Simulation and optimization of etch on flexible substrates for roll-to-roll processing (Englisch)
- Neue Suche nach: Helpert, Sofia
- Neue Suche nach: Ban, Yang
- Neue Suche nach: Chopra, Meghali
- Neue Suche nach: Bonnecaze, Roger T.
- Neue Suche nach: Helpert, Sofia
- Neue Suche nach: Ban, Yang
- Neue Suche nach: Chopra, Meghali
- Neue Suche nach: Bonnecaze, Roger T.
In:
Advanced Etch Technology for Nanopatterning VIII
;
109630T-109630T-10
;
2019
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ISBN:
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ISSN:
- Aufsatz (Konferenz) / Print
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Titel:Simulation and optimization of etch on flexible substrates for roll-to-roll processing
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Beteiligte:Helpert, Sofia ( Autor:in ) / Ban, Yang ( Autor:in ) / Chopra, Meghali ( Autor:in ) / Bonnecaze, Roger T. ( Autor:in )
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Kongress:Advanced Etch Technology for Nanopatterning VIII
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Erschienen in:Advanced Etch Technology for Nanopatterning VIII ; 109630T-109630T-10Proceedings of SPIE, the International Society for Optical Engineering ; 10963 ; 109630T-109630T-10
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Verlag:
- Neue Suche nach: SPIE
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Erscheinungsdatum:01.01.2019
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Format / Umfang:109630T-109630T-10
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ISBN:
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ISSN:
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Medientyp:Aufsatz (Konferenz)
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Format:Print
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Sprache:Englisch
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Datenquelle:
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Inhaltsverzeichnis Konferenzband
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
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Simulation and optimization of etch on flexible substrates for roll-to-roll processingHelpert, Sofia / Ban, Yang / Chopra, Meghali / Bonnecaze, Roger T. et al. | 2019
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