Low temperature growth of high-k Hf–La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties (Englisch)
- Neue Suche nach: Tang, Fu
- Neue Suche nach: Zhu, Chiyu
- Neue Suche nach: Smith, David J.
- Neue Suche nach: Nemanich, Robert J.
- Neue Suche nach: Tang, Fu
- Neue Suche nach: Zhu, Chiyu
- Neue Suche nach: Smith, David J.
- Neue Suche nach: Nemanich, Robert J.
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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30
, 1
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6
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2012
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Low temperature growth of high-k Hf–La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
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Weitere Titelangaben:Low temperature growth of high-k Hf-La oxides by RPALD
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Beteiligte:Tang, Fu ( Autor:in ) / Zhu, Chiyu ( Autor:in ) / Smith, David J. ( Autor:in ) / Nemanich, Robert J. ( Autor:in )
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Erschienen in:
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Verlag:
- Neue Suche nach: American Vacuum Society
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Erscheinungsdatum:01.01.2012
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Format / Umfang:6 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 30, Ausgabe 1
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