Influence of the sputtering gas pressure on deposition profiles (Englisch)
- Neue Suche nach: González‐Díaz, G.
- Neue Suche nach: Mártil, I.
- Neue Suche nach: Sánchez‐Quesada, F.
- Neue Suche nach: Rodríguez‐Vidal, M.
- Neue Suche nach: Gras‐Martí, A.
- Neue Suche nach: Vallés‐Abarca, J. A.
- Neue Suche nach: González‐Díaz, G.
- Neue Suche nach: Mártil, I.
- Neue Suche nach: Sánchez‐Quesada, F.
- Neue Suche nach: Rodríguez‐Vidal, M.
- Neue Suche nach: Gras‐Martí, A.
- Neue Suche nach: Vallés‐Abarca, J. A.
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
;
1
, 3
;
1394-1397
;
1983
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Influence of the sputtering gas pressure on deposition profiles
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Weitere Titelangaben:Influence of the sputtering gas pressure
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Beteiligte:González‐Díaz, G. ( Autor:in ) / Mártil, I. ( Autor:in ) / Sánchez‐Quesada, F. ( Autor:in ) / Rodríguez‐Vidal, M. ( Autor:in ) / Gras‐Martí, A. ( Autor:in ) / Vallés‐Abarca, J. A. ( Autor:in )
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Erschienen in:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films ; 1, 3 ; 1394-1397
-
Verlag:
- Neue Suche nach: American Vacuum Society
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Erscheinungsdatum:01.07.1983
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Format / Umfang:4 pages
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ISSN:
-
DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:thin films , thickness , sputtering , spatial distribution , vapor pressure , deposition , argon , glass
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Datenquelle:
Inhaltsverzeichnis – Band 1, Ausgabe 3
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