Pattern dependent profile distortion during plasma etching of high aspect ratio features in SiO2 (Englisch)
- Neue Suche nach: Huang, Shuo
- Neue Suche nach: Shim, Seungbo
- Neue Suche nach: Nam, Sang Ki
- Neue Suche nach: Kushner, Mark J.
- Neue Suche nach: Huang, Shuo
- Neue Suche nach: Shim, Seungbo
- Neue Suche nach: Nam, Sang Ki
- Neue Suche nach: Kushner, Mark J.
In:
Journal of Vacuum Science & Technology A
;
38
, 2
;
12
;
2020
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Pattern dependent profile distortion during plasma etching of high aspect ratio features in SiO2
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Beteiligte:Huang, Shuo ( Autor:in ) / Shim, Seungbo ( Autor:in ) / Nam, Sang Ki ( Autor:in ) / Kushner, Mark J. ( Autor:in )
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Erschienen in:Journal of Vacuum Science & Technology A ; 38, 2 ; 12
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Verlag:
- Neue Suche nach: American Vacuum Society
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Erscheinungsdatum:01.03.2020
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Format / Umfang:12 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 38, Ausgabe 2
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