An industrial three dimensional surface treatment system and its applications (Englisch)
- Neue Suche nach: Hulak, I.
- Neue Suche nach: Legeay, G.
- Neue Suche nach: Hulak, I.
- Neue Suche nach: Legeay, G.
In:
VIDE -PARIS-
;
53
, 284
;
199-202
;
1997
-
ISSN:
- Aufsatz (Zeitschrift) / Print
-
Titel:An industrial three dimensional surface treatment system and its applications
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Beteiligte:Hulak, I. ( Autor:in ) / Legeay, G. ( Autor:in )
-
Erschienen in:VIDE -PARIS- ; 53, 284 ; 199-202
-
Verlag:
- Neue Suche nach: DIVISION DE LA SOCIETE FRANCAISE DU VIDE
-
Erscheinungsdatum:01.01.1997
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Format / Umfang:4 pages
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ISSN:
-
Medientyp:Aufsatz (Zeitschrift)
-
Format:Print
-
Sprache:Englisch
- Neue Suche nach: 634.8 / 663.2
- Weitere Informationen zu Dewey Decimal Classification
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Klassifikation:
-
Datenquelle:
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Inhaltsverzeichnis – Band 53, Ausgabe 284
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Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 1
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Diffusion mechanisms of plasmas produced over multipolar magnetic field structures: from DC magnetrons to distributed electron cyclotron resonance (DECR) plasma sourcesLagarde, T. / Pelletier, J. et al. | 1997
- 1
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Interaction of the elementary components of a plasma with a solid surfaceGautier-Soyer, M. et al. | 1997
- 2
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Plasmas DiagnosticsRicard, A. et al. | 1997
- 3
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Metal surface treatment and depositionRicard, A. et al. | 1997
- 4
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Plasma reactor and process applicationsPeccoud, L. et al. | 1997
- 5
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Comparison between chemical and plasma modifications of polymeric surfacesPoncin-Epaillard, F. et al. | 1997
- 8
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Radiative species in the afterglow of A N~2 flowing barrier dischargePagnon, D. / Ricard, A. / Cantacuzene, C. / Sindzingre, T. et al. | 1997
- 12
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Radiative species in He dielectric controlled glow discharge at atmospheric Gas pressureMassines, F. / Decomps, P. / Ricard, A. et al. | 1997
- 16
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Use of reactive sputtering model to predict working point conditions of two different TiN sputtering devicesRoquiny, P. / Bodart, F. / Lucas, S. / Terwagne, G. et al. | 1997
- 21
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Negative ions generated in downstream plasmas and their Si etching reactivityHoriike, Y. / Shibayama, T. / Morikawa, Y. / Takayanagi, T. / Oshio, H. / Ita, H. / Ichiki, T. / Shindo, H. et al. | 1997
- 24
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New process and etch equipment in aluminum dry etching for SAW devicesBouyer, B. et al. | 1997
- 29
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Experimental investigation of a Cl~2/BCl~3/N~2 chemistry based aluminium plasma etchingVignes, M. J. / Baleo, J. N. et al. | 1997
- 33
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Silicon wall profiles generated by isotropic dry etching processesMansano, R. D. / Verdonck, P. / Maciel, H. S. et al. | 1997
- 37
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Use of plasma processes for the fabrication of metal and silicon microtips cathodesBaptist, R. et al. | 1997
- 45
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Characterization and optimization of CH~4 based ECR plasmas by optical emission spectroscopyRar, A. / Zimmermann, H. / Seelmann-Eggebert, M. et al. | 1997
- 49
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Characterization of the plasma beam extracted from an ECR ion source for RIBE and CAIBE of siliconChevolleau, T. / Tessier, P. Y. / Cardinaud, C. / Turban, G. et al. | 1997
- 53
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Reactive ion etching of alumina-doped silica thin films for integrated optics applicationsLe Luyer, Y. et al. | 1997
- 57
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Plasma treatment of synthetic vulcanized styrene-butadiene rubberPastor-Blas, M. M. / Dillard, J. C. / Torro-Palau, A. / Martin-Martinez, J. M. et al. | 1997
- 61
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Modification of polymeric surface by cold plasma, treatment of the surface or into the bulk?Poncin-Epaillard, F. / Brosse, J. C. / Falher, T. et al. | 1997
- 65
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Growth of human endothelial cells on plasma-treated polyethy-leneterephthalate surfacesMirenghi, L. / Ramires, P. A. / Pentassuglia, R. E. / Rotolo, P. / Romito, A. et al. | 1997
- 69
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A study comparing the use of plasmas and sodium complexes for the pretreatment of fluoropolymersBrewis, D. M. / Mathieson, I. et al. | 1997
- 74
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Investigations of plasma-treated polymer surfaces by zeta potential measurementsGresser, L. / Bouriat, P. / Held, B. et al. | 1997
- 78
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Cold plasma fluorination processes of polyethylene surfacesQuensierre, J. D. / Jama, C. / Dessaux, O. / Goudmand, P. et al. | 1997
- 82
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Plasma treatment and biomaterialsLegeay, G. / Poncin-Epaillard, F. et al. | 1997
- 89
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Plasma-enhanced fluorination of carbon materialsMoguet, F. / Shirasaki, T. / Tressaud, A. et al. | 1997
- 93
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Surface properties and the stability of poly(ethyleneterephtalate)(pet) films treated in plasmas of HE-O~2 mixturesPlacinta, G. / Arefi-Khonsari, F. / Gheorghiu, M. / Amouroux, J. / Popa, G. et al. | 1997
- 97
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Scaling-up of the diamond deposition reactor using surface-wave discharges by lowering the operating frequency from 2.45 Ghz to 915 MhzMoisan, M. / Borges, C. F. M. / Schelz, S. et al. | 1997
- 101
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Evolution of morphological properties of coatings sputtered with heat treatmentMartin, N. / Baretti, D. / Rousselot, C. / Rondot, D. et al. | 1997
- 105
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Low temperature nitriding of aluminium in a low pressure arc dischargeRenevier, N. / Czerwiec, T. / Collignon, P. / Michel, H. et al. | 1997
- 113
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Decarburization during sputtering in steels in a DC glow electrical dischargeEgert, P. / Seeber, A. / Speller, C. V. / Maliska, A. M. et al. | 1997
- 117
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Influence of sputtering parameters on the mechanical properties of chromium filmsPaturaud, C. / Farges, C. / Catherine, M. C. S. / Machet, J. et al. | 1997
- 121
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Growth mechanisms study of TiN coatings obtained by vacuum arc depositionCledat, P. / Machet, J. et al. | 1997
- 125
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Crystalline and amorphous phases in carbon-nitride films produced by intense high-pressure plasmaGurarie, V. N. / Orlov, A. V. / Bursill, L. A. / Julin, P. / Nugent, K. W. / Chon, J. W. / Prawer, S. et al. | 1997
- 129
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Oxidation performance of various monolithic and superlattice PVD hard coatings in the temperature range of 400C to 1000CSmith, I. J. / Wadsworth, I. / Donohue, L. A. / Brooks, J. S. / Muenz, W.-D. et al. | 1997
- 133
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Atmospheric non-equilibrium plasma-assisted surface technologyKoulik, P. et al. | 1997
- 142
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Pulsed microwave plasmas for homogeneous deposition of HMDSOSoll, C. / Theirich, D. / Ningel, K. P. / Engemann, J. et al. | 1997
- 146
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Role of oxygen atoms in the growth kinetics of PECVD SiO~2 films in Helicon reactorVallee, C. / Granier, A. / Goullet, A. / Nicolazo, F. / Turban, G. et al. | 1997
- 150
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Deposition of thin SiO~xC~yHz films from oxygen/organosilicone mixtures in different PECVD reactorsGranier, A. / Berthomieu, D. / Deville, J. P. / Ducarroir, M. / Durand, J. / Goullet, A. / Leprince, P. / Marliere, C. / Raynaud, P. / Segui, E. et al. | 1997
- 154
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A complete plasma physics, plasma chemistry and surface chemistry simulator used for deposition and etching of thin filmsGogolides, E. / Vauvert, P. / Turban, G. et al. | 1997
- 160
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RF Glow discharge deposition of nanostructured silicon films: solid state versus gaz phase reactionsRoca, P. / Cabarrocas, I. / Hamma, S. et al. | 1997
- 164
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High rate direct current reactive sputter deposition of Al~2O~3 - Required Process ParametersMacak, K. / Kharrazi, M. / Helmersson, U. et al. | 1997
- 167
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PA-CVD of aluminium composite filmsTaeschner, C. / Klosowski, J. / Leonhardt, A. et al. | 1997
- 171
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Deposition of semiconductive and transparent thin TiN oxide films by PACVD. Role of the bias voltageHellegouarc'h, F. / Arefi-Khonsari, F. / Amouroux, J. et al. | 1997
- 175
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Vertically integrated circuits - A key technology for future high performance systemsEngelhardt, M. / Huebner, H. / Jacobs, H. / Kleiner, M. / Kuehn, S. / Pamier, W. / Renner, E. / Saenger, A. / Scheler, U. / Schmidt, C. et al. | 1997
- 181
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PVD techniques applied to a neutron micro-sensor realizationCosset, F. / Celerier, A. / Barelaud, B. / N'Doye, A. / Malhouitre, S. / Vareille, J. C. et al. | 1997
- 185
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Applications of plasma processes in integrated opticsPoulsen, M. R. et al. | 1997
- 191
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WN~x thin films as diffusion barriers between Al and SiBoukhris, L. / Poitevin, J. M. et al. | 1997
- 195
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High power generators for medium frequency sputtering applicationsRettich, T. / Wiedemuth, P. et al. | 1997
- 199
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An industrial three dimensional surface treatment system and its applicationsHulak, I. / Legeay, G. et al. | 1997
- 203
-
Emission spectroscopy analysis of atmospheric pressure air plasmaChabchoub, M. / Cheron, B. G. et al. | 1997
- 207
-
Modelling of reactive magnetron sputtering used for the deposition of thin filmsRousselot, C. / Martin, N. et al. | 1997
- 208
-
Resumes en anglais des communications| 1997
- 211
-
Characterization of uniform distributed plasmas (UDP) of N~2, O~2 and H~2 for ion implantation applications: the example of nitrogen implantationLe Coeur, F. / Arnal, Y. / Brunel, M. / Burke, R. / Pelletier, J. et al. | 1997
- 213
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Correlation between the TICN deposition and the optical emission spectroscopy in an arc plasma reactorSultan, G. / Baravian, G. / Damond, E. / Detour, H. / Hayaud, C. / Jacquot, P. et al. | 1997
- 215
-
Design and performance of new hybrid plasma source for thin films depositionMiernik, K. / Walkowicz, J. et al. | 1997
- 219
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Cold plasma for surface treatment of titanium alloysLebrun, J. P. / Corre, Y. / Douet, M. et al. | 1997
- 223
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Reactivity of polypropylene surface modified by nitrogen cold plasma towards N-Vinyl-2-pyrrolidonePoncin-Epaillard, F. / Brosse, J. C. / Falher, T. et al. | 1997
- 227
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Titania coating on PET: P.V.D. elaboration, characterisation, adhesion and photoprotective properties studyBen Amor, S. / Baud, G. / Besse, J. P. / Jacquet, M. / Pichon, N. et al. | 1997
- 230
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Detection de fuite et << volume mort >>Henriot, C. et al. | 1997
- 231
-
Surface modifications of polyethylene by cold remote nitrogen plasma effect of NF~3 additionJama, C. / Quensierre, J. D. / Dessaux, O. / Goudmand, P. et al. | 1997
- 235
-
Plasma polymerized Iso-t-pentinol and its post-polymerization propertiesSalansky, J. et al. | 1997
- 237
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Hermetic sealing off the stainless steel pumping tubePregelj, A. / Drab, M. / Novak, J. / Mozetic, M. et al. | 1997
- 239
-
Excimer laser irradiation on carbide/polyimide layersDanev, G. / Spassova, E. / Petkov, K. / Tomov, R. I. / Atanasov, P. A. / Popova, K. et al. | 1997
- 242
-
The pratical application of plasma treatment to polymer surfaces for improved adhesionDurand, A. M. et al. | 1997
- 243
-
Study of a plasma polymerization reactor for hydrocarbon coatingsBenardais, A. / Leprince, P. / Zielinski, F. / Baclet, P. et al. | 1997
- 247
-
Overall Kinetic in remote-PECVD-reactorBayer, C. / Von Rohr, P. R. et al. | 1997
- 251
-
Oxidation of commercial steels in gliding discharges reactorChabchoub, M. / Lenglet, M. / Hannoyer, B. et al. | 1997
- 253
-
Application industrielle des plasmas froids pour les traitements anti-usureLebrun, J. P. et al. | 1997
- 255
-
Super-pure high-nitrogen stainless steels produced in plasma unitsZhadkevich, M. L. / Torkhov, G. F. et al. | 1997
- 259
-
Treatment of CdTe thin films in an oxidizing plasmaElazhari, M. Y. / Outzourhit, A. / Azizan, M. / Bennouna, A. / Ameziane, E. L. / Brunel, M. et al. | 1997
- 263
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A study of technological properties of plasma sprayed Y~2O~3 stabilised ZrO~2 ceramic coatingsIoncea, A. / Radu, D. / Ionescu, D. / Dumitrescu, O. et al. | 1997
- 267
-
Investigation of tribological characteristics of ultra-hard diamond-like carbon coatingsAkoulich, V. V. / Tochitsky, E. I. / Chekan, N. M. / Sitnikova, E. K. / Akula, I. P. / Ladutko, E. V. / Anisimovich, V. G. et al. | 1997
- 271
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The influence of ion etching on the structure of nitrided substrates made from hot working steelWalkowicz, J. / Smolik, J. / Miernik, K. et al. | 1997
- 277
-
Synthesis of boron nitride by remote plasma enhanced chemical vapor depositionPierson, J. F. / Belmonte, T. / Czerwiec, T. / Michel, H. et al. | 1997
- 281
-
Low-pressure plasma nitriding of constructional steelCerstvy, R. et al. | 1997
- 285
-
Corrosion behaviour of bioimplants stainless steel with thin IBAD SiN coatingsCerny, F. / Van Den Berg, S. et al. | 1997
- 288
-
Diamond-like carbon: application in wire and tube drawing; numerical simulation by FEMSchurer, C. / Semmler, U. et al. | 1997
- 292
-
Properties of pulsed plasma ion nitrided and oxinitrided steel surfacesHruby, V. / Kadlec, J. / Pospichal, M. et al. | 1997
- 299
-
Study of surface properties of steel samples treated by plasma processesMouri, L. / Fiaud, C. / Amouroux, J. et al. | 1997
- 303
-
A combined flame-field method for the deposition of hard C:H filmsZake, M. / Lubane, M. et al. | 1997
- 306
-
Microwave plasma reactor for silicon dioxide depositionBenissad, N. / Bechu, S. / Boisse-Laporte, C. / Leprince, P. et al. | 1997
- 310
-
Reactive deposition from collimated beams of sputtered materialMiernik, K. / Walkowicz, J. / Smolik, J. et al. | 1997
- 314
-
Characterization of PECVD SiO~xC~YHz films by ellipsometry and X-ray reflectometryVallee, C. / Goullet, A. / Granier, A. / Marliere, C. / Van Der Lee, A. / Durand, J. / Raynaud, P. / Deville, J. P. et al. | 1997
- 318
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Dielectric properties of plasma deposited films obtained from organosilicion monomersDurand, J. / Granier, A. / Marlieres, C. / Nicolazo, F. / Raynaud, P. / Segui, Y. et al. | 1997
- 322
-
Characterisation of unbalenced magnetron sputtered Si-Al coatingsJacobs, M. / Terwagne, G. / Bodart, F. et al. | 1997
- 327
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ECR plasma source for metallic clustersFarchi, A. / Delaunay, M. et al. | 1997
- 331
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Influence of the H/C ratio in precursor gases on a-C:H films deposited by means of an expanding thermal plasma| 1997
- 335
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Multilayered dielectric films on semiconductor: the properties of the interfaceKropman, D. / Kaerner, T. / Abru, U. et al. | 1997
- 337
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Si-Ta thin films sputtered under constant or pulsed voltage operation of magnetronBeensh-Marchwicka, G. / Berlicki, T. / Osadnik, S. / Prociow, E. et al. | 1997
- 341
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The role of helium in RF PECVD hard carbonNeuville, S. et al. | 1997
- 347
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Lectro-Treat - Surface treatersSenink, N. / Antoine, A. / Hulak, I. et al. | 1997
- 351
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Microwaves couplers for surface treatmentBoutroy / Chollet, P. / Lemortellec, J. L. / Oge, F. et al. | 1997
- 356
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Plasma monitoring by integrated sensorsBrueckner, R. / Canteloup, J. / Titov, A. / Vassilakis, J. P. / Poulin, G. et al. | 1997
- 372
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Modification of polyimide films by low-frequency glow dischargeGilman, A. / Drachev, A. / Kuznetsov, A. / Potapov, V. et al. | 1997