Ion Bombardment during Plasma-Assisted Atomic Layer Deposition (Englisch)
- Neue Suche nach: Profijt, H.B.
- Neue Suche nach: Kessels, W.
- Neue Suche nach: Electrochemical Society; Electrochemical Society of Japan
- Neue Suche nach: Profijt, H.B.
- Neue Suche nach: Kessels, W.
- Neue Suche nach: Elam, J.W.
- Neue Suche nach: Electrochemical Society; Electrochemical Society of Japan
In:
Atomic layer deposition application
13
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23-34
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2012
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ISBN:
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ISSN:
- Aufsatz (Konferenz) / Print
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Titel:Ion Bombardment during Plasma-Assisted Atomic Layer Deposition
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Beteiligte:Profijt, H.B. ( Autor:in ) / Kessels, W. ( Autor:in ) / Elam, J.W. / Electrochemical Society; Electrochemical Society of Japan
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Kongress:Symposium; 8th, Atomic layer deposition application ; 2012 ; Honolulu, HI
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Erschienen in:Atomic layer deposition application , 13 ; 23-34ECS TRANSACTIONS, ISSN 1938-5862 ; VOL 50 NO 13 2012 ; 50, 13 ; 23-34
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Verlag:
- Neue Suche nach: Electrochemical Society
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Erscheinungsort:Pennington, N.J.
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Erscheinungsdatum:01.01.2012
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Format / Umfang:12 pages
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Anmerkungen:Includes bibliographical references and index; Held during the PRiME 2012 joint international meeting of the Electrochemical Society and the Electrochemical Society of Japan
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ISBN:
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ISSN:
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Medientyp:Aufsatz (Konferenz)
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Format:Print
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
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Inhaltsverzeichnis Konferenzband
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- 3
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Fabrication of Sb~2Te~3 and Bi~2Te~3 Multilayer Composite Films by Atomic Layer DepositionZhang, K. / Nminibapiel, D. / Tangirala, M. / Baumgart, H. / Kochergin, V. / Electrochemical Society; Electrochemical Society of Japan et al. | 2012
- 11
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Trimethylaluminum-Based Atomic Layer Deposition of MO2 (M=Zr, Hi) Gate Dielectrics on In0.53Ga0.47As(001) SubstratesMolle, A. / Cianci, E. / Lamperti, A. / Wiemer, C. / Baldovino, S. / Lamagna, L. / Spiga, S. / Fanciulli, M. / Brammertz, G. / Merckling, C. et al. | 2012
- 11
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Trimethylaluminum-Based Atomic Layer Deposition of MO~2 (M=Zr, Hf) Gate Dielectrics on In~0~.~5~3Ga~0~.~4~7As(001) SubstratesMolle, A. / Cianci, E. / Lamperti, A. / Wiemer, C. / Baldovino, S. / Lamagna, L. / Spiga, S. / Fanciulli, M. / Brammertz, G. / Merckling, C. et al. | 2012
- 23
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Ion Bombardment during Plasma-Assisted Atomic Layer DepositionProfijt, H.B. / Kessels, W. / Electrochemical Society; Electrochemical Society of Japan et al. | 2012
- 35
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In Situ Study of ALD Processes Using Synchrotron-based X-ray Fluorescence and Scattering TechniquesDendooven, J. / Devloo-Casier, K. / Ide, M. / Grandfield, K. / Ludwig, K.F. / Bals, S. / Van Der Voort, P. / Detavernier, C. / Electrochemical Society; Electrochemical Society of Japan et al. | 2012
- 43
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In Situ FTIR Characterization of Growth Inhibition in Atomic Layer Deposition Using Reversible Surface FunctionalizationYanguas-Gil, A. / Libera, J.A. / Elam, J.W. / Electrochemical Society; Electrochemical Society of Japan et al. | 2012
- 53
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Solution Reactivity Studies for Identification of Promising New ALD and Pulsed CVD Reaction ChemistriesVidjayacoumar, B. / Ramalingam, V. / Emslie, D.J. / Blackwell, J. / Clendenning, S. / Electrochemical Society; Electrochemical Society of Japan et al. | 2012
- 69
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Crystallization Study by Transmission Electron Microscopy of SrTiO~3 Thin Films Prepared by Plasma-Assisted ALDLongo, V. / Roozeboom, F. / Kessels, W. / Verheijen, M.A. / Electrochemical Society; Electrochemical Society of Japan et al. | 2012
- 79
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TiO~2-Based Metal-Insulator-Metal Structures for Future DRAM Storage CapacitorsFrohlich, K. / Hudec, B. / Tapajna, M. / Husekova, K. / Rosova, A. / Elias, P. / Aarik, J. / Rammula, R. / Kasikov, A. / Arroval, T. et al. | 2012
- 89
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Plasma Surface Modification of Blown Polyethylene Films for Uniform Atomic Layer Deposition of Al~2O~3Lee, G. / Son, K. / Park, S. / Shim, J. / Choi, B. / Electrochemical Society; Electrochemical Society of Japan et al. | 2012
- 93
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Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALDPotts, S.E. / Profit, H.B. / Roelofs, R. / Kessels, W. / Electrochemical Society; Electrochemical Society of Japan et al. | 2012
- 107
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Growth Characteristics and Properties of Yttrium Oxide Thin Films by Atomic Layer Deposition from Novel Y(iPrCp)~3 Precursor and O~3Xu, R. / Selvaraj, S. / Azimi, N. / Takoudis, C.G. / Electrochemical Society; Electrochemical Society of Japan et al. | 2012
- 117
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Electrocatalytic Activity of Pt Grown by ALD on Carbon Nanotubes for Si-Based DMFC ApplicationsJohansson, A. / Dalslet, B. / Yang, R. / Haugshoj, K. / Molgaard, M. / Christiansen, K. / Christensen, L.H. / Thomsen, E.V. / Electrochemical Society; Electrochemical Society of Japan et al. | 2012
- 127
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High Performance Core-Shell Nanowire Array Devices Prepared by Atomic Layer DepositionKim, H. / Ko, K. / Kang, H. / Electrochemical Society; Electrochemical Society of Japan et al. | 2012
- 137
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Metal Oxide ALD Films for Low Power Sensor ApplicationsBlauw, M.A. / Dam, V.T. / Calama, M.C. / Brongersma, S.H. / Electrochemical Society; Electrochemical Society of Japan et al. | 2012
- 141
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Enabling High Performance Mirrors for Astronomy with ALDGreer, F. / Lee, M.C. / Nikzad, S. / Traub, W. / Beasley, M. / Electrochemical Society; Electrochemical Society of Japan et al. | 2012
- 151
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Atomic Layer Deposition of TiN/Al~2O~3/TiN Nanolaminates for Capacitor ApplicationsAssaud, L. / Hanbucken, M. / Santinacci, L. / Electrochemical Society; Electrochemical Society of Japan et al. | 2012
- 159
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Impact of Direct Plasma Densification on Resistivity and Conformality of PEALD Tantalum Nitridevan der Straten, O. / Zhang, X. / Penny, C. / Maniscalco, J. / Chiang, S. / Ren, J. / Ma, P. / Electrochemical Society; Electrochemical Society of Japan et al. | 2012
- 165
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Atomic Layer Deposition of Ruthenium in Various Precursors and Oxygen DosesKim, J. / Son, K. / Kim, B. / Kim, W. / Shim, J. / Electrochemical Society; Electrochemical Society of Japan et al. | 2012
- 175
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Synthesis of VO~2 Thin Films by Atomic Layer Deposition with TEMAV as PrecursorZhang, K. / Tangirala, M. / Nminibapiel, D. / Cao, W. / Pallem, V. / Dussarrat, C. / Baumgart, H. / Electrochemical Society; Electrochemical Society of Japan et al. | 2012