Deuterium Uptake in Iron Oxide Under ‐Plasma Exposure (Englisch)
- Neue Suche nach: Sogawa, T.
- Neue Suche nach: Matsunami, N.
- Neue Suche nach: Ohno, N.
- Neue Suche nach: Tokitani, M.
- Neue Suche nach: Masuzaki, S.
- Neue Suche nach: Sogawa, T.
- Neue Suche nach: Matsunami, N.
- Neue Suche nach: Ohno, N.
- Neue Suche nach: Tokitani, M.
- Neue Suche nach: Masuzaki, S.
- Neue Suche nach: Matsuo, Jiro
- Neue Suche nach: Kase, Masataka
- Neue Suche nach: Aoki, Takaaki
- Neue Suche nach: Seki, Toshio
In:
AIP Conference Proceedings
;
1321
, 1
;
274-277
;
2011
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Deuterium Uptake in Iron Oxide Under ‐Plasma Exposure
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Beteiligte:Sogawa, T. ( Autor:in ) / Matsunami, N. ( Autor:in ) / Ohno, N. ( Autor:in ) / Tokitani, M. ( Autor:in ) / Masuzaki, S. ( Autor:in ) / Matsuo, Jiro ( Herausgeber:in ) / Kase, Masataka ( Herausgeber:in ) / Aoki, Takaaki ( Herausgeber:in ) / Seki, Toshio ( Herausgeber:in )
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Erschienen in:AIP Conference Proceedings ; 1321, 1 ; 274-277
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Verlag:
- Neue Suche nach: American Institute of Physics
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Erscheinungsdatum:07.01.2011
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Format / Umfang:4 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 1321, Ausgabe 1
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Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
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Implant Monitoring Measurements On Ultra Shallow Implants Before And After Anneal Using Photomodulated Reflection And Junction Photovoltage Measurement TechniquesTallian, M. / Pap, A. / Mocsar, K. / Somogyi, A. / Nadudvari, Gy. / Kosztka, D. / Pavelka, T. et al. | 2011
- 440
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Monitoring Ion Implantation Energy Using Non‐contact Characterization MethodsTallian, M. / Pap, A. / Mocsar, K. / Somogyi, A. / Nadudvari, Gy. / Kosztka, D. / Pavelka, T. et al. | 2011
- 444
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Leakage Current Measurements by Junction Photovoltage TechniqueTallian, M. / Pap, A. / Kosztka, D. / Pavelka, T. et al. | 2011
- 448
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Development of a Compact Ion Source with a Hot Hollow CathodeMiyamoto, N. / Demura, Y. / Imakita, S. / Kasuya, T. / Vasquez, M. R. / Wada, M. et al. | 2011
- 452
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N‐ and P‐Type Cluster SourceHorsky, Thomas N. / Hahto, Sami K. / McIntyre, Edward K. / Sacco, George P. et al. | 2011
- 456
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Fabrication of Impregnated‐Electrode‐Type Polyatomic Ion Source with Ionic LiquidTakeuchi, Mitsuaki / Ryuto, Hiromichi / Takaoka, Gikan H. et al. | 2011
- 460
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Optimization of Compact Microwave Ion Source for Generation of High Current and Low Energy Ion BeamTaguchi, Shuhei / Gotoh, Yasuhito / Tsuji, Hiroshi / Sakai, Shigeki / Ishikawa, Junzo et al. | 2011
- 464
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Multi‐Frequency Microwaves Plasma Production for Active Profile Control of Ion Beams on a Large Bore ECR Ion Source with Permanent MagnetsSakamoto, Naoki / Kato, Yushi / Kiriyama, Ryutaro / Takenaka, Tomoya / Sato, Fuminobu / Iida, Toshiyuki et al. | 2011
- 468
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Plasma Sputter‐type Ion Source with Wire Electrodes for Low‐energy Gallium Ion ExtractionVasquez, M. / Kasuya, T. / Maeno, S. / Miyamoto, N. / Wada, M. et al. | 2011
- 472
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Ion Source of Pure Single Charged Boron Based on Planar Magnetron Discharge in Self‐Sputtering ModeVizir, A. V. / Gushenets, V. I. / Hershcovitch, A. / Kulevoy, T. V. / Oks, E. M. / Yushkov, G. Yu. et al. | 2011
- 476
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Molecular Ion Beam Transportation for Low Energy Ion ImplantationKulevoy, T. V. / Kropachev, G. N. / Seleznev, D. N. / Yakushin, P. E. / Kuibeda, R. P. / Kozlov, A. V. / Koshelev, V. A. / Hershcovitch, A. / Gushenets, V. I. / Johnson, B. M. et al. | 2011
- 480
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Synthesis of Endohedral Fullerene Using ECR Ion SourceMinezaki, Hidekazu / Uchida, Takashi / Tanaka, Kiyokatsu / Muramatsu, Masayuki / Asaji, Toyohisa / Kitagawa, Atsushi / Kato, Yushi / Racz, Richard / Biri, Sandor / Yoshida, Yoshikazu et al. | 2011
- 484
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Ion Beam Sweeping using High Temperature Super Conducting MagnetSakai, Shigeki / King, Tom / Fujita, Hideki / Briggs, Neil / Miles, Matt / McCrohon, Mick / Gibson, Simon et al. | 2011
- 488
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Collimator Magnet with Functionally Defined Profile for Ion ImplantationNicolaescu, Dan / Sakai, Shigeki / Gotoh, Yasuhito / Ishikawa, Junzo et al. | 2011
- 492
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Ion Beam Neutralization Using FEAs and Mirror Magnetic FieldsNicolaescu, Dan / Sakai, Shigeki / Gotoh, Yasuhito / Ishikawa, Junzo et al. | 2011
- 496
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Suppression of Divergence of Low Energy Ion Beams by Space Charge Neutralization with Low Energy Electrons Emitted from Field Emitter ArraysIshikawa, Junzo / Gotoh, Yasuhito / Takeuchi, Mitsuaki / Taguchi, Shuhei / Nicolaescu, Dan / Tsuji, Hiroshi / Kimoto, Tsunenobu / Sakai, Shigeki et al. | 2011
- 500
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Mass Filtering Function of Magnetic Boundaries in Multi‐Cusp Ion SourceInouchi, Yutaka / Dohi, Shojiro / Tanii, Masahiro / Konishi, Masashi / Naito, Masao et al. | 2011
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Back Matter for Volume 1321| 2011
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Front Matter for Volume 1321| 2011