Advanced electron cyclotron resonance plasma etching technology for precise ultra‐large‐scale integration patterning (Englisch)
- Neue Suche nach: Samukawa, Seiji
- Neue Suche nach: Samukawa, Seiji
In:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
;
12
, 1
;
112-115
;
1994
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Advanced electron cyclotron resonance plasma etching technology for precise ultra‐large‐scale integration patterning
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Weitere Titelangaben:Advanced etching technology plasma
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Beteiligte:Samukawa, Seiji ( Autor:in )
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Erschienen in:
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Verlag:
- Neue Suche nach: American Vacuum Society
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Erscheinungsdatum:01.01.1994
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Format / Umfang:4 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 12, Ausgabe 1
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