Lithography layout classification based on graph convolution network (Englisch)
- Neue Suche nach: Zhang, Junbi
- Neue Suche nach: Ma, Xu
- Neue Suche nach: Zhang, Shengen
- Neue Suche nach: Zheng, Xianqiang
- Neue Suche nach: Chen, Rui
- Neue Suche nach: Pan, Yihua
- Neue Suche nach: Dong, Lisong
- Neue Suche nach: Wei, Yayi
- Neue Suche nach: Arce, Gonzalo R.
- Neue Suche nach: Zhang, Junbi
- Neue Suche nach: Ma, Xu
- Neue Suche nach: Zhang, Shengen
- Neue Suche nach: Zheng, Xianqiang
- Neue Suche nach: Chen, Rui
- Neue Suche nach: Pan, Yihua
- Neue Suche nach: Dong, Lisong
- Neue Suche nach: Wei, Yayi
- Neue Suche nach: Arce, Gonzalo R.
In:
Optical Microlithography XXXIV
;
116130U-116130U-7
;
2021
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ISBN:
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ISSN:
- Aufsatz (Konferenz) / Print
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Titel:Lithography layout classification based on graph convolution network
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Beteiligte:Zhang, Junbi ( Autor:in ) / Ma, Xu ( Autor:in ) / Zhang, Shengen ( Autor:in ) / Zheng, Xianqiang ( Autor:in ) / Chen, Rui ( Autor:in ) / Pan, Yihua ( Autor:in ) / Dong, Lisong ( Autor:in ) / Wei, Yayi ( Autor:in ) / Arce, Gonzalo R. ( Autor:in )
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Kongress:Optical Microlithography XXXIV
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Erschienen in:Optical Microlithography XXXIV ; 116130U-116130U-7Proceedings of SPIE, the International Society for Optical Engineering ; 11613 ; 116130U-116130U-7
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Verlag:
- Neue Suche nach: SPIE
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Erscheinungsdatum:01.01.2021
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Format / Umfang:116130U-116130U-7
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ISBN:
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ISSN:
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Medientyp:Aufsatz (Konferenz)
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Format:Print
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Sprache:Englisch
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Datenquelle:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Inhaltsverzeichnis Konferenzband
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
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A study on various curvilinear data representations and their impact on mask manufacturing flowGharat, Sayalee / Durvasula, Bhardwaj / Pai, Ravi / Buck, Peter / Koranne, Sandeep / Tritchkov, Alexander et al. | 2021
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Fast rigorous modeling of photoresist in lithographyFryer, David / Moskalenko, Ignat / Fenger, Germain / Khaira, Daman / Deng, Yunfei / Granik, Yuri et al. | 2021
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Qualification of small alignment mark by on-product overlay performanceMa, Jigang / Bijnen, Frans / Hulsebos, Edo / Macht, Lukasz / Tsiachris, Sotirios / Dai, Jin / van der Meulen, Rob / Yu, Miao / Böcker, Paul / Kim, Jung-Hwan et al. | 2021
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Innovative dual mark design for alignment verification and process monitoring in advanced lithographyChang, Jia Hung / Lio, En Chuan / Lin, Junjin / Weng, Tang Chun / Lin, Bill / Lomtscher, Patrick / Freitag, Martin / Buhl, Stefan / Hsu, Hsiao Lin / Liu, Rex H. et al. | 2021
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Lithography layout classification based on graph convolution networkZhang, Junbi / Ma, Xu / Zhang, Shengen / Zheng, Xianqiang / Chen, Rui / Pan, Yihua / Dong, Lisong / Wei, Yayi / Arce, Gonzalo R. et al. | 2021
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