Electron cyclotron resonance reactive ion etching of fine features in HgxCd1−xTe using CH4/H2 plasmas (Englisch)
- Neue Suche nach: Eddy, C. R.
- Neue Suche nach: Dobisz, E. A.
- Neue Suche nach: Meyer, J. R.
- Neue Suche nach: Hoffman, C. A.
- Neue Suche nach: Eddy, C. R.
- Neue Suche nach: Dobisz, E. A.
- Neue Suche nach: Meyer, J. R.
- Neue Suche nach: Hoffman, C. A.
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
;
11
, 4
;
1763-1767
;
1993
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Electron cyclotron resonance reactive ion etching of fine features in HgxCd1−xTe using CH4/H2 plasmas
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Weitere Titelangaben:ECR‐RIE of fine features in HgxCd1−xTe
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Beteiligte:Eddy, C. R. ( Autor:in ) / Dobisz, E. A. ( Autor:in ) / Meyer, J. R. ( Autor:in ) / Hoffman, C. A. ( Autor:in )
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Erschienen in:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films ; 11, 4 ; 1763-1767
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Verlag:
- Neue Suche nach: American Vacuum Society
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Erscheinungsdatum:01.07.1993
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Format / Umfang:5 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
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- 1383
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Thin film sensors: The role of defects and impurity sites in controlling sensor response and selectivityCollins, G. E. / Armstrong, N. R. / Pankow, J. W. / Oden, C. / Brina, R. / Arbour, C. / Dodelet, J.‐P. et al. | 1993
- 1392
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Ultrathin heteroepitaxial SnO2 films for use in gas sensorsPoirier, G. E. / Cavicchi, R. E. / Semancik, S. et al. | 1993
- 1396
-
Novel embedded capacitive sensors for monitoring the cure of polyimide in multichip modulesPan, Zikang / Hesketh, P. J. / Maclay, G. J. et al. | 1993
- 1401
-
Sputtered high temperature thin film thermocouplesKreider, Kenneth G. et al. | 1993
- 1406
-
Properties of ferroelectric PbTiO3 films grown in an ionized cluster beam systemHuffman, Maria / Kalkur, T. S. / Kammerdiner, L. / Kwor, R. / Levenson, L. L. / Reeder, M. et al. | 1993
- 1411
-
Development and fabrication of thin‐film BaTiO3 capacitors using radio‐frequency magnetron sputteringShi, Z. Q. / Jia, Q. X. / Anderson, W. A. et al. | 1993
- 1414
-
Ellipsometry and x‐ray photoelectron spectroscopy study of SnO2 reduction at the interface with sputtered a‐Si:HYang, Y. H. / Feng, G. F. / Katiyar, M. / Maley, N. / Abelson, J. R. et al. | 1993
- 1418
-
Saddle‐field ion source deposition of conductive thin filmsCardinale, G. F. / Howitt, D. G. et al. | 1993
- 1422
-
Transparent and conductive GaN thin films prepared by an electron cyclotron resonance plasma metalorganic chemical vapor deposition methodSato, H. / Minami, T. / Yamada, E. / Takata, S. / Ishii, M. et al. | 1993
- 1426
-
Gas porosity formation in epitaxial TiN films deposited by reactive magnetron sputtering in mixed Ar/N2 dischargesKazansky, P. R. / Hultman, L. / Ivanov, I. / Sundgren, J.‐E. et al. | 1993
- 1431
-
Materials for superconducting electronics: In situ growth of PrGaO3 thin films by metalorganic chemical vapor depositionHan, Bin / Neumayer, Deborah A. / Schulz, Douglas L. / Hinds, Bruce J. / Marks, Tobin J. et al. | 1993
- 1435
-
Role of stress relief in the hexagonal‐close‐packed to face‐centered‐cubic phase transformation in cobalt thin filmsCabral, C. / Barmak, K. / Gupta, J. / Clevenger, L. A. / Arcot, B. / Smith, D. A. / Harper, J. M. E. et al. | 1993
- 1441
-
Electrophoretic deposition of pure MoS2 dry film lubricant coatingsPanitz, Janda K. G. / Dugger, M. T. / Peebles, D. E. / Tallant, D. R. / Hills, C. R. et al. | 1993
- 1447
-
Gas incorporation during ion‐assisted deposition in bias sputteringWindow, B. / Harding, G. L. et al. | 1993
- 1451
-
Design and performance of a novel powder flash evaporatorShepherd, J. A. / Sobottka, S. E. / Williams, M. B. et al. | 1993
- 1454
-
Ir–Zr alloys as diffusion barriers between Cu and Si(100)Yang, H. / Gilmore, C. M. / Ramaker, D. E. et al. | 1993
- 1458
-
Oxidation behavior of annealed CoCr thin filmsDemczyk, B. G. et al. | 1993
- 1458
-
Oxidation behavlor of annealed CoCr thin filmsDemczyk, B.G. et al. | 1993
- 1464
-
Investigation of a laser soldering process for the interconnection of thin film sensors with sputtered multilayer metallizationsChabicovsky, R. / Nicolics, J. / Musiejovsky, L. et al. | 1993
- 1470
-
X‐ray diffraction analysis and x‐ray photoelectron spectroscopy of α‐ and β‐W thin films grown by ion beam assisted depositionShah, S. I. / Doele, B. A. / Fincher, C. R. / Unruh, K. M. / Weerasekera, I. et al. | 1993
- 1470
-
X-ray diffraction analysis and x-ray photoelectron spectroscopy of a- and b-W thin films grown by ion beam assisted depositionShah, S.I. et al. | 1993
- 1474
-
Characteristics of oxygen implanted indium phosphideHe, L. / Anderson, W. A. et al. | 1993
- 1480
-
Metal ion implantation for large scale surface modificationBrown, Ian G. et al. | 1993
- 1486
-
Radio frequency plasma jet applied to coating of internal walls of narrow tubesBárdoš, L. / Berg, S. / Baránková, H. et al. | 1993
- 1491
-
Aluminum oxide thin film deposition by reactive ion plating using the cathode system composed of LaB6 disc and Ta pipeTakahashi, Y. / Nitobe, K. / Uramoto, J. / Momose, T. / Ishimaru, H. et al. | 1993
- 1496
-
Characteristics of hollow cathode discharge plasma and its application for the reactive ion plating of TiN and TiCWhang, K. W. / Seo, Y. W. et al. | 1993
- 1501
-
Cosputtering and serial cosputtering using cylindrical rotatable magnetronsBelkind, A. et al. | 1993
- 1510
-
Deposition by glow discharge sputtering of thin epitaxial films of Ib–VIII alloys (AgPd, CuPd, CuRh)Delplancke, M. P. / Reniers, F. / Asskali, A. / Jardinier‐Offergeld, M. / Bouillon, F. et al. | 1993
- 1516
-
Metastable states’ population densities in Gd atomic beam at high‐rate evaporation by electron beam heatingNishimura, Akihiko / Arisawa, Takashi / Ohba, Hironori / Shibata, Takemasa et al. | 1993
- 1522
-
Removing the energetic neutral problem in sputteringWindow, B. et al. | 1993
- 1528
-
Reactive magnetron sputter deposition of niobium nitride filmsWong, M. S. / Sproul, W. D. / Chu, X. / Barnett, S. A. et al. | 1993
- 1528
-
Reactive magnetron sputter deposition of nioblum nitride filmsWong, M. S. / Sproul, W. D. / Chu, X. / Barnett, S. A. et al. | 1993
- 1534
-
Reactive sputtering using two reactive gases, experiments and computer modelingCarlsson, P. / Nender, C. / Barankova, H. / Berg, S. et al. | 1993
- 1540
-
Phase formation in sputter deposited metal (V, Nb, Zr, Y) oxides: Relationship to metal, metal–oxygen, and oxygen fluxAita, Carolyn Rubin et al. | 1993
- 1548
-
Sputter deposition of yttrium–oxidesJankowski, A. F. / Schrawyer, L. R. / Hayes, J. P. et al. | 1993
- 1553
-
Effects of aluminum sputtering target surface grain relief and crystallographic orientation on sputtering I–V characteristicsLeybovich, A. / Kuniya, T. et al. | 1993
- 1558
-
Effects of aluminum silicon copper sputtering target processing methods on thin film uniformity and process control during very large scale integrated device fabricationDunlop, J. A. / Pouliquen, B. Y. / Drinnon, T. J. / Wilcoxen, D. T. / Huneke, J. C. / Ivanov, I. C. / Knorr, D. B. / Tracy, D. P. et al. | 1993
- 1566
-
Time-dependent hellum and hydrogen pressure profiles in a long, cryogenically cooled tube, pumped at periodic intervalsHobson, J.P. et al. | 1993
- 1566
-
Time‐dependent helium and hydrogen pressure profiles in a long, cryogenically cooled tube, pumped at periodic intervalsHobson, J. P. / Welch, K. M. et al. | 1993
- 1575
-
Radio‐frequency superconductivity technology: Its sensitivity to surface conditionsKneisel, P. et al. | 1993
- 1584
-
Gas permeation through a high density polyethylene microwave windowNguyen‐Tuong, Viet et al. | 1993
- 1587
-
Design of large aperture, low mass vacuum windowsMapes, M. / Leonhardt, W. J. et al. | 1993
- 1593
-
Quantitative analysis of contaminants in ultrapure gases at the parts‐per‐trillion level using atmospheric pressure ionization mass spectroscopySiefering, Kevin / Berger, Henry / Whitlock, Walter et al. | 1993
- 1598
-
High sensitivity He desorption leak detection methodRao, M. G. et al. | 1993
- 1602
-
Low temperature organometallic gas introduction system for chemical beam epitaxy under micro gravity conditionsZaltsberg, M. / Bensaoula, A. / Horton, C. / Haacke, R. / Freundlich, A. / Mahavadi, P. / Rossignol, V. et al. | 1993
- 1607
-
Pumping of helium and hydrogen by sputter‐ion pumps. I. Helium pumpingWelch, K. M. / Pate, D. J. / Todd, R. J. et al. | 1993
- 1614
-
New concepts in turbomolecular pump designHablanian, M. H. et al. | 1993
- 1620
-
Total pressure measurement down to 10−12 Pa without electron stimulated desorption ion errorsWatanabe, Fumio et al. | 1993
- 1627
-
Safety and health considerations related to vacuum gaugingPeacock, R. N. et al. | 1993
- 1631
-
CUMULATIVE AUTHOR INDEX| 1993
- 1637
-
Dynamics of adsorbate‐induced restructuring and reaction between adsorbates on Cu and Ni surfaces studied by scanning tunneling microscopyBesenbacher, F. / Klink, C. / Lægsgaard, E. / Nielsen, L. P. / Ruan, L. / Stensgaard, I. et al. | 1993
- 1640
-
Real‐time scanning tunneling microscopy of phase transition and faceting on a vicinal Si(111) surfaceSuzuki, M. / Homma, Y. / Hibino, H. / Fukuda, T. / Sato, T. / Iwatsuki, M. / Miki, K. / Tokumoto, H. et al. | 1993
- 1644
-
Vacancy migration, adatom motion, and atomic bistability on the GaAs(110) surface studied by scanning tunneling microscopyGwo, S. / Smith, A. R. / Shih, C. K. et al. | 1993
- 1649
-
Elevated temperature oxidation and etching of the Si(111) 7x7 surface observed with scanning tunneling microscopySeiple, J. / Pecquet, J. / Meng, Z. / Pelz, J. P. et al. | 1993
- 1649
-
Elevated temperature oxidation and etching of the Si(111) 7×7 surface observed with scanning tunneling microscopySeiple, J. / Pecquet, J. / Meng, Z. / Pelz, J. P. et al. | 1993
- 1654
-
Growth and morphology of partial and multilayer Fe thin films on Cu(100) and the effect of adsorbed gases studied by scanning tunneling microscopyJohnson, K. E. / Chambliss, D. D. / Wilson, R. J. / Chiang, S. et al. | 1993
- 1661
-
Face‐centered‐cubic (111) to body‐centered‐cubic (110) transition in epitaxial Fe on Cu(111)Kief, M. T. / Egelhoff, W. F. et al. | 1993
- 1661
-
Face-centered-dubic (111) to body-centered-cubic (110) transition in epitaxial Fe on Cu(111)Kief, M. T. / Egelhoff, W. F. et al. | 1993
- 1667
-
Ultrathin Fe films on TiO2(110): Growth and reactivityPan, Jian‐Mei / Madey, Theodore E. et al. | 1993
- 1675
-
Electronic and geometric structure of C60 molecules on Au(001)Kim, D. K. / Suh, Y. D. / Park, K. H. / Noh, H. P. / Kim, S. K. / Oh, S. J. / Kuk, Young et al. | 1993
- 1680
-
Scanning tunneling microscopy studies of nucleation and growth in a reactive, epitaxial system: Co/Si(111)Bennett, P. A. / Parikh, S. A. / Cahill, D. G. et al. | 1993
- 1686
-
Ellipsometry investigation of nucleation and growth of electron cyclotron resonance plasma deposited silicon filmsLi, M. / Hu, Y. Z. / Wall, J. / Conrad, K. / Irene, E. A. et al. | 1993
- 1692
-
Nucleation and growth of chemical vapor deposition TiN films on Si (100) as studied by total reflection x‐ray fluorescence, atomic force microscopy, and Auger electron spectroscopyHegde, Rama I. / Tobin, Philip J. / Fiordalice, Robert W. / Travis, Edward O. et al. | 1993
- 1696
-
Precision parts cleaning using supercritical fluidsPurtell, Robert / Rothman, Laura / Eldridge, Benjamin / Chess, Catherine et al. | 1993
- 1702
-
Model for the outgassing of water from metal surfacesLi, M. / Dylla, H. F. et al. | 1993