Evaluation of novel hydrophilic derivatives for chemically amplified EUV resists [9051-81] (Englisch)
- Neue Suche nach: Tanagi, H.
- Neue Suche nach: Tanaka, H.
- Neue Suche nach: Hayakawa, S.
- Neue Suche nach: Furukawa, K.
- Neue Suche nach: Yamamoto, H.
- Neue Suche nach: Kozawa, T.
- Neue Suche nach: Tanagi, H.
- Neue Suche nach: Tanaka, H.
- Neue Suche nach: Hayakawa, S.
- Neue Suche nach: Furukawa, K.
- Neue Suche nach: Yamamoto, H.
- Neue Suche nach: Kozawa, T.
- Neue Suche nach: Wallow, Thomas I.
- Neue Suche nach: Hohle, Christoph K.
In:
Advances in patterning materials and processes; XXXI
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9051 25
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2014
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ISBN:
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ISSN:
- Aufsatz (Konferenz) / Print
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Titel:Evaluation of novel hydrophilic derivatives for chemically amplified EUV resists [9051-81]
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Beteiligte:Tanagi, H. ( Autor:in ) / Tanaka, H. ( Autor:in ) / Hayakawa, S. ( Autor:in ) / Furukawa, K. ( Autor:in ) / Yamamoto, H. ( Autor:in ) / Kozawa, T. ( Autor:in ) / Wallow, Thomas I. / Hohle, Christoph K.
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Kongress:Conference; 31st, Advances in patterning materials and processes; XXXI ; 2014 ; San Jose, CA
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Erschienen in:PROCEEDINGS - SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING ; 9051 ; 9051 25
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Verlag:
- Neue Suche nach: SPIE
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Erscheinungsort:Bellingham, Washington
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Erscheinungsdatum:01.01.2014
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Format / Umfang:9051 25
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Anmerkungen:"SPIE Advanced Lithography" --cover. Includes bibliographical references and index.
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ISBN:
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ISSN:
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Medientyp:Aufsatz (Konferenz)
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Format:Print
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Inhaltsverzeichnis Konferenzband
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 90510A
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Assessing SEM contour based OPC models quality using rigorous simulationWeisbuch, Francois / Samy Naranaya, Aravind et al. | 2014
- 90510B
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SEM simulation for 2D and 3D inspection metrology and defect reviewLevi, Shimon / Schwartsband, Ishai / Khristo, Sergey / Ivanchenko, Yan / Adan, Ofer et al. | 2014
- 90510D
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Chiral nanomaterial fabrication by means of on-edge lithographyDietrich, Kay / Lehr, Dennis / Puffky, Oliver / Kley, Ernst-Bernhard / Tünnermann, Andreas et al. | 2014
- 90510E
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Positive tone cross-linked resists based on photoacid inhibition of cross linkingLawson, Richard A. / Chun, Jun Sung / Neisser, Mark / Tolbert, Laren M. / Henderson, Clifford L. et al. | 2014
- 90510G
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Nanopatterning with tailored moleculesWieberger, Florian / Kolb, Tristan / Neuber, Christian / Ober, Christopher K. / Schmidt, Hans-Werner et al. | 2014
- 90510H
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Line width roughness reduction by rational design of photoacid generator for sub-millisecond laser post-exposure bakeJiang, Jing / Thompson, Michael O. / Ober, Christopher K. et al. | 2014
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Process optimization of templated DSA flowsGronheid, Roel / Bekaert, Joost / Murugesan Kuppuswamy, Vijaya-Kumar / Vandenbroeck, Nadia / Doise, Jan / Cao, Yi / Lin, Guanyang / Sayan, Safak / Parnell, Doni / Somervell, Mark et al. | 2014
- 90510J
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Anin-situhard mask block copolymer approach for the fabrication of ordered, large scale, horizontally aligned, Si nanowire arrays on Si substrateGhoshal, Tandra / Senthamaraikannan, Ramsankar / Shaw, Matthew T. / Holmes, Justin D. / Morris, Michael A. et al. | 2014
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Investigation of cross-linking poly(methyl methacrylate) as a guiding material in block copolymer directed self-assemblySeidel, Robert / Rincon Delgadillo, Paulina / Ramirez-Hernandez, Abelardo / Wu, Hengpeng / Her, Youngjun / Yin, Jian / Nealey, Paul / de Pablo, Juan / Gronheid, Roel et al. | 2014
- 90510L
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Novel surface treatment materials for aligning block-co-polymer in directed self-assembly processesSomeya, Yasunobu / Wakayama, Hiroyuki / Endo, Takafumi / Sakamoto, Rikimaru et al. | 2014
- 90510M
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Directed self-assembly process integration: Fin patterning approaches and challengesSayan, Safak / Chan, B. T. / Gronheid, Roel / Van Roey, Frieda / Kim, Min-Soo / Williamson, Lance / Nealey, Paul et al. | 2014
- 90510N
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High-volume manufacturing equipment and processing for directed self-assembly applicationsSomervell, Mark / Yamauchi, Takashi / Okada, Soichiro / Tomita, Tadatoshi / Nishi, Takanori / Iijima, Etsuo / Nakano, Takeo / Ishiguro, Takumi / Nagahara, Seiji / Iwaki, Hiroyuki et al. | 2014
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Anin situanalysis of resist dissolution in alkali-based and organic solvent-based developers using high speed atomic force microscopySantillan, Julius Joseph / Shichiri, Motoharu / Itani, Toshiro et al. | 2014
- 90510P
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In-situ analysis of defect formation in coat develop track processHarumoto, Masahiko / Stokes, Harold / Tamada, Osamu / Miyagi, Tadashi / Kaneyama, Koji / Pieczulewski, Charles / Asai, Masaya et al. | 2014
- 90510Q
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Methods of controlling cross-linking in negative-tone resistsLawson, Richard A. / Chun, Jun Sung / Neisser, Mark / Tolbert, Laren M. / Henderson, Clifford L. et al. | 2014
- 90510R
-
How to design a good photoresist solvent package using solubility parameters and high-throughput researchTate, Michael P. / Cutler, Charlotte / Sakillaris, Mike / Kaufman, Michael / Estelle, Thomas / Mohler, Carol / Tucker, Chris / Thackeray, Jim et al. | 2014
- 90510S
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ICE: Ionic contrast enhancement for organic solvent negative tone developSundberg, Linda K. / Wallraff, Gregory M. / Bozano, Luisa D. / Truong, Hoa D. / Sanchez, Martha I. / Goldfarb, Dario L. / Petrillo, Karen E. / Hinsberg, William D. et al. | 2014
- 90510T
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Introduction of an innovative water based photoresist stripping process using intelligent fluidsRudolph, Matthias / Thrun, Xaver / Schumann, Dirk / Hoehne, Anita / Esche, Silvio / Hohle, Christoph et al. | 2014
- 90510U
-
Reduction of image placement error on photomask-making for multiple patterningHiromatsu, Takahiro / Fukui, Toru / Tsukagoshi, Kenta / Ono, Kazunori / Hashimoto, Masahiro et al. | 2014
- 90510V
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Robust complementary technique with multiple-patterning for sub-10 nm node deviceOyama, Kenichi / Yamauchi, Shohei / Natori, Sakurako / Hara, Arisa / Yamato, Masatoshi / Yaegashi, Hidetami et al. | 2014
- 90510W
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Advanced develop processes for reducing defects related with e-beam resistsLee, Byunghoon / Han, Sung-Jae / Moon, Se-Gun / Kim, Hee Bom et al. | 2014
- 90510X
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Recent progress on multiple-patterning processYaegashi, Hidetami / Oyama, Kenichi / Hara, Arisa / Natori, Sakurako / Yamauchi, Shohei / Yamato, Masatoshi et al. | 2014
- 90510Y
-
Novel and cost-effective multiple patterning technology by means of invisible SiOxNy hardmaskJang, Linus / Moon, Young Joon / Kim, Ryoung-Han / Bencher, Christopher / Dai, Huixiong / Xie, Peng / Diehl, Daniel L. / Cao, Yong / Zeng, Wilson / Ngai, Christopher S. et al. | 2014
- 90510Z
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Manufacturability considerations for DSAFarrell, Richard A. / Hosler, Erik R. / Schmid, Gerard M. / Xu, Ji / Preil, Moshe E. / Rastogi, Vinayak / Mohanty, Nihar / Kumar, Kaushik / Cicoria, Michael J. / Hetzer, David R. et al. | 2014
- 90511A
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Patterning chemistry of HafSOx resistAmador, Jenn M. / Decker, Shawn R. / Lucchini, Stefan E. / Ruther, Rose E. / Keszler, Douglas A. et al. | 2014
- 90511B
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EUV resists based on tin-oxo clustersCardineau, Brian / Del Re, Ryan / Al-Mashat, Hashim / Marnell, Miles / Vockenhuber, Michaela / Ekinci, Yasin / Sarma, Chandra / Neisser, Mark / Freedman, Daniel A. / Brainard, Robert L. et al. | 2014
- 90511C
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Inhomogeneity of PAGs in resist film studied by molecular-dynamics simulations for EUV lithographyToriumi, Minoru / Itani, Toshiro et al. | 2014
- 90511E
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Innovative solutions on 193 immersion-based self-aligned multiple patterningNatori, Sakurako / Yamauchi, Shohei / Hara, Arisa / Yamato, Masatoshi / Oyama, Kenichi / Yaegashi, Hidetami et al. | 2014
- 90511F
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Wet particle source identification and reduction using a new filter cleaning processUmeda, Toru / Morita, Akihiko / Shimizu, Hideki / Tsuzuki, Shuichi et al. | 2014
- 90511G
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Adsorption characteristics of lithography filters in various solvents using application-specific ratingsUmeda, Toru / Tsuzuki, Shuichi et al. | 2014
- 90511H
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Removal of highly crosslinked resists and hybrid polymers for single micro parts fabrication and nanoimprint stamp reworkVoigt, Anja / Engelke, Rainer / Ahrens, Gisela / Bullerjahn, Franziska / Schleunitz, Arne / Klein, Jan J. / Grützner, Gabi et al. | 2014
- 90511J
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Characterization of chemically amplified resists for electron beam lithographyYamazaki, Tomoharu / Yamamoto, Hiroki / Kozawa, Takahiro / Wang, Wen-Chuan et al. | 2014
- 90511K
-
Improved adhesion of novolac and epoxy based resists by cationic organic materials on critical substrates for high volume patterning applicationsVoigt, Anja / Ahrens, Gisela / Heinrich, Marina / Thompson, Andrew / Gruetzner, Gabi et al. | 2014
- 90511L
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Spin on lithographic resist trim process optimization and process window evaluationKaranikas, Christos F. / Taylor, J. C. / Vaduri, Naveen / Islam, Tafsirul et al. | 2014
- 90511M
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Modeling acid transport in chemically amplified resist filmsPatil, Abhijit A. / Doxastakis, Manolis / Stein, Gila E. et al. | 2014
- 90511O
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Deprotonation mechanism of ionized poly(4-hydroxystyrene)Susa, Toshihiko / Okamoto, Kazumasa / Ishida, Takuya / Yamamoto, Hiroki / Kozawa, Takahiro / Fujiyoshi, Ryoko / Umegaki, Kikuo et al. | 2014
- 90511P
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Numerical analysis for resist profile after thermal process in display manufacturingDomnenko, Vitaliy / Stock, Hans-Jürgen / Shin, Sangmin / Ryu, Jonghyoek / Choi, Sung Won / Cho, Hyunwoo / Jeong, Eun-Soo / Choi, Jung-Hoe et al. | 2014
- 90511Q
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Photoresist analysis to investigate LWR generation mechanismMochida, Kenji / Nakamura, Shinichi / Kimura, Tooru / Kawai, Kazuki / Taguchi, Yoshihiko / Man, Naoki / Hashimoto, Hideki et al. | 2014
- 90511R
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Decreasing curing temperature of spin-on dielectrics by using additivesBae, Jin Hee / Han, Kwen Woo / Park, Eun Su / Yoon, Hui Chan / Na, Yoong Hee / Seo, Jin Woo / Lim, Wan Hee / Kim, Bo Sun / Jang, Jun Young / Cho, Younjin et al. | 2014
- 90511S
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Study of acid diffusion behaves form PAG by using top coat methodSekiguchi, Atsushi / Matsumoto, Yoko et al. | 2014
- 90511T
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Fluidity dependence of deprotonation kinetics of chemically amplified resistOkamoto, Kazumasa / Ishida, Takuya / Yamamoto, Hiroki / Kozawa, Takahiro / Fujiyoshi, Ryoko / Umegaki, Kikuo et al. | 2014
- 90511U
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Inorganic resist materials based on zirconium phosphonate for atomic force microscope lithographyKang, Mankyu / Kim, Seonae / Jung, JinHyuck / Kim, Heebom / Shin, Inkyun / Jeon, Chanuk / Lee, Haiwon et al. | 2014
- 90511W
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Organic-inorganic hybrid resists for EUVLSingh, Vikram / Kalyani, Vishwanath / Satyanarayana, V. S. V. / Pradeep, Chullikkattil P. / Ghosh, Subrata / Sharma, Satinder / Gonsalves, Kenneth E. et al. | 2014
- 90511X
-
Development of spin-on-carbon hard mask for advanced nodeKudo, Takanori / Rahman, M. Dalil / McKenzie, Douglas / Anyadiegwu, Clement / Doerrenbaecher, Sandra / Zahn, Wolfgang / Padmanaban, Munirathna et al. | 2014
- 90511Y
-
Effective resist profile controlLiu, Chen-Yu / Wang, Chien-Wei / Huang, Chun-Ching / Chang, Ching-Yu / Ku, Yao-Ching et al. | 2014
- 90511Z
-
Study on resist performance of chemically amplified molecular resist based on noria derivative and calixarene derivativeYamamoto, Hiroki / Kudo, Hiroto / Kozawa, Takahiro et al. | 2014
- 90512A
-
EUV resists comprised of main group organometallic oligomeric materialsPassarelli, James / Cardineau, Brian / Del Re, Ryan / Sortland, Miriam / Vockenhuber, Michaela / Ekinci, Yasin / Sarma, Chandra / Neisser, Mark / Freedman, Daniel A. / Brainard, Robert L. et al. | 2014
- 90512B
-
Novel spin-on metal hardmask materials for filling applicationsDioses, Alberto D. / Chada, Venkata / Wolfer, Elizabeth / Ng, Edward / Mullen, Salem / Yao, Huirong / Cho, JoonYeon / Padmanaban, Munirathna et al. | 2014
- 905101
-
Front Matter: Volume 9051| 2014
- 905106
-
Novel non-chemically amplified (n-CARs) negative resists for EUVLSingh, Vikram / Satyanarayana, V. S. V. / Sharma, Satinder K. / Ghosh, Subrata / Gonsalves, Kenneth E. et al. | 2014
- 905107
-
Evaluation of vacancies in positive-tone non-chemically and chemically amplified EUV / EB resists: relationship between free-volume and LEROshima, Akihiro / Hinata, Toru / Nakamura, Hirotaka / Oka, Toshitaka / Oshima, Nagayasu / O'Rourke, Brian E. / Suzuki, Ryoichi / Washio, Masakazu / Tagawa, Seiichi et al. | 2014
- 905108
-
Manufacturability improvements in EUV resist processing toward NXE:3300 processingKuwahara, Yuhei / Matsunaga, Koichi / Shimoaoki, Takeshi / Kawakami, Shinichiro / Nafus, Kathleen / Foubert, Philippe / Goethals, Anne-Marie / Shimura, Satoru et al. | 2014
- 905109
-
Investigation of interactions between metrology and lithography with a CD SEM simulatorSmith, Mark D. / Fang, Chao / Biafore, John J. / Vaglio Pret, Alessandro / Robertson, Stewart A. et al. | 2014
- 905110
-
Formation of sub-7 nm feature size PS-b-P4VP block copolymer structures by solvent vapour processChaudhari, Atul / Ghoshal, Tandra / Shaw, Matthew T. / Cummins, Cian / Borah, Dipu / Holmes, Justin D. / Morris, Michael A. et al. | 2014
- 905111
-
New materials for directed self-assembly for advanced patterningZhang, Jieqian / Wu, Janet / Li, Mingqi / Ginzburg, Valeriy V. / Weinhold, Jeffrey D. / Clark, Michael B. / Trefonas, Peter / Hustad, Phillip D. et al. | 2014
- 905114
-
Extending lithography with advanced materialsGuerrero, Douglas J. et al. | 2014
- 905115
-
Spin-on organic hardmask for topo-patterned substrateKomura, Kazuhiko / Hishiro, Yoshi / Wakamatsu, Goji / Takimoto, Yoshio / Nagai, Tomoki / Kimura, Tooru / Yamaguchi, Yoshikazu / Shimokawa, Tsutomu / Breyta, Greg / Arellano, Noel et al. | 2014
- 905116
-
EUV lithography and etching performance enhancement by EUV sensitive Si hard mask (EUV Si-HM) for 1Xnm hp generationShibayama, Wataru / Shigaki, Shuhei / Fujitani, Noriaki / Onishi, Ryuji / Sakamoto, Rikimaru et al. | 2014
- 905117
-
A chemical underlayer approach to mitigate shot noise in EUV contact hole patterningLi, Jin / Yasuaki, Ide / Nakasugi, Shigemasa / Misumi, Motoki / Yanagita, Hiroshi / Suzuki, Fumihiro / Pawlowski, Georg / Cho, JoonYeon / Yao, Huirong / Kudo, Takanori et al. | 2014
- 905118
-
Anti-spacer double patterningHyatt, Michael / Huang, Karen / DeVilliers, Anton / Slezak, Mark / Liu, Zhi et al. | 2014
- 905119
-
Optimization of fullerene-based negative tone chemically amplified fullerene resist for extreme ultraviolet lithographyFrommhold, A. / Yang, D. X. / McClelland, A. / Xue, X. / Ekinci, Y. / Palmer, R. E. / Robinson, A. P. G. et al. | 2014
- 905120
-
SRAF window improvement with under-coating layerHiromatsu, Takahiro / Fukui, Toru / Tsukagoshi, Kenta / Ono, Kazunori / Hashimoto, Masahiro et al. | 2014
- 905121
-
Development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVLSato, Takashi / Yamakawa, Masako / Ochiai, Yumi / Okada, Yu / Makinoshima, Takashi / Takasuka, Masaaki / Echigo, Masatoshi et al. | 2014
- 905123
-
Chemical shrink materials and process for negative tone development (NTD) resistMiyamoto, Yoshihiro / Sagan, John / Padmanaban, Munirathna / Pawlowski, Georg / Nagahara, Tatsuro et al. | 2014
- 905124
-
Novel polymeric sulfonium photoacid generator and its application for chemically amplified photoresistsLiu, Juan / Qiao, Yu / Wang, Liyuan et al. | 2014
- 905125
-
Evaluation of novel hydrophilic derivatives for chemically amplified EUV resistsTanagi, Hiroyuki / Tanaka, Hiroyasu / Hayakawa, Shoichi / Furukawa, Kikuo / Yamamoto, Hiroki / Kozawa, Takahiro et al. | 2014
- 905126
-
ArF photoresist polymers with nitrogen or sulfone moieties for negative tone development processKim, Dong-Gyun / Kwon, Su-Jee / Hong, Suk-Koo / Lee, Joon Je / Lee, Hyung Rae / Yun, Hyo-jin / Baik, Ji-Hoon / Im, Dohyuk / Jang, Eujean / Lee, Jae-Woo et al. | 2014
- 905127
-
Development of novel protecting derivatives for chemically amplified extreme ultraviolet resistTanaka, Hiroyasu / Tanagi, Hiroyuki / Hayakawa, Shoichi / Furukawa, Kikuo / Yamamoto, Hiroki / Kozawa, Takahiro et al. | 2014
-
Nanopatterning with tailored molecules [9051-15]Wieberger, F. / Kolb, T. / Neuber, C. / Ober, C.K. / Schmidt, H.-W. et al. | 2014
-
Manufacturability considerations for DSA [9051-35]Farrell, R.A. / Hosler, E.R. / Schmid, G.M. / Xu, J. / Preil, M.E. / Rastogi, V. / Mohanty, N. / Kumar, K. / Cicoria, M.J. / Hetzer, D.R. et al. | 2014
-
EUV resists comprised of main group organometallic oligomeric materials [9051-86]Passarelli, J. / Cardineau, B. / Del Re, R. / Sortland, M. / Vockenhuber, M. / Ekinci, Y. / Sarma, C. / Neisser, M. / Freedman, D.A. / Brainard, R.L. et al. | 2014
-
Evaluation of vacancies in positive-tone non-chemically and chemically amplified EUV / EB resists: relationship between free-volume and LER [9051-6]Oshima, A. / Hinata, T. / Nakamura, H. / Oka, T. / Oshima, N. / O Rourke, B.E. / Suzuki, R. / Washio, M. / Tagawa, S. et al. | 2014
-
A chemical underlayer approach to mitigate shot noise in EUV contact hole patterning [9051-44]Li, J. / Yasuaki, I. / Nakasugi, S. / Misumi, M. / Yanagita, H. / Suzuki, F. / Pawlowski, G. / Cho, J. / Yao, H. / Kudo, T. et al. | 2014
-
Patterning chemistry of HafSOx resist [9051-47]Amador, J.M. / Decker, S.R. / Lucchini, S.E. / Ruther, R.E. / Keszler, D.A. et al. | 2014
-
Optimization of fullerene-based negative tone chemically amplified fullerene resist for extreme ultraviolet lithography [9051-46]Frommhold, A. / Yang, D.X. / McClelland, A. / Xue, X. / Ekinci, Y. / Palmer, R.E. / Robinson, A.P.G. et al. | 2014
-
Innovative solutions on 193 immersion-based self-aligned multiple patterning [9051-52]Natori, S. / Yamauchi, S. / Hara, A. / Yamato, M. / Oyama, K. / Yaegashi, H. et al. | 2014
-
Adsorption characteristics of lithography filters in various solvents using application-specific ratings [9051-54]Umeda, T. / Tsuzuki, S. et al. | 2014
-
Inorganic resist materials based on zirconium phosphonate for atomic force microscope lithography [9051-69]Kang, M. / Kim, S. / Jung, J. / Kim, H. / Shin, I. / Jeon, C. / Lee, H. et al. | 2014
-
Manufacturability improvements in EUV resist processing toward NXE:3300 processing [9051-7]Kuwahara, Y. / Matsunaga, K. / Shimoaoki, T. / Kawakami, S. / Nafus, K. / Foubert, P. / Goethals, A.-M. / Shimura, S. et al. | 2014
-
Wet particle source identification and reduction using a new filter cleaning process [9051-53]Umeda, T. / Morita, A. / Shimizu, H. / Tsuzuki, S. et al. | 2014
-
Photoresist analysis to investigate LWR generation mechanism [9051-64]Mochida, K. / Nakamura, S. / Kimura, T. / Kawai, K. / Taguchi, Y. / Man, N. / Hashimoto, H. et al. | 2014
-
Organic-inorgnaic hybrid resists for EUVL [9051-71]Singh, V. / Kalyani, V. / Satyanarayana, V.S.V. / Pradeep, C.P. / Ghosh, S. / Sharma, S. / Gonsalves, K.E. et al. | 2014
-
Assessing SEM contour based OPC models quality using rigorous simulation [9051-9]Weisbuch, F. / Narayana, A.S. et al. | 2014
-
Methods of controlling cross-linking in negative-tone resists [9051-25]Lawson, R.A. / Chun, J.S. / Neisser, M. / Tolbert, L.M. / Henderson, C.L. et al. | 2014
-
Recent progress on multiple-patterning process [9051-33]Yaegashi, H. / Oyama, K. / Hara, A. / Natori, S. / Yamauchi, S. / Yamato, M. et al. | 2014
-
Characterization of chemically amplified resists for electron beam lithography [9051-58]Yamazaki, T. / Yamamoto, H. / Kozawa, T. / Wang, W.-C. et al. | 2014
-
Development of novel protecting derivatives for chemically amplified extreme ultraviolet resist [9051-83]Tanaka, H. / Tanagi, H. / Hayakawa, S. / Furukawa, K. / Yamamoto, H. / Kazawa, T. et al. | 2014
-
Novel non-chemically amplified (n-CARs) negative resists for EUVL [9051-5]Singh, V. / Satyanarayana, V.S.V. / Sharma, S.K. / Ghosh, S. / Gonsalves, K.E. et al. | 2014
-
Formation of sub-7 nm feature size PS-b-P4VP block copolymer structures by solvent vapour process [9051-36]Chaudhari, A. / Ghoshai, T. / Shaw, M.T. / Cummins, C. / Borah, D. / Holmes, J.D. / Morris, M.A. et al. | 2014
-
Deprotonation mechanism of ionized poly(4-hydroxystyrene) [9051-62]Susa, T. / Okamoto, K. / Ishida, T. / Yamamoto, H. / Kozawa, T. / Fujiyoshi, R. / Umegaki, K. et al. | 2014
-
Study on resist performance of chemically amplified molecular resist based on noria derivative and calixarene derivative [9051-74]Yamamoto, H. / Kudo, H. / Kozawa, T. et al. | 2014
-
Chemical shrink materials and process for negative tone development (NTD) resist [9051-79]Miyamoto, Y. / Sagan, J. / Padmanaban, M. / Pawlowski, G. / Nagahara, T. et al. | 2014
-
Development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL [9051-77]Sato, T. / Yamakawa, M. / Ochiai, Y. / Okada, Y. / Makinoshima, T. / Takasuka, M. / Echigo, M. et al. | 2014
-
Chiral nanomaterial fabrication by means of on-edge lithography [9051-12]Dietrich, K. / Lehr, D. / Puffky, O. / Kley, E.-B. / Tunnermann, A. et al. | 2014
-
An in situ analysis of resist dissolution in alkali-based and organic solvent-based developers using high speed atomic force microscopy [9051-23]Santillan, J.J. / Shichiri, M. / Itani, T. et al. | 2014
-
Introduction of an innovative water based photoresist stripping process using intelligent fluids [9051-28]Rudolph, M. / Thrun, X. / Schumann, D. / Hohne, A. / Esche, S. / Hohle, C. et al. | 2014
-
Reduction of image placement error on photomask-making for multiple patterning [9051-29]Hiromatsu, T. / Fukui, T. / Tsukagoshi, K. / Ono, K. / Hashimoto, M. et al. | 2014
-
Advanced develop processes for reducing defects related with e-beam resists [9051-31]Lee, B. / Han, S.-J. / Moon, S.-G. / Kim, H.B. et al. | 2014
-
Spin on lithographic resist trim process optimization and process window evaluation [9051-43]Karanikas, C.F. / Taylor, J.C. / Vaduri, N. / Islam, T. et al. | 2014
-
Decreasing curing temperature of spin-on dielectrics by using additives [9051-65]Bae, J.H. / Han, K.W. / Park, E.S. / Yoon, H.C. / Na, Y.H. / Seo, J.W. / Lim, W.H. / Kim, B.S. / Jang, J.Y. / Cho, Y. et al. | 2014
-
Investigation of interactions between metrology and lithography with a CD SEM simulator [9051-8]Smith, M.D. / Fang, C. / Biafore, J.J. / Pret, A.V. / Robertson, S.A. et al. | 2014
-
Novel surface treatment materials for aligning block-co-polymer in directed self-assembly processes [9051-20]Someya, Y. / Wakayama, H. / Endo, T. / Sakamoto, R. et al. | 2014
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Directed self-assembly process integration: Fin patterning approaches and challenges [9051-21]Sayan, S. / Chan, B.T. / Gronheid, R. / Van Roey, F. / Kim, M.-S. / Williamson, L. / Nealey, P. et al. | 2014
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High-volume manufacturing equipment and processing for directed self-assembly applications (Invited Paper) [9051-22]Somervell, M. / Yamauchi, T. / Okada, S. / Tomita, T. / Nishi, T. / Iijima, E. / Nakano, T. / Ishiguro, T. / Nagahara, S. / Iwaki, H. et al. | 2014
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Removal of highly crosslinked resists and hybrid polymers for single micro parts fabrication and nanoimprint stamp rework [9051-56]Voigt, A. / Engelke, R. / Ahrens, G. / Bullerjahn, F. / Schleunitz, A. / Klein, J.J. / Gruetzner, G. et al. | 2014
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Modeling acid transport in chemically amplified resist films [9051-60]Patil, A.A. / Doxastakis, M. / Stein, G.E. et al. | 2014
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Numerical analysis for resist profile after thermal process in display manufacturing [9051-63]Domnenko, V. / Stock, H.-J. / Shin, S. / Ryu, J. / Choi, S.W. / Cho, H. / Jeong, E.-S. / Choi, J.-H. et al. | 2014
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Novel spin-on metal hardmask materials for filling applications [9051-87]Dioses, A.D. / Chada, V. / Wolfer, E. / Ng, E. / Mullen, S. / Yao, H. / Cho, J. / Padmanaban, M. et al. | 2014
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EUV resists based on tin-oxo clusters [9051-48]Cardineau, B. / Del Re, R. / Al-Mashat, H. / Marnell, M. / Vockenhuber, M. / Ekinci, Y. / Sarma, C. / Neisser, M. / Freedman, D.A. / Brainard, R.L. et al. | 2014
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Fluidity dependence of deprotonation kinetics of chemically amplified resist [9051-68]Okamoto, K. / Ishida, T. / Yamamoto, H. / Kozawa, T. / Fujiyoshi, R. / Umegaki, K. et al. | 2014
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Positive tone cross-linked resists based on photoacid inhibition of cross linking [9051-13]Lawson, R.A. / Chun, J.S. / Neisser, M. / Tolbert, L.M. / Henderson, C.L. et al. | 2014
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Line width roughness reduction by rational design of photoacid generator for submillisecond laser post-exposure bake [9051-16]Jiang, J. / Thompson, M.O. / Ober, C.K. et al. | 2014
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Robust complementary technique with multiple-patterning for sub-10 nm node device [9051-30]Oyama, K. / Yamauchi, S. / Natori, S. / Hara, A. / Yamato, M. / Yaegashi, H. et al. | 2014
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Extending lithography with advanced materials (Invited Paper) [9051-40]Guerrero, D.J. et al. | 2014
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Inhomogeneity of PAGs in resist film studied by molecular-dynamics simulations for EUV lithography [9051-49]Toriumi, M. / Itani, T. et al. | 2014
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Improved adhesion of novolac and epoxy based resists by cationic organic materials on critical substrates for high volume patterning applications [9051-59]Voigt, A. / Ahrens, G. / Heinrich, M. / Thompson, A. / Gruetzner, G. et al. | 2014
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SRAF window improvement with under-coating layer [9051-76]Hiromatsu, T. / Fukui, T. / Tsukagoshi, K. / Ono, K. / Hashimoto, M. et al. | 2014
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An in-situ hard mask block copolymer approach for the fabrication of ordered, large scale, horizontally aligned, Si nanowire arrays on Si substrate [9051-18]Ghoshal, T. / Senthamaraikannan, R. / Shaw, M.T. / Holmes, J.D. / Morris, M.A. et al. | 2014
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Investigation of cross-linking poly(methyl methacrylate) as a guiding material in block copolymer directed self-assembly [9051-19]Seidel, R. / Delgadillo, P.R. / Ramirez-Hernandez, A. / Wu, H. / Her, Y. / Yin, J. / Nealey, P. / de Pablo, J. / Gronheid, R. et al. | 2014
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New materials for directed self-assembly for advanced patterning [9051-37]Zhang, J. / Wu, J. / Li, M. / Ginzburg, V.V. / Weinhold, J.D. / Clark, M.B. / Trefonas, P. / Hustad, P.D. et al. | 2014
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EUV lithography and etching performance enhancement by EUV sensitive Si hard mask (EUV Si-HM) for 1Xnm hp generation [9051-42]Shibayama, W. / Shigaki, S. / Fujitani, N. / Onishi, R. / Sakamoto, R. et al. | 2014
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Anti-spacer double patterning [9051-45]Hyatt, M. / Huang, K. / DeVilliers, A. / Slezak, M. / Liu, Z. et al. | 2014
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Development of spin-on-carbon hard mask for advanced node [9051-72]Kudo, T. / Rahman, M.D. / McKenzie, D. / Anyadiegwu, C. / Doerrenbaecher, S. / Zahn, W. / Padmanaban, M. et al. | 2014
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SEM simulation for 2D and 3D inspection metrology and defect review [9051-10]Levi, S. / Schwarzband, I. / Khristo, S. / Ivanchenko, Y. / Adan, O. et al. | 2014
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Process optimization of templated DSA flows [9051-17]Gronheid, R. / Bekaert, J. / Kuppuswamy, V.-K.M. / Vandenbroeck, N. / Doise, J. / Cao, Y. / Lin, G. / Sayan, S. / Parnell, D. / Somervell, M. et al. | 2014
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In-situ analysis of defect formation in coat develop track process [9051-24]Harumoto, M. / Stokes, H. / Tamada, O. / Miyagi, T. / Kaneyama, K. / Pieczulewski, C. / Asai, M. et al. | 2014
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Novel and cost-effective multiple patterning technology by means of invisible SiO~xN~y hardmask [9051-34]Jang, L. / Moon, Y.J. / Kim, R.-H. / Bencher, C. / Dai, H. / Xie, P. / Diehl, D.L. / Cao, Y. / Zeng, W. / Ngai, C.S. et al. | 2014
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Spin-on organic hardmask for topo-patterned substrate [9051-41]Komura, K. / Hishiro, Y. / Wakamatsu, G. / Takimoto, Y. / Nagai, T. / Kimura, T. / Yamaguchi, Y. / Shimokawa, T. / Breyta, G. / Arellano, N. et al. | 2014
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Study of acid diffusion behaves form PAG by using top coat method [9051-67]Sekiguchi, A. / Matsumoto, Y. et al. | 2014
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Novel polymeric sulfonium photoacid generator and its application for chemically amplified photoresists [9051-80]Liu, J. / Qiao, Y. / Wang, L. et al. | 2014
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ArF photoresist polymers with nitrogen or sulfone moieties for negative tone development process [9051-82]Kim, D.-G. / Kwon, S.-J. / Hong, S.-K. / Lee, J.J. / Lee, H.R. / Yun, H.J. / Baik, J.-H. / Im, D. / Jang, E. / Lee, J.-W. et al. | 2014
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How to design a good photoresist solvent package using solubility parameters and high-throughput research [9051-26]Tate, M.P. / Cutler, C. / Sakillaris, M. / Kaufman, M. / Estelle, T. / Mohler, C. / Tucker, C. / Thackeray, J. et al. | 2014
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ICE: Ionic contrast enhancement for organic solvent negative tone develop [9051-27]Sundberg, L.K. / Wallraff, G.M. / Bozano, L.D. / Truong, H.D. / Sanchez, M.I. / Goldfarb, D.L. / Watson, J. / Petrillo, K.E. / Hinsberg, W.D. et al. | 2014
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Effective resist profile control [9051-73]Liu, C.-Y. / Wang, C.-W. / Huang, C.-C. / Chang, C.-Y. / Ku, Y.-C. et al. | 2014
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Evaluation of novel hydrophilic derivatives for chemically amplified EUV resists [9051-81]Tanagi, H. / Tanaka, H. / Hayakawa, S. / Furukawa, K. / Yamamoto, H. / Kozawa, T. et al. | 2014