ZnO:Ga Thin Films Produced by RF Sputtering at Room Temperature: Effect of the Power Density (Englisch)
- Neue Suche nach: Fortunato, E.
- Neue Suche nach: Assuncao, V.
- Neue Suche nach: Marques, A.
- Neue Suche nach: Goncalves, A.
- Neue Suche nach: Aguas, H.
- Neue Suche nach: Pereira, L.
- Neue Suche nach: Ferreira, I.
- Neue Suche nach: Fernandes, F. M. B.
- Neue Suche nach: Silva, R. J. C.
- Neue Suche nach: Martins, R.
- Neue Suche nach: Fortunato, E.
- Neue Suche nach: Assuncao, V.
- Neue Suche nach: Marques, A.
- Neue Suche nach: Goncalves, A.
- Neue Suche nach: Aguas, H.
- Neue Suche nach: Pereira, L.
- Neue Suche nach: Ferreira, I.
- Neue Suche nach: Fernandes, F. M. B.
- Neue Suche nach: Silva, R. J. C.
- Neue Suche nach: Martins, R.
In:
MATERIALS SCIENCE FORUM
;
455/456
;
12-15
;
2004
-
ISSN:
- Aufsatz (Zeitschrift) / Print
-
Titel:ZnO:Ga Thin Films Produced by RF Sputtering at Room Temperature: Effect of the Power Density
-
Beteiligte:Fortunato, E. ( Autor:in ) / Assuncao, V. ( Autor:in ) / Marques, A. ( Autor:in ) / Goncalves, A. ( Autor:in ) / Aguas, H. ( Autor:in ) / Pereira, L. ( Autor:in ) / Ferreira, I. ( Autor:in ) / Fernandes, F. M. B. ( Autor:in ) / Silva, R. J. C. ( Autor:in ) / Martins, R. ( Autor:in )
-
Erschienen in:MATERIALS SCIENCE FORUM ; 455/456 ; 12-15
-
Verlag:
- Neue Suche nach: Transtec Publications
-
Erscheinungsdatum:01.01.2004
-
Format / Umfang:4 pages
-
ISSN:
-
Medientyp:Aufsatz (Zeitschrift)
-
Format:Print
-
Sprache:Englisch
- Neue Suche nach: 620.11
- Weitere Informationen zu Dewey Decimal Classification
-
Klassifikation:
DDC: 620.11 -
Datenquelle:
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Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
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- 7
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Physical Properties of Sputtered ITO and WO3 Thin Films| 2004
- 12
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ZnO:Ga Thin Films Produced by RF Sputtering at Room Temperature: Effect of the Power Density| 2004
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