Novel through-die connections for MEMS applications [4979-29] (Englisch)
- Neue Suche nach: Kommera, S.
- Neue Suche nach: Woods, W.
- Neue Suche nach: Krusius, J. P.
- Neue Suche nach: International Society for Optical Engineering
- Neue Suche nach: Kommera, S.
- Neue Suche nach: Woods, W.
- Neue Suche nach: Krusius, J. P.
- Neue Suche nach: Yasaitis, J.
- Neue Suche nach: Perez-Maher, M. A.
- Neue Suche nach: Karam, J. M.
- Neue Suche nach: International Society for Optical Engineering
In:
Micromachining and microfabrication process technology
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261-270
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2003
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ISBN:
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ISSN:
- Aufsatz (Konferenz) / Print
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Titel:Novel through-die connections for MEMS applications [4979-29]
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Beteiligte:Kommera, S. ( Autor:in ) / Woods, W. ( Autor:in ) / Krusius, J. P. ( Autor:in ) / Yasaitis, J. / Perez-Maher, M. A. / Karam, J. M. / International Society for Optical Engineering
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Kongress:Conference; 8th, Micromachining and microfabrication process technology ; 2003 ; San Jose, CA
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Erschienen in:PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING ; 4979 ; 261-270
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Verlag:
- Neue Suche nach: SPIE
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Erscheinungsdatum:01.01.2003
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Format / Umfang:10 pages
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ISBN:
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ISSN:
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Medientyp:Aufsatz (Konferenz)
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Format:Print
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Inhaltsverzeichnis Konferenzband
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 1
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Micropackaging technologies for integrated microsystems: applications to MEMS and MOEMS (Plenary Paper) [4979-200]Najafi, K. / International Society for Optical Engineering et al. | 2003
- 1
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Micropackaging Technologies for Integrated Microsystems: Applications to MEMS and MOEMSNajafi, Khalil et al. | 2003
- 20
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NEXUS: roadmaps and applications (Plenary Paper) [4979-201]El-Fatatry, A. / International Society for Optical Engineering et al. | 2003
- 20
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NEXUS: Roadmaps and ApplicationsEl-Fatatry, Ayman et al. | 2003
- 26
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MEMS and MOEMS for national security applicationsScott, Marion W. et al. | 2003
- 26
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MEMS and MOEMS for National Security applications (Plenary Paper) [4979-202]Scott, M. W. / International Society for Optical Engineering et al. | 2003
- 34
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Performance enhancement and evaluation of deep dry etching on a production cluster platformMcNie, Mark E. / Pickering, Christopher / Rickard, Alexandra L. / Young, Iain M. / Hopkins, Janet / Ashraf, Huma / McAuley, Serrita A. / Nicholls, Glenn / Barnett, Richard / Roozeboom, Fred et al. | 2003
- 34
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Performance enhancement and evaluation of deep dry etching on a production cluster platform [4979-01]McNie, M. E. / Pickering, C. / Rickard, A. L. / Young, I. M. / Hopkins, J. / Ashraf, H. / McAuley, S. A. / Nicholls, G. / Barnett, R. / Roozeboom, F. et al. | 2003
- 43
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Scalloping minimization in deep Si etching on Unaxis DSE toolsLai, Shouliang / Johnson, Dave J. / Westerman, Russ J. / Nolan, John J. / Purser, David / Devre, Mike et al. | 2003
- 43
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Scalloping minimization in deep Si etching on Unaxis DSE tools [4979-02]Lai, S. / Johnson, D. J. / Westerman, R. J. / Nolan, J. J. / Purser, D. / Devre, M. / International Society for Optical Engineering et al. | 2003
- 51
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Advanced dry etching for oxide deep trench [4979-03]Gobil, Y. / Noel, P. / Moreau, M. / van der Reijden, M. / International Society for Optical Engineering et al. | 2003
- 51
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Advanced Dry Etching for Oxide Deep-TrenchGobil, Yveline / Noel, Patrice / Moreau, Muriel / van der Reijden, Marc et al. | 2003
- 62
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Reduction in surface roughness and aperture size effect for XeF~2 etching of Si [4979-04]Sugano, K. / Tabata, O. / International Society for Optical Engineering et al. | 2003
- 62
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Reduction in surface roughness and aperture size effect for XeF2etching of SiSugano, Koji / Tabata, Osamu et al. | 2003
- 70
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Optimization of EDP solutions for feature size independent silicon etchingYellampalli, Chandana / Bhat, Kunchinadka N. / DasGupta, Nandita / DasGupta, Amitava / Rao, Parimi R. et al. | 2003
- 70
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Optimization of EDP solutions for feature-size-independent silicon etching [4979-05]Yellampalli, C. / Bhat, K. N. / DasGupta, N. / DasGupta, A. / Rao, P. R. / International Society for Optical Engineering et al. | 2003
- 79
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Polymer protective coating for wet deep silicon etching processesSpencer, Mary / Ruben, Kim / Li, Chenghong / Williams, Paul / Flaim, Tony D. et al. | 2003
- 79
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Polymer protective coating for wet deep silicon etching processes [4979-06]Spencer, M. / Ruben, K. / Li, C. / Williams, P. / Flaim, T. D. / International Society for Optical Engineering et al. | 2003
- 87
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Bi/In as patterning and masking layers for alkaline-based Si anisotropic etching [4979-07]Tu, Y. / Chapman, G. H. / International Society for Optical Engineering et al. | 2003
- 87
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Bi/In as patterning and masking layers for alkaline-base Si anisotropic etchingTu, Yuqiang / Chapman, Glenn H. et al. | 2003
- 99
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Generation and application of opto-mchancial microstructures on glassSchmidt, Volker / Arens, Winfried / Kriems, Ulrich et al. | 2003
- 99
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Generation and application of opto-mechanical microstructures on glass [4979-09]Schmidt, V. / Arens, W. / Kriems, U. / International Society for Optical Engineering et al. | 2003
- 105
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Microfabrication of ultrathick SU-8 photoresist for microengines [4979-10]Jin, P. / Jiang, K. C. / Sun, N. / International Society for Optical Engineering et al. | 2003
- 105
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Microfabrication of ultra-thick SU-8 photoresist for microenginesJin, Peng / Jiang, Kyle C. / Sun, Nianjun et al. | 2003
- 111
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Fabrication of a porous membrane for gas precombustion [4979-11]Sturmann, J. / Bodecker, A. / Splinter, A. / Benecke, W. / International Society for Optical Engineering et al. | 2003
- 111
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Fabrication of a porous membrane for the gas pre-combustionStuermann, Joerg / Boedecker, Andre / Splinter, Alexandra / Benecke, Wolfgang et al. | 2003
- 119
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Chemical mechanical planarization: an effective microfabrication and micromachining technology for MEMS [4979-13]Lee, J. / Myers, R. / Dear, T. / Gensler, C. / International Society for Optical Engineering et al. | 2003
- 119
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Chemical mechanical planarization: an effective microfabrication and micromachining technology for MEMSLee, Juikun / Myers, Ronald / Dear, Tina / Gensler, Carl et al. | 2003
- 129
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Chemical mechanical planarization of large-area wells for MEMS and MOEMS [4979-12]Lee, J. / Busta, H. / Myers, R. / Dear, T. / Dokmeci, M. R. / Bernstein, J. J. / International Society for Optical Engineering et al. | 2003
- 129
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Chemical Mechanical Planarization of large area well for MEMS and MOEMSLee, Juikun / Busta, Heinz / Myers, Ronald / Dear, Tina / Dokmeci, Mehmet R. / Bernstein, Jonathan J. et al. | 2003
- 137
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Planarization of a CMOS die for an integrated metal MEMSLee, Hocheol / Miller, Michele H. / Bifano, Thomas G. et al. | 2003
- 137
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Planarization of a CMOS die for an integrated metal MEMS [4979-14]Lee, H. / Miller, M. H. / Bifano, T. G. / International Society for Optical Engineering et al. | 2003
- 145
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A modular process for integrating thick polysilicon MEMS devices with sub-micron CMOSYasaitis, John A. / Judy, Michael / Brosnihan, Tim / Garone, Peter M. / Pokrovskiy, Nikolay / Sniderman, Debbie / Limb, Scott / Howe, Roger T. / Boser, Bernhard E. / Palaniapan, Moorthi et al. | 2003
- 145
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Modular process for integrating thick polysilicon MEMS devices with submicron CMOS [4979-15]Yasaitis, J. A. / Judy, M. / Brosnihan, T. / Garone, P. M. / Pokrovskiy, N. / Sniderman, D. / Limb, S. / Howe, R. T. / Boser, B. E. / Palaniapan, M. et al. | 2003
- 155
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Batch-fabricated silicon electrostatic micropositioner for dual-stage actuation [4979-16]Del Sarto, M. / Sassolini, S. / Baldo, L. / Marchi, M. / McCaslin, M. J. / International Society for Optical Engineering et al. | 2003
- 155
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Batch fabricated silicon electrostatic micropositioner for dual stage actuationDel Sarto, Marco / Sassolini, Simone / Baldo, Lorenzo / Marchi, Mauro / McCaslin, Martin J. et al. | 2003
- 165
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Fabrication of PZT-actuated cantilevers on silicon-on-insulator wafers for rf microswitches [4979-17]Jiang, H. W. / Kirby, P. B. / Zhang, Q. / International Society for Optical Engineering et al. | 2003
- 165
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Fabrication of PZT actuated cantilevers on silicon-on-insulator wafers for a RF microswitchJiang, Hong Wen / Kirby, Paul B. / Zhang, Qi et al. | 2003
- 174
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Double-sided MEMS mirror for L-switching matrixYeow, Tze Wei / Law, K. L. Eddie / Goldenberg, Andrew A. et al. | 2003
- 174
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Double-sided MEMS mirror for L-switching matrix [4979-18]Yeow, T. W. / Law, K. L. E. / Goldenberg, A. A. / International Society for Optical Engineering et al. | 2003
- 178
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Thin film metal surface micromachining: a new enabling foundry technology [4979-19]van Heeren, H. / Andringa, T. / Attenborough, K. / Eisenberg, M. / Meeuws, P. / International Society for Optical Engineering et al. | 2003
- 178
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Thin film metal surface micromachining: a new enabling foundry technologyvan Heeren, Henne / Andringa, Toon / Attenborough, K. / Eisenberg, Martin / Meeuws, P. et al. | 2003
- 189
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Quartz substrate infrared photonic crystal [4979-20]Ghadiri, K. / Rejeb, J. / Vitchev, V. N. / International Society for Optical Engineering et al. | 2003
- 189
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Quartz substrate infrared photonic crystalGhadiri, Khosrow / Rejeb, Jalel / Vitchev, Vladimir N. et al. | 2003
- 199
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Blazed silicon grating made of (111) silicon wafer [4979-21]Ju, H. / Zhang, P. / Wang, S. / Liang, J. / Wu, Y. / International Society for Optical Engineering et al. | 2003
- 199
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A Blazed silicon grating made of (111) silicon waferJu, Hui / Zhang, Ping / Wang, Shurong / Liang, Jingqiu / Wu, Yihui et al. | 2003
- 207
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Novel MEMS-technology-based silicon and polymer hybrid actuator and applications as a tunable filter in telecom and in IR chemical detectors [4979-22]Li, P. / Lee, K. / Wang, W. / Peters, J. / International Society for Optical Engineering et al. | 2003
- 207
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Novel MEMS technology based silicon and polymer hybrid actuator and applications as a tunable filter in telecom and in IR chemical detectorLi, Ping / Lee, Kusol / Wang, Weijie / Peters, Jon et al. | 2003
- 217
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Depth and surface roughness control on laser micromachined polyimide for direct-write depositionPratap, Bhanu / Arnold, Craig B. / Pique, Alberto et al. | 2003
- 217
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Depth and surface roughness control on laser micromachined polyimide for direct-write deposition [4979-24]Pratap, B. / Arnold, C. B. / Pique, A. / International Society for Optical Engineering et al. | 2003
- 226
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Microjoining of dissimilar materials for optoelectronic and biomedical applications [4979-25]Witte, R. / Herfurth, H. J. / Bauer, I. / International Society for Optical Engineering et al. | 2003
- 226
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Microjoining of dissimilar materials for optoelectronic and biomedical applicationsWitte, Reiner / Herfurth, Hans Joachim / Bauer, Ingo et al. | 2003
- 234
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Fabrication of planar grating by direct ablation using ultrashort pulse laser with a novel optical configurationSivakumar, N. R. / Venkatakrishnan, Krishnan / Tan, Bo / Ngoi, Bryan K. A. et al. | 2003
- 234
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Fabrication of planar grating by direct ablation using ultrashort-pulse laser with a novel optical configuration [4979-26]Sivakumar, N. R. / Venkatakrishnan, K. / Tan, B. / Ngoi, B. K. A. / International Society for Optical Engineering et al. | 2003
- 243
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Application of the technology of the excimer laser etching to fabricate the three-dimensional microstructuresLiang, Jingqiu / Le, Zichun / Yao, Jingshong / Zhang, Yushu / Wang, Shurong / Zhang, Ping / Wu, YiHui / Xuan, Ming / Wang, Lijun et al. | 2003
- 243
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Application of the technology of excimer laser etching to fabricate three-dimensional microstructures [4979-27]Liang, J. / Le, Z. / Yao, J. / Zhang, Y. / Wang, S. / Zhang, P. / Wu, Y. / Xuan, M. / Wang, L. / International Society for Optical Engineering et al. | 2003
- 251
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Design concept for tong grippers for automated microassembly [4979-28]Schlick, J. / Zuehlke, D. / International Society for Optical Engineering et al. | 2003
- 251
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Design concept for tong grippers for automated micro-assemblySchlick, Jochen / Zuehlke, Detlef et al. | 2003
- 261
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Novel through-die connections for MEMS applicationsKommera, Swaroop / Woods, Wayne / Krusius, J. Peter et al. | 2003
- 261
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Novel through-die connections for MEMS applications [4979-29]Kommera, S. / Woods, W. / Krusius, J. P. / International Society for Optical Engineering et al. | 2003
- 271
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Vacuum wafer-level packaging for MEMS applicationsCaplet, Stephane / Sillon, Nicolas / Delaye, Marie-Therese / Berruyer, Pascale et al. | 2003
- 271
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Vacuum wafer-level packaging for MEMS applications [4979-30]Caplet, S. / Sillon, N. / Delaye, M.-T. / Berruyer, P. / International Society for Optical Engineering et al. | 2003
- 279
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Alignment and fabrication of micro-optic assemblies using fiber fusion [4979-31]Florence, J. M. / Hoggins, J. T. / International Society for Optical Engineering et al. | 2003
- 279
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Alignment and fabrication of micro-optic assemblies using fiber fusionFlorence, James M. / Hoggins, James T. et al. | 2003
- 287
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Fabrication of microchannels for compliant wafer level packaging using sacrificial materialsReed, Hollie A. / Jayachandran, Joseph P. / Shick, Robert A. / Rhodes, Larry F. / Krotine, Jeffery / Elce, Ed / Allen, Sue Ann / Kohl, Paul A. et al. | 2003
- 287
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Fabrication of microchannels for compliant wafer-level packaging using sacrificial materials [4979-32]Reed, H. A. / Jayachandran, J. P. / Shick, R. A. / Rhodes, L. F. / Krotine, J. / Elce, E. / Allen, S. A. / Kohl, P. A. / International Society for Optical Engineering et al. | 2003
- 295
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Chip on flex with 5-mum features [4979-33]Salmon, P. C. / International Society for Optical Engineering et al. | 2003
- 295
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Chip-on-flex with 5-micron featuresSalmon, Peter C. et al. | 2003
- 307
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Processable high-carbon-yielding polymer for micro- and nanofabrication [4979-34]Perpall, M. W. / Zengin, H. / Perera, K. P. U. / Zhou, W. / Shah, H. / Wu, X. / Creager, S. E. / Smith, D. W. / Foulger, S. H. / Ballato, J. M. et al. | 2003
- 307
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Processable high-carbon-yielding polymer for micro- and nanofabricationPerpall, Mark W. / Zengin, Huseyin / Perera, K. Prasanna U. / Zhou, Wensheng / Shah, Hiren / Wu, Xinyu / Creager, Stephen E. / Smith, Dennis W. / Foulger, Stephen H. / Ballato, John M. et al. | 2003
- 317
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Three-dimensional polymer MEMS with functionalized carbon nanotubes by micro-stereo-lithography [4979-35]Varadan, V. K. / Xie, J. / International Society for Optical Engineering et al. | 2003
- 317
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Three-dimensional polymer MEMS with functionalized carbon nanotubes by microstereolithographyVaradan, Vijay K. / Xie, Jining et al. | 2003
- 327
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European MEMS foundriesSalomon, Patric R. et al. | 2003
- 327
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European MEMS foundries [4979-36]Salomon, P. R. / International Society for Optical Engineering et al. | 2003
- 337
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Design rules for the fabrication of binary half-tone masks used for MEMS and photonic devices [4979-37]Rhyins, P. D. / Progler, C. J. / Claydon, G. S. / Balch, E. W. / International Society for Optical Engineering et al. | 2003
- 337
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Design rules for the fabrication of binary half-tone masks used for MEMS and photonic devicesRhyins, Peter D. / Progler, Christopher J. / Claydon, Glenn S. / Balch, Ernest W. et al. | 2003
- 353
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Microfabrication services at INOAlain, Christine / Jerominek, Hubert / Topart, Patrice A. / Pope, Timothy D. / Picard, Francis / Cayer, Felix / Larouche, Carl / Leclair, Sebastien / Tremblay, Bruno et al. | 2003
- 353
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Microfabrication services at INO [4979-38]Alain, C. / Jerominek, H. / Topart, P. A. / Pope, T. D. / Picard, F. / Cayer, F. / Larouche, C. / Leclair, S. / Tremblay, B. / International Society for Optical Engineering et al. | 2003
- 364
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Novel micromachining method based on AFM and high-accuracy stage [4979-39]Yan, Y. / Sun, T. / Dong, S. / Cheng, K. / International Society for Optical Engineering et al. | 2003
- 364
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Novel micro-machining method basing on AFM and high-accuracy stageYan, Yongda / Sun, Tao / Dong, Shen / Cheng, Kai et al. | 2003
- 372
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Plasma etching of polymers like SU8 and BCB [4979-40]Mischke, H. / Gruetzner, G. / Shaw, M. / International Society for Optical Engineering et al. | 2003
- 372
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Plasma etching of polymers like SU8 and BCBMischke, Helge / Gruetzner, Gabi / Shaw, Mark et al. | 2003
- 382
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Thick SU-8 photolithography for BioMEMS [4979-41]Rabarot, M. / Bablet, J. / Ruty, M. / Kipp, M. / Chartier, I. / Dubarry, C. / International Society for Optical Engineering et al. | 2003
- 382
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Thick SU-8 photolithography for BioMEMSRabarot, Marc / Bablet, Jacqueline / Ruty, Marine / Kipp, Matthieu / Chartier, Isabelle / Dubarry, Christophe et al. | 2003
- 394
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SU-8-based deep x-ray lithography/LIGA [4979-42]Jian, L. / Desta, Y. M. / Goettert, J. / Bednarzik, M. / Loechel, B. / Jin, Y. / Aigeldinger, G. / Singh, V. / Ahrens, G. / Gruetzner, G. et al. | 2003
- 394
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SU-8 based deep x-ray lithography/LIGAJian, Linke / Desta, Yohannes M. / Goettert, Jost / Bednarzik, Martin / Loechel, Bernd / Jin, Yoonyoung / Aigeldinger, Georg / Singh, Varshni / Ahrens, Gisela / Gruetzner, Gabi et al. | 2003
- 402
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Expansion of SU-8 application scope by PAG concentration modificationLing, Zhong-geng / Lian, Kun et al. | 2003
- 402
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Expansion of SU-8 application scope by PAG concentration modification [4979-43]Ling, Z. G. / Lian, K. / International Society for Optical Engineering et al. | 2003
- 410
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Process conditions and lithographic performance of arch durimide polyimides in the ultra-thick film regimeMisat, Sylvain I. / Pellens, Rudy J. M. / Voets, Rutger / van Klaveren, Angelique / van den Heuvel, Jean-Paul / Peterson, L. / Waterson, Pamela J. / Racicot, D. / Roza, D. et al. | 2003
- 410
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Process conditions and lithographic performance of Arch Durimide polyimides in the ultrathick-film regime [4979-44]Misat, S. I. / Pellens, R. J. M. / Voets, R. / van Klaveren, A. / van den Heuvel, J. P. / Peterson, L. / Waterson, P. J. / Racicot, D. / Roza, D. / International Society for Optical Engineering et al. | 2003
- 422
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Cyclotene diaphragm for MEMS based IR detectorsGuo, Shuwen et al. | 2003
- 422
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Cyclotene diaphragm for MEMS-based IR detectors [4979-45]Guo, S. / International Society for Optical Engineering et al. | 2003
- 430
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Micromolding and sintering of nanoparticle preforms into micropartsMorales, Alfredo M. / Garino, Terry J. / Boyce, Bradley L. / Domeier, Linda A. / Gutmann, Anne K. / McLean, Dorrance E. et al. | 2003
- 430
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Micromolding and sintering of nanoparticle preforms into microparts [4979-46]Morales, A. M. / Garino, T. J. / Boyce, B. L. / Domeier, L. A. / Gutmann, A. K. / McLean, D. E. / International Society for Optical Engineering et al. | 2003
- 440
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Microstructure and mechanical properties of nickel microparts electroformed in replicated LIGA molds [4979-47]Morales, A. M. / Domeier, L. A. / Gonzales, M. G. / Hachman, J. T. / Hruby, J. M. / Goods, S. H. / McLean, D. E. / Yang, N. / Gardea, A. D. / International Society for Optical Engineering et al. | 2003
- 440
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Microstructure and mechanical properties of nickel microparts electroformed in replicated LIGA moldsMorales, Alfredo M. / Domeier, Linda A. / Gonzales, Marcela G. / Hachman, John T. / Hruby, Jill M. / Goods, Steven H. / McLean, Dorrance E. / Yang, Nancy / Gardea, Andrew D. et al. | 2003
- 448
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Sacrificial layer for the fabrication of electroformed cantilevered LIGA micropartsMorales, Alfredo M. / Aigeldinger, Georg / Bankert, Michelle A. / Domeier, Linda A. / Hachman, John T. / Hauck, Cheryl / Keifer, Patrick N. / Krafcik, Karen L. / McLean, Dorrance E. / Yang, Peter C. et al. | 2003
- 448
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Sacrificial layer for the fabrication of electroformed cantilevered LIGA microparts [4979-48]Morales, A. M. / Aigeldinger, G. / Bankert, M. A. / Domeier, L. A. / Hachman, J. T. / Hauck, C. / Keifer, P. N. / Krafcik, K. L. / McLean, D. E. / Yang, P. C. et al. | 2003
- 456
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Novel micromolded structures [4979-49]Fleming, J. G. / Mani, S. S. / Baker, M. S. / International Society for Optical Engineering et al. | 2003
- 456
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Novel micromolded structuresFleming, James G. / Mani, Seethambal S. / Baker, Michael S. et al. | 2003
- 464
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High-aspect-ratio microstructures for magnetoelectronic applicationsWang, Tao / McCandless, Andrew B. / Ford, Sean M. / Kelly, Kevin W. / Lienau, Richard / Hensley, Dale / Desta, Yohannes M. / Ling, Zhong-geng et al. | 2003
- 464
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High-aspect-ratio microstructures for magnetoelectronic applications [4979-50]Wang, T. / McCandless, A. B. / Ford, S. M. / Kelly, K. W. / Lienau, R. / Hensley, D. / Desta, Y. M. / Ling, Z. G. / International Society for Optical Engineering et al. | 2003
- 472
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Direct thin-film imaging, DTFI, based on PMOD (photochemical metal-organic deposition) methodologyMadsen, Harold O. / Suh, Seigi / Svendsen, Leo G. / Mukherjee, Shyama P. / Roman, Paul J. / Fury, Michael A. / Ip, Katy et al. | 2003
- 472
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Direct thin film imaging (DTFI) based on PMOD (photochemical metal-organic deposition) methodology [4979-51]Madsen, H. O. / Suh, S. / Svendsen, L. G. / Mukherjee, S. P. / Roman, P. J. / Fury, M. A. / Ip, K. / International Society for Optical Engineering et al. | 2003
- 482
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Modeling of secondary radiation damage in LIGA PMMA resist exposure [4979-52]Ting, A. / International Society for Optical Engineering et al. | 2003
- 482
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Modeling of secondary radiation damage in LIGA PMMA resist exposureTing, Aili et al. | 2003
- 493
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High-aspect-ratio microfabrication of crosslinked polytetrafluoroethylene using synchrotron radiation direct photo-etching [4979-53]Katoh, T. / Sato, Y. / Yamaguchi, D. / Ikeda, S. / Aoki, Y. / Oshima, A. / Washio, M. / Tabata, Y. / International Society for Optical Engineering et al. | 2003
- 493
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High-aspect ratio microfabrication of crosslinked polytetrafluoroethylene using synchrotron radiation direct photo-etchingKatoh, Takanori / Sato, Yasunori / Yamaguchi, Daichi / Ikeda, Shigetoshi / Aoki, Yasushi / Oshima, Ahihiro / Washio, Masakazu / Tabata, Yoneho et al. | 2003
- 501
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New process to fabricate DXRL x-ray mask by direct pattern writingLing, Zhong G. / Lian, Kun / Wen, Shirong et al. | 2003
- 501
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New process to fabricate DXRL x-ray mask by direct pattern writing [4979-54]Ling, Z. G. / Lian, K. / Wen, S. / International Society for Optical Engineering et al. | 2003
- 508
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High-resolution x-ray masks for high-aspect-ratio microelectromechanical systems (HARMS) [4979-55]Wang, L. / Aristone, F. / Goettert, J. / Kong, J. R. / Bradshaw, K. / Christenson, T. R. / Desta, Y. M. / Jin, Y. / International Society for Optical Engineering et al. | 2003
- 508
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High resolution x-ray masks for high aspect ratio microelectromechanical systems (HARMS)Wang, Lin / Aristone, Flavio / Goettert, Jost / Kong, Jong Ren / Bradshaw, Keith / Christenson, Todd R. / Desta, Yohannes M. / Jin, Yoonyoung et al. | 2003
- 514
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Borosilicate glass based x-ray masks for LIGA microfabricationDesta, Yohannes M. / Bednarzik, Martin / Bryant, Michael D. / Goettert, Jost / Jian, Linke / Jin, Yoonyoung / Kim, Daejong / Lee, Sanghoon / Loechel, Bernd / Scheunemann, Hans-Ulrich et al. | 2003
- 514
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Borosilicate-glass-based x-ray masks for LIGA microfabrication [4979-56]Desta, Y. M. / Bednarzik, M. / Bryant, M. D. / Goettert, J. / Jian, L. / Jin, Y. / Kim, D. / Lee, S. / Loechel, B. / Scheunemann, H.-U. et al. | 2003
- 523
-
Embossing of microscale features in Pb and ZnGuidry, Dean J. / Cao, Dong Mei / Wang, Tao / Meng, Wen Jin / Kelly, Kevin W. et al. | 2003
- 523
-
Embossing of microscale features in Pb and Zn [4979-57]Guidry, D. J. / Cao, D. M. / Wang, T. / Meng, W. J. / Kelly, K. W. / International Society for Optical Engineering et al. | 2003
- 532
-
Wafer thinning for high-density, through-wafer interconnectsWang, Lianwei / Visser, Cassan C. G. / de Boer, Charles R. / Laros, M. / van der Vlist, W. / Groeneweg, J. / Craciun, G. / Sarro, Pasqualina M. et al. | 2003
- 540
-
Inverse model for optimizing the process of fabricating a microstructure by Laser Chemical Vapor DepositionZhang, Chaoyang / Dai, Weizhong / Nassar, Raja / Lan, Hong et al. | 2003
- 549
-
Mathematical model for simulating axisymmetric rod growth with kinetically limited and mass transport limited ratesLan, Hong / Nassar, Raja / Dai, Weizhong / Zhang, Chaoyang et al. | 2003
- 561
-
Improved resolution of thick film resist (effect of pre-bake condition)Sensu, Yoshihisa / Sekiguchi, Atsushi et al. | 2003
- 582
-
Thermo- and galvanomagnetic properties of hetrophases materials of high pressureShchennikov, Vladimir V. / Ovsyannikov, Sergey V. / Vorontsov, Grigoriy V. et al. | 2003
- 593
-
Evaluation of a rapid prototyping process for microsystems for silicon microstructuresBange, Stefan / Herding, Mark / Woias, Peter et al. | 2003