The residual stress instrument with optimized Si(220) monochromator and position-sensitive detector at HANARO (Englisch)
- Neue Suche nach: Lee, C. H.
- Neue Suche nach: Moon, M. K.
- Neue Suche nach: Em, V. T.
- Neue Suche nach: Choi, Y. H.
- Neue Suche nach: Cheon, J. K.
- Neue Suche nach: Nam, U. W.
- Neue Suche nach: Kong, K. N.
- Neue Suche nach: Lee, C. H.
- Neue Suche nach: Moon, M. K.
- Neue Suche nach: Em, V. T.
- Neue Suche nach: Choi, Y. H.
- Neue Suche nach: Cheon, J. K.
- Neue Suche nach: Nam, U. W.
- Neue Suche nach: Kong, K. N.
In:
NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH SECTION A
;
545
, 1-2
;
480-489
;
2005
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:The residual stress instrument with optimized Si(220) monochromator and position-sensitive detector at HANARO
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Beteiligte:Lee, C. H. ( Autor:in ) / Moon, M. K. ( Autor:in ) / Em, V. T. ( Autor:in ) / Choi, Y. H. ( Autor:in ) / Cheon, J. K. ( Autor:in ) / Nam, U. W. ( Autor:in ) / Kong, K. N. ( Autor:in )
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Erschienen in:NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH SECTION A ; 545, 1-2 ; 480-489
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Verlag:
- Neue Suche nach: Elsevier Science B.V., Amsterdam.
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Erscheinungsdatum:01.01.2005
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Format / Umfang:10 pages
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ISSN:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 539.7
- Weitere Informationen zu Dewey Decimal Classification
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Klassifikation:
DDC: 539.7 -
Datenquelle:
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Inside front cover (Editorial Board)| 2005