A nanoporous silicon nitride membrane using a two-step lift-off pattern transfer with thermal nanoimprint lithography (Englisch)
- Neue Suche nach: Nabar, B.P.
- Neue Suche nach: Celik-Butler, Z.
- Neue Suche nach: Dennis, B.H.
- Neue Suche nach: Billo, R.E.
- Neue Suche nach: Nabar, B.P.
- Neue Suche nach: Celik-Butler, Z.
- Neue Suche nach: Dennis, B.H.
- Neue Suche nach: Billo, R.E.
In:
JOURNAL OF MICROMECHANICS AND MICROENGINEERING
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22
, 4
;
045012
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2012
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:A nanoporous silicon nitride membrane using a two-step lift-off pattern transfer with thermal nanoimprint lithography
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Beteiligte:Nabar, B.P. ( Autor:in ) / Celik-Butler, Z. ( Autor:in ) / Dennis, B.H. ( Autor:in ) / Billo, R.E. ( Autor:in )
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Erschienen in:JOURNAL OF MICROMECHANICS AND MICROENGINEERING ; 22, 4 ; 045012
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Verlag:
- Neue Suche nach: Institute of Physics Publishing
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Erscheinungsdatum:01.01.2012
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Format / Umfang:45012 pages
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ISSN:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 620
- Weitere Informationen zu Dewey Decimal Classification
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Klassifikation:
DDC: 620 -
Datenquelle:
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