Fabrication of Porogen Residue Free Ultra Low-k PECVD Material by Subsequent H~2-Afterglow Plasma Treatment and UV Curing (Englisch)
- Neue Suche nach: Urbanowicz, A.M.
- Neue Suche nach: Vanstreels, K.
- Neue Suche nach: Verdonck, P.
- Neue Suche nach: Shamiryan, D.
- Neue Suche nach: Cremel, M.
- Neue Suche nach: De Gendt, S.
- Neue Suche nach: Baklanov, M.R.
- Neue Suche nach: University of California, Berkeley
- Neue Suche nach: Urbanowicz, A.M.
- Neue Suche nach: Vanstreels, K.
- Neue Suche nach: Verdonck, P.
- Neue Suche nach: Shamiryan, D.
- Neue Suche nach: Cremel, M.
- Neue Suche nach: De Gendt, S.
- Neue Suche nach: Baklanov, M.R.
- Neue Suche nach: Edelstein, D.C.
- Neue Suche nach: Schulz, S.E.
- Neue Suche nach: University of California, Berkeley
In:
Advanced metallization
;
65-74
;
2010
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ISBN:
- Aufsatz (Konferenz) / Print
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Titel:Fabrication of Porogen Residue Free Ultra Low-k PECVD Material by Subsequent H~2-Afterglow Plasma Treatment and UV Curing
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Beteiligte:Urbanowicz, A.M. ( Autor:in ) / Vanstreels, K. ( Autor:in ) / Verdonck, P. ( Autor:in ) / Shamiryan, D. ( Autor:in ) / Cremel, M. ( Autor:in ) / De Gendt, S. ( Autor:in ) / Baklanov, M.R. ( Autor:in ) / Edelstein, D.C. / Schulz, S.E. / University of California, Berkeley
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Kongress:Conference, Advanced metallization ; 2009 ; Baltimore, MD
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Erschienen in:Advanced metallization ; 65-74
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Verlag:
- Neue Suche nach: Materials Research Society
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Erscheinungsort:Warrendale, Pa.
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Erscheinungsdatum:01.01.2010
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Format / Umfang:10 pages
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Anmerkungen:Includes bibliographical references and indexes
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ISBN:
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Medientyp:Aufsatz (Konferenz)
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Format:Print
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
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