Integration of block copolymer directed assembly with 193 immersion lithography (Englisch)
- Neue Suche nach: Liu, Chi-Chun
- Neue Suche nach: Nealey, Paul F.
- Neue Suche nach: Raub, Alex K.
- Neue Suche nach: Hakeem, Philip J.
- Neue Suche nach: Brueck, Steve R. J.
- Neue Suche nach: Han, Eungnak
- Neue Suche nach: Gopalan, Padma
- Neue Suche nach: Liu, Chi-Chun
- Neue Suche nach: Nealey, Paul F.
- Neue Suche nach: Raub, Alex K.
- Neue Suche nach: Hakeem, Philip J.
- Neue Suche nach: Brueck, Steve R. J.
- Neue Suche nach: Han, Eungnak
- Neue Suche nach: Gopalan, Padma
In:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
;
28
, 6
;
C6B30-C6B34
;
2010
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Integration of block copolymer directed assembly with 193 immersion lithography
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Weitere Titelangaben:Integration of block copolymer directed assembly
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Beteiligte:Liu, Chi-Chun ( Autor:in ) / Nealey, Paul F. ( Autor:in ) / Raub, Alex K. ( Autor:in ) / Hakeem, Philip J. ( Autor:in ) / Brueck, Steve R. J. ( Autor:in ) / Han, Eungnak ( Autor:in ) / Gopalan, Padma ( Autor:in )
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Erschienen in:
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Verlag:
- Neue Suche nach: American Vacuum Society
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Erscheinungsdatum:01.11.2010
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Format / Umfang:5 pages
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ISSN:
-
DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 28, Ausgabe 6
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PrefaceFeldman, Martin et al. | 2010
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Integration of block copolymer directed assembly with 193 immersion lithographyLiu, Chi-Chun / Nealey, Paul F. / Raub, Alex K. / Hakeem, Philip J. / Brueck, Steve R. J. / Han, Eungnak / Gopalan, Padma et al. | 2010
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- C6M28
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Characterizations of nanoembossed ferroelectric filmsShen, Zhenkui / Chen, Zhihui / Lu, Qian / Jiang, Anquan / Qiu, Zhijun / Qu, Xinping / Chen, Yifang / Liu, Ran et al. | 2010
- C6M32
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Electrical properties of transferred metal nanopattern using metal oxide release layerUnno, Noriyuki / Taniguchi, Jun / Ide, Shouichi et al. | 2010
- C6M37
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Fabrication of mesas with micro- and nanopatterned surface relief used as working stamps for step and stamp imprint lithographySchleunitz, Arne / Spreu, Christian / Haatainen, Tomi / Klukowska, Anna / Schift, Helmut et al. | 2010
- C6M41
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Fabrication of ordered nanospheres using a combination of nanoimprint lithography and controlled dewettingSchleunitz, Arne / Spreu, Christian / Lee, JaeJong / Schift, Helmut et al. | 2010
- C6M45
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Fabrication of seamless three-dimensional roll mold using direct electron-beam writing on rotating cylindrical substrateTaniguchi, Jun / Tsuji, Shintaro / Aratani, Masao et al. | 2010
- C6M50
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Facile wide-scale defect detection of UV-nanoimprinted resist patterns by fluorescent microscopyKobayashi, Kei / Kubo, Shoichi / Matsui, Shinji / Nakagawa, Masaru et al. | 2010
- C6M57
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High accuracy UV-nanoimprint lithography step-and-repeat master stamp fabrication for wafer level camera applicationKreindl, G. / Glinsner, T. / Miller, R. / Treiblmayr, D. / Födisch, R. et al. | 2010
- C6M63
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Hole mobility enhancement by chain alignment in nanoimprinted poly(3-hexylthiophene) nanogratings for organic electronicsZhou, Min / Aryal, Mukti / Mielczarek, Kamil / Zakhidov, Anvar / Hu, Walter et al. | 2010
- C6M68
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Impact of molecular size on resist filling process in nanoimprint lithography: Molecular dynamics studyTaga, Akihiro / Yasuda, Masaaki / Kawata, Hiroaki / Hirai, Yoshihiko et al. | 2010
- C6M72
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Impact of the resist properties on the antisticking layer degradation in UV nanoimprint lithographyFrancone, A. / Iojoiu, C. / Poulain, C. / Lombard, C. / Pépin-Donat, B. / Boussey, J. / Zelsmann, M. et al. | 2010
- C6M77
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Impact of substrate deformation on demolding force for thermal imprint processKawata, H. / Watanabe, Y. / Fujikawa, N. / Yasuda, M. / Hirai, Y. et al. | 2010
- C6M83
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Imprinted quarter wave plate at terahertz frequencySaha, Shimul C. / Ma, Yong / Grant, James P. / Khalid, A. / Cumming, David R. S. et al. | 2010
- C6M88
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Long-range ordered aluminum oxide nanotubes by nanoimprint-assisted aluminum film surface engineeringNoh, Kunbae / Choi, Chulmin / Kim, Jin-Yeol / Oh, Young / Brammer, Karla S. / Loya, Mariana C. / Jin, Sungho et al. | 2010
- C6M93
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Nanofabrication of surface-enhanced Raman scattering device by an integrated block-copolymer and nanoimprint lithography methodYang, E. L. / Liu, C. C. / Yang, C. Y. P. / Steinhaus, C. A. / Nealey, P. F. / Skinner, J. L. et al. | 2010
- C6M98
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Nanoimprinting for diffractive light trapping in solar cellsWeiss, Dirk N. / Yuan, Hao-Chih / Lee, Benjamin G. / Branz, Howard M. / Meyers, Stephen T. / Grenville, Andrew / Keszler, Douglas A. et al. | 2010
- C6M104
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Nanoimprinted solar cells optimized by oblique deposition ofYang, Yi / Aryal, Mukti / Mielczarek, Kamil / Hu, Walter / Zakhidov, Anvar et al. | 2010
- C6M108
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Process-simulation system for UV-nanoimprint lithographyShibata, Mayuko / Horiba, Akira / Nagaoka, Yoshinori / Kawata, Hiroaki / Yasuda, Masaaki / Hirai, Yoshihiko et al. | 2010
- C6M114
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Rapid patterning of spin-on-glass using ultrasonic nanoimprintMekaru, Harutaka / Takahashi, Masaharu et al. | 2010
- C6M122
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Rapid thermal imprinting of high-aspect-ratio nanostructures with dynamic heating of mold surfaceNagato, Keisuke / Hattori, Shuntaro / Hamaguchi, Tetsuya / Nakao, Masayuki et al. | 2010
- C6M125
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Residual layer uniformity using complementary patterns to compensate for pattern density variation in UV nanoimprint lithographyWang, Qing / Hiroshima, Hiroshi / Atobe, Hidemasa / Youn, Sung-Won et al. | 2010
- C6M130
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Spectroscopic ellipsometry optical critical dimension measurements of templates and imprinted resist for patterned magnetic media applicationsYu, Zhaoning / Hwu, Justin / Liu, Yongdong / Su, Zhenpeng / Yang, Henry / Wang, Hongying / Hu, Wei / Xu, Yuan / Kurataka, Nobuo / Hsu, Yautzong et al. | 2010
- C6M136
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Sputtering with an etch-free lift-off in thermal nanoimprint lithographyMayer, Andre / Bogdanski, Nicolas / Möllenbeck, Saskia / Dhima, Khalid / Papenheim, Marc / Scheer, Hella-Christin et al. | 2010
- C6N1
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Microelectromechanical systems for biomimetical applicationsLatif, Rhonira / Mastropaolo, Enrico / Bunting, Andy / Cheung, Rebecca / Koickal, Thomas / Hamilton, Alister / Newton, Michael / Smith, Leslie et al. | 2010
- C6N7
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Microfabricated resistive high-sensitivity nanoprobe for scanning thermal microscopyWielgoszewski, G. / Sulecki, P. / Gotszalk, T. / Janus, P. / Szmigiel, D. / Grabiec, P. / Zschech, E. et al. | 2010
- C6N12
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Micromachined scanning proximal probes with integrated piezoresistive readout and bimetal actuator for high eigenmode operationWoszczyna, Mirosław / Zawierucha, Paweł / Pałetko, Piotr / Zielony, Michał / Gotszalk, Teodor / Sarov, Yanko / Ivanov, Tzvetan / Frank, Andreas / Zöllner, Jens-Peter / Rangelow, Ivo W. et al. | 2010
- C6N18
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Piezoelectrically driven silicon carbide resonatorsMastropaolo, Enrico / Gual, Isaac / Wood, Graham / Bunting, Andrew / Cheung, Rebecca et al. | 2010
- C6O1
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On the fabrication of three-dimensional silicon-on-insulator based optical phased array for agile and large angle laser beam steering systemsHosseini, Amir / Kwong, David / Zhang, Yang / Chandorkar, Saurabh A. / Crnogorac, Filip / Carlson, Andrew / Fallah, Babak / Bank, Seth / Tutuc, Emanuel / Rogers, John et al. | 2010
- C6O8
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Tunable optofluidic nano-Bragg microcavity filterJugessur, A. S. / Dou, J. / Aitchison, J. S. et al. | 2010
- C6O11
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Colloidal optical waveguides with integrated local light sources built by capillary force assemblyLecarme, O. / Pinedo Rivera, T. / Arbez, L. / Honegger, T. / Berton, K. / Peyrade, D. et al. | 2010
- C6O16
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Resonant coupling to a dipole absorber inside a metamaterial: Anticrossing of the negative index responseSmolev, Svyatoslav / Ku, Zahyun / Brueck, S. R. J / Brener, Igal / Sinclair, Michael B. / Ten Eyck, Gregory A. / Langston, W. L. / Basilio, Lorena I. et al. | 2010
- C6O21
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Fabrication and characterization of coupled metal-dielectric-metal nanoantennasJoshi, Bhuwan / Wen, Xuejin / Sun, Kai / Lu, Wu / Wei, Qi-Huo et al. | 2010
- C6O26
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Fabrication of nanostar arrays by nanoimprint lithographyVeres, Teodor / Cui, Bo / Clime, Liviu et al. | 2010
- C6O30
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Fabrication techniques for three-dimensional metamaterials in the midinfraredWendt, J. R. / Burckel, D. B. / Ten Eyck, G. A. / Ellis, A. R. / Brener, I. / Sinclair, M. B. et al. | 2010
- C6O34
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Self-aligned gold nanocone probe tipsZeeb, B. / Jäger, S. / Schäfer, C. / Nill, P. / Meixner, A. J. / Kern, D. P. / Fleischer, M. et al. | 2010
- C6O38
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Large area three-dimensional photonic crystals with embedded waveguidesRaub, Alex K. / Brueck, S. R. J. et al. | 2010
- C6O45
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Sub-10 nm patterning of gold nanostructures on silicon-nitride membranes for plasmon mapping with electron energy-loss spectroscopyKoh, Ai Leen / McComb, David W. / Maier, Stefan A. / Low, H. Y. / Yang, Joel K. W. et al. | 2010
- C6O50
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Geometry enhanced asymmetric rectifying tunneling diodesChoi, Kwangsik / Ryu, Geunmin / Yesilkoy, Filiz / Chryssis, Athanasios / Goldsman, Neil / Dagenais, Mario / Peckerar, Martin et al. | 2010
- C6O56
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Waveguide-plasmon resonances in gold-capped silicon-nitride disk photonic crystal slabsShyu, Jia-Hong / Lee, Huang-Ming / Chien, Jui-Hsing / Wu, Jong-Ching et al. | 2010
- C6O60
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Multilayer pattern transfer for plasmonic color filter applicationsKaplan, Alex F. / Xu, Ting / Wu, Yi-Kuei / Guo, L. Jay et al. | 2010
- C6P1
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Batch wafer scale fabrication of passivated carbon nanotube transistors for electrochemical sensing applicationsMartin-Fernandez, I. / Borrisé, X. / Lora-Tamayo, E. / Godignon, P. / Perez-Murano, F. et al. | 2010
- C6P6
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Copper-plated 50 nm -gate fabricationOxland, Richard K. / Li, Xu / Ferguson, Susan / Bentley, Steven / Thayne, Iain G. et al. | 2010
- C6P11
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Direct synthesis of vertical nanowires from sputtered Fe thin filmNagato, Keisuke / Furubayashi, Masaki / Hamaguchi, Tetsuya / Nakao, Masayuki et al. | 2010
- C6P14
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Pyrolysis of two-dimensional and three-dimensional interferometrically patterned resist structuresBurckel, D. B. / Washburn, C. M. / Koleske, D. D. / Polsky, R. et al. | 2010
- C6P18
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Fabrication and initial characterization of ultrahigh aspect ratio vias in gold using the helium ion microscopeScipioni, Larry / Ferranti, David C. / Smentkowski, Vincent S. / Potyrailo, Radislav A. et al. | 2010
- C6P24
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Fabrication of poly(ethylene glycol) hydrogel structures for pharmaceutical applications using electron beam and optical lithographyBae, Misuk / Gemeinhart, Richard A. / Divan, Ralu / Suthar, Kamlesh J. / Mancini, Derrick C. et al. | 2010
- C6P30
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Nanofabrication of x-ray zone plates using ultrananocrystalline diamond molds and electroformingWojcik, Michael J. / Joshi, Vishwanath / Sumant, Anirudha V. / Divan, Ralu / Ocola, Leonidas E. / Lu, Ming / Mancini, Derrick C. et al. | 2010
- C6P36
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Nanomachining and clamping point optimization of silicon carbon nitride resonators using low voltage electron beam lithography and cold developmentMohammad, M. A. / Guthy, C. / Evoy, S. / Dew, S. K. / Stepanova, M. et al. | 2010
- C6P42
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Nanoporous ultrananocrystalline diamond membranesMakarova, Olga / Divan, Ralu / Moldovan, Nicolaie / Rosenmann, Daniel / Tang, Cha-Mei et al. | 2010
- C6P48
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Nanostructured silicon membranes for control of molecular transportSrijanto, Bernadeta R. / Retterer, Scott T. / Fowlkes, Jason D. / Doktycz, Mitchel J. et al. | 2010
- C6P53
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Semiconductor crystal islands for three-dimensional integrationCrnogorac, F. / Wong, S. / Pease, R. F. W. et al. | 2010
- C6P59
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Structure and properties of polymer core-shell systems: Helium ion microscopy and electrical conductivity studiesBliznyuk, Valery / Pud, Alexander / Scipioni, Larry / Huynh, Chuong / Ogurtsov, Nikolay / Ferranti, David et al. | 2010
- C6P66
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Noise analysis of carbon nanotube field effect transistors irradiated by electron beamChan, Jack / Kidd, Deborah / Burke, Brian / Harriott, Lloyd / Williams, Keith et al. | 2010
- C6P70
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Plasma etch fabrication of 60:1 aspect ratio silicon nanogratings with 200 nm pitchMukherjee, Pran / Bruccoleri, Alexander / Heilmann, Ralf K. / Schattenburg, Mark L. / Kaplan, Alex F. / Guo, L. Jay et al. | 2010
- C6Q1
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Optical and computed evaluation of keyhole diffractive imaging for lensless x-ray microscopyDai, Bing / Zhu, Diling / Jaroensri, Ronnachai / Kulalert, Kanokwan / Pianetta, Piero / Pease, R. Fabian W. et al. | 2010
- C6Q6
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Customized illumination for process window optimization and yield improvement in mask aligner lithography systemsHornung, Michael / Vogler, Uwe / Voelkel, Reinhard et al. | 2010
- C6Q12
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Projection lithography below lambda/7 through deep-ultraviolet evanescent optical imagingXie, P. / Smith, B. W. et al. | 2010
- C6Q20
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Development of a simple, compact, low-cost interference lithography systemKorre, Hasan / Fucetola, Corey P. / Johnson, Jeremy A. / Berggren, Karl K. et al. | 2010
- C6Q25
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Nondestructive detection of deviation in integrated circuitsBaghaei, Leili / Dai, Bing / Pianetta, Piero / Pease, R. Fabian W. et al. | 2010
- C6S1
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Impact of development chemistry on extreme ultraviolet resist performanceGronheid, Roel et al. | 2010
- C6S6
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Comparison of positive tone versus negative tone resist pattern collapse behaviora)Yeh, Wei-Ming / Noga, David E. / Lawson, Richard A. / Tolbert, Laren M. / Henderson, Clifford L. et al. | 2010
- C6S12
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High sensitivity nonchemically amplified molecular resists based on photosensitive dissolution inhibitorsLawson, Richard A. / Tolbert, Laren M. / Henderson, Clifford L. et al. | 2010
- C6S19
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Photopatternable inorganic hardmaskTelecky, Alan / Xie, Peng / Stowers, Jason / Grenville, Andrew / Smith, Bruce / Keszler, Douglas A. et al. | 2010
- C6S23
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Effects of salty-developer temperature on electron-beam-exposed hydrogen silsesquioxane resist for ultradense pattern transferYan, M. / Lee, J. / Ofuonye, B. / Choi, S. / Jang, J. H. / Adesida, I. et al. | 2010
- L61
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Sputtering of (001)AlN thin films: Control of polarity by a seed layerMilyutin, E. / Harada, S. / Martin, D. / Carlin, J. F. / Grandjean, N. / Savu, V. / Vaszquez-Mena, O. / Brugger, J. / Muralt, P. et al. | 2010
- P1
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Editorial| 2010
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Nanostructures Batch wafer scale fabrication of passivated carbon nanotube transistors for electrochemical sensing applicationsMartin-Fernandez, I et al. | 2010
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Electron Beams High-current electron optical design for reflective electron beam lithography direct write lithographyMcCord, Mark et al. | 2010
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Masks and Maskless Lithography Blanking characteristics of a miniature electron beam columnSilver, C S et al. | 2010
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Novel Imaging-Optical Lithography Optical and computed evaluation of keyhole diffractive imaging for lensless x-ray microscopyDai, Bing et al. | 2010
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PHOTON BEAM TECHNOLOGY AND NANOFABRICATION PAPERS FROM THE 54th INTERNATIONAL CONFERENCE ON ELECTRON, ION, AND Preface| 2010
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Modeling Mask-topography-induced phase effects and wave aberrations in optical and extreme ultraviolet lithographyErdmann, A et al. | 2010
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Nanophotonics On the fabrication of three-dimensional silicon-on-insulator based optical phased array for agile and large angle laser beam steering systemsHosseini, Amir et al. | 2010
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Letters Sputtering of (001)AIN thin films: Control of polarity by a seed layerMilyutin, E et al. | 2010
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Directed Assembly Argon ion multibeam nanopatterning of Ni-Cu inserts for injection moldingKoeck, Anton et al. | 2010
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Nanomechanics Microelectromechanical systems for biomimetical applicationsLatif, Rhonira et al. | 2010
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Resists Impact of development chemistry on extreme ultraviolet resist performanceGronheid, Roel et al. | 2010
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Microfluidics Three-dimensional microfluidic mixers using ion beam lithography and micromachiningPalacios, E et al. | 2010
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Nanobiology Fabrication of three-dimensional structures for the assessment of cell mechanical interactions within cell monolayersFuard, David et al. | 2010
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Editorial EditorialLucovsky, Gerry et al. | 2010
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Extreme Ultraviolet Lithography Wavelength-specific reflections: A decade of extreme ultraviolet actinic mask inspection researchGoldberg, K A et al. | 2010
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Focused Ion Beams Focused chromium ion beamSteele, A V et al. | 2010
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Metrology and Imaging Application of analytic scanning electron microscopy to critical dimensions metrology at nanometer scaleBabin, Sergey et al. | 2010
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Plenary To charge or not to charge: 50 years of lithographic choicesFabian Pease, R et al. | 2010
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Emerging Technologies Direct transformation of a resist pattern into a graphene field effect transistor through interfacial graphitization of liquid galliumFujita, Jun-ichi et al. | 2010
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Nanoelectronics Low damage fully self-aligned replacement gate process for fabricating deep sub-100 nm gate length GaAs metal-oxide-semiconductor field-effect transistorsLi, X et al. | 2010
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Comparison of positive tone versus negative tone resist pattern collapse behaviorYeh, Wei-Ming et al. | 2010
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Nanoimprint Aspects of hybrid pattern definition while combining thermal nanoimprint with optical lithographyScheer, H-C et al. | 2010