Evaluation of field stitching optimization for robust manufacturing with high-NA EUVL (Englisch)
- Neue Suche nach: Levinson, Zachary
- Neue Suche nach: Dam, Thuc
- Neue Suche nach: Pfaeffli, Paul
- Neue Suche nach: Lee, C. Jay
- Neue Suche nach: Hoppe, Wolfgang
- Neue Suche nach: Klostermann, Ulrich
- Neue Suche nach: Lucas, Kevin
- Neue Suche nach: Levinson, Zachary
- Neue Suche nach: Dam, Thuc
- Neue Suche nach: Pfaeffli, Paul
- Neue Suche nach: Lee, C. Jay
- Neue Suche nach: Hoppe, Wolfgang
- Neue Suche nach: Klostermann, Ulrich
- Neue Suche nach: Lucas, Kevin
In:
DTCO and Computational Patterning II
;
124950B-124950B-11
;
2023
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ISBN:
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ISSN:
- Aufsatz (Konferenz) / Print
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Titel:Evaluation of field stitching optimization for robust manufacturing with high-NA EUVL
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Beteiligte:Levinson, Zachary ( Autor:in ) / Dam, Thuc ( Autor:in ) / Pfaeffli, Paul ( Autor:in ) / Lee, C. Jay ( Autor:in ) / Hoppe, Wolfgang ( Autor:in ) / Klostermann, Ulrich ( Autor:in ) / Lucas, Kevin ( Autor:in )
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Kongress:DTCO and Computational Patterning II
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Erschienen in:DTCO and Computational Patterning II ; 124950B-124950B-11Proceedings of SPIE, the International Society for Optical Engineering ; 12495 ; 124950B-124950B-11
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Verlag:
- Neue Suche nach: SPIE
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Erscheinungsdatum:01.01.2023
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Format / Umfang:124950B-124950B-11
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ISBN:
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ISSN:
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Medientyp:Aufsatz (Konferenz)
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Format:Print
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Sprache:Englisch
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Datenquelle:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Inhaltsverzeichnis Konferenzband
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
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Application of resolution enhancement techniques at high NA EUV for next generation DRAM patterningArmeanu, Ana-Maria / Malankin, Evgeny / Lafferty, Neal / Wei, Chih-I / Kempsell Sears, Monica / Fenger, Germain / Zhang, Xima / Gillijns, Werner / Trivkovic, Darko / Kim, Ryoung-han et al. | 2023
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Evaluation of field stitching optimization for robust manufacturing with high-NA EUVLLevinson, Zachary / Dam, Thuc / Pfaeffli, Paul / Lee, C. Jay / Hoppe, Wolfgang / Klostermann, Ulrich / Lucas, Kevin et al. | 2023
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- 124951A
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- 124951D
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- 124951G
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- 124951N
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