Surface plasmon waveguide devices with Tg-bonded Cytop claddings (Englisch)
- Neue Suche nach: Chiu, Charles
- Neue Suche nach: Lisicka-Skrzek, Ewa
- Neue Suche nach: Niall Tait, R.
- Neue Suche nach: Berini, Pierre
- Neue Suche nach: Chiu, Charles
- Neue Suche nach: Lisicka-Skrzek, Ewa
- Neue Suche nach: Niall Tait, R.
- Neue Suche nach: Berini, Pierre
In:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
;
29
, 6
;
7
;
2011
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Surface plasmon waveguide devices with Tg-bonded Cytop claddings
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Weitere Titelangaben:Surface plasmon waveguide devices with Tg-bonded Cytop claddings
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Beteiligte:Chiu, Charles ( Autor:in ) / Lisicka-Skrzek, Ewa ( Autor:in ) / Niall Tait, R. ( Autor:in ) / Berini, Pierre ( Autor:in )
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Erschienen in:
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Verlag:
- Neue Suche nach: American Vacuum Society
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Erscheinungsdatum:01.11.2011
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Format / Umfang:7 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 29, Ausgabe 6
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Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
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Charging effects during focused electron beam induced deposition of silicon oxidede Boer, Sanne K. / van Dorp, Willem F. / De Hosson, Jeff Th. M. et al. | 2011
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Lithography-patterning-fidelity-aware electron-optical system design optimizationChen, Sheng-Yung / Ng, Hoi-Tou / Ma, Shiau-Yi / Chen, Hsing-Hong / Liu, Chun-Hung / Tsai, Kuen-Yu / 陳勝勇 / 伍海濤 / 馬學億 / 陳信宏 et al. | 2011
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Nanofabrication down to 10 nm on a plastic substrateTao, Li / Lee, Jongho / Akinwande, Deji et al. | 2011
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Technology platform for the fabrication of titanium nanostructuresEcoffey, Serge / Guilmain, Marc / Morissette, Jean-François / Bourque, Frédéric / Pont, Jérémy / Sang, Bruno Lee / Drouin, Dominique et al. | 2011
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In situ study of hydrogen silsesquioxane dissolution rate in salty and electrochemical developersHarry, Katherine J. / Strobel, Sebastian / Yang, Joel K. W. / Duan, Huigao / Berggren, Karl K. et al. | 2011
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Electron beam lithography writing strategies for low loss, high confinement silicon optical waveguides 06F309Bojko, Richard J et al. | 2011
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Lithography - Integration of moth-eye structures into a poly(dimethylsiloxane) stamp for the replication of functionalized microlenses using UV-nanoimprint lithography 061601Senn, Tobias et al. | 2011
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Fast aerial image simulations using one basis mask pattern for optical proximity correction 06FH03Liu, Shiyuan et al. | 2011
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Fabrication of silicon template with smooth tapered sidewall for nanoimprint lithography 06FC16He, Jian et al. | 2011
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Multitip atomic force microscope lithography system for high throughput nanopatterning 06FD03Oh, Young et al. | 2011
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Nanomachining with a focused neon beam: A preliminary investigation for semiconductor circuit editing and failure analysis 06F604Tan, Shida et al. | 2011
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MEMS process compatibility of multiwall carbon nanotubes 06FE04Cook, Eugene H et al. | 2011
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Room temperature nanoimprinting using spin-coated hydrogen silsesquioxane with high boiling point solvent 06FC03Kang, Yuji et al. | 2011
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Large-diameter roll mold fabrication method using a small-diameter quartz roll mold and UV nanoimprint lithography 06FC08Taniguchi, Jun et al. | 2011
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Atomic step patterning in nanoimprint lithography: Molecular dynamics study 06FC11Tada, Kazuhiro et al. | 2011
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MEMS & NEMS - Semiconductor nanopores formed by chemical vapor deposition of heteroepitaxial SiC films on SOI(100) substrates 062001Ikoma, Yoshifumi et al. | 2011
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Organic Electronics and Optoelectronics - Fabrication of a blue organic light-emitting diode with a novel thermal deposition boat 062401Lee, Sangmin et al. | 2011
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Review Article - Functional semiconductor nanowires via vapor deposition 060801Shi, Jian et al. | 2011
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Emerging Technologies - 3D nanostructures by stacking pre-patterned fluid-supported single-crystal Si membranes 06F401Ghadarghadr, Shabnam et al. | 2011
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High aspect ratio fine pattern transfer using a novel mold by nanoimprint lithography 06FC15Sakamoto, J et al. | 2011
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AUTHOR INDEX A27| 2011
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Materials Index to Volume 29 A111| 2011
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Nanostructures and Pattern Transfer - Etch properties of resists modified by sequential infiltration synthesis 06FG01Tseng, Yu-Chih et al. | 2011
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Twelve nanometer half-pitch W-Cr-HSQ trilayer process for soft x-ray tungsten zone plates 06FG02Reinspach, Julia et al. | 2011
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Evaluation of the curing process of UV resins in a 1,1,1,3,3-pentafluoropropane gas environment by photo differential scanning calorimetry and Fourier transform infrared spectroscopy 06FC05Sawada, Yohei et al. | 2011
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Temperature mapping using single wavelength pyrometry during epitaxial growthPaquette, Bernard / Gsib, Badii / Arès, Richard et al. | 2011
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Effects of proton irradiation on dc characteristics of InAlN/GaN high electron mobility transistorsLo, C. F. / Liu, L. / Ren, F. / Kim, H.-Y. / Kim, J. / Pearton, S. J. / Laboutin, O. / Cao, Yu / Johnson, J. W. / Kravchenko, I. I. et al. | 2011
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Oxide nanotube analogues: CuO nanobarrelsFarrell, H. H. / Parra, Ruben D. et al. | 2011
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Modeling the power spectrum of thermal line edge roughness in a lamellar diblock copolymer mesophase a)Bosse, August W. et al. | 2011
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Probe field enhancement in photonic crystals by upconversion nanoparticlesZhang, Jingyu / Pick, Teresa E. / Gargas, Daniel / Dhuey, Scott / Chan, Emory M. / Wu, Ying / Liang, Xiaogan / Schuck, P. James / Olynick, Deirdre L. / Helms, Brett A. et al. | 2011
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Scanning proximal probe lithography for sub-10 nm resolution on calix[4]resorcinareneKaestner, Marcus / Rangelow, Ivo W. et al. | 2011
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New diamond nanofabrication process for hard x-ray zone platesUhlén, Fredrik / Lindqvist, Sandra / Nilsson, Daniel / Reinspach, Julia / Vogt, Ulrich / Hertz, Hans M. / Holmberg, Anders / Barrett, Ray et al. | 2011
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Selective graphene growth from DLC thin film patterned by focused-ion-beam chemical vapor depositionHatakeyama, Taiki / Kometani, Reo / Warisawa, Shin’ichi / Ishihara, Sunao et al. | 2011
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Fast aerial image simulations using one basis mask pattern for optical proximity correctionLiu, Shiyuan / Wu, Xiaofei / Liu, Wei / Zhang, Chuanwei et al. | 2011
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Flexible poly(dimethyl siloxane) support layers for the evanescent characterization of near-field lithography systemsMoore, Ciaran P. / Blaikie, Richard J. et al. | 2011
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Large-area suspended graphene on GaN nanopillarsLee, Chongmin / Kim, Byung-Jae / Ren, Fan / Pearton, S. J. / Kim, Jihyun et al. | 2011
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Functional semiconductor nanowires via vapor depositionShi, Jian / Wang, Xudong et al. | 2011
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Experimental evaluation method of point spread functions used for proximity effects correction in electron beam lithographyNilsson, Bengt A. et al. | 2011
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Model based hybrid proximity effect correction scheme combining dose modulation and shape adjustmentsKlimpel, Thomas / Schulz, Martin / Zimmermann, Rainer / Stock, Hans-Jürgen / Zepka, Alex et al. | 2011
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Electron bombardment of films used for reducing spurious charge in electrostatic electron opticsMaldonado, Juan R. / Pease, Fabian / Hitzman, Charles J. / Brodie, Alan D. / Petric, Paul / Bevis, Chris / McCord, Mark / Tong, William M. / Kidwingira, Francoise / Pianetta, Piero et al. | 2011
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Modeling of charging effect on ion induced secondary electron emission from nanostructured materialsOhya, Kaoru / Takami, Daiki / Yamanaka, Takuya et al. | 2011
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Influence of surface patterning on bacterial growth behaviorNill, Peter / Kern, Dieter P. / Goehring, Nadine / Peschel, Andreas et al. | 2011
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Novel method for fabrication of nanoscale single-electron transistors: Electron beam induced deposition of Pt and atomic layer deposition of tunnel barriersGeorge, Hubert C. / Orlova, Tatyana A. / Orlov, Alexei O. / Snider, Gregory L. et al. | 2011
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Fabrication of hybrid metal island/silicon single electron transistorLee, Yen-Chun / Orlov, Alexei O. / Snider, Gregory L. et al. | 2011
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Macro-optical inspection method for deterioration evaluation of release-coated mold surfaces for nanoimprint lithographyTaniguchi, Jun / Takahashi, Junki / Uda, Mitsuru / Kohayase, Atushi / Kotaki, Kenichi et al. | 2011
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Combining nanoimprint lithography and a molecular weight selective thermal reflow for the generation of mixed 3D structuresSchleunitz, Arne / Spreu, Christian / Vogler, Marko / Atasoy, Hakan / Schift, Helmut et al. | 2011
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Soft patterning on cylindrical surface of plastic optical fiberMekaru, Harutaka / Takagi, Hideki / Ohtomo, Akihiro / Kokubo, Mitsunori / Goto, Hiroshi et al. | 2011
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Experimental analysis for process control in hybrid lithographyDhima, Khalid / Steinberg, Christian / Möllenbeck, Saskia / Mayer, Andre / Wang, Si / Sheer, Hella-Christin et al. | 2011
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Morphology of the Au-Si interface formed during solidification of liquid Au/Si(111) islands 061805Jungwirth, Nick et al. | 2011
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Interface and electrical properties of Tm2O3 gate dielectrics for gate oxide scaling in MOS devices 062202Kouda, M et al. | 2011
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Selective placement of DNA origami on substrates patterned by nanoimprint lithography 06F205Penzo, Erika et al. | 2011
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Direct top-down ordering of diblock copolymers through nanoimprint lithography 06F208Salaün, M et al. | 2011
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Electron or Ion Beam Lithography - 3D Nanostructuring of hydrogen silsesquioxane resist by 100 keV electron beam lithography 06F301Vila-Comamala, Joan et al. | 2011
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Developer-free direct patterning of PMMA/ZEP 520A by low voltage electron beam lithography 06F303Zhi Zheng, David Ai et al. | 2011
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Comparison between ZEP and PMMA resists for nanoscale electron beam lithography experimentally and by numerical modeling 06F306Koshelev, Kirill et al. | 2011
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Investigation of polarity effects on the degradation of Pd/Ti/Pt ohmic contacts to p-type SiC under current stress 061205Downey, B P et al. | 2011
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Probe field enhancement in photonic crystals by upconversion nanoparticles 06F403Zhang, Jingyu et al. | 2011
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Improved time dependent performance of hydrogen silsesquioxane resist using a spin on top coat 06RJ02Westly, Daron A et al. | 2011
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Ion beams in SEM: An experiment towards a high brightness low energy spread electron impact gas ion source 06F603Jun, David S et al. | 2011
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Quality factor enhancement on nanomechanical resonators utilizing stiction phenomena 06FE02Ashiba, Hiroki et al. | 2011
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Enhancement of spatial resolution in generating point spread functions by Monte Carlo simulation in electron-beam lithography 06F902Lee, S-Y et al. | 2011
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Influence of surface patterning on bacterial growth behavior 06FA03Nill, Peter et al. | 2011
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Fabrication of hybrid metal island/silicon single electron transistor 06FB02Lee, Yen-Chun et al. | 2011
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Fabrication of complex nanostructures of Poly(vinylidenefluoride-trifluoroethylene) by dual step hot-embossing 06FG08Wen, Juan-juan et al. | 2011
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High temperature focused ion beam response of graphite resulting in spontaneous nanosheet formation 061804Langegger, Rupert et al. | 2011
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Optimization of block copolymer self-assembly through graphoepitaxy: A detectivity study 06F206Tiron, Raluca et al. | 2011
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Graphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applications 061202Lin, Meng-Yu et al. | 2011
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Secondary-electron signal level measurements of self-assembled monolayers for spatial-phase-locked electron-beam lithography 06F308Cheong, Lin Lee et al. | 2011
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Method to pattern etch masks in two inclined planes for three-dimensional nano- and microfabrication 061604Willem Tjerkstra, R et al. | 2011
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Electron bombardment of films used for reducing spurious charge in electrostatic electron optics 06F317Maldonado, Juan R et al. | 2011
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Imaging of extreme-ultraviolet mask patterns using coherent extreme-ultraviolet scatterometry microscope based on coherent diffraction imaging 06F503Harada, Tetsuo et al. | 2011
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Metrology development for extreme ultraviolet lithography: Flare and out-of-band qualification 06F505Lorusso, G F et al. | 2011
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Subject Index to Volume 29 A37| 2011
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Micro- and Nano-Mechanics (MEMS, NEMS) - Investigation of graphene piezoresistors for use as strain gauge sensors 06FE01Chen, Xing et al. | 2011
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Process window modeling using focus balancing technique 06F903Isoyan, Artak et al. | 2011
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Nanoelectronics - Novel method for fabrication of nanoscale single-electron transistors: Electron beam induced deposition of Pt and atomic layer deposition of tunnel barriers 06FB01George, Hubert C et al. | 2011
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Technology platform for the fabrication of titanium nanostructures 06FG06Ecoffey, Serge et al. | 2011
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Computational study of electron-irradiation effects in carbon nanomaterials on substrates 06FG09Chihara, Yoshinori et al. | 2011
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Injection compression molding of high-aspect-ratio nanostructures 06FG10Nagato, Keisuke et al. | 2011
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PEN/Si3N4 bilayer film for dc bus capacitors in power converters in hybrid electric vehiclesZou, Chen / Zhang, Qiming / Zhang, Shihai / Kushner, Douglas / Zhou, Xin / Bernard, Richard / Orchard, Raymond J. et al. | 2011
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Fabrication of nanogaps by a progressive electromigration technique using wires of various thicknessesSaha, Swatilekha / Qian, Guoguang / Lewis, Kim M. et al. | 2011
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Laser nitriding of niobium for application to superconducting radio-frequency accelerator cavitiesSingaravelu, S. / Klopf, J. M. / Krafft, G. / Kelley, M. J. et al. | 2011
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Interface and electrical properties of Tm2O3 gate dielectrics for gate oxide scaling in MOS devicesKouda, M. / Kawanago, T. / Ahmet, P. / Natori, K. / Hattori, T. / Iwai, H. / Kakushima, K. / Nishiyama, A. / Sugii, N. / Tsutsui, K. et al. | 2011
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Patterned atomic layer epitaxy of Si/Si(001):HOwen, James H. G. / Ballard, Joshua / Randall, John N. / Alexander, Justin / Von Ehr, James R. et al. | 2011
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Selective placement of DNA origami on substrates patterned by nanoimprint lithographyPenzo, Erika / Wang, Risheng / Palma, Matteo / Wind, Shalom J et al. | 2011
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Di-block copolymer directed anodization of hexagonally ordered nanoporous aluminum oxideNoh, Kunbae / Choi, Chulmin / Kim, Hyunsu / Oh, Young / Kim, Jin-Yeol / Jung, Se-Yeon / Seong, Tae-Yeon / Jin, Sungho et al. | 2011
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Characterization of pentafluoropropane dissolved UV-nanoimprint resinChinen, Mika / Sawada, Yohei / Haruyama, Yuichi / Matsui, Shinji / Okada, Makoto / Hiroshima, Hiroshi et al. | 2011
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Carbon nanomechanical resonator fabrication from PMMA by FIB/electron-beam dual-beam lithographyKometani, Reo / Hatakeyama, Taiki / Kuroda, Kouhei / Warisawa, Shin’ichi / Ishihara, Sunao et al. | 2011
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Injection compression molding of high-aspect-ratio nanostructuresNagato, Keisuke / Hamaguchi, Tetsuya / Nakao, Masayuki et al. | 2011
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Towards an all-track 300 mm process for directed self-assembly 06F203Liu, Chi-Chun et al. | 2011
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Recessed area patterning via nanoimprint lithography 060602Chong, Karen S L et al. | 2011
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Scanning proximal probe lithography for sub-10 nm resolution on calix[4]resorcinarene 06FD02Kaestner, Marcus et al. | 2011
-
Lithography-patterning-fidelity-aware electron-optical system design optimization 06FD04Chen, Sheng-Yung et al. | 2011
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Nanobiology and Cell Guidance - Suspended, micron-scale corner cube retroreflectors as ultra-bright optical labels 06FA01Sherlock, Tim et al. | 2011
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New approach for measuring protrusive forces in cells 06FA02Mathur, A et al. | 2011
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Mechanical characteristics of imprinted nanostructures fabricated with a poly(dimethylsiloxane) mold 06FC10Kang, Yuji et al. | 2011
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Fabrication of a blue organic light-emitting diode with a novel thermal deposition boatLee, Sangmin / Tang, Ching W. et al. | 2011
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Surface plasmon waveguide devices with Tg-bonded Cytop claddingsChiu, Charles / Lisicka-Skrzek, Ewa / Niall Tait, R. / Berini, Pierre et al. | 2011
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Direct top-down ordering of diblock copolymers through nanoimprint lithographySalaün, M. / Kehagias, N. / Salhi, B. / Baron, T. / Boussey, J. / Sotomayor Torres, C. M. / Zelsmann, M. et al. | 2011
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Developer-free direct patterning of PMMA/ZEP 520A by low voltage electron beam lithographyAi Zhi Zheng, David / Ali Mohammad, Mohammad / Kelly Dew, Steven / Stepanova, Maria / 鄭愛智 et al. | 2011
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Nanopatterning of PMMA on insulating surfaces with various anticharging schemes using 30 keV electron beam lithographyMuhammad, Mustafa / Buswell, Steven C. / Dew, Steven K. / Stepanova, Maria et al. | 2011
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Density multiplication of nanostructures fabricated by ultralow voltage electron beam lithography using PMMA as positive- and negative-tone resistAdeyenuwo, Adegboyega P. / Stepanova, Maria / Dew, Steven K. et al. | 2011
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Imaging of extreme-ultraviolet mask patterns using coherent extreme-ultraviolet scatterometry microscope based on coherent diffraction imagingHarada, Tetsuo / Nakasuji, Masato / Kimura, Teruhiko / Watanabe, Takeo / Kinoshita, Hiroo / Nagata, Yutaka et al. | 2011
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Defined emission area and custom thermal electron sourcesMackie, William A. / Magera, Gerald G. et al. | 2011
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Ion beams in SEM: An experiment towards a high brightness low energy spread electron impact gas ion sourceJun, David S. / Kutchoukov, Vladimir G. / Kruit, Pieter et al. | 2011
-
Evaluation of the curing process of UV resins in a 1,1,1,3,3-pentafluoropropane gas environment by photo differential scanning calorimetry and Fourier transform infrared spectroscopySawada, Yohei / Haruyama, Yuichi / Kanda, Kazuhiro / Matsui, Shinji / Okada, Makoto / Miyake, Hiroto / Ohsaki, Takeshi / Hirai, Yoshihiko / Hiroshima, Hiroshi et al. | 2011
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Atomic step patterning in nanoimprint lithography: Molecular dynamics studyTada, Kazuhiro / Yasuda, Masaaki / Tan, Geng / Miyake, Yumiko / Kawata, Hiroaki / Yoshimoto, Mamoru / Hirai, Yoshihiko et al. | 2011
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Anisotropic filling phenomenon of cavities in UV nanoimprint lithographyWang, Qing / Hiroshima, Hiroshi et al. | 2011
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Etch properties of resists modified by sequential infiltration synthesisTseng, Yu-Chih / Peng, Qing / Ocola, Leonidas E. / Czaplewski, David A. / Elam, Jeffrey W. / Darling, Seth B. et al. | 2011