Interstitial Boron-Doped TiO2 Thin Films: The Significant Effect of Boron on TiO2 Coatings Grown by Atmospheric Pressure Chemical Vapor Deposition (Unbekannt)
- Neue Suche nach: Quesada-González, Miguel
- Neue Suche nach: Boscher, Nicolas D.
- Neue Suche nach: Carmalt, Claire J.
- Neue Suche nach: Parkin, Ivan P.
- Neue Suche nach: Quesada-González, Miguel
- Neue Suche nach: Boscher, Nicolas D.
- Neue Suche nach: Carmalt, Claire J.
- Neue Suche nach: Parkin, Ivan P.
In:
ACS Applied Materials & Interfaces
;
8
, 38
;
25024-25029
;
2016
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Interstitial Boron-Doped TiO2 Thin Films: The Significant Effect of Boron on TiO2 Coatings Grown by Atmospheric Pressure Chemical Vapor Deposition
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Weitere Titelangaben:ACS Appl. Mater. Interfaces
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Beteiligte:Quesada-González, Miguel ( Autor:in ) / Boscher, Nicolas D. ( Autor:in ) / Carmalt, Claire J. ( Autor:in ) / Parkin, Ivan P. ( Autor:in )
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Erschienen in:ACS Applied Materials & Interfaces ; 8, 38 ; 25024-25029
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Verlag:
- Neue Suche nach: American Chemical Society
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Erscheinungsdatum:28.09.2016
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ISSN:
-
Coden:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Unbekannt
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 8, Ausgabe 38
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