MOCVD of ZrO~2 Thin Films from Two Different beta-Diketonate Precursors: Dependence of Microstructure and Growth Kinetics on the Precursor (Englisch)
- Neue Suche nach: Dharmaprakash, M. S.
- Neue Suche nach: Shivashankar, S. A.
- Neue Suche nach: Electrochemical Society
- Neue Suche nach: Dharmaprakash, M. S.
- Neue Suche nach: Shivashankar, S. A.
- Neue Suche nach: Allendorf, M. D.
- Neue Suche nach: Maury, F.
- Neue Suche nach: Teyssandier, F.
- Neue Suche nach: Electrochemical Society
In:
Chemical vapor deposition
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900-906
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2003
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ISBN:
- Aufsatz (Konferenz) / Print
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Titel:MOCVD of ZrO~2 Thin Films from Two Different beta-Diketonate Precursors: Dependence of Microstructure and Growth Kinetics on the Precursor
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Beteiligte:Dharmaprakash, M. S. ( Autor:in ) / Shivashankar, S. A. ( Autor:in ) / Allendorf, M. D. / Maury, F. / Teyssandier, F. / Electrochemical Society
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Kongress:International conference; 16th, Chemical vapor deposition ; 2003 ; Paris
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Erschienen in:Chemical vapor deposition ; 900-906PROCEEDINGS- ELECTROCHEMICAL SOCIETY PV ; 2 ; 900-906
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Verlag:
- Neue Suche nach: Electrochemical Society
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Erscheinungsdatum:01.01.2003
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Format / Umfang:7 pages
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Anmerkungen:Held jointly with EUROCVD 14. Held as part of the 203rd meeting of the Electrochemical Society
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ISBN:
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Medientyp:Aufsatz (Konferenz)
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Format:Print
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Inhaltsverzeichnis Konferenzband
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 1
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Quantum Chemical Study of ZrO~2 Atomic Layer Deposition on the SiO~2 SurfaceGao, G. / Han, J. / Widjaja, Y. / Garfunkel, E. / Musgrave, C. / Electrochemical Society et al. | 2003
- 15
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Surface and Gas Phase Chemistry of the MOCVD of ZnSeMoscatelli, D. / Cavallotti, C. / Masi, M. / Carra, S. / Electrochemical Society et al. | 2003
- 22
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Effects of Heat Treatment of Silica and Precursor on the Surface Density of Aminosilanes Deposited Onto Silica by ALDEk, S. / Iiskola, E. I. / Niinisto, L. / Electrochemical Society et al. | 2003
- 30
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Non-Equilibrium Effects During Disilane DecompositionTsang, W. / Electrochemical Society et al. | 2003
- 39
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Investigation of Gas Phase Decomposition Mechanisms in GaN-CVD by Theoretical Methods: The "Entropic Challenge"Schmid, R. / Wolbank, B. / Basting, D. / Electrochemical Society et al. | 2003
- 47
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Gas-Phase Kinetic Modeling in the AlCl~3-CO~2-H~2-HCl System in View of the Chemical Vapor Deposition of Al~2O~3Tan, P. / Muller, J. / Neuschutz, D. / Electrochemical Society et al. | 2003
- 55
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Thermodynamics and Reaction Pathways in the Decomposition, Oxidation, and Hydrolysis of MonobutyltintrichlorideAllendorf, M. D. / Nielsen, I. M. B. / Melius, C. F. / van Mol, A. M. B. / Electrochemical Society et al. | 2003
- 65
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Decomposition, Oxidation, and Hydrolysis Kinetics of Monobutyltintrichloridevan Mol, A. M. B. / Allendorf, M. / Electrochemical Society et al. | 2003
- 74
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Thermal Decomposition of Ti Precursors in Gas PhaseHeo, J. S. / Cho, Y. S. / Kim, J. C. / Moon, S. H. / Electrochemical Society et al. | 2003
- 81
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Heat and Mass Transfer of Chemical Deposition of Zinc-Selenide LayersMinkina, V. G. / Electrochemical Society et al. | 2003
- 85
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A Method to Extract Physical Properties from Raman Scattering Data in a CVD ReactorHwang, J. / Huang, M. / Anderson, T. / Park, C. / Electrochemical Society et al. | 2003
- 92
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Identification of Black Deposits Produced During the Hydride-OMVPE Growth of GaNPark, C. / Han, S. / Doh, C. / Yeo, S. / Yoon, D. / Hwang, S.-K. / Lee, K.-H. / Anderson, T. / Electrochemical Society et al. | 2003
- 98
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Quantifying Superconformal Filling of Submicrometer Features Through Surfactant Catalyzed Chemical Vapor DepositionJosell, D. / Kim, S. / Wheeler, D. / Moffat, T. / Pyo, S. / Electrochemical Society et al. | 2003
- 104
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NMR, X-Ray, and Mass Spectrometry Characterization of Some Heteroleptic Aluminum Alkoxide ComplexesBau, D. / Carta, G. / Benetollo, F. / Rossetto, G. / Tamburini, S. / Turgambaeva, A. / Zanella, P. / Electrochemical Society et al. | 2003
- 112
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Mechanisms of Thermal and Photo Assisted MOCVD Processes From M(hfac)~2Tetraglyme (M=Sr, Ba) PrecursorsCondorelli, G. G. / Anastasi, G. / Giuffrida, S. / Fragala, I. L. / Electrochemical Society et al. | 2003
- 120
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Thermal Properties of Ir(I) Precursors: Acetylacetonato (1,5-Cyclooctadiene) Iridium(I) and (Methylcyclopentadienyl) (1,5-Cyclooctadiene) Iridium(I)Morozova, N. B. / Gelfond, N. V. / Semyannikov, P. P. / Trubin, S. V. / Igumenov, I. K. / Gimeno-Fabra, L. / Electrochemical Society et al. | 2003
- 128
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The Problem of the Storage Alkaline Earth Precursors Containing 2,2,6,6- Tetramethylheptanedione-3,5Vertlib, V. / Drozdov, A. / Timokhin, I. / Troyanov, S. / Pettinari, C. / Marchetti, F. / Min, Y. / Kim, D. / Electrochemical Society et al. | 2003
- 136
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A Correlation Between Volatility, and Molecular Structure: Spectroscopic Estimation of the Temperature for Onset of Sublimation in Metal beta-DiketonatesDas, M. / Shivashankar, S. A. / Electrochemical Society et al. | 2003
- 144
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From pyrocarbon CVD to pyrocarbon CVIVignoles, G. L. / Langlais, F. / Reuge, N. / Le Poche, H. / Descamps, C. / Mouchon, A. / Electrochemical Society et al. | 2003
- 155
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An Open-Source, Extensible Software Suite for CVD Process SimulationGoodwin, D. / Electrochemical Society et al. | 2003
- 163
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Procedure and Related Tools Proposed for the Modeling of Gas-Phase Mechanisms Involved in Chemical Vapor Deposition: Application to CVD of SiCde Persis, S. / Dollet, A. / Teyssandier, F. / Electrochemical Society et al. | 2003
- 171
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Heat Transfer in Very Low Pressure Stagnation Flow CVD ReactorsDorsman, R. / Kleijn, C. R. / Electrochemical Society et al. | 2003
- 179
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Uniform Molecular Flux in a Vertical Reactor with Pulsed Transition Regime Gas FlowKrumdieck, S. / Lee, J.-Y. / Raatz, H. / Electrochemical Society et al. | 2003
- 186
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Local Deposition Rates of alpha-Al~2O~3 from AlCl~3-CO~2-H~2-HCl derived with PHOENICS-CVD from Thermogravimetric Measurements in a Hot-Wall Reactor with Long Isothermal ZoneMuller, J. / Neuschutz, D. / Electrochemical Society et al. | 2003
- 194
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Predictive Model Extraction from Commercial Scale Poly-Silicon LPCVD ReactorShimizu, R. / Ogino, M. / Sugiyama, M. / Shimogaki, Y. / Electrochemical Society et al. | 2003
- 202
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Tin Oxide Deposition in a Cold-Wall CVD Reactor: Computations and ExperimentsXenidou, T. C. / Diamantis, A. G. / Boudouvis, A. G. / Tsamakis, D. M. / Markatos, N. C. / Electrochemical Society et al. | 2003
- 210
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Modeling Analysis of SiC CVD in the Horizontal Hot Wall ReactorsSemennikov, A. K. / Talalaev, R. A. / Vorob ev, A. N. / Makarov, Y. N. / Electrochemical Society et al. | 2003
- 218
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Modeling of Transport and Kinetic Processes in an Atomic Layer Deposition ReactorDevulapalli, B. / McInerney, J. / Dharan, M. / Electrochemical Society et al. | 2003
- 226
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Simulation of Epitaxial Silicon Deposition and Dopant Incorporation in an Industrial Barrel ReactorDi Stanislao, M. / Valente, G. / Fascella, S. / Masi, M. / Carra, S. / Fei, J. Y. / Yarlagadda, S. / Electrochemical Society et al. | 2003
- 235
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Aerosol Dynamics Modeling and Computational Fluid Dynamics of a Laser-Driven Nanoparticle Synthesis ReactorTalukdar, S. / Ng, C. / Swihart, M. / Electrochemical Society et al. | 2003
- 243
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Thermodynamic Optimization of OMCVD Deposition of SrTiO~3Salinas, E. R. / Pisch, A. / Chatillon, C. / Bernard, C. / Electrochemical Society et al. | 2003
- 249
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Design of MOCVD Film Growth in a Hot Wall Tubular ReactorBattiston, G. A. / Gerbasi, R. / Raic, K. T. / Electrochemical Society et al. | 2003
- 258
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Critical Issues in Group-III Nitride MOVPE ModelingYakovlev, E. / Talalaev, R. / Vorob ev, A. / Makarov, Y. / Electrochemical Society et al. | 2003
- 266
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Simulation of Silicon Thermal Oxidation and Stress Analysis in Flash Memory TechnologyVeneroni, A. / Beretta, A. / Masi, M. / Electrochemical Society et al. | 2003
- 272
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Study of the Automatic Modeling of Reaction Systems for Chemical Vapor Deposition Processes Using Genetic AlgorithmsTakahashi, T. / Funatsu, K. / Ema, Y. / Electrochemical Society et al. | 2003
- 279
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Modeling of Thermo- and Mass-Transfer Processes at Sublimation of Molecular Crystals of CVD PrecursorsGelfond, N. V. / Cherepanov, A. N. / Mikheev, A. N. / Cherepanova, V. K. / Popov, V. N. / Morozova, N. B. / Igumenov, I. K. / Electrochemical Society et al. | 2003
- 287
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Use of Surfactants in Organometallic Vapor Phase EpitaxyStringfellow, G. B. / Chapman, D. C. / Kim, B. J. / Seong, T. Y. / Electrochemical Society et al. | 2003
- 299
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Arrangement of Silicon and Oxygen Atoms in Low Pressure Chemically Vapor Deposited SiO~2 Films by SiH~4-O~2 and TEOS Chemistries: Comparison With Thermally Grown SiO~2 FilmsVamvakas, V. / Pappa, A. / Davazoglou, D. / Electrochemical Society et al. | 2003
- 307
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Formation Mechanism of Local Thickness Profile of Silicon Epitaxial FilmHabuka, H. / Fukaya, S. / Sawada, A. / Takeuchi, T. / Aihara, M. / Electrochemical Society et al. | 2003
- 316
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Synthesis and Structural Characterizations of Vanadium Oxide Thin Films Prepared by MOCVD and ALDMantoux, A. / Groult, H. / Doppelt, P. / Badot, J. C. / Balnois, E. / Baffier, N. / Lincot, D. / Electrochemical Society et al. | 2003
- 325
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Direct Injection Chemical Vapor Deposition of Textured Zirconium Oxide FilmsRapenne, L. / Bernard, O. / Huntz, A. M. / Andrieux, M. / Poulin, J. C. / Haut, C. / Seiler, W. / Electrochemical Society et al. | 2003
- 333
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Morphological Studies of Focused Ion Beam Induced Tungsten DepositionLangfischer, H. / Harasek, S. / Wanzenboeck, H. / Lugstein, A. / Basnar, B. / Bertagnolli, E. / Electrochemical Society et al. | 2003
- 340
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Mechanical Characterisation of Zirconium Oxide Thin Films Deposited by Chemical Vapor DepositionBernard, O. / Rapenne, L. / Huntz, A. M. / Rieux, M. / Poissonnet, S. / Electrochemical Society et al. | 2003
- 351
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CVD Coating of Sapphire Fibers With hBN to Improve Mechanical Properties of Reinforced NiAl CompositesReichert, K. / Cremer, R. / Neuschutz, D. / Electrochemical Society et al. | 2003
- 359
-
Microwave PACVD of Low Friction a-SiC Coatings: From Plasma Characterization to Material Mechanical PropertyThomas, L. / Teyssandier, F. / Ducarroir, M. / Boher, C. / Autrique, L. / Badie, J. M. / Berjoan, R. / Electrochemical Society et al. | 2003
- 364
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Optical Characterization of Solid Phase Crystallization of Silicon Thin Films Obtained by LPCVDModreanu, M. / Gartner, M. / Cobianu, C. / Hurley, P. / Electrochemical Society et al. | 2003
- 373
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Electrical Properties of TiN Films Prepared by Plasma Assisted Atomic Layer Deposition Using Tetrakis(Dimethylamido)-TitaniumKim, D.-H. / Kim, Y. J. / Song, Y. S. / Electrochemical Society et al. | 2003
- 378
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Interrelation of Bond Configuration and Optical Properties of muc-SiC Thin Films by Spectroscopic EllipsometryLosurdo, M. / Iannuzzi, G. / Capezzuto, P. / Bruno, G. / Electrochemical Society et al. | 2003
- 386
-
Optical Properties of Low Pressure Chemically Vapor Deposited Silicon Oxynitride Films From SiCl~2H~2-NH~3-N~2O MixturesDavazoglou, D. / Electrochemical Society et al. | 2003
- 394
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Electrochromic Characterization of Mo-W Mixed Oxides and MoO~3 Thin FilmsGesheva, K. / Ivanova, T. / Kovalchuk, A. / Gurtovoi, B. / Trofimov, O. / Electrochemical Society et al. | 2003
- 401
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Electrochromism in WO~3 and WO~3-Pt Doped Nanophasic Thin Films Deposited by MOCVD on Gold SubstratesCarta, G. / Cavallotti, P. L. / Filippin, M. / Magagnin, L. / Rossetto, G. / Zanella, P. / Electrochemical Society et al. | 2003
- 408
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Comparison of Photovoltaic Performance of SnO~2:F Coated Substrates Made Using APCVD With Different Sn Precursorsvan Mol, A. M. B. / Grob, F. / Spee, K. / van der Werf, K. / Schropp, R. / Electrochemical Society et al. | 2003
- 417
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The Influence of Film Thickness on Photoactivity for TiO~2 Films Grown on Glass by CVDNolan, M. / Sheel, D. W. / Pemble, M. / Electrochemical Society et al. | 2003
- 424
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MOCVD of Tungsten Nitride Thin Films from the Imido Complex Cl~4(CH~3CN)W(NiPr): Effect of NH~3 on Film PropertiesBchir, O. / Anderson, T. / Brooks, B. / McElwee-White, L. / Electrochemical Society et al. | 2003
- 432
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Mass-Transfer and Doping Processes of the Inside Surfaces of Cast Iron Sleeves Using the Electrolyte-Plasma TreatmentPogrebnjak, A. D. / Kul ment eva, O. P. / Tyurin, Y. N. / Kobzev, A. P. / Boyko, A. G. / Golovenko, S. I. / Electrochemical Society et al. | 2003
- 439
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Optical Probes of Atmospheric Pressure CVD SystemsPemble, M. / Electrochemical Society et al. | 2003
- 455
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MOCVD Materials for Electronic and Optoelectronic ApplicationsChristiansen, K. / Luenenbuerger, M. / Dikme, Y. / Schineller, B. / Heuken, M. / Juergensen, H. / Electrochemical Society et al. | 2003
- 463
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In Situ Monitoring of Thin Film Oxygen Diffusion by Macroscopic CurvatureTripathi, A. B. / Boyd, D. A. / Goodwin, D. G. / Electrochemical Society et al. | 2003
- 471
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Investigation of Gas-Phase Reaction Effective on Deposition Behavior in MOCVD-Pb(Zr,Ti)O~3 Film Using In-Situ-Monitored by Fourier Transform Infrared SpectroscopyAsano, G. / Satake, T. / Ohtsuki, K. / Funakubo, H. / Electrochemical Society et al. | 2003
- 479
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Atomic Layer Deposition of Thin Films for MicroelectronicsRitala, M. / Leskela, M. / Electrochemical Society et al. | 2003
- 491
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Characteristics of Tungsten Carbide Films Prepared by Plasma Assisted Atomic Layer Deposition using Bis (TerT-Butylimido) Bis (Dimethylamido)TungstenKim, D. / Kim, Y. / Song, Y. / Lee, B. / Kim, J. / Suh, S. / Gordon, R. / Electrochemical Society et al. | 2003
- 503
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Atomic Layer Deposition of Alumina from Trimethylaluminum and OzoneHo, P. / Chou, C.-P. / Mokhtari, S. / Bailey, J. / Senzaki, Y. / Electrochemical Society et al. | 2003
- 511
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Growth of SnO~2 Thin Films by ALD and CVD: A Comparative StudySundqvist, J. / Harsta, A. / Electrochemical Society et al. | 2003
- 516
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Alkaline Earth Cyclopentadienyl Compounds as Precursors for Atomic Layer DepositionHatanpaa, T. / Hanninen, T. / Ihanus, J. / Kansikas, J. / Mutikainen, I. / Vehkamaki, M. / Ritala, M. / Leskela, M. / Electrochemical Society et al. | 2003
- 523
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Inside-Outside Densification of Carbon Fiber Preforms by Isothermal, Isobaric CVIZhang, W. G. / Huttinger, K. J. / Electrochemical Society et al. | 2003
- 530
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Fluidized Bed Chemical Vapor Deposition: State of the Art and Main ChallengesCaussat, B. / Serp, P. / Vahlas, C. / Electrochemical Society et al. | 2003
- 538
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Chemical Vapor Deposition in Spouted Bed ReactorsJuarez L, F. / Lafont, M. C. / Senocq, F. / Vahlas, C. / Electrochemical Society et al. | 2003
- 549
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Pyrolysis of Mixed Aerosols: A Versatile CVD-Based Process to Produce Clean and Long Aligned Multi-Walled Carbon NanotubesHemite, M. / Armand, X. / Porterat, D. / Reyhaud, C. / Electrochemical Society et al. | 2003
- 557
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Deposition of Thin Film Transition Metal Oxides (TMO) on Glass by Combustion Chemical Vapour Deposition (C-CVD)Benito, G. / Davis, M. J. / Hurst, S. J. / Sheel, D. W. / Pemble, M. E. / Electrochemical Society et al. | 2003
- 565
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Grafting Metalorganic Species into Mesoporous Silica from the Vapour PhaseGleizes, A. N. / Electrochemical Society et al. | 2003
- 573
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Kinetic Analysis of the Low Temperature CVD of Silicon/Silicon Carbide from Methyltrichlorosilane/Hydrogen for the Ceramization of Biomorphic Carbon PreformsPopovska, N. / Streitwieser, D. / Gerhard, H. / Emig, G. / Electrochemical Society et al. | 2003
- 581
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Laser-Induced Carbon CVD Using an Open-Air ReactorKwok, K. H. / Chiu, W. K. S. / Electrochemical Society et al. | 2003
- 588
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Titanium Dioxide Thin Film Deposition on Polymer Substrates by Light Induced Chemical Vapor DepositionHalary-Wagner, E. / Wagner, F. / Hoffmann, P. / Electrochemical Society et al. | 2003
- 596
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Atmospheric Pressure Deposition of Silica Thin Films by Photo-CVD Using Vacuum Ultraviolet Excimer LampMaezono, Y. / Nishi, K. / Yokotani, A. / Kurosawa, K. / Electrochemical Society et al. | 2003
- 603
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Characterization of SiO~2 Films by Photo-CVD using a Xe~2 Excimer LampMiyano, J. / Maezono, Y. / Toshikawa, K. / Yokotani, A. / Kurosawa, K. / Electrochemical Society et al. | 2003
- 609
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Physical Properties of SiO~2 Layers Deposited at Room Temperature by a Combination of ECR Plasma and High-Speed Jet of SilaneIsai, G. / Holleman, J. / Woerlee, P. / Wallinga, H. / Modreanu, M. / Cobianu, C. / Electrochemical Society et al. | 2003
- 617
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Composite Nitrided + Ti(N,C,O) Type Layers Produced by PAMOCVD ProcessesWierzchon, T. / Sobiecki, J. R. / Mankowski, P. / Rozniatowski, K. / Electrochemical Society et al. | 2003
- 624
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Influence of the Microwave Power in an ECR-PECVD Reactor on Dielectric-Cap Induced Blue Shift in 1.55 mum Laser StructuresWojcik, J. / Robinson, B. / Thompson, D. A. / Mascher, P. / Electrochemical Society et al. | 2003
- 630
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Study of Precursors for Atmospheric Pressure Plasma Enhanced CVD (AP-PECVD) of Silicon Dioxide FilmsAlexandrov, S. E. / Hitchman, M. L. / McSporran, N. / Electrochemical Society et al. | 2003
- 638
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Low Temperature Processing of SiO~2 Thin Films by PECVD Technique Using an Inductively-Coupled High-Density RF Plasma SourceJoshi, P. / Droes, S. / Flores, J. / Voutsas, T. / Hartzel, J. / Electrochemical Society et al. | 2003
- 646
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Plasma CVD of Si/C/N: Experimental and Theoretical ResultsBerger, C. / Broszeit, E. / Falk, F. / Hoche, H. / Kroke, E. / Kroll, P. / Probst, D. / Riedel, R. / Stafast, H. / Uhlitzsh, V. et al. | 2003
- 653
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Bias Power Effect on Property of PECVD Low-k SiOCH FilmShioya, Y. / Ohdaira, T. / Suzuki, R. / Maeda, K. / Electrochemical Society et al. | 2003
- 661
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Low Temperature Deposition of Microcrystalline Silicon Films by Plasma Assisted CVDGrimaldi, A. / Sacchetti, A. / Losurdo, M. / Ambrico, M. / Capezzuto, P. / Bruno, G. / Electrochemical Society et al. | 2003
- 668
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Atmospheric-Pressure Plasma-Enhanced Chemical Vapour Deposition (AP-PE-CVD) for Growth of Thin Films at Low TemperatureDavis, M. J. / Tsanos, M. / Lewis, J. / Sheel, D. W. / Pemble, M. E. / Electrochemical Society et al. | 2003
- 676
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Atmospheric Pressure Deposition of SiO~x Thin Films by Oxidation of Liquid HMDSO in Remote PlasmaHuet, S. / Belmonte, T. / Czerwiec, T. / Thiebaut, J. M. / Bockel, S. / Electrochemical Society et al. | 2003
- 681
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Optimizing Net Deposition Rates for a High Density Plasma CVD ProcessNiazi, K. / Chen, Z. / Karpenko, O. / Electrochemical Society et al. | 2003
- 689
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High-Density Plasma CVD Films of Aluminium, Gallium, and Indium Nitrides From Coordination Compounds of MetalsMazurenko, Y. A. / Gerasimchuk, A. I. / Electrochemical Society et al. | 2003
- 693
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Low-Temperature Solution for Silicon Nitride LPCVD Using Cl-Free Inorganic TrisilylamineTamaoki, N. / Sato, Y. / Dussarrat, C. / Girard, J.-M. / Kimura, T. / Electrochemical Society et al. | 2003
- 701
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Mechanism of Oxygen Contamination in PECVD a-Si:H FilmsHiramatsu, M. / Kimura, Y. / Jyumonji, M. / Nishitani, M. / Matsumura, M. / Electrochemical Society et al. | 2003
- 708
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Growth of Homogeneous and Gradient BC~xN~y Films by PECVD Using Trimethylaminoborane ComplexKosinova, M. L. / Fainer, N. I. / Rumyantsev, Y. M. / Maximovski, E. A. / Kuznetsov, F. A. / Terauchi, M. / Shibata, K. / Satoh, F. / Electrochemical Society et al. | 2003
- 716
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Plasma Enhanced Chemical Vapor Deposition of Er-Doped Amorphous Silicon Thin FilmsGiangregorio, M. M. / Losurdo, M. / Capezzuto, P. / Bruno, G. / Electrochemical Society et al. | 2003
- 722
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Interaction Between Active Plasma and Growing Co-C-O - Layer During PACVDNurnberg, A. / Stolle, R. / Wahl, G. / Raic, K. T. / Electrochemical Society et al. | 2003
- 730
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Niobium Nitride Film Growth by Plasma CVDYu, A. / Grigori, G. / Vajenine, V. / Electrochemical Society et al. | 2003
- 733
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Chromium and Zirconium Type Layers Produced from Metalorganic Compounds Using the Glow Discharge ConditionsSobiecki, J. / Wierzchon, T. / Electrochemical Society et al. | 2003
- 741
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Epitaxial Stabilization in MOCVD of Oxide Thin FilmsKaul, A. / Gorbenko, O. / Graboy, I. / Novozhilov, M. / Bosak, A. / Kamenev, A. / Antonov, S. / Nikulin, I. / Mikhailov, A. / Kartavtzeva, M. et al. | 2003
- 749
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MOCVD of Oxides on Textured Ni for High Temperature Superconducting TapesStadel, O. / Liekefett, M. / Schmidt, J. / Wahl, G. / Gorbenko, O. / Kaul, A. / Electrochemical Society et al. | 2003
- 755
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Magnesium Acetylacetonate-Dipivaloylmethanate as a New Precursor for MOCVD of MgO Thin FilmsKotova, O. / Botev, A. / Gorbenko, O. / Kuzmina, N. / Kaul, A. / Malkerova, I. / Alikhanyan, A. / Electrochemical Society et al. | 2003
- 763
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Aluminium Oxide Thin Film Grown by Low Pressure MOCVD Using Aluminium Acetylacetone and Nitrous OxideSingh, M. P. / Shripathi, T. / Shivashankar, S. A. / Electrochemical Society et al. | 2003
- 771
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Growth of Al~2O~3 Films by Pulsed Injection MOCVD: Comparative Study of Precursor MaterialsAbrutis, A. / Bartasyte, A. / Kubilius, V. / Teiserskis, A. / Baumann, P. / Lindner, J. / Schumacher, M. / Dubourdieu, C. / Electrochemical Society et al. | 2003
- 777
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Tungsten Doped Vanadium Oxide Thin Films by Atmospheric Pressure Chemical Vapour DepositionManning, T. D. / Parkin, I. P. / Electrochemical Society et al. | 2003
- 783
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Parametric Study of the CVD of YSZ from Organometallic PrecursorsVaranasi, V. / Besmann, T. / Hyde, R. / Xu, W. / Starr, T. / Electrochemical Society et al. | 2003
- 790
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MOLPCVD of Ta~2O~5 Using TaC~1~2H~3~0O~5N as Precursor for Batch FabricationBriand, D. / Mondin, G. / Jenny, S. / Banakh, O. / van der Wal, P. D. / Jeanneret, S. / Keppner, H. / de Rooj, N. F. / Electrochemical Society et al. | 2003
- 798
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Single Source MOCVD Precursors for RNiO~3 (R = Rare Earth Metal) Thin Film DepositionAbdyushev, P. R. / Novojilov, M. A. / Ryazanov, M. V. / Bochkov, E. A. / Kuzmina, N. P. / Kaul, A. R. / Gleizes, A. N. / Electrochemical Society et al. | 2003
- 806
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Textured SrTiO~3 Thin Films on SiO~2/Si by Liquid Injection MOCVD Using a New Bimetallic PrecursorLhostis, S. / Audier, M. / Senateur, J.-P. / Dubourdieu, C. / Auvray, L. / Electrochemical Society et al. | 2003
- 814
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Infrared Spectroscopic Study on Metalorganic Chemical Vapor Deposition of (Ba, Sr)TiO~3 FilmsNakamura, T. / Nishimura, T. / Momose, S. / Tachibana, K. / Electrochemical Society et al. | 2003
- 821
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Strongly Oriented Thin Films of Er~2O~3 Grown on Fused Quartz by Low-Pressure MOCVDSingh, M. P. / Shalini, K. / Shivashankar, S. A. / Electrochemical Society et al. | 2003
- 829
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Balancing Reactor Fluid Dynamics and Deposition Kinetics to Achieve Compositional Variation in Combinatorial Chemical Vapor Depositions of ZrO, HfO~2, and SnO~2Gladfelter, W. / Xia, B. / Chen, F. / Campbell, S. / Roberts, J. / Electrochemical Society et al. | 2003
- 839
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Novel precursors for high k dielectrics and metal electrodes. Part I: SynthesisAtwood, Jim D. / Hoth, David C. / Moreno, Debra A. / Hoover, Cynthia A. / Peck, John / Natwora, Jim / Mosscrop, Michael T. / Meiere, Scott H. et al. | 2003
- 839
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Novel Precursor for High-k Dielectrics and Metal Electrodes Part I: SynthesisAtwood, J. / Hoth, D. / Moreno, D. / Hoover, C. / Peck, J. / Natwora, J. / Mosscrop, M. / Meiere, S. / Electrochemical Society et al. | 2003
- 847
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Novel Precursors for High-k Dielectrics and Metal Electrodes Part II: DepositionAtwood, J. / Hoth, D. / Moreno, D. / Hoover, C. / Meiere, S. / Thompson, D. / Piotrowski, G. / Litwin, M. / Peck, J. / Electrochemical Society et al. | 2003
- 855
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Chemical Vapor Deposition of Zirconium Tin Titanate: A Dielectric Material for Potential Microelectronic ApplicationsMays, E. / Hess, D. / Rees, W. / Electrochemical Society et al. | 2003
- 855
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Chemical vapor deposition of zirconium tin titanate: a dielectric material for potential microelectronic aaplicationsMays, Ebony L. / Hess, Dennis W. / Rees, William S. jun. et al. | 2003
- 863
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Hafnium Titanium Silicate High-k Dielectric Films Deposited by MOCVD using Novel Single Source PrecursorsZuercher, S. / Morstein, M. / Lemberger, M. / Bauer, A. / Electrochemical Society et al. | 2003
- 871
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Development of Improved Precursors for the MOCVD of Bismuth TitanateJones, A. C. / Williams, P. A. / Tobin, N. L. / Chalker, P. R. / Marshall, P. / Wright, P. J. / Lane, P. A. / Donohue, P. / Smith, L. M. / Davies, H. O. et al. | 2003
- 879
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Effect of Solvent on Growth of Ru and RuO~2 Films by Liquid Injection MOCVDFrohlich, K. / Husekova, K. / Machajdik, D. / Soltys, J. / Patoprsty, V. / Baumann, P. / Lindner, J. / Schumacher, M. / Electrochemical Society et al. | 2003
- 886
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MOCVD of RuO~2 Thin Films Using (?^6-benzene)(?^4-1,3-cyclohexadiene)RuHwang, H.-N. / Han, K. C. / An, K.-S. / Chung, T.-M. / Kim, Y. / Electrochemical Society et al. | 2003
- 886
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MOCVD of RuO2 thin films using (eta6-benzene)(eta4-1,3-cyclohexadiene)RuHwang, Han-Na / Han, Ki-Chul / An, Ki-Seok / Chung, Taek-Mo / Kim, Yunsoo et al. | 2003
- 894
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Utilizing MOCVD for High-Quality Zirconium Dioxide Gate Dielectrics in MicroelectronicsHarasek, S. / Wanzenboeck, H. / Brezna, W. / Smoliner, J. / Gornik, E. / Bertagnolli, E. / Electrochemical Society et al. | 2003
- 900
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MOCVD of ZrO~2 Thin Films from Two Different beta-Diketonate Precursors: Dependence of Microstructure and Growth Kinetics on the PrecursorDharmaprakash, M. S. / Shivashankar, S. A. / Electrochemical Society et al. | 2003
- 907
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HfO~2 Films Obtained By Injection MOCVDRoussel, F. / Roussel, H. / Audier, M. / Dubourdieu, C. / Senateur, J. P. / Jimenez, C. / Leedham, T. J. / Davies, H. O. / Jones, A. C. / O Sullivan, B. J. et al. | 2003
- 915
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MOCVD Growth of Pr~2O~3 High-k Gate Dielectric for Silicon: Synthesis and Structural InvestigationNigro, R. L. / Toro, R. / Malandrino, G. / Raineri, V. / Fragala, I. L. / Electrochemical Society et al. | 2003
- 923
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Continuous and Granular Metal Films Produced by Chemical Vapor Deposition with Chelate Compound PrecursorsBakovets, V. V. / Electrochemical Society et al. | 2003
- 931
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CVD of Transition Metals from Metalorganic ComplexesPopovska, N. / Schneider, A. / Emig, G. / Zenneck, U. / Topf, C. / Electrochemical Society et al. | 2003
- 938
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Silver Thin Films Deposited by Injection MOCVDAbourida, M. / Guillon, H. / Jimenez, C. / Decams, J. M. / Valet, O. / Doppelt, P. / Electrochemical Society et al. | 2003
- 946
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Atomic Layer Deposition of Ruthenium from RuCp^2 and Oxygen: Film Growth and Reaction Mechanism StudiesAaltonen, T. / Rahtu, A. / Ritala, M. / Leskela, M. / Electrochemical Society et al. | 2003
- 954
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Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonyle Pentaisonitrile in a Remote Plasma ReactorHamelmann, F. / Brechling, A. / Aschentrup, A. / Heinzmann, U. / Jutzi, P. / Sandrock, J. / Siemeling, U. / Electrochemical Society et al. | 2003
- 959
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MOCVD of Transparent, p-Type Conducting CuCrO~2 Thin Films Using Acetylacetonat PrecursorsMahapatra, S. / Mane, A. U. / Dharmaprakash, M. S. / Bera, P. S. / Hegde, M. S. / Shivashankar, S. A. / Electrochemical Society et al. | 2003
- 959
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MOCVD of transparent, p-type conducting CuCrO2 thin films using acetylacetonate precursorsMahapatra, S. / Mane, A.U. / Dharmaprakash, M.S. / Bera, Parthasarathy / Hegde, M.S. / Shivashankar, S.A. et al. | 2003
- 967
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Growth and Formation of Inverse GaP and InP OpalsYates, H. M. / Whitehead, D. E. / Nolan, M. G. / Pemble, M. E. / Palacios-Lidon, E. / Rubio, S. / Meseguer, F. J. / Lopez, C. / Electrochemical Society et al. | 2003
- 975
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Zinc Amide Compounds as Potential Precursors for the Synthesis of Zinc NitrideMaile, E. / Devi, A. / Fischer, R. / Electrochemical Society et al. | 2003
- 982
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InP/InGaAs Tunneling-Emitter Bipolar Transistor (TEBT) with a Step-Graded Collector Structure Prepared by MOCVDChen, C.-Y. / Lin, K.-W. / Chiou, W.-H. / Chuang, H.-M. / Chen, J.-Y. / Fu, S.-Y. / Kao, C.-I. / Liu, W.-C. / Electrochemical Society et al. | 2003
- 990
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MOCVD of Thin Mixed-Conducting Films on Porous Ceramic SubstratesStiens, D. / Wahl, G. / Garcia, G. / Van Veen, A. / Rebeilleau, M. / Electrochemical Society et al. | 2003
- 996
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Deposition of Mixed Conducting Oxide Thin Films on Porous Ceramic SubstratesFaucheux, V. / Deschanvres, J. L. / Pignard, S. / Audier, M. / Teiserskis, A. / Abrutis, A. / Rushworth, S. / Electrochemical Society et al. | 2003
- 1001
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CVD-Grown Thin Films of Tetracyanoethylene-Based Room-Temperature FerrimagnetsCasellas, H. / Valade, L. / De Caro, D. / Cassoux, P. / Villain, F. / Gatteschi, D. / Electrochemical Society et al. | 2003
- 1008
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Chemical Vapour Deposition of Cobalt for Magnetic ApplicationsDeo, N. / Montgomery, J. / Bain, M. / Gamble, H. / Electrochemical Society et al. | 2003
- 1016
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Chemical Vapor Deposition of Cobalt on Si(100)Greve, D. / Zhao, Q. / Barmak, K. / Singanamalla, R. / Electrochemical Society et al. | 2003
- 1024
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MOCVD Growth Characterization of Cobalt Phosphide Thin Films on InP SubstratesBarreca, D. / Camporese, R. / Casarin, M. / El Habra, N. / Gasparotto, R. / Natali, M. / Rossetto, G. / Tondello, E. / Zanella, P. / Electrochemical Society et al. | 2003
- 1032
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(Cu~xZn~1~-~x)Fe~2O~4 Ferrimagnetic Films Prepared by Atmospheric MOCVD at 360^o CChang, Y. / Huang, C. / Lin, J. / Yang, J. / Yiu, Z. / Electrochemical Society et al. | 2003
- 1040
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Niobium and Molybdenum-Based Molecular Magnets Grown as Thin Films by Chemical Vapor DepositionLamouroux, E. / Alric, E. / Casellas, H. / Valade, L. / De Caro, D. / Etienne, M. / Gatteschi, D. / Electrochemical Society et al. | 2003
- 1047
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CVD Growth of Carbon Nanotubes: Catalyst, Growth, and StructureDelzeit, L. / McAninch, I. / Matthews, K. / Ng, H. T. / Stevens, R. / Meyyappan, M. M. M. / Electrochemical Society et al. | 2003
- 1056
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Synthesis of Carbon Nanotubes on Metallic Substrates by PECVD Thermal CVDPark, D. / Kim, Y. H. / Lee, J. K. / Electrochemical Society et al. | 2003
- 1064
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Macroscopic and Microscopic Investigations on the LPCVD Fabrication of Silicon Nanodots on Oxidized Silicon WafersBlanquet, E. / Donnadieu, P. / Schouler, M.-C. / Simon, J.-P. / Maret, M. / Pons, M. / Cocheteau, V. / Caussat, B. / Scheid, E. / Mur, P. et al. | 2003
- 1072
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CVD-Based Preparation Routes of Single-Walled Carbon Nanotubes with Controlled ArchitecturesTerranova, M. L. / Orlanducci, S. / Sessa, V. / Botti, S. / Electrochemical Society et al. | 2003
- 1079
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Investigation of Nanocrystalline Diamond Films Prepared by Microwave Plasma Chemical Vapor DepositionKulisch, C. P. W. / Electrochemical Society et al. | 2003
- 1086
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Nanocrystalline SiC~xN~y films: RPECVD Synthesis and Transformation Under Thermal AnnealingFainer, N. I. / Kosinova, M. L. / Rumyantsev, Y. M. / Ayupov, B. M. / Kolesov, B. A. / Kuznetsov, F. A. / Boronin, A. I. / Koscheev, C. V. / Terauchi, M. / Shibata, K. et al. | 2003
- 1094
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Plasma Enhanced Chemical Vapour Deposition of AlN NanolayersBeshkov, G. / Grigorov, K. / Maciel, H. / Oliveira, I. C. / Georgiev, S. / Electrochemical Society et al. | 2003
- 1098
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Nano structures of Group-III Nitrides by MOCVD Using Molecular PrecursorsKhanderi, J. / Wohlfart, A. / Parala, H. / Devi, A. / Fischer, R. A. / Electrochemical Society et al. | 2003
- 1104
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Nanoscale ZnS and CdS Thin Films from Single-Source Molecular PrecursorsArmelao, L. / Barreca, D. / Bottaro, G. / Gasparotto, A. / Maragno, C. / Sada, C. / Spalding, T. R. / Tondello, E. / Electrochemical Society et al. | 2003
- 1112
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Nanostructured Cerium Dioxide Thin Films by MOCVD: Influence of the Substrate Nature and Processing ParametersMalandrino, G. / Nigro, R. L. / Toro, R. / Fragala, I. / Electrochemical Society et al. | 2003
- 1119
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Nanoscale CeO~2-ZrO~2 Thin Films: A Combined Approach by CVD and Sol-Gel RoutesArmelao, L. / Barreca, D. / Bigliani, L. / Bottaro, G. / Gasparotto, A. / Tondello, E. / Electrochemical Society et al. | 2003
- 1123
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Preparation of Thin Films and Nanoparticles of Zinc Oxide Using Alkylzinc AlkoxidesCho, W. / Sung, K. / An, K.-S. / Lee, S. S. / Kim, C. G. / Kim, Y. / Electrochemical Society et al. | 2003
- 1131
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Nanostructured TiO~2 Films Deposited by MOCVD on Si-SubstratesBackman, U. / Auvinen, A. / Jokiniemi, J. / Electrochemical Society et al. | 2003
- 1138
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SAXS/WAXD on Thermally Annealed Nanostructured CVD-Obtained TiO~2 FilmsLaveeviae, M. L. / Posedel, D. / Turkoviae, A. / Electrochemical Society et al. | 2003
- 1146
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Ordered Nanostructure Observed in ZnO Films Grown by MOCVD at 320^oCChang, Y. / Lu, H. / Hung, Y. / Lee, C. / Qiu, J. / Li, X. / Electrochemical Society et al. | 2003
- 1153
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Pure and Lu(III)-Doped Nanocrystalline ZnO Films by CVDBarreca, D. / Battiston, G. A. / Berto, D. / Convertino, A. / Gasparotto, A. / Gerbasi, R. / Tondello, E. / Viticoli, S. / Electrochemical Society et al. | 2003
- 1161
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Photothermal Aerosol Synthesis of and Photoluminescence from Silicon NanoparticlesLi, X. / He, Y. / Swihart, M. / Electrochemical Society et al. | 2003
- 1168
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MOCVD of Nanocrystalline Fe~2O~3-ZrO~2 and Fe~2O~3-Y~2O~3-ZrO~2 Thin FilmsBattiston, G. A. / Gerbasi, R. / Berto, D. / Barreca, D. / Tondello, E. / Electrochemical Society et al. | 2003
- 1174
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Lead Containing Perovskite Films and Superlattices Grown by MOCVD in Self-Tuning ModeBosak, A. / Gorbenko, O. / Kaul, A. / Mirin, I. G. N. / Gudenko, S. / Dubourdieu, C. / Senateur, J.-P. / Electrochemical Society et al. | 2003
- 1182
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Polycrystalline Copper Nanowires and Networks with 100-Nanometer Radius Observed in MOCVDChang, Y. / Chen, Y. / Wu, R. / Chen, K. / Lin, J. / Electrochemical Society et al. | 2003
- 1190
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Microcoiled Carbon Fibers Formed by Using Ni-Cu Catalysts in CVD ProcessChen, X. / Takeuchi, K. / Yang, S. / Hishikawa, Y. / Motojima, S. / Electrochemical Society et al. | 2003
- 1198
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Vapor Phase Preparation of Carbon Microcoils/Nanocoils Under Concerted Amplification of Magnetic Field Their PropertiesMotojima, S. / Kuzuya, K. / Yang, S. / Chen, X. / Hashishin, T. / Iwanaga, H. / Shimada, S. / Saito, H. / Yoshikawa, N. / Awaji, T. et al. | 2003
- 1198
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Vapor phase preparation of carbon microcoils and nanocoils under concerted amplification of high magnetic field and their propertiesMotojima, S. / Kuzuya, K. / Yang, S. / Chen, X. / Hashishin, T. / Iwanaga, H. / Shimada, S. / Saito, H. / Yoshikawa, N. / Awaji, T. et al. | 2003
- 1206
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Carbon Micro/Nanocoils Produced by Using WS~2 Catalyst in CVD ProcessYang, S. / Chen, X. / Motojima, S. / Electrochemical Society et al. | 2003
- 1212
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Thermodynamic and Experimental Approaches of Barrier Materials Synthesis for Silicon IC TechnologyBlanquet, E. / Chenevier, B. / Ramberg, E. / Bernard, C. / Madar, R. / Electrochemical Society et al. | 2003
- 1224
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Deposition and Treatment of Titanium Based Barrier Layers by MOCVDEcke, R. / Schulz, S. E. / Gessner, T. / Riedel, S. / Lipp, E. / Eizenberg, M. / Electrochemical Society et al. | 2003
- 1231
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Nitrogen-Free Cu Barrier SiOCH Film with k = 4.3Nishimoto, Y. / Shioya, Y. / Shimoda, H. / Ohdaira, T. / Suzuki, R. / Maeda, K. / Electrochemical Society et al. | 2003
- 1239
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Cu Barrier Property of Low-K SiOCH Film with k = 3.5 Deposited by PE-CVD Using HMDSO and N~2O GasesShioya, Y. / Nishimoto, Y. / Ohdaira, T. / Suzuki, R. / Maeda, K. / Electrochemical Society et al. | 2003
- 1247
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MOCVD of CrSi~xC~y Thin Films: Study of Their Potentiality as Diffusion BarrierDuminica, F. D. / Maury, F. / Electrochemical Society et al. | 2003
- 1255
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Cr~3(C,N)~2 Thin Films Grown by MOCVD as Barrier Against Copper DiffusionGasqueres, C. / Maury, F. / Electrochemical Society et al. | 2003
- 1262
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Growth and Characterization of Ti-Al-N Films Prepared by Plasma-Enhanced Atomic Layer Deposition of TiN and AlNLee, Y. J. / Kang, S.-W. / Electrochemical Society et al. | 2003
- 1268
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Structural Comparison Between Cu(hfac)(VTMS) and Cu(hfac)(MHY): An Answer to Differences in Copper Film DepositionJoulaud, M. / Omnes, L. / Mourier, T. / Mayer, D. / Doppelt, P. / Electrochemical Society et al. | 2003
- 1275
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MOCVD of Copper Films From Bis(ethyl-3-oxo-butanoato)copper(II): Experiment and Thermodynamic AnalysisMukhopadhyay, S. / Shalini, K. / Devi, A. / Shivashankar, S. A. / Electrochemical Society et al. | 2003
- 1284
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Preparation of Cu Thin Films by MOCVD Using Novel Organometallic Cu(II) PrecursorsKim, C. G. / Park, J. W. / Chung, T.-M. / Lee, S. S. / Kim, Y. / Electrochemical Society et al. | 2003
- 1290
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Low Temperature Cu Thin Film Growth Using Cycles of Alternate Supply of (HFAC)Cu(I)(DMB) and Ar Purge GasYong, K. K. K. / Electrochemical Society et al. | 2003
- 1297
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Thin Copper Films Prepared by CVD from (HFA)Cu (1.5-COD)Panin, A. / Shugurov, A. / Liskovskaya, T. / Igumenov, I. / Ivonin, I. / Oskomov, K. / Electrochemical Society et al. | 2003
- 1305
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Copper Dots Deposition Using New Precuresors [Cu^1(hfac)]~2(DVTMSO) and [Cu^1(hfac)]~2(HD)Kang, S.-W. / Yun, J.-H. / Rhee, S.-W. / Krisyuk, V. / Turgambaeva, A. / Electrochemical Society et al. | 2003
- 1313
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Copper Film Deposition with Cu(dpm)~2 PrecursorBakovets, V. V. / Levashova, T. M. / Dolgovesova, I. P. / Maximovski, E. A. / Electrochemical Society et al. | 2003
- 1318
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Comparative Study of Cu-Precursors for 3D Focused Electron Beam Induced DepositionLuisier, A. / Utke, I. / Bret, T. / Cicoira, F. / Hauert, R. / Rhee, S.-W. / Doppelt, P. / Hoffmann, P. / Electrochemical Society et al. | 2003
- 1327
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MOCVD of Ir-Al~2O~3 Protective CoatingsIgumenov, I. K. / Gelfond, N. V. / Morozova, N. B. / Semyannikov, P. P. / Trubin, S. V. T. / Danilovich, V. S. / Gimeno-Fabra, L. / Electrochemical Society et al. | 2003
- 1335
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Investigation of Chemical Vapor Deposition Processes to Perform Dense alpha-Alumina Coating on SuperalloysBahlawane, N. / Blittersdorf, S. / Kohse-Hoinghaus, K. / Atakan, B. / Muller, J. / Electrochemical Society et al. | 2003
- 1343
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Diamond Nucleation on Silicon Using an Intermediate Temperature StepDumitrescu-Buforn, L. / Blank, E. / Electrochemical Society et al. | 2003
- 1351
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Growth of ECR-CVD Carbon Nitride Films With a High Nitrogen Content from CH~4/N~2/Ar MixturesCamero, M. / Gomez-Aleixandre, C. / Albella, J. M. / Electrochemical Society et al. | 2003
- 1357
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Growth of Si and Ge Quantum Dots on Insulators by LPCVDBaron, T. / Mazen, F. / Perniola, I. / Pelissier, B. / Hartmann, J. M. / Damlencourt, J. F. / Electrochemical Society et al. | 2003
- 1364
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Fabrication Characteristics of Midgap Metal Gates Compatible With Thin SiO~2 Films Using Low Pressure Chemically Vapor Deposited Tungsten FilmsKouvatsos, D. N. / Ioannou-Sougleridis, V. / Tsevas, S. / Davazoglou, D. / Christoforou, F. / Boukouras, C. / Electrochemical Society et al. | 2003
- 1364
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Fabrication and characteristics of midgap metal gates compatible with thin SiO2 films using low pressure chemically vapor deposited tungsten filmsKouvatsos, D.N. / Ionnou-Sougleridis, V. / Tsevas, S. / Davazoglou, D. / Christoforou, F. / Boukouras, C. et al. | 2003
- 1372
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Low Pressure Chemical Vapor Deposition of Silicon Nitride Using Mono- and DisilylamineDussarrat, C. / Girard, J.-M. / Kimura, T. / Tamaoki, N. / Sato, Y. / Electrochemical Society et al. | 2003
- 1380
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Very Thin (<10nm) Silicon Oxynitride (SiO~xN~y) Layers Formed by PECVDBeck, R. B. / Cuch, M. / Wojtkiewicz, A. / Kudla, A. / Jakubowski, A. / Electrochemical Society et al. | 2003
- 1387
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Titanium Phosphide Coatings From the Atmospheric Pressure CVD Reaction of TiCl~4 with PR~xH~3~-~x (R = cy^h^e^x; or R = SiMe~3 where x = 3)Blackman, C. / Carmalt, C. / O Neill, S. / Parkin, I. / Molloy, K. / Apostolico, L. / Electrochemical Society et al. | 2003
- 1395
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An n^+-InGaAs/n-GaAs Dual-Doped-Channel Heterostructure Field-Effect Transistor (DDC-HFET) Grown by LP-MOCVDChuang, H.-M. / Lin, K.-W. / Yu, K.-H. / Chen, C.-Y. / Chen, J.-Y. / Lai, P.-H. / Kao, C.-I. / Liu, W.-C. / Electrochemical Society et al. | 2003
- 1403
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Study of Deposition Processes in PZT Films Grown by Liquid Delivery MOCVDKurasawa, M. / Nakabayashi, M. / Nakamura, K. / Maruyama, K. / Eshita, T. / Kurihara, K. / Electrochemical Society et al. | 2003
- 1411
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Effect of Solvent on the Deposition Behavior of MOCVD-Pb(Zr,Ti)O~3 Films Using Liquid-Deliver Source Supply SystemFunakubo, H. / Asano, G. / Ozeki, T. / Machida, H. / Yoneyama, T. / Takamatsu, Y. / Electrochemical Society et al. | 2003
- 1419
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Deposition of Yttrium or Lanthanum-Substituted Bismuth Titanate Films by Direct Liquid Injection-Metal Organic Chemical Vapor Deposition for Use in Non-Volatile MemoriesKang, S.-W. / Rhee, S.-W. / Electrochemical Society et al. | 2003
- 1426
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Tin Phosphide Coatings from the Atmospheric Pressure Chemical Vapour Deposition of SnCl~4 and Pcyc^h^e^x~xH~3~-~xBinions, R. / Carmalt, C. J. / Parkin, I. P. / Electrochemical Society et al. | 2003
- 1434
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Optical Thin Fillm Coatings of CVD Molybdenum Oxides and Investigations of Their Electrochromic PropertiesIvanova, T. / Gesheva, K. A. / Electrochemical Society et al. | 2003
- 1442
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Fabrication of electrochromic displays by chemically vapor depositing and patterning WO3 films on SnO2:F covered glass substratesVassilopoulou, M. / Pappas, D. / Raptis, I. / Dazazoglou, D. / Kostis, I. et al. | 2003
- 1442
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Fabrication of Electrochromic Displays by Chemically Vapor Depositing Patterning WO~3 Films on SnO~2:F Covered Glass SubstratesVassilopoulou, M. / Pappas, D. / Raptis, I. / Kostis, D. D. I. / Electrochemical Society et al. | 2003
- 1448
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Characterization of Vanadium Oxide Films Prepared by Atmospheric Pressure Chemical Vapour DepositionVernardou, D. / Pemble, M. E. / Sheel, D. / Ivan, T. D. M. / Parkin, P. / Electrochemical Society et al. | 2003
- 1455
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Chemical Vapor Deposition of Co~3O~4 on Honeycomb Substrates for Catalytic ApplicationsRivera, E. F. / Atakan, B. / Kohse-Hoinghaus, K. / Electrochemical Society et al. | 2003
- 1463
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Preparation of Pd/Zn/ZnO Catalysts for Methanol Steam Reforming by MOCVDPopovska, N. / Kiesslich, F. / Emig, G. / Electrochemical Society et al. | 2003
- 1471
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Sub-Estioquiometric Titania Layers Prepared by MOCVD for Photocatalysis ApplicationsJusticia, I. / Garcia, G. / Battiston, G. A. / Gerbasi, R. / Figueras, A. / Dorignac, D. / Electrochemical Society et al. | 2003
- 1477
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MOCVD of TiO~2 Thin Films Using a New Class of Metalorganic PrecursorsBhakta, R. / Patil, U. / Devi, A. / Electrochemical Society et al. | 2003
- 1484
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Polycrystalline Spinel Chromite ZnCr~2O~4 Films Prepared by MOCVDChang, Y. / Pen, H. / Chung, C. / Electrochemical Society et al. | 2003
- 1492
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A Study on (311) CuCr~2O~4 Spinel Films Prepared by MOCVDChang, Y. / Lin, C. / Lee, B. / Electrochemical Society et al. | 2003
- 1500
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Comparative Study of MOCVD Platinum Thin films Obtained by the Use of Liquid Injection System or Conventional BubblerValet, O. / Doppelt, P. / Baumann, P. K. / Schumacher, M. / Beuran, F. C. / Guillon, H. / Electrochemical Society et al. | 2003
- 1508
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New Yttrium Precursors for YBCO Films Prepared by PI-MOCVDTerrematte, J. / Daniele, S. / Hubert-Pfalzgraf, L. G. / Decams, J. M. / Le Gall, S. / Guillon, H. / Beauquis, S. / Ng, P. H. / Jimenez, C. / Weiss, F. et al. | 2003
- 1514
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Novel Compounds for use as TiO~2 Precursors in Thin Film Deposition by Liquid Injection MOCVDClarke, C. L. / Boag, N. M. / Pemble, M. E. / Electrochemical Society et al. | 2003
- 1522
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Buffer Layers and YBCO Growth on Ni Rabit TapesDonet, S. / Weiss, F. / Chaudouet, P. / Electrochemical Society et al. | 2003
- 1528
-
PI-MOCVD Original Buffer Layers for YBa~2Cu~3O~7~-~d~e~l~t~a Coated ConductorsBeauquis, S. / Donet, S. / Weiss, F. / Roussel, H. / Abrutis, A. / Electrochemical Society et al. | 2003
- 1540
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CVD Of Thin Oxygen Permeable Membrane FilmsMuydinov, R. / Novojilov, M. / Gorbenko, O. / Korsakov, I. / Kaul, A. / Stiens, D. / Samoilenkov, S. / Wahl, G. / Electrochemical Society et al. | 2003
- 1547
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Preparation Of Tl-1223 Superconducting Films With High Transport J~c by Spray PyrolysisPhok, S. / Galez, P. / Jorda, J. L. / De Barros, D. / Weiss, F. / Peroz, C. / Villard, C. / Electrochemical Society et al. | 2003