A thermochemical model for the plasma etching of aluminum in BCl3/Cl2 and BBr3/Br2 (Englisch)
- Neue Suche nach: McNevin, S. C.
- Neue Suche nach: McNevin, S. C.
In:
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
;
8
, 6
;
1212-1222
;
1990
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:A thermochemical model for the plasma etching of aluminum in BCl3/Cl2 and BBr3/Br2
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Weitere Titelangaben:Plasma etching of Al in BCl3/Cl2 and BBr3/Br2
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Beteiligte:McNevin, S. C. ( Autor:in )
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Erschienen in:
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Verlag:
- Neue Suche nach: American Vacuum Society
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Erscheinungsdatum:01.11.1990
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Format / Umfang:11 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 8, Ausgabe 6
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- 1848
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Performance of a combined focused ion and electron beam systemSawaragi, H. / Mimura, R. / Kasahara, H. / Aihara, R. / Thompson, W. / Shearer, M. Hassel et al. | 1990
- 1853
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Electron emission properties of laser pulsed GaAs negative electron affinity photocathodesSanford, Colin A. / MacDonald, Noel C. et al. | 1990
- 1858
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Modifying a JEOL 100B for electron‐beam lithographyAndrews, C. C. / Kirk, W. P. et al. | 1990
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Reduction in beam positioning error by modification of dynamic responses in electron beam direct writing systemMatsukura, Hiroyuki / Tsutaoka, Takanori / Nakajima, Ken et al. | 1990
- 1867
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Energy density function determination in very‐high‐resolution electron‐beam lithographyGentili, M. / Grella, L. / Lucchesini, A. / Luciani, L. / Mastrogiacomo, L. / Musumeci, P. et al. | 1990
- 1872
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The effect of resist contrast on linewidth error induced by e‐beam proximity exposureLiu, Hua‐Yu / Owen, Geraint et al. | 1990
- 1877
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A high accuracy and high throughput electron beam reticle writing system for 16M dynamic random access memory class and beyond beyond devicesTakigawa, T. / Ogawa, Y. / Yoshikawa, R. / Koyama, K. / Tamamushi, S. / Ikenaga, O. / Abe, T. / Hattori, K. / Nishimura, E. / Kusakabe, H. et al. | 1990
- 1877
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A high accuracy and high throughput electron beam reticle writing system for 16M dynamic random access memory class and beyond devicesTakigawa, T. / Ogawa, Y. / Yoshikawa, R. / Koyama, K. / Tamamushi, S. / Ikenaga, O. / Abe, T. / Hattori, K. / Nishimura, E. / Kusakabe, H. et al. | 1990
- 1882
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An error measure for dose correction in e‐beam nanolithographyPati, Y. C. / Teolis, A. / Park, D. / Bass, R. / Rhee, K. / Bradie, B. / Peckerar, M. C. et al. | 1990
- 1889
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Methods for proximity effect correction in electron lithographyOwen, Geraint et al. | 1990
- 1893
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Charging effects on trilevel resist with an e‐beam lithography systemItoh, Hiroyuki / Nakamura, Kazumitsu / Hayakawa, Hajime et al. | 1990
- 1898
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Resist heating effects in 25 and 50 kV e‐beam lithography on glass masksKratschmer, E. / Groves, T. R. et al. | 1990
- 1903
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An advanced electron beam lithography system for sub‐half‐micron ultra‐large‐scale production: The distortion corrector technologyNakamura, K. / Okino, T. / Nakanoda, S. / Kawamura, I. / Goto, N. / Nakagawa, Y. / Thompson, W. / Shearer, M. Hassel et al. | 1990
- 1909
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Quantitative lithographic performance of proximity correction for electron beam lithographyBojko, R. J. / Hughes, B. J. et al. | 1990
- 1914
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Electron beam/optical intralevel mix‐and‐match lithography for deep submicron device fabricationMatsuda, Tadahito / Iwadate, Kazumi / Tanaka, Akinobu / Kawai, Yoshio / Komatsu, Kazuhiko et al. | 1990
- 1919
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Double 15‐nm‐wide metal gates 10 nm apart and 70 nm thick on GaAsChou, Stephen Y. / Fischer, Paul B. et al. | 1990
- 1923
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Stochastic effects occurring after ion emission from liquid metal ion sourcesWard, J. W. / Kubena, R. L. et al. | 1990
- 1927
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Ion beam assisted etching and depositionGamo, Kenji / Namba, Susumu et al. | 1990
- 1932
-
The angular dependence of the emission characteristics for a Pd2As liquid‐alloy ion sourceRao, S. / Bell, A. E. / Schwind, G. A. / Swanson, L. W. et al. | 1990
- 1937
-
Ultrashallow Si p+–n junction fabrication by low energy Ga+ focused ion beam implantationSteckl, A. J. / Mogul, H. C. / Mogren, S. M. et al. | 1990
- 1941
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Low distortion, large area ion beam proximity printing for GaAs field effect transistors and monolithic microwave integrated circuitsSen, Sudipto / Stumbo, D. P. / Fong, F‐O. / Damm, G. A. / Engler, D. W. / Wolfe, J. C. / Randall, John N. et al. | 1990
- 1945
-
Focused ion beam machining of Si, GaAs, and InPPellerin, J. G. / Griffis, D. P. / Russell, P. E. et al. | 1990
- 1951
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Chlorine and HCl radical beam etching of III–V semiconductorsLishan, David G. / Hu, Evelyn L. et al. | 1990
- 1956
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Characterization of GaAs/AlxGa1−xAs selective reactive ion etching in SiCl4/SiF4 plasmasGuggina, W. H. / Ketterson, A. A. / Andideh, E. / Hughes, J. / Adesida, I. / Caracci, S. / Kolodzey, J. et al. | 1990
- 1960
-
Assessing thermal Cl2 etching and regrowth as methods for surface passivationClausen, E. M. / Harbison, J. P. / Florez, L. T. / Van der Gaag, B. et al. | 1990
- 1966
-
An investigation of CH4/H2 reactive ion etching damage to thin heavily doped GaAs metal–semiconductor field effect transistor layers during gate recessingCameron, N. I. / Beaumont, S. P. / Wilkinson, C. D. W. / Johnson, N. P. / Kean, A. H. / Stanley, C. R. et al. | 1990
- 1966
-
An investigation of CH4/H2 reactive etching damage to thin heavily doped GaAs metal-semiconductor field effect transistor layers during gate recessingCameron, N.I. / Beaumont, S.P. / Wilkinson, C.D.W. / Johnson, N.P. / Kean, A.H. / Stanley, C.R. et al. | 1990
- 1970
-
High resolution germanium zone plates and apertures for soft x‐ray focalometryTennant, D. M. / Raab, E. L. / Becker, M. M. / O’Malley, M. L. / Bjorkholm, J. E. / Epworth, R. W. et al. | 1990
- 1975
-
Free standing silicon microstructures for soft x‐ray masks and cold atom focusingTennant, D. M. / Bjorkholm, J. E. / O’Malley, M. L. / Becker, M. M. / Gregus, J. A. / Epworth, R. W. et al. | 1990
- 1980
-
Plasma‐deposited amorphous carbon films as planarization layersPang, S. W. / Horn, M. W. et al. | 1990
- 1985
-
The role of heat transfer during reactive‐ion etching of polymer filmsDems, B. C. / Rodriguez, F. et al. | 1990
- 1990
-
Reactive ion etching of indium compounds using iodine containing plasmasFlanders, D. C. / Pressman, L. D. / Pinelli, G. et al. | 1990
- 1994
-
Automatic mark detection in electron beam nanolithography using digital image processing and correlationBoegli, V. / Kern, D. P. et al. | 1990
- 2002
-
X‐ray stepper exposure system performance and statusFlamholz, Alex / Rippstein, Robert et al. | 1990
- 2008
-
Alignment for masked ion beam lithography using ion‐induced fluorescenceStumbo, D. P. / Sen, Sudipto / Fong, F‐O. / Damm, G. A. / Engler, D. W. / Wolfe, J. C. / Randall, John N. et al. | 1990
- 2012
-
The effect of process coatings on the alignment signal in a proximity lithography systemChen, G. / Wallace, J. / Palmer, S. / Cerrina, F. / Randall, J. et al. | 1990
- 2017
-
A new precise optical autofocus systemFein, Michael E. / Kelderman, Herman F. / Neukermans, Armand P. / Loh, Alan E. / Wolze, David et al. | 1990
- 2023
-
A scanning tunneling microscope with a capacitance‐based position monitorGriffith, J. E. / Miller, G. L. / Green, C. A. / Grigg, D. A. / Russell, P. E. et al. | 1990
- 2028
-
Error component analysis in the metrology of x‐ray masksFoss, Gordon O. et al. | 1990
- 2032
-
An analysis of polarization mixing errors in distance measuring interferometersAugustyn, Walter / Davis, Paul et al. | 1990
- 2037
-
Electron beam testing of integrated circuits with multilevel metalRadzimski, Z. J. / Ricks, D. A. / Wolcott, J. S. / Russell, P. E. et al. | 1990
- 2041
-
Testing integrated circuit microstructures using charging‐induced voltage contrastAton, T. J. / Mahant‐Shetti, S. S. / Gale, R. J. / Bennett‐Lilley, M. H. / Harward, M. G. / Pico, C. A. / Weaver, T. L. et al. | 1990
- 2045
-
Design and application of an e‐beam test system for micropackaging boardsSchmid, R. / Brunner, M. / Schmitt, R. / Lischke, B. / Bergh, N. Then / Wörner, M. et al. | 1990
- 2048
-
High repetition rate electron beam chopping system for electron beam testing at microwave frequenciesThong, J. T. L. / Breton, B. C. / Nixon, W. C. et al. | 1990
- 2053
-
Optical column design for large area voltage contrast electron beam testing of multichip packaging substratesGoruganthu, R. R. / Bahasadri, A. / Kumar, N. / Woodard, O. C. et al. | 1990