 pages
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Anmerkungen:Held as part of the MRS fall meeting; Includes bibliographical references and index
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ISBN:
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ISSN:
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Medientyp:Aufsatz (Konferenz)
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Format:Print
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
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