Lateral manipulation of single Cu atoms on flat and stepped copper surfaces (Englisch)
- Neue Suche nach: Bartels, L.
- Neue Suche nach: Meyer, G.
- Neue Suche nach: Rieder, K.-H.
- Neue Suche nach: Bartels, L.
- Neue Suche nach: Meyer, G.
- Neue Suche nach: Rieder, K.-H.
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
;
16
, 3
;
1047-1049
;
1998
- Aufsatz (Zeitschrift) / Elektronische Ressource
-
Titel:Lateral manipulation of single Cu atoms on flat and stepped copper surfaces
-
Beteiligte:
-
Erschienen in:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films ; 16, 3 ; 1047-1049
-
Verlag:
- Neue Suche nach: American Vacuum Society
-
Erscheinungsdatum:01.05.1998
-
Format / Umfang:3 pages
-
ISSN:
-
DOI:
-
Medientyp:Aufsatz (Zeitschrift)
-
Format:Elektronische Ressource
-
Sprache:Englisch
-
Schlagwörter:
-
Datenquelle:
Inhaltsverzeichnis – Band 16, Ausgabe 3
Zeige alle Jahrgänge und Ausgaben
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 913
-
Electron transport and emission properties of diamondYater, J. E. / Shih, A. / Abrams, R. et al. | 1998
- 919
-
Carbon based thin film cathodes for field emission displaysWeber, A. / Hoffmann, U. / Klages, C.-P. et al. | 1998
- 922
-
Field emission characteristics of patterned free-standing diamond filmsKim, S. H. / Han, I. T. et al. | 1998
- 926
-
Surface and intergallery catalytic properties of Cu(II)-exchanged hectorite: A scanning force microscope studyPorter, Timothy L. / Manygoats, Kevin / Bradley, Michelle / Eastman, Michael P. / Reynolds, Benjamin P. / Votava, Amy E. / Hagerman, Michael E. et al. | 1998
- 926
-
Surface and intergallery catalytic properties of Cu(Il)-exchanged hectorite: A scanning force microscope studyPorter, T. L. / Manygoats, K. / Bradley, M. / Eastman, M. P. / Reynolds, B. P. / Votava, A. E. / Hagerman, M. E. et al. | 1998
- 932
-
Study of the desorption mechanism of alkylsiloxane self-assembled monolayers through isotopic labeling and high resolution electron energy-loss spectroscopy experimentsKluth, G. Jonathan / Sander, Melissa / Sung, Myung M. / Maboudian, Roya et al. | 1998
- 937
-
Comparison of the initial oxidation of polycrystalline indium and ultrathin deposits of indium on the Au (111) surfaceRobinson, M. C. / Slavin, A. J. et al. | 1998
- 943
-
Adsorption of oxygen on Pd(111): Precursor kinetics and coverage-dependent stickingSjövall, Peter / Uvdal, Per et al. | 1998
- 948
-
State resolved dynamics of methyl desorption from GaAsWang, H. / Zhu, X.-Y. / Xin, Q.-S. et al. | 1998
- 951
-
Atomic force microscopy and scanning tunneling microscopy/spectroscopy investigations of molybdenum ditelluridesSaidi, A. / Hasbach, A. / Raberg, W. / Wandelt, K. et al. | 1998
- 956
-
Electronic structure calculations of small molecule adsorbates on (110) and (100)Ferris, Kim F. / Wang, Li-Qiong et al. | 1998
- 961
-
Surface cleaning aluminum foil with ozone gasMomose, Takashi / Hayasaka, Eisyuh / Saitou, Katuhiro / Nagayama, Katuya / Abe, Sin’ya et al. | 1998
- 964
-
Atomic force microscopy study of the faceting on MgO(110) surfaceChern, G. / Huang, J. J. / Leung, T. C. et al. | 1998
- 968
-
Atomic force microscopy study of microcrystalline SiC fabricated by ion beam synthesisWu, W. / Chen, D. H. / Xu, J. B. / Cheung, W. Y. / Wong, S. P. / Wilson, I. H. / Kwok, R. W. M. et al. | 1998
- 974
-
Ellipsometric and low energy electron diffraction study of the layer growth of xenon physisorbed on Ag (111) surfaceIgarashi, S. / Abe, Y. / Irie, Y. / Hirayama, T. / Arakawa, I. et al. | 1998
- 979
-
Desorption of metastable particles induced by electronic excitation at the surface of rare-gas solid with physisorbed hydrogenHayama, A. / Kuninobu, T. / Hirayama, T. / Arakawa, I. et al. | 1998
- 984
-
Ammonia decomposition on Ru(001) using gas-phase atomic hydrogenHagedorn, Christopher J. / Weiss, Michael J. / Weinberg, W. Henry et al. | 1998
- 990
-
Novel electronic and magnetic properties of ultrathin chromium oxide films grown on Pt(111)Robbert, P. S. / Geisler, H. / Ventrice, C. A. / van Ek, J. / Chaturvedi, S. / Rodriguez, J. A. / Kuhn, M. / Diebold, U. et al. | 1998
- 996
-
Coadsorption of sodium and water on MgO(100)/Mo(100) studied by ultraviolet photoelectron and metastable impact electron spectroscopiesGünster, J. / Liu, G. / Kempter, V. / Goodman, D. W. et al. | 1998
- 1000
-
Oxygen adsorption and oxide formation on (111)Becker, C. / Kandler, J. / Raaf, H. / Linke, R. / Pelster, T. / Dräger, M. / Tanemura, M. / Wandelt, K. et al. | 1998
- 1006
-
Voltage-dependent scanning tunneling microscopy images of the Ge(111)-c(2x8) surfaceLee, Geunseop et al. | 1998
- 1006
-
Voltage-dependent scanning tunneling microscopy images of the Ge(111)- surfaceLee, Geunseop / Mai, H. / Chizhov, Ilya / Willis, R. F. et al. | 1998
- 1010
-
Carbon monoxide oxidation on Ir (110)Burghaus, U. / Ding, Junqi / Weinberg, W. H. et al. | 1998
- 1014
-
A fast x-ray photoelectron spectroscopy study of the reaction over Rh(533): Identifying surface speciesCobden, P. D. / Nieuwenhuys, B. E. / Esch, F. / Baraldi, A. / Comelli, G. / Lizzit, S. / Kiskinova, M. et al. | 1998
- 1017
-
Near edge x-ray absorption fine structure study of benzene adsorbed on metal surfaces: Comparison to benzene cluster complexesWeiss, K. / Gebert, S. / Wühn, M. / Wadepohl, H. / Wöll, Ch. et al. | 1998
- 1023
-
Vibrational study of and radicals on the Cu(111) surface by high resolution electron energy loss spectroscopyChan, Y. L. / Chuang, Ping / Chuang, T. J. et al. | 1998
- 1031
-
Scanning tunneling microscopy study of benzene adsorption onSelf, K. W. / Pelzel, R. I. / Owen, J. H. G. / Yan, C. / Widdra, W. / Weinberg, W. H. et al. | 1998
- 1031
-
Scanning tunneling microscopy study of benzene adsorption on Si(100)-(2 x 1)Self, K.W. et al. | 1998
- 1037
-
Multiple bonding geometries and binding state conversion of benzene/Si(100)Lopinski, G. P. / Fortier, T. M. / Moffatt, D. J. / Wolkow, R. A. et al. | 1998
- 1043
-
Surface segregation of low-energy ion-induced defects in SiBedrossian, Peter J. / Diaz de la Rubia, Tomas et al. | 1998
- 1047
-
Lateral manipulation of single Cu atoms on flat and stepped copper surfacesBartels, L. / Meyer, G. / Rieder, K.-H. et al. | 1998
- 1050
-
Photoexcited surfaces: Properties and chemisorptionToledano, D. S. / Dufresne, E. R. / Henrich, V. E. et al. | 1998
- 1055
-
Surface structure and bonding in the strongly correlated metal oxides NiO andCastell, M. R. / Dudarev, S. L. / Muggelberg, C. / Sutton, A. P. / Briggs, G. A. D. / Goddard, D. T. et al. | 1998
- 1059
-
Scanning tunneling microscopy of equilibrium crystal shapesSurnev, S. / Arenhold, K. / Coenen, P. / Voigtländer, B. / Bonzel, H. P. / Wynblatt, P. et al. | 1998
- 1066
-
Reaction of 1,2-ethanedithiol on clean, sulfur-modified, and carbon-modified Mo (110) surfacesRoe, Charles L. / Schulz, Kirk H. et al. | 1998
- 1073
-
Bonding nature between oxygen and sodium on Si(113) surfaceHwang, Chan-Cuk / An, Ki-Seok / Park, Rae-Jun / Kim, Jeong-Seon / Lee, Ju-Bong / Park, Chong-Yun / Kimura, Akio / Kakizaki, Akito et al. | 1998
- 1078
-
Nonstoichiometry on (110) and interfacesWagner, M. / Kienzle, O. / Bonnell, D. A. / Rühle, M. et al. | 1998
- 1086
-
Photoelectron microspectroscopy observations of a cleaved surface of semiconductor double heterostructureKiyokura, Takanori / Maeda, Fumihiko / Watanabe, Yoshio / Kadota, Yoshiaki / Iketaki, Yoshinori / Horikawa, Yoshiaki / Oshima, Masaharu / Shigemasa, Eiji / Yagishita, Akira et al. | 1998
- 1091
-
Auger electron spectroscopy depth profiling of Ge/Si multilayers using and ionsMenyhard, M. / Sulyok, A. et al. | 1998
- 1091
-
Auger electron spectroscopy depth profiling of Ge/Si multilayers using He^+ and A^+ ionsMenyhard, M. / Sulyok, A. et al. | 1998
- 1096
-
Determination and application of the depth resolution function in sputter profiling with secondary ion mass spectroscopy and Auger electron spectroscopyHofmann, Siegfried / Schubert, Johannes et al. | 1998
- 1103
-
Tungsten silicide composition analysis by Rutherford backscattering spectroscopy, Auger electron spectroscopy, and x-ray photoelectron spectroscopyBradbury, C. A. / Fillmore, D. K. et al. | 1998
- 1106
-
Quantitative uses of the x-ray photoelectron spectroscopy valence band region in the analysis of polymer blendsThomas, Elizabeth A. / Fulghum, Julia E. et al. | 1998
- 1112
-
Valence band x-ray photoelectron spectroscopic investigation of surface cleanliness of aluminum metal and its alloysHavercroft, Nathan J. / Sherwood, Peter M. A. et al. | 1998
- 1117
-
Ellipsomicroscopy for surface imaging: A novel tool to investigate surface dynamicsHaas, G. / Pletcher, T. D. / Bonilla, G. / Jachimowski, T. A. / Rotermund, H. H. / Lauterbach, J. et al. | 1998
- 1122
-
Two-dimensional imaging of surface morphology by energy-analyzed secondary electrons and Auger electron spectroscopy for stepped Si(111) surfacesSuzuki, M. / Mogi, K. / Homma, Y. et al. | 1998
- 1127
-
A plasma-polymerized protective film for transmission electron microscopy specimen preparation by focused ion beam etchingKato, N. I. / Miura, N. / Tsutsui, N. et al. | 1998
- 1131
-
Measurement and control of sticking probability of on stainless steel surfacesShiokawa, Yoshiro / Ichikawa, Masakazu et al. | 1998
- 1137
-
Design of a low cost, low magnetic susceptibility, ultrahigh vacuum compatible, flanged electrical breakMapes, M. / Hseuh, H. C. / Cameron, P. et al. | 1998
- 1137
-
Design of a low cost, low magnetic susceptibility, ultrahigh vacuum compatible, flanked electrical breakMapes, M. / Hseuh, H. C. / Cameron, P. et al. | 1998
- 1139
-
Design and pumping characteristics of a compact titanium–vanadium non-evaporable getter pumpLi, Yulin / Hess, Daniel / Kersevan, Roberto / Mistry, Nariman et al. | 1998
- 1145
-
Measurements of the helium propagation at 4.4 K in a 480 m long stainless steel pipeHseuh, H. C. / Wallen, E. et al. | 1998
- 1151
-
Turbomolecular pump design for high pressure operationSpagnol, M. / Cerruti, R. / Helmer, J. et al. | 1998
- 1157
-
Miniature quadrupole residual gas analyzer for process monitoring at milliTorr pressuresHolkeboer, D. H. / Karandy, T. L. / Currier, F. C. / Frees, L. C. / Ellefson, R. E. et al. | 1998
- 1163
-
Stable cancellation of x-ray errors in Bayard–Alpert gaugesKendall, B. R. F. / Drubetsky, E. et al. | 1998
- 1169
-
Application of calculated physical adsorption isotherms to a radon sensorHobson, J. P. / Appleby, A. / Kim, I. S. / Sigel, G. H. et al. | 1998
- 1172
-
The morphology of duplex and quadruplex DNA on micaMuir, Tera / Morales, Emily / Root, Jeffrey / Kumar, Indira / Garcia, Brian / Vellandi, Christian / Jenigian, Dena / Marsh, Thomas / Henderson, Eric / Vesenka, James et al. | 1998
- 1178
-
A numerical simulation of the evolution of nanometer-scale surface topography generated by ion millingWinningham, Thomas A. / Zou, Zhong / Douglas, Kenneth / Clark, Noel A. et al. | 1998
- 1183
-
Cell-based sensor microelectrode array characterized by imaging x-ray photoelectron spectroscopy, scanning electron microscopy, impedance measurements, and extracellular recordingsJung, D. R. / Cuttino, D. S. / Pancrazio, J. J. / Manos, P. / Cluster, T. / Sathanoori, R. S. / Aloi, L. E. / Coulombe, M. G. / Czarnaski, M. A. / Borkholder, D. A. et al. | 1998
- 1189
-
Real-time monitoring of scattered laser light by a single particle of several tens of nanometers in the etching chamber in relation to its status with the equipmentUesugi, Fumihiko / Ito, Natsuko / Moriya, Tsuyoshi / Doi, Hiroshi / Sakamoto, Shingo / Hayashi, Yuji et al. | 1998
- 1196
-
Pit-free electropolishing of aluminum and its application for process chamberTajiri, K. / Saito, Y. / Yamanaka, Y. / Kabeya, Z. et al. | 1998
- 1201
-
Self-consistent particle simulation of radio-frequency discharge with implementation of all ion–neutral reactive collisionsDenpoh, Kazuki / Nanbu, Kenichi et al. | 1998
- 1207
-
Studies on structural, electrical, compositional, and mechanical properties of thin films produced by low-pressure chemical vapor depositionSantucci, S. / Lozzi, L. / Passacantando, M. / Picozzi, P. / Petricola, P. / Moccia, G. / Alfonsetti, R. / Diamanti, R. et al. | 1998
- 1213
-
Properties of ZnO:In film prepared by sputtering of facing ZnO:In and Zn targetsTominaga, K. / Umezu, N. / Mori, I. / Ushiro, T. / Moriga, T. / Nakabayashi, I. et al. | 1998
- 1213
-
Properties of ZnO:ln film prepared by sputtering of facing ZnO:ln and Zn targetsTominaga, K. / Umezu, N. / Mori, I. / Ushiro, T. / Moriga, T. / Nakabayashi, I. et al. | 1998
- 1218
-
-type transparent conducting thin films prepared by rf magnetron sputteringMinami, T. / Shimokawa, K. / Miyata, T. et al. | 1998
- 1222
-
Reemission of sputtered refractory metals during depositionTait, R. N. et al. | 1998
- 1227
-
X-ray photoelectron spectroscopy characterization of the oxidation of electroplated and sputter deposited copper surfacesApen, Elizabeth / Rogers, B. R. / Sellers, James A. et al. | 1998
- 1233
-
Texture and surface morphology improvement of Al by two-stage chemical vapor deposition and its integration in an Al plug-interconnect scheme for sub 0.25 mm metallizationNaik, Mehul et al. | 1998
- 1233
-
Texture and surface morphology improvement of AI by two-stage chemical vapor deposition and its integration in an AI plug-interconnect scheme for sub 0.25 m metallizationNaik, M. / Guo, T. / Chen, L. / Mosely, R. / Beinglass, I. et al. | 1998
- 1233
-
Texture and surface morphology improvement of Al by two-stage chemical vapor deposition and its integration in an Al plug-interconnect scheme for sub 0.25 μm metallizationNaik, Mehul / Guo, Ted / Chen, Liang / Mosely, Rod / Beinglass, Israel et al. | 1998
- 1239
-
Submicron contacts for electrical characterization of semiconducting thin filmsBallif, C. / Regula, M. / Lévy, F. / Burmeister, F. / Schäfle, C. / Matthes, Th. / Leiderer, P. / Niedermann, Ph. / Gutmannsbauer, W. / Bucher, R. et al. | 1998
- 1244
-
Control of the preferred orientation of AIN thin films by collimated sputteringRodriguez-Navarro, A. et al. | 1998
- 1244
-
Control of the preferred orientation of AlN thin films by collimated sputteringRodrı́guez-Navarro, A. / Otaño-Rivera, W. / Pilione, L. J. / Messier, R. / Garcı́a-Ruiz, J. M. et al. | 1998
- 1247
-
Generation of vapor stream using a porous rod in an electron beam evaporation processOhba, Hironori / Shibata, Takemasa et al. | 1998
- 1251
-
Effects of treatment on the recrystallization and electro-optical properties of CdTe thin filmsMoutinho, H. R. / Al-Jassim, M. M. / Levi, D. H. / Dippo, P. C. / Kazmerski, L. L. et al. | 1998
- 1251
-
Effects of CdCI~2 treatment on the recrystallization and electro-optical properties of CdTe thin filmsMoutinho, H. R. / Al-Jassim, M. M. / Levi, D. H. / Dippo, P. C. / Kazmerski, L. L. et al. | 1998
- 1258
-
Microstructure-dependent ferroelectric properties of thin films fabricated by radio frequency magnetron sputteringCho, Kwang-Jun / Lee, Jeon-Kook / Jung, Hyung-Jin / Park, Jong-Wan et al. | 1998
- 1262
-
X-ray photoelectron spectroscopy study of TiN films produced with tetrakis(dimethylamido)titanium and selected N-containing precursors onEndle, J. P. / Sun, Y.-M. / White, J. M. / Ekerdt, J. G. et al. | 1998
- 1268
-
Large magnetoresistance effect in as-grown epitaxial films prepared by a molecular beam epitaxy coevaporation techniqueMiniotas, A. / Karlsson, U. O. / Brazdeikis, A. / Chu, C. W. et al. | 1998
- 1272
-
Hardness enhancement by compositionally modulated structure of Ti/TiN multilayer filmsKusano, E. / Kitagawa, M. / Nanto, H. / Kinbara, A. et al. | 1998
- 1277
-
Computer modeling as a tool to predict deposition rate and film composition in the reactive sputtering processBerg, S. / Nyberg, T. / Blom, H.-O. / Nender, C. et al. | 1998
- 1286
-
Modeling of the deposition of stoichiometric using nonarcing direct current magnetron sputteringMacák, K. / Nyberg, T. / Macák, P. / Kharrazi Olsson, M. / Helmersson, U. / Berg, S. et al. | 1998
- 1293
-
Atomistic simulations of organic thin film deposition through hyperthermal cluster impactsQi, Lifeng / Sinnott, Susan B. et al. | 1998
- 1297
-
Determining thickness of thin metal films with spectroscopic ellipsometry for applications in magnetic random-access memoryTompkins, Harland G. / Zhu, Theodore / Chen, Eugene et al. | 1998
- 1303
-
In situ sputter deposition discharge diagnostics for tailoring ceramic film growthAita, C. R. et al. | 1998
- 1311
-
Growth of SiC and films by pulsed laser ablation of SiC in Ar and environmentsSoto, G. / Samano, E. C. / Machorro, R. / Cota, L. et al. | 1998
- 1316
-
Plasma enhanced selective area microcrystalline silicon deposition on hydrogenated amorphous silicon: Surface modification for controlled nucleationSmith, L. L. / Read, W. W. / Yang, C. S. / Srinivasan, E. / Courtney, C. H. / Lamb, H. H. / Parsons, G. N. et al. | 1998
- 1321
-
Synergetic effects in ion beam energy and substrate temperature during hyperthermal particle film depositionMarton, D. / Boyd, K. J. / Rabalais, J. W. et al. | 1998
- 1327
-
Seeded pulsed supersonic molecular beam growth of silicon carbide thin filmsJamison, K.D. / Kempel, M.L. / Ballarotto, V. W. / Kordesch, M.E. et al. | 1998
- 1331
-
Cubic boron nitride thin film deposition by unbalanced magnetron sputtering and dc pulsed substrate biasingOtaño-Rivera, Wilfredo / Pilione, Lawrence J. / Zapien, Juan A. / Messier, Russell et al. | 1998
- 1336
-
Structural and magnetic properties of Fe/Rh(001) sputter deposited multilayersTomaz, M. A. / Harp, G. R. / Mayo, E. / Lederman, D. / Wu, R. / O’Brien, W. L. et al. | 1998
- 1342
-
Co on stepped Cu(100) surfaces: A comparison of experimental data with Monte Carlo growth simulationsCoyle, S. T. / Scheinfein, M. R. / Blue, James L. et al. | 1998
- 1348
-
Characterization and photoemission dichroism of epitaxially grown Gd(0001)/Y(0001)Mishra, S. R. / Cummins, T. R. / Waddill, G. D. / Goodman, K. W. / Tobin, J. G. / Gammon, W. J. / Sherwood, T. / Pappas, D. P. et al. | 1998
- 1355
-
Directly identifying the order of layer switching in magnetic multilayersFreeland, J. W. / Chakarian, V. / Idzerda, Y. U. / Doherty, S. / Zhu, J. G. / Wende, H. / Kao, C.-C. et al. | 1998
- 1359
-
Comparison of x-ray magnetic circular dichroism at the and edges of Mo, Ru, Rh, and PdTomaz, M. A. / Lin, Tao / Harp, G. R. / Hallin, E. / Sham, T. K. / O’Brien, W. L. et al. | 1998
- 1364
-
Magnetization of ultrathin Fe films deposited on Gd (0001)Sherwood, T. S. / Mishra, S. R. / Popov, A. P. / Pappas, D. P. et al. | 1998
- 1368
-
Quantum well states in high-quality Cu films deposited on Co (100): A high resolution photoemission studySegovia, P. / Michel, E. G. / Ortega, J. E. et al. | 1998
- 1374
-
Magnetic nanostructures produced by electron beam patterning of direct write transition metal fluoride resistsStreblechenko, Dmitry / Scheinfein, M. R. et al. | 1998
- 1380
-
Biaxially oriented conductive thin films onJia, Q. X. / Arendt, P. N. / Kwon, C. / Roper, J. M. / Fan, Y. / Groves, J. R. / Foltyn, S. R. et al. | 1998
- 1380
-
Biaxially oriented conductive La0.5Sr0.5Co0.3 thin films on SiO2-SiJia, Q.X. et al. | 1998
- 1384
-
Analysis of B-SiO2 films by highly charged ion based time-of-flight secondary ion mass spectrometry, standard secondary ion mass spectrometry and elastic recoil detectionSchenkel, T. et al. | 1998
- 1384
-
Analysis of films by highly charged ion based time-of-flight secondary ion mass spectrometry and elastic recoil detectionSchenkel, T. / Hamza, A. V. / Barnes, A. V. / Schneider, D. H. / Walsh, D. S. / Doyle, B. L. et al. | 1998
- 1388
-
Sharing of Auger electron spectroscopy and x-ray photoelectron spectroscopy spectral data through the InternetYoshihara, Kazuhiro / Yoshitake, Michiko et al. | 1998
- 1394
-
The birth of electronics: Thermionic emission and vacuumRedhead, P. A. et al. | 1998
- 1402
-
CUMULATIVE AUTHOR INDEX| 1998
- 1403
-
Doping scheme of semiconducting atomic chainsYamada, Toshishige et al. | 1998
- 1403
-
Nanowires and Electronic Properties of Materials| 1998
- 1409
-
Characterization of zinc implanted silica: Effects of thermal annealing and picosecond laser radiationChen, Jinli / Mu, R. / Ueda, A. / Wu, M. H. / Tung, Y.-S. / Gu, Z. / Henderson, D. O. / White, C. W. / Budai, J. D. / Zuhr, R. A. et al. | 1998
- 1409
-
Near-Field Optics and Nanoparticles| 1998
- 1414
-
Numerical study on near field imaging of fluorescence decay of near-surface molecule clusterXiao, Mufei et al. | 1998
- 1420
-
Interference in far-field radiation of two contra-propagating surface plasmon polaritons in the Kretchmann configurationXiao, Mufei / Machorro, Roberto / Siqueiros, Jesús et al. | 1998
- 1425
-
Imaging and direct manipulation of nanoscale three-dimensional features using the noncontact atomic force microscopeRamachandran, T. R. / Madhukar, A. / Chen, P. / Koel, B. E. et al. | 1998
- 1425
-
Nanolithography| 1998
- 1430
-
The use of a Si-based resist system and Ti electrode for the fabrication of sub-10 nm metal-insulator-metal tunnel junctionsWada, T. / Haraichi, S. / Ishii, K. / Hiroshima, H. / Komuro, M. / Gorwadkar, S. M. et al. | 1998
- 1435
-
Observation of channel shortening in -metal–oxide–semiconductor field-effect transistors arising from interconnect plasma processingEl Hassan, Motasim G. / Awadelkarim, O. O. / Werking, J. et al. | 1998
- 1435
-
Plasma Damage| 1998
- 1440
-
Evaluation of plasma charging damage during polysilicon gate etching process in a decoupled plasma source reactorMa, Shawming / Jain, Mohit / Chinn, J. D. et al. | 1998
- 1440
-
Plasma Damage and Feature Evolution| 1998
- 1444
-
Probe diagnostics in a full wave resonator radio-frequency dischargeVinogradov, G. K. / Menagarishvili, V. M. / Yoneyama, S. et al. | 1998
- 1444
-
Plasma Sources, Sensors, Processes, and Damage| 1998
- 1449
-
Dynamic images of plasma processes: Use of Fourier blobs for endpoint detection during plasma etching of patterned wafersRietman, Edward A. / Lee, John Tseng-Chung / Layadi, Nace et al. | 1998
- 1454
-
Effect of upper hybrid waves on uniform electron cyclotron resonance plasmasUeda, Yoko / Kawai, Yoshinobu et al. | 1998
- 1459
-
Role of gas feed delivery and dilutent on oxide etching in an inductively coupled plasma etch systemLercel, M. J. / Dang, D. / Marmillion, N. / Mlynko, W. et al. | 1998
- 1464
-
Characterization of the etch rate non-uniformity in a magnetically enhanced reactive ion etcherBuie, M. J. / Pender, J. T. P. / Dahimene, M. et al. | 1998
- 1469
-
Passivation role of fluorine on the anticorrosion of AlCu films after plasma etchingBaek, Kyu-Ha / Kim, Chang-Il / Kwon, Kwang-Ho / Kim, Tae-Hyung / Chang, Eui-Goo / Yun, Sun Jin / Yoon, Yong-Sun / Kim, Sang-Gi / Nam, Kee-Soo et al. | 1998
- 1469
-
Plasma Etching, Deposition, and Surface Interactions| 1998
- 1473
-
Hydrogen and disilane adsorption on low energy ion-roughened Si (100)Gong, B. / Jo, S. / Hess, G. / Parkinson, P. / Ekerdt, J. G. et al. | 1998
- 1478
-
Etch characteristics of GaN using inductively coupled and plasmasLee, Y. H. / Kim, H. S. / Yeom, G. Y. / Lee, J. W. / Yoo, M. C. / Kim, T. I. et al. | 1998
- 1483
-
Effects of argon addition to a platinum dry etch processMilkove, K. R. / Coffin, J. A. / Dziobkowski, C. et al. | 1998
- 1489
-
A study of platinum electrode patterning in a reactive ion etcherChang, Li-Hsin / Apen, Elizabeth / Kottke, Mike / Tracy, Clarence et al. | 1998
- 1497
-
Comparison of plasma chemistries for inductively coupled plasma etching of InGaAlP alloysHong, J. / Lee, J. W. / Abernathy, C. R. / Lambers, E. S. / Pearton, S. J. / Shul, R. J. / Hobson, W. S. et al. | 1998
- 1502
-
Deep-submicron trench profile control using a magnetron enhanced reactive ion etching system for shallow trench isolationYeon, Chung-Kyu / You, Hyuk-Joon et al. | 1998
- 1509
-
Characterization of low dielectric constant plasma enhanced chemical vapor deposition fluorinated silicon oxide films as intermetal dielectric materialsKim, K. / Kwon, D. H. / Nallapati, G. / Lee, G. S. et al. | 1998
- 1514
-
Contact etch scaling with contact dimensionMcNevin, S. C. / Cerullo, M. et al. | 1998
- 1514
-
Oxide Etching: Aspect Ratio Dependent Etching and Selectivity| 1998
- 1519
-
Flow rate rule for high aspect ratio hole etchingChinzei, Yasuhiko / Ogata, Makoto / Shindo, Haruo / Ichiki, Takanori / Horiike, Yasuhiro et al. | 1998
- 1525
-
Stability of Si-O-F low-K dielectrics: Attack by water molecules as function of near-neighbor Si-F bonding arrangementsYang, H. / Lucovsky, G. et al. | 1998
- 1525
-
Low-K Dielectric and Organic Plasma Processes| 1998
- 1529
-
Magnetically neutral loop discharged plasma sources and systemUchida, Taijiro et al. | 1998
- 1529
-
Novel Plasma Sources and Systems| 1998
- 1537
-
Large-area high-density plasma excitation using standing pure and hybrid surface wavesGhanashev, I. / Nagatsu, M. / Morita, S. / Sugai, H. et al. | 1998
- 1542
-
High-rate etching of GaAs using chlorine atmospheres doped with a Lewis acidFranz, Gerhard et al. | 1998
- 1542
-
Compound Semiconductor Etching| 1998
- 1547
-
Surface chemistry and damage in the high density plasma etching of gallium arsenideLeonhardt, D. / Eddy, C. R. / Shamamian, V. A. / Holm, R. T. / Glembocki, O. J. / Butler, J. E. et al. | 1998
- 1552
-
Proposal for an etching mechanism of InP in mixtures based on plasma diagnostics and surface analysisFeurprier, Y. / Cardinaud, Ch. / Grolleau, B. / Turban, G. et al. | 1998
- 1560
-
Spatially-averaged model for plasma etch processes: Comparison of different approaches to electron kineticsAhlrichs, P. / Riedel, U. / Warnatz, J. et al. | 1998
- 1560
-
Plasma Reaction Mechanisms| 1998
- 1566
-
Visualization of etching mechanisms of a vicinal Cu surface using scanning tunneling microscopyNakakura, C. Y. / Altman, E. I. et al. | 1998
- 1571
-
Halogen uptake by thin layers on exposure to and plasmas, investigated by vacuum transfer x-ray photoelectron spectroscopyDonnelly, V. M. / Layadi, N. et al. | 1998
- 1571
-
Plasma Surface Interactions| 1998
- 1577
-
Chamber Cleaning and Downstream Processing| 1998
- 1577
-
Evaluation of trifluoroacetic anhydride as an alternative plasma enhanced chemical vapor deposition chamber clean chemistryPruette, L. C. / Karecki, S. M. / Reif, R. / Langan, J. G. / Rogers, S. A. / Ciotti, R. J. / Felker, B. S. et al. | 1998
- 1582
-
Ultrahigh-selectivity silicon nitride etch process using an inductively coupled plasma sourceWang, Ying / Luo, Leroy et al. | 1998
- 1588
-
Suppression of notching by lowering the bias frequency in electron cyclotron resonance plasma with a divergent magnetic fieldMorioka, H. / Matsunaga, D. / Yagi, H. et al. | 1998
- 1588
-
Pulsed Plasma Material Processing| 1998
- 1594
-
etching in magnetic neutral loop discharge plasmaChen, W. / Itoh, M. / Hayashi, T. / Uchida, T. et al. | 1998
- 1594
-
Oxide Etching: Diagnostics and Tools| 1998
- 1600
-
Magnetic field optimization in a dielectric magnetically enhanced reactive ion etch reactor to produce an instantaneously uniform plasmaLindley, R. A. / Björkman, C. H. / Shan, H. / Ke, K.-H. / Doan, K. / Mett, R. R. / Welch, M. et al. | 1998
- 1604
-
Dielectric etching for 0.18 μm technologiesBerruyer, P. / Vinet, F. / Feldis, H. / Blanc, R. / Lerme, M. / Morand, Y. / Poiroux, T. et al. | 1998
- 1604
-
Dielectric etching for 0.18 m m technologiesBerruyer, P. et al. | 1998
- 1609
-
Doping of group III nitridesPloog, Klaus H. / Brandt, Oliver et al. | 1998
- 1609
-
Critical Issues in Wideband Nitrides| 1998
- 1615
-
Ultrahigh vacuum arcjet nitrogen source for selected energy epitaxy of group III nitrides by molecular beam epitaxyGrunthaner, F. J. / Bicknell-Tassius, R. / Deelman, P. / Grunthaner, P. J. / Bryson, C. / Snyder, E. / Giuliani, J. L. / Apruzese, J. P. / Kepple, P. et al. | 1998
- 1621
-
Selective inductively coupled plasma etching of group-III nitrides in - and -based plasmasShul, R. J. / Willison, C. G. / Bridges, M. M. / Han, J. / Lee, J. W. / Pearton, S. J. / Abernathy, C. R. / MacKenzie, J. D. / Donovan, S. M. / Zhang, L. et al. | 1998
- 1627
-
Issues in Optoelectronics| 1998
- 1627
-
Effect of atomic hydrogen on Er luminescence from AlNPearton, S. J. / Abernathy, C. R. / MacKenzie, J. D. / Hömmerich, U. / Zavada, J. M. / Wilson, R. G. / Schwartz, R. N. et al. | 1998
- 1631
-
Comparison of inductively coupled plasma and /H2 etching of III-nitridesCho, Hyun / Vartuli, C. B. / Donovan, S. M. / Abernathy, C. R. / Pearton, S. J. / Shul, R. J. / Constantine, C. et al. | 1998
- 1636
-
Electrical, optical, and structural properties of indium-tin-oxide thin films deposited on polyethylene terephthalate substrates by rf sputteringKulkarni, A. K. / Lim, T. / Khan, M. / Schulz, Kirk H. et al. | 1998
- 1641
-
Photonic and Electronic Materials Processing| 1998
- 1641
-
Wurtzite GaN surface structures studied by scanning tunneling microscopy and reflection high energy electron diffractionSmith, A. R. / Ramachandran, V. / Feenstra, R. M. / Greve, D. W. / Shin, M.-S. / Skowronski, M. / Neugebauer, J. / Northrup, J. E. et al. | 1998
- 1646
-
Enhanced Schottky barrier on InGaAs for high performance photodetector applicationHe, L. / Costello, M. J. / Cheng, K. Y. / Wohlert, D. E. et al. | 1998
- 1650
-
Growth of GaS on GaAs (100) surfaces using the molecular precursor in ultrahigh vacuumYi, S. I. / Chung, C.-H. / Weinberg, W. H. et al. | 1998
- 1654
-
Issues in Silicon Processing and in Microelectronics| 1998
- 1654
-
Analytic representations of the dielectric functions of crystalline and amorphous Si and crystalline Ge for very large scale integrated device and structural modelingLeng, J. / Opsal, J. / Chu, H. / Senko, M. / Aspnes, D. E. et al. | 1998
- 1658
-
Spectroscopic and thermal studies of -SiC:H film growth: Comparison of mono-, tri-, and tetramethylsilaneLee, Moon-Sook / Bent, Stacey F. et al. | 1998
- 1664
-
Gate leakage current: A sensitive characterization parameter for plasma-induced damage detection in ultrathin oxide submicron transistorsJiang, J. / Awadelkarim, O. O. / Werking, J. et al. | 1998
- 1670
-
Ultrathin film growth by chemical vapor deposition of and on bare and -passivated Si(100) for gate dielectric applicationsSon, K.-A. / Mao, A. Y. / Kim, B. Y. / Liu, F. / Pylant, E. D. / Hess, D. A. / White, J. M. / Kwong, D. L. / Roberts, D. A. / Vrtis, R. N. et al. | 1998
- 1670
-
Novel Dielectrics and Materials for Semiconductors| 1998
- 1676
-
Pulsed supersonic molecular beam growth of AINBallarotto, V.W. et al. | 1998
- 1676
-
Pulsed supersonic molecular beam growth of AlNBallarotto, V. W. / Kordesch, M. E. et al. | 1998
- 1680
-
Octadecyltrichlorosilane self-assembled-monolayer islands as a self-patterned-mask for HF etching of on SiKomeda, T. / Namba, K. / Nishioka, Y. et al. | 1998
- 1686
-
Transition metal nitride formed by simultaneous physisorption and thermal evaporation; TiN/Si(100)Ahn, S. / Han, J. Y. / Seo, J. M. et al. | 1998
- 1692
-
Measurements of epitaxially grown structures by ballistic electron emission microscopy and scanning tunneling microscopyLaBella, V. P. / Shusterman, Y. / Schowalter, L. J. / Ventrice, C. A. et al. | 1998
- 1697
-
Magnetic Recording Technology: Processing Issues| 1998
- 1697
-
Development of electron cyclotron resonance and inductively coupled plasma high density plasma etching for patterning of NiFe and NiFeCoJung, K. B. / Lambers, E. S. / Childress, J. R. / Pearton, S. J. / Jenson, M. / Hurst, A. T. et al. | 1998
- 1702
-
Effects of “processing parameters” in plasma deposition: Acrylic acid revisitedCandan, Sennur / Beck, Alison J. / O’Toole, Liam / Short, Robert D. et al. | 1998
- 1702
-
Macromolecules at Suffaces| 1998
- 1710
-
Surface studies of plasma source ion implantation treated polystyreneLee, Yeonhee / Han, Seunghee / Lee, Jung-Hye / Yoon, Jung-Hyeon / Lim, Hyun Eui / Kim, Kang-Jin et al. | 1998
- 1716
-
Real-time core-level spectroscopy of initial thermal oxide on Si(100)Enta, Y. / Miyanishi, Y. / Irimachi, H. / Niwano, M. / Suemitsu, M. / Miyamoto, N. / Shigemasa, E. / Kato, H. et al. | 1998
- 1716
-
Ultra Thin Silicon Oxides: Interface Structure and Kinetics| 1998
- 1721
-
Optimization of nitrided gate dielectrics by plasma-assisted and rapid thermal processingLucovsky, G. / Niimi, H. / Wu, Y. / Parker, C. R. / Hauser, J. R. et al. | 1998
- 1730
-
Second-harmonic generation at the interface between Si(100) and thin layersCundiff, S. T. / Knox, W. H. / Baumann, F. H. / Evans-Lutterodt, K. W. / Green, M. L. et al. | 1998
- 1735
-
Localized degradation studies of ultrathin gate oxidesWen, H. J. / Ludeke, R. et al. | 1998
- 1735
-
Ultra Thin Silicon Oxides: Growth and Electrical Characterization| 1998
- 1741
-
Hard Disc Processing Issues I| 1998
- 1741
-
Nanoscale scratch resistance of ultrathin protective overcoats on hard magnetic disksAnoikin, E. V. / Yang, M. M. / Chao, J. L. / Elings, J. R. / Brown, D. W. et al. | 1998
- 1745
-
Study of substrate bias effect on corrosion susceptibility of thin film magnetic disks by accelerated chemical testsWang, Charles C. / Chia, Ray W. J. / Lee, Jerry K. / Tang, Wing T. et al. | 1998
- 1750
-
Hard Disc Processing Issues II| 1998