Ion depletion effects in sheath dynamics during plasma immersion ion implantation—models and data (Englisch)
Nationallizenz
- Neue Suche nach: Kellerman, Peter L.
- Neue Suche nach: Qin, Shu
- Neue Suche nach: Bradley, Michael P.
- Neue Suche nach: Saadatmand, Kourosh
- Neue Suche nach: Kellerman, Peter L.
- Neue Suche nach: Qin, Shu
- Neue Suche nach: Bradley, Michael P.
- Neue Suche nach: Saadatmand, Kourosh
In:
Review of Scientific Instruments
;
73
, 2
;
837-839
;
2002
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Ion depletion effects in sheath dynamics during plasma immersion ion implantation—models and data
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Beteiligte:Kellerman, Peter L. ( Autor:in ) / Qin, Shu ( Autor:in ) / Bradley, Michael P. ( Autor:in ) / Saadatmand, Kourosh ( Autor:in )
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Erschienen in:Review of Scientific Instruments ; 73, 2 ; 837-839
-
Verlag:
- Neue Suche nach: American Institute of Physics
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Erscheinungsdatum:01.02.2002
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Datenquelle:
Inhaltsverzeichnis – Band 73, Ausgabe 2
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Effects of ion pumping in a pulsed Penning sourceSato, Y. / Miyata, T. / Miyoshi, T. / Kitagawa, A. / Muramatsu, M. / Murakami, T. / Honma, T. / Yamamoto, M. / Ogawa, H. / Yamada, S. et al. | 2002
- 723
-
Accel–decel extraction system for PIG sourcesSpa¨dtke, P. / Heymach, F. / Hollinger, R. / Leible, K. D. / Mayr, R. / Shi, L. Q. et al. | 2002
- 726
-
Small anode source for efficient ion productionDudnikov, V. / Dudnikova, G. et al. | 2002
- 729
-
Ion source with closed drift anode layer plasma accelerationDudnikov, V. / Westner, A. et al. | 2002
- 732
-
Reducing ion-beam noise of vacuum arc ion sourcesAnders, Andre´ / Hollinger, Ralph et al. | 2002
- 735
-
Further development of low noise vacuum arc ion sourceOks, Efim / Yushkov, George / Litovko, Irina / Anders, Andre´ / Brown, Ian et al. | 2002
- 738
-
High temperature ion sources with ion confinementPanteleev, V. N. / Barzakh, A. E. / Fedorov, D. V. / Moroz, F. V. / Orlov, S. Yu. / Seliverstov, M. D. / Volkov, Yu. M. / Tecchio, L. / Andrighetto, A. et al. | 2002
- 741
-
Recent results from the low inductance Z-discharge metal vapor ion sourceDebolt, N. / Hershcovitch, A. / Johnson, B. M. / Rostoker, N. / VanDrie, A. / Wessel, F. et al. | 2002
- 744
-
Electron beams and Z-pinches as plasma strippers and lens for low-energy heavy ionsHershcovitch, A. / Johnson, B. M. / Patton, F. / Rostoker, N. / VanDrie, A. / Wessel, F. J. et al. | 2002
- 748
-
High-temperature ion source for elements of platinum-palladium groupBelokurov, A. P. / Kousmine, R. N. / Martynov, M. I. / Sokolov, D. V. et al. | 2002
- 751
-
Cylindrical hollow anode ion sourceMiljevic, Vujo et al. | 2002
- 754
-
Plasma emission in vacuum arc and rf-discharge plasma sourcesBoonyawan, D. / Davydov, S. / Yotsombat, B. / Chirapatpimol, N. / Vilaithong, T. et al. | 2002
- 757
-
Characteristics of a helicon ion source as a high current density ion source (abstract)Jung, H. D. / Hong, I. S. / Hwang, Y. S. et al. | 2002
- 758
-
Energy distribution of the compact microwave ion source for extremely low voltage ion extractionGotoh, Y. / Nakajima, K. / Hagiwara, T. / Tsuji, H. / Ishikawa, J. et al. | 2002
- 761
-
Simulation of direct injection scheme for RFQ linacOkamura, M. / Katayama, T. / Jameson, R. A. / Takeuchi, T. / Hattori, T. et al. | 2002
- 764
-
Acceleration of heavy ion beams by means of direct injection into RFQ LinacTakeuchi, T. / Katayama, T. / Okamura, M. / Yano, K. / Sakumi, A. / Hattori, T. / Jameson, R. A. et al. | 2002
- 767
-
Measurement of the laser plasma properties of the direct plasma injection method to the RFQ LINAC on the RIKEN laser ion sourceTakeuchi, T. / Katayama, T. / Nakagawa, T. / Okamura, M. / Yano, K. / Sakumi, A. / Ozawa, S. / Kondrashev, S. / Mescheryakov, N. / Sharkov, B. et al. | 2002
- 770
-
Laser ion source development for the Columbia University microbeamBigelow, A. W. / Randers-Pehrson, G. / Brenner, D. J. et al. | 2002
- 773
-
Development and operation of laser source of highly charged ions for ITEP terraWatt accumulator facilityBalabaev, A. / Balanutsa, V. / Kondrashev, S. / Konukov, K. / Lozhkin, A. / Marchenko, A. / Mescheryakov, N. / Nikolaev, V. / Savin, S. / Sharkov, B. et al. | 2002
- 776
-
Multiply charged ion-induced secondary electron emission from metals relevant for laser ion source beam diagnosticsLa´ska, L. / Kra´sa, J. / Sto¨ckli, M. P. / Fehrenbach, C. W. et al. | 2002
- 780
-
Ion source modeling with LORENTZ-2DAsi, Ali et al. | 2002
- 783
-
Comparison of simulation codes for the beam dynamics of low-energy ionsHanke, K. / Heising, S. / Probert, G. / Scrivens, R. et al. | 2002
- 786
-
Effusive-flow characterization of arbitrary size and geometry target/vapor transport systems: RIB applicationsBilheux, J.-C. / Alton, G. D. / Liu, Y. / Murray, S. N. / Williams, C. L. et al. | 2002
- 789
-
Mono 1000: A simple and efficient 2.45 GHz electron cyclotron resonance ion source using a new magnetic structure conceptJardin, P. / Barue, C. / Canet, C. / Dupuis, M. / Flambard, J. L. / Gaubert, G. / Lecesne, N. / Lehe´rissier, P. / Lemagnen, F. / Leroy, R. et al. | 2002
- 792
-
A design of an ECR ion source for radioactive ion beams for ISAC on-line facility at TRIUMFJayamanna, K. / Yuan, D. / Dombsky, M. / Bricault, P. / McDonald, M. / Olivo, M. / Schmor, P. / Stanford, G. / Vincent, J. / Zyuzin, A. et al. | 2002
- 795
-
Development of a low-energy oxygen 14 ion beam (abstract)Burke, J. T. / Wutte, D. / Vetter, P. / Freedman, S. J. / Fujikawa, B. K. / Lyneis, C. et al. | 2002
- 796
-
Efficient negative-ion sources for radioactive ion beam applications (abstract)Alton, G. D. / Liu, Y. / Murray, S. N. / Mills, G. D. / Zaim, H. et al. | 2002
- 797
-
Operation of the Relativistic Heavy Ion Collider Au− ion sourceSteski, D. B. / Alessi, J. / Benjamin, J. / Carlson, C. / Manni, M. / Thieberger, P. / Wiplich, M. et al. | 2002
- 800
-
Cooling negative-ion beamsLiu, Y. / Liang, J. F. / Alton, G. D. / Beene, J. R. / Zhou, Z. / Wollnik, H. et al. | 2002
- 803
-
Stopping efficiency of an ECR charge breeder for axially injected ionsJeong, S. C. / Oyaizu, M. / Tojyo, E. / Kawakami, H. / Ishiyama, H. / Miyatake, H. / Enomoto, K. / Katayama, I. / Nomura, T. et al. | 2002
- 806
-
The development of a charge breeding system with ECR ion sources of permanent magnetsOyaizu, M. / Jeong, S. C. / Tojyo, E. / Kawakami, H. / Ishiyama, H. / Miyatake, H. / Enomoto, K. / Katayama, I. / Nomura, T. et al. | 2002
- 809
-
Production of intense beams of fission fragments at MAFFBongers, H. / Gross, M. / Habs, D. / Maier, H. J. / Sieber, T. / Thirolf, P. G. / Kester, O. / Ko¨ster, U. / Faestermann, T. / von Egidy, T. et al. | 2002
- 812
-
Magnetic-field configuration fitted to the microwave ion-source plasmaSakudo, Noriyuki / Ito, Hiroyuki / Matsunaga, Yasuhiko / Hayashi, Keiji / Miyamoto, Atsushi / Tazaki, Yoshiaki et al. | 2002
- 816
-
Model-based predictors for improved automated beam generation and tuning of high current ion implantersGraf, M. A. / Tieger, D. R. / Hsieh, T. J. / Rutishauser, H. / Ring, P. et al. | 2002
- 819
-
Development of a long-life ion source for ion-implantation applicationMiyamoto, N. / Miyabayashi, K. / Yamashita, T. / Fujisawa, H. et al. | 2002
- 822
-
Production of various species of focused ion beamJi, Q. / King, T.-J. / Leung, K.-N. / Wilde, S. B. et al. | 2002
- 825
-
Fabrication of radioactive stents by ion implantationHuttel, Erhard / Kaltenbaek, Johann / Schloesser, Klaus / Schweickert, Hermann et al. | 2002
- 828
-
High voltage pulse discharge for ion treatment of metalsDougar-Jabon, V. D. / Moreno, J. Dulce / Tsygankov, P. A. et al. | 2002
- 831
-
Pulsed plasma accelerators of different gas ions for surface modificationTereshin, V. I. / Bandura, A. N. / Bovda, A. M. / Brown, I. G. / Byrka, O. V. / Chebotarev, V. V. / Garkusha, I. E. / Tortika, A. S. et al. | 2002
- 834
-
Particle trapping and annihilation within the extraction system of ion sourcesKellerman, Peter L. / Benveniste, Victor / Bradley, Michael P. / Saadatmand, Kourosh et al. | 2002
- 837
-
Ion depletion effects in sheath dynamics during plasma immersion ion implantation—models and dataKellerman, Peter L. / Qin, Shu / Bradley, Michael P. / Saadatmand, Kourosh et al. | 2002
- 840
-
Measurement and analysis of deposition-etch characteristics of BF3 plasma immersion ion implantationQin, Shu / Bradley, Michael P. / Kellerman, Peter L. / Saadatmand, Kourosh et al. | 2002
- 843
-
Application of electron cyclotron resonance plasma in arched magnetic mirrors to deposition of TiO2 thin filmsHonbo, E. / Miyata, M. / Kato, Y. / Ishii, S. et al. | 2002
- 846
-
Test of negative ion beams from a microwave ion source with a charge exchange canal for accelerator mass spectrometry applicationsKim, S-W. / Schneider, R. J. / von Reden, K. F. / Hayes, J. M. / Wills, J. S. C. et al. | 2002
- 849
-
Temperature distribution in polymeric films during ion beam irradiationIde-Ektessabi, Ari / Watanabe, Yoshinori et al. | 2002
- 852
-
A slit-end extraction Penning ionization gauge ion source with a permanent magnetZhizhong, Song / JinXiang, Yu / Guocai, Dong / Jun, Zhang / Zhongyi, Wang / Weijiang, Zhao et al. | 2002
- 854
-
Permanent magnet PIG ion sources and injectors used in RFQ acceleratorsJinxiang, Yu / Chia-erh, Chen / Xiaotang, Ren / Zhizhong, Song / Zhongyi, Wang / Zhengfang, Zhang / Weijiang, Zhao et al. | 2002
- 857
-
Simulations of intense pulsed ion beam uniformity in a planar magnetically insulated ion diodeXiang, W. / Zhao, W. J. / Yan, S. / Zeng, B. Q. et al. | 2002
- 860
-
Shunting arc plasma generation over a wide range of ambient pressure and ion extractionYukimura, Ken / Masamune, Sadao et al. | 2002
- 863
-
Use of ion sources for nonsemiconductor surface modification (plenary)Iwaki, Masaya et al. | 2002
- 868
-
Ion beam technologies in the semiconductor world (plenary)Poate, J. M. / Saadatmand, K. et al. | 2002