Characterization of high density plasmas for semiconductor etching (Englisch)
- Neue Suche nach: Eddy, C. R.
- Neue Suche nach: Leonhardt, D.
- Neue Suche nach: Douglass, S. R.
- Neue Suche nach: Thoms, B. D.
- Neue Suche nach: Shamamian, V. A.
- Neue Suche nach: Butler, J. E.
- Neue Suche nach: Eddy, C. R.
- Neue Suche nach: Leonhardt, D.
- Neue Suche nach: Douglass, S. R.
- Neue Suche nach: Thoms, B. D.
- Neue Suche nach: Shamamian, V. A.
- Neue Suche nach: Butler, J. E.
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
;
17
, 1
;
38-51
;
1999
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Characterization of high density plasmas for semiconductor etching
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Beteiligte:Eddy, C. R. ( Autor:in ) / Leonhardt, D. ( Autor:in ) / Douglass, S. R. ( Autor:in ) / Thoms, B. D. ( Autor:in ) / Shamamian, V. A. ( Autor:in ) / Butler, J. E. ( Autor:in )
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Erschienen in:
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Verlag:
- Neue Suche nach: American Vacuum Society
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Erscheinungsdatum:01.01.1999
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Format / Umfang:14 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 17, Ausgabe 1
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- 322
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- 324
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CUMULATIVE AUTHOR INDEX| 1999
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Information for Contributors| 1999