Advances in arrayed microcolumn lithography (Englisch)
- Neue Suche nach: Muray, L. P.
- Neue Suche nach: Spallas, J. P.
- Neue Suche nach: Stebler, C.
- Neue Suche nach: Lee, K.
- Neue Suche nach: Mankos, M.
- Neue Suche nach: Hsu, Y.
- Neue Suche nach: Gmur, M.
- Neue Suche nach: Chang, T. H. P.
- Neue Suche nach: Muray, L. P.
- Neue Suche nach: Spallas, J. P.
- Neue Suche nach: Stebler, C.
- Neue Suche nach: Lee, K.
- Neue Suche nach: Mankos, M.
- Neue Suche nach: Hsu, Y.
- Neue Suche nach: Gmur, M.
- Neue Suche nach: Chang, T. H. P.
In:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
;
18
, 6
;
3099-3104
;
2000
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Advances in arrayed microcolumn lithography
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Beteiligte:Muray, L. P. ( Autor:in ) / Spallas, J. P. ( Autor:in ) / Stebler, C. ( Autor:in ) / Lee, K. ( Autor:in ) / Mankos, M. ( Autor:in ) / Hsu, Y. ( Autor:in ) / Gmur, M. ( Autor:in ) / Chang, T. H. P. ( Autor:in )
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Erschienen in:
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Verlag:
- Neue Suche nach: American Vacuum Society
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Erscheinungsdatum:01.11.2000
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Format / Umfang:6 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
-
Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 18, Ausgabe 6
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Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
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Growth of low-defect density on GaAs by molecular beam epitaxyPickrell, G. W. / Chang, K. L. / Epple, J. H. / Cheng, K. Y. / Hsieh, K. C. et al. | 2000
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Investigation of mesa-sidewall effects on direct current and radio frequency characteristics of pseudomorphic high electron mobility transistorsYen, Chih-Hung / Lin, Kuan-Po / Yu, Kuo-Hui / Chang, Wen-Lung / Lin, Kun-Wei / Liu, Wen-Chau et al. | 2000
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Diode structures based on for optoelectronic applications in the near-ultraviolet range of the spectrumStarikov, D. / Berishev, I. / Um, J.-W. / Badi, N. / Medelci, N. / Tempez, A. / Bensaoula, A. et al. | 2000
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Study of current leakage in InAs photodetectorsLin, Ray-Ming / Tang, Shiang-Feng / Kuan, C. H. et al. | 2000
- 2627
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Low temperature deposition for high performance photodetectorHe, Lili et al. | 2000
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Effect of growth interruption and the introduction of on the growth of InGaN/GaN multiple quantum wellsMoon, Yong-Tae / Kim, Dong-Joon / Song, Keun-Man / Kim, Dong-Wan / Yi, Min-Su / Noh, Do-Young / Park, Seong-Ju et al. | 2000
- 2635
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Site control of InAs quantum dots on GaAs surfaces patterned by in situ electron-beam lithographyIshikawa, T. / Kohmoto, S. / Nishikawa, S. / Nishimura, T. / Asakawa, K. et al. | 2000
- 2640
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Fabrication technology of a Si nanowire memory transistor using an inorganic electron beam resist processTsutsumi, Toshiyuki / Ishii, Kenichi / Hiroshima, Hiroshi / Hazra, Sukti / Yamanaka, Mitsuyuki / Sakata, Isao / Taguchi, Hirohisa / Suzuki, Eiichi / Tomizawa, Kazutaka et al. | 2000
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Deposition of Fe clusters on Si surfacesUpward, M. D. / Cotier, B. N. / Moriarty, P. / Beton, P. H. / Baker, S. H. / Binns, C. / Edmonds, K. et al. | 2000
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Initial growth analysis of Si overlayers on cerium oxide layersKim, Chong Geol et al. | 2000
- 2653
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Electrical properties of self-organized nanostructures of alkanethiol-encapsulated gold particlesHuang, Shujuan / Tsutsui, Gen / Sakaue, Hiroyuki / Shingubara, Shoso / Takahagi, Takayuki et al. | 2000
- 2658
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Atomic force microscopy of reaction of ammonia gas with crystalline substituted benzoic acidZeng, Qingdao / Wang, Chen / Bai, Chunli / Li, Yan / Yan, Xinjian et al. | 2000
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Effect of photoenhanced minority carriers in metal-oxide-semiconductor capacitor studied by scanning capacitance microscopyShin, S. / Kye, J.-I. / Pi, U. H. / Khim, Z. G. / Hong, J. W. / Park, Sang-il / Yoon, S. et al. | 2000
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Integrated atomic force microscopy array probe with metal–oxide–semiconductor field effect transistor stress sensor, thermal bimorph actuator, and on-chip complementary metal–oxide–semiconductor electronicsAkiyama, T. / Staufer, U. / de Rooij, N. F. / Lange, D. / Hagleitner, C. / Brand, O. / Baltes, H. / Tonin, A. / Hidber, H. R. et al. | 2000
- 2676
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X-ray source combined ultrahigh-vacuum scanning tunneling microscopy for elemental analysisHasegawa, Y. / Tsuji, K. / Nakayama, K. / Wagatsuma, K. / Sakurai, T. et al. | 2000
- 2681
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New method for imaging atomsDou, Juying / Chen, Ergang / Zhu, Changchun / Yang, Deqing et al. | 2000
- 2684
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Dual tunneling-unit scanning tunneling microscope for practical length measurement based on reference scalesZhang, Haijun / Wu, Lan / Huang, Feng / Cheng, Shuwen et al. | 2000
- 2688
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Effect of metal–insulator–semiconductor structure derived space charge field on the tip vibration signal in electrostatic force microscopyHong, Seungbum / Woo, Jungwon / Shin, Hyunjung / Kim, Eunah / Kim, Keun-Ho / Jeon, Jong Up / Pak, Y. Eugene / No, Kwangsoo et al. | 2000
- 2692
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Wide dynamic range silicon diaphragm vacuum sensor by electrostatic servo systemMiyashita, Haruzo / Esashi, Masayoshi et al. | 2000
- 2698
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Field emission properties of nanocomposite carbon nitride filmsAlexandrou, I. / Baxendale, M. / Rupesinghe, N. L. / Amaratunga, G. A. J. / Kiely, C. J. et al. | 2000
- 2704
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Study of the emission performance of carbon nanotubesWei, Lei / Baoping, Wang / Linsu, Tong / Hanchun, Yin / Yan, Tu / Changchun, Zhu et al. | 2000
- 2710
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Influence of diamond film thickness on field emission characteristicsJi, H. / Jin, Z. S. / Gu, C. Z. / Wang, J. Y. / Lu, X. Y. / Liu, B. B. / Gao, C. X. / Yuan, G. / Wang, W. B. et al. | 2000
- 2714
-
Characterization of the surface morphology and electronic properties of microwave enhanced chemical vapor deposited diamond filmsFitzgerald, A. G. / Fan, Y. / John, P. / Troupe, C. E. / Wilson, J. I. R. et al. | 2000
- 2722
-
Enhancement in field emission of silicon microtips by bias-assisted carburizationKichambare, P. D. / Tarntair, F. G. / Chen, L. C. / Chen, K. H. / Cheng, H. C. et al. | 2000
- 2730
-
Polysubstituted derivatives of triphenylene as high resolution electron beam resists for nanolithographyRobinson, A. P. G. / Palmer, R. E. / Tada, T. / Kanayama, T. / Allen, M. T. / Preece, J. A. / Harris, K. D. M. et al. | 2000
- 2737
-
Comparative study of sputtered and spin-coatable aluminum oxide electron beam resistsSaifullah, M. S. M. / Kurihara, K. / Humphreys, C. J. et al. | 2000
- 2745
-
How to make polyvinylphenol inhibitable by diazonaphthoquinone sulfonatesYan, Zhenglin / Yeh, Tung-Feng / He, Xiaohua / Reiser, Arnost / Schadt, Frank L. / Fincher, Curtis R. et al. | 2000
- 2750
-
High performance micropane electron beam windowDougal, Roger A. / Liu, Shengyi et al. | 2000
- 2757
-
Design and development of plasma enhanced chemical vapor deposition universal antireflective layer films for deep subquarter micron deep ultraviolet applicationsWang, Ying / MacWilliams, Ken / Karim, Zia / Fan, Wendy / Reilly, Michael / Holden, James M. et al. | 2000
- 2763
-
Effects of fluorocarbon polymer deposition on the selective etching of in high density plasmaChu, Changwoong / Ahn, Taehyuk / Kim, Jisoo / Jeong, Sangsup / Moon, Jootae et al. | 2000
- 2769
-
Direct pattern etching for micromachining applications without the use of a resist maskCho, Byeong-Ok / Ryu, Jung-Hyun / Hwang, Sung-Wook / Lee, Gyeo-Re / Moon, Sang Heup et al. | 2000
- 2774
-
Electron population above 13.5 eV in ultrahigh frequency and inductively coupled plasmas through and gas mixturesNakano, Toshiki / Samukawa, Seiji et al. | 2000
- 2780
-
Study of grass formation in GaAs backside via etching using inductively coupled plasma systemNam, P. S. / Ferreira, L. M. / Lee, T. Y. / Tu, K. N. et al. | 2000
- 2785
-
Two-channel spectroscopic reflectometry for in situ monitoring of blanket and patterned structures during reactive ion etchingStutzman, Brooke S. / Huang, Hsu-Ting / Terry, Fred L. et al. | 2000
- 2794
-
Development and qualification of a vacuum pumping system for metalorganic vapor phase epitaxy copper precursorsDavis, R. P. / Abreu, R. A. et al. | 2000
- 2799
-
Oxygen plasma induced degradation in InGaAs/InP heterostructuresDriad, R. / McKinnon, W. R. / McAlister, S. P. et al. | 2000
- 2803
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reactive ion etching induced damage of InPNeitzert, H. C. / Fang, R. / Kunst, M. / Layadi, N. et al. | 2000
- 2808
-
Characterization of showerhead performance at low pressureHash, D. B. / Mihopoulos, T. / Govindan, T. R. / Meyyappan, M. et al. | 2000
- 2814
-
Thermal stability and adhesion improvement of Ag deposited on by oxygen plasma treatmentGadre, Kaustubh S. / Alford, T. L. et al. | 2000
- 2820
-
Thermal modeling of a polysilicon-metal test structure used for thermally induced voltage alteration characterizationTangyunyong, Paiboon / Benson, David / Cole, Edward I. et al. | 2000
- 2826
-
Influence of underlying interlevel dielectric films on extrusion formation in aluminum interconnectsChen, Fen / Li, Baozhen / Sullivan, Timothy D. / Gonzalez, Clara L. / Muzzy, Christopher D. / Lee, H. K. / Levy, Mark D. / Dashiell, Michael W. / Kolodzey, James et al. | 2000
- 2835
-
Characterization of additive systems for damascene Cu electroplating by the superfilling profile monitorChiu, Shao-Yu / Shieh, Jia-Min / Chang, Shih-Chieh / Lin, Kun-Cheng / Dai, Bau-Tong / Chen, Chia-Fu / Feng, Ming-Shiann et al. | 2000
- 2842
-
Effect of various sputtering parameters on Ta phase formation using an I-Optimal experimental designWhitman, Charles S. et al. | 2000
- 2848
-
Electrical characteristics of metal–ferroelectric –insulator structure for nonvolatile memory applicationsSze, Chi-yuan / Lee, Joseph Ya-min et al. | 2000
- 2851
-
Electronic structure and mechanical properties of hard coatings from the chromium–tungsten nitride systemHones, P. / Diserens, M. / Sanjinés, R. / Lévy, F. et al. | 2000
- 2857
-
Electron-beam direct writing using RD2000N for fabrication of nanodevicesDutta, A. / Lee, S. P. / Hayafune, Y. / Oda, S. et al. | 2000
- 2862
-
Thin layers on Si(111) with ultralow atomic step densityOliver, Antonio C. / Blakely, Jack M. et al. | 2000
- 2877
-
Implementing advanced lithography technology: A 100 MHz, 1 V digital signal processor fabricated with phase shifted gatesWatson, G. P. / Kizilyalli, I. C. / Nalamasu, O. / Cirelli, R. A. / Miller, M. / Wang, Y. / Pati, B. / Radosevich, J. / Kohler, R. / Freyman, R. et al. | 2000
- 2881
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Lithographic patterning and confocal imaging with zone platesGil, Darı́o / Menon, Rajesh / Carter, D. J. D. / Smith, Henry I. et al. | 2000
- 2886
-
Sub-100 nm silicon on insulator complimentary metal–oxide semiconductor transistors by deep ultraviolet optical lithographyFritze, M. / Burns, J. / Wyatt, P. W. / Chen, C. K. / Gouker, P. / Chen, C. L. / Keast, C. / Astolfi, D. / Yost, D. / Preble, D. et al. | 2000
- 2891
-
Defect formation and structural alternation in modified glasses by irradiation with laser or ArF excimer laserIkuta, Yoshiaki / Kikugawa, Shinya / Hirano, Masahiro / Hosono, Hideo et al. | 2000
- 2896
-
Shape engineering: A novel optical proximity correction technique for attenuated phase-shift maskPau, S. / Bolan, K. / Blakey, M. / Nalamasu, O. et al. | 2000
- 2900
-
Analytic study of gratings patterned by evanescent near field optical lithographyMcNab, S. J. / Blaikie, R. J. / Alkaisi, M. M. et al. | 2000
- 2905
-
Development of the large field extreme ultraviolet lithography cameraWatanabe, T. / Kinoshita, H. / Nii, H. / Li, Y. / Hamamoto, K. / Oshino, T. / Sugisaki, K. / Murakami, K. / Irie, S. / Shirayone, S. et al. | 2000
- 2911
-
Extreme ultraviolet alignment and testing of a four-mirror ring field extreme ultraviolet optical systemGoldberg, Kenneth A. / Naulleau, Patrick / Batson, Phillip / Denham, Paul / Anderson, Erik H. / Chapman, Henry / Bokor, Jeffrey et al. | 2000
- 2916
-
At-wavelength extreme ultraviolet lithography mask inspection using a Mirau interferometric microscopeHaga, Tsuneyuki / Takenaka, Hisataka / Fukuda, Makoto et al. | 2000
- 2921
-
Reticle’s contribution to critical dimension control and overlay in extreme-ultraviolet lithographyMeiling, H. / Benschop, J. P. H. / Loopstra, E. / van der Werf, J. E. / Leenders, M. H. A. et al. | 2000
- 2926
-
Extreme ultraviolet mask defect simulation: Low-profile defectsPistor, Tom / Deng, Yunfei / Neureuther, Andrew et al. | 2000
- 2930
-
Characterization of extreme ultraviolet lithography mask defects from extreme ultraviolet far-field scattering patternsYi, Moonsuk / Jeong, Seongtae / Rekawa, Seno / Bokor, Jeffrey et al. | 2000
- 2935
-
Extreme ultraviolet holographic microscopy and its application to extreme ultraviolet mask-blank defect characterizationLee, Sang Hun / Bokor, Jeffrey / Naulleau, Patrick / Jeong, Seong Tae / Goldberg, Kenneth A. et al. | 2000
- 2939
-
Extreme ultraviolet carrier-frequency shearing interferometry of a lithographic four-mirror optical systemNaulleau, Patrick P. / Goldberg, Kenneth A. / Bokor, Jeffrey et al. | 2000
- 2944
-
Effects of smoothing on defect printability at extreme ultraviolet wavelengthsCardinale, G. F. / Ray-Chaudhuri, A. K. / Fisher, A. / Mangat, P. S. J. / Wasson, J. / Mirkarimi, P. B. / Gullikson, E. et al. | 2000
- 2950
-
Proposal for a 50 nm proximity x-ray lithography system and extension to 35 nm by resist material selectionKitayama, Toyoki / Itoga, Kenji / Watanabe, Yutaka / Uzawa, Shunichi et al. | 2000
- 2955
-
Technology and performance of the Canon XRA-1000 production x-ray stepperMizusawa, Nobutoshi / Uda, Kouji / Tanaka, Yutaka / Ohta, Hirohisa / Watanabe, Yutaka et al. | 2000
- 2961
-
Overlay evaluation of proximity x-ray lithography in 100 nm device fabricationAoyama, H. / Taguchi, T. / Matsui, Y. / Fukuda, M. / Deguchi, K. / Morita, H. / Oda, M. / Matsuda, T. / Kumasaka, F. / Iba, Y. et al. | 2000
- 2966
-
Membrane-mask distortion correction: Analytical and experimental resultsMurooka, Ken-ichi / Lim, Michael H. / Smith, Henry I. et al. | 2000
- 2970
-
Nanofabrication and diffractive optics for high-resolution x-ray applicationsAnderson, Erik H. / Olynick, Deirdre L. / Harteneck, Bruce / Veklerov, Eugene / Denbeaux, Gregory / Chao, Weilun / Lucero, Angelic / Johnson, Lewis / Attwood, David et al. | 2000
- 2976
-
Generation of arbitrary three dimensional surfaces by x-ray lithographyFeldman, M. / Lee, G. S. / Noel, D. / Khan Malek, C. / Bass, R. et al. | 2000
- 2981
-
Zone-plate-array lithography using synchrotron radiationPépin, A. / Decanini, D. / Chen, Y. et al. | 2000
- 2986
-
Performance of a compact beamline with high brightness for x-ray lithographyHirose, Sayumi / Miyatake, Tsutomu / Li, Xuan / Toyota, Eijiro / Hirose, Masaoki / Fujii, Kiyoshi / Suzuki, Katsumi et al. | 2000
- 2990
-
Highly accurate x-ray masks with 100-nm-class high-density device patternsUchiyama, Shingo / Shimada, Masaru / Tsuchizawa, Tai / Ohkubo, Takashi / Oda, Masatoshi / Yoshihara, Hideo et al. | 2000
- 2995
-
Overlay compatibility between two synchroton radiation steppersFukuda, Makoto / Suzuki, Masanori / Haga, Tsuneyuki / Morita, Hirofumi / Aoyama, Hajime / Mitsui, Souichirou / Taguchi, Takao / Matsui, Yasuji et al. | 2000
- 2999
-
Scaled measurements of global space-charge induced image blur in electron beam projection systemHan, Liqun / Pease, R. Fabian / Meisburger, W. Dan / Winograd, Gil I. / Takahashi, Kimitoshi et al. | 2000
- 3004
-
Structure of stochastic Coulomb interactions in electron beam columnsWu, Bo / Neureuther, Andrew R. et al. | 2000
- 3010
-
Multisource optimization of a column for electron lithographyMankos, M. / Coyle, S. / Fernandez, A. / Sagle, A. / Allen, P. / Owens, W. / Sullivan, J. / Chang, T. H. P. et al. | 2000
- 3017
-
Electron optical image correction subsystem in electron beam projection lithographyKojima, S. / Stickel, W. / Rockrohr, J. D. / Gordon, M. et al. | 2000
- 3023
-
Analytic evaluation of the intensity point spread functionGallatin, Gregg M. et al. | 2000
- 3029
-
Application of the generalized curvilinear variable axis lens to electron projectionStickel, W. / Langner, G. O. et al. | 2000
- 3034
-
Computer aided design and analysis of imaging energy filters with inhomogeneous bending magnetsMunro, Eric / Rouse, John et al. | 2000
- 3042
-
Prospect for high brightness III–nitride electron emitterMachuca, Francisco / Sun, Y. / Liu, Z. / Ioakeimidi, K. / Pianetta, P. / Pease, R. F. W. et al. | 2000
- 3047
-
Depth of field at high magnifications of scanning electron microscopesSato, Mitsugu / Mizuno, Fumio et al. | 2000
- 3052
-
Demonstration of multiblanker electron-beam technologyWinograd, G. / Krishnamurthi, V. / Garcia, R. / Veneklasen, L. H. / Mankos, M. / Pease, F. et al. | 2000
- 3057
-
Optimization of microcolumn electron optics for high-current applicationsMankos, M. / Lee, K. Y. / Muray, L. / Spallas, J. / Hsu, Y. / Stebler, C. / DeVore, W. / Bullock, E. / Chang, T. H. P. et al. | 2000
- 3061
-
New concept for high-throughput multielectron beam direct write systemMuraki, Masato / Gotoh, Susumu et al. | 2000
- 3067
-
Correction of the field curvature in SCALPEL projection systemsXiu, K. / Gibson, J. M. et al. | 2000
- 3072
-
PREVAIL Alpha system: Status and design considerationsGolladay, S. D. / Pfeiffer, H. C. / Rockrohr, J. D. / Stickel, W. et al. | 2000
- 3079
-
PREVAIL: Dynamic correction of aberrationsGordon, M. S. / Enichen, W. A. / Golladay, S. D. / Pfeiffer, H. C. / Robinson, C. F. / Stickel, W. et al. | 2000
- 3084
-
Patterning performance of EB-X3 x-ray mask writerOhki, Shigehisa / Watanabe, Toshifumi / Takeda, Yuji / Morosawa, Tetsuo / Saito, Kenichi / Kunioka, Tatsuya / Kato, Junichi / Shimizu, Akira / Matsuda, Tadahito / Tsuboi, Shinji et al. | 2000
- 3089
-
Evaluation of a 100 kV thermal field emission electron-beam nanolithography systemTennant, D. M. / Fullowan, R. / Takemura, H. / Isobe, M. / Nakagawa, Y. et al. | 2000
- 3095
-
Calculation of surface potential and beam deflection due to charging effects in electron beam lithographyLee, Yongjae / Lee, Woojin / Chun, Kukjin et al. | 2000
- 3099
-
Advances in arrayed microcolumn lithographyMuray, L. P. / Spallas, J. P. / Stebler, C. / Lee, K. / Mankos, M. / Hsu, Y. / Gmur, M. / Chang, T. H. P. et al. | 2000
- 3105
-
Quantitative factor analysis of resolution limit in electron beam lithography using the edge roughness evaluation methodYoshizawa, Masaki / Moriya, Shigeru et al. | 2000
- 3111
-
Grid lens approach for high effective emittance in SCALPEL®Moonen, D. / van Kranen, S. / Kruit, P. / Katsap, V. / Waskiewicz, W. K. et al. | 2000
- 3115
-
Analytical-based solutions for SCALPEL wafer heatingFares, N. / Stanton, S. / Liddle, J. / Gallatin, G. et al. | 2000
- 3122
-
Charge induced pattern distortion in low energy electron beam lithographySatyalakshmi, K. M. / Olkhovets, A. / Metzler, M. G. / Harnett, C. K. / Tanenbaum, D. M. / Craighead, H. G. et al. | 2000
- 3126
-
Electron optical column for a multicolumn, multibeam direct-write electron beam lithography systemYin, E. / Brodie, A. D. / Tsai, F. C. / Guo, G. X. / Parker, N. W. et al. | 2000
- 3132
-
Demagnifying immersion magnetic lenses used for projection electron beam lithography without crossoversCheng, Min / Tang, Tiantong et al. | 2000
- 3138
-
Implementation of real-time proximity effect correction in a raster shaped beam toolBoegli, V. / Johnson, L. / Kao, H. / Veneklasen, L. / Hofmann, U. / Finkelstein, I. / Stovall, S. / Rishton, S. et al. | 2000
- 3143
-
Sub-0.1 μ electron-beam lithography for nanostructure developmentPeckerar, Martin / Bass, Robert / Rhee, Kee Woo et al. | 2000
- 3150
-
Proximity effect correction using pattern shape modification and area density mapTakahashi, Kimitoshi / Osawa, Morimi / Sato, Masami / Arimoto, Hiroshi / Ogino, Kozo / Hoshino, Hiromi / Machida, Yasuhide et al. | 2000
- 3158
-
Carrier distribution profiles in Si-doped layers in GaAs formed by focused ion beam implantation and successive overlayer growthHada, Takuo / Goto, Takayuki / Yanagisawa, Junichi / Wakaya, Fujio / Yuba, Yoshihiko / Gamo, Kenji et al. | 2000
- 3162
-
Focused ion beam patterning of III–V crystals at low temperature: A method for improving the ion-induced defect localizationSchneider, M. / Gierak, J. / Marzin, J. Y. / Gayral, B. / Gérard, J. M. et al. | 2000
- 3168
-
Focused electron beam induced deposition of goldUtke, I. / Hoffmann, P. / Dwir, B. / Leifer, K. / Kapon, E. / Doppelt, P. et al. | 2000
- 3172
-
Pattern generators and microcolumns for ion beam lithographyScott, K. L. / King, T.-J. / Lieberman, M. A. / Leung, K.-N. et al. | 2000
- 3177
-
Determination of resist exposure parameters in helium ion beam lithography: Absorbed energy gradient, contrast, and critical doseRuchhoeft, P. / Wolfe, J. C. et al. | 2000
- 3181
-
Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor depositionMatsui, Shinji / Kaito, Takashi / Fujita, Jun-ichi / Komuro, Masanori / Kanda, Kazuhiro / Haruyama, Yuichi et al. | 2000
- 3185
-
Optimal strategy for controlling linewidth on spherical focal surface arraysRuchhoeft, P. / Wolfe, J. C. et al. | 2000
- 3190
-
Modeling of focused ion beam induced surface chemistryEdinger, Klaus / Kraus, Thomas et al. | 2000
- 3194
-
Performance of multicusp plasma ion source for focused ion beam applicationsScipioni, L. / Stewart, D. / Ferranti, D. / Saxonis, A. et al. | 2000
- 3198
-
Maskless deposition of gold patterns on siliconErickson, Lynden E. / Schmuki, Patrik / Champion, Garth et al. | 2000
- 3202
-
Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experimentVolland, B. / Shi, F. / Heerlein, H. / Rangelow, I. W. / Hudek, P. / Kostic, I. / Cekan, E. / Vonach, H. / Loeschner, H. / Horner, C. et al. | 2000
- 3207
-
Experimental evaluation of an optimized radiation cooling geometry for ion projection lithography masksTorres, J. L. / Nounu, H. N. / Wasson, J. R. / Wolfe, J. C. / Lutz, J. / Haugeneder, E. / Löschner, H. / Stengl, G. / Kaesmaier, R. et al. | 2000
- 3210
-
Fabrication of masks for electron-beam projection lithographyLercel, Michael / Magg, Chris / Barrett, Monica / Collins, Kevin / Trybendis, Michael / Caldwell, Neal / Jeffer, Ray / Bouchard, Lucien et al. | 2000
- 3216
-
Progress in extreme ultraviolet mask repair using a focused ion beamLiang, Ted / Stivers, Alan / Livengood, Richard / Yan, Pei-Yang / Zhang, Guojing / Lo, Fu-Chang et al. | 2000
- 3221
-
Mechanical analysis of the PLASMAX particle removal process for optical and next-generation lithography masksSemke, W. H. / Weisbrod, E. J. / Engelstad, R. L. / Lovell, E. G. / Festa, J. J. / Bailey, J. B. et al. | 2000
- 3227
-
Characterization of phase defects in phase shift masksAdam, Konstantinos / Hotta, Shoji / Neureuther, Andrew R. et al. | 2000
- 3232
-
TaSiN thin-film pattern transfer optimization for 200 mm SCALPEL and extreme ultraviolet lithography masksDauksher, W. J. / Resnick, D. J. / Clemens, S. B. / Standfast, D. L. / Masnyj, Z. S. / Wasson, J. R. / Bergmann, N. M. / Han, S.-I. / Mangat, P. J. S. et al. | 2000
- 3237
-
High-performance membrane mask for electron projection lithographyYamashita, Hiroshi / Amemiya, Isao / Nomura, Eiichi / Nakajima, Ken / Nozue, Hiroshi et al. | 2000
- 3242
-
Inter- and intramembrane resist critical dimension uniformity across a SCALPEL maskNordquist, K. / Ainley, E. / Resnick, D. J. / Weisbrod, E. / Martin, C. / Engelstad, R. / Masnyj, Z. / Mangat, P. et al. | 2000
- 3248
-
Simulating the mechanical response of electron-beam projection lithography masksJachim, A. F. / Chen, C.-F. / Engelstad, R. L. / Lovell, E. G. / Mangat, P. J. S. / Dauksher, W. J. et al. | 2000
- 3254
-
Stencil reticle repair for electron beam projection lithographyOkada, Masashi / Shimizu, Sumito / Kawata, Shintaro / Kaito, Takashi et al. | 2000
- 3259
-
Thickness analysis of silicon membranes for stencil masksSossna, E. / Kassing, R. / Rangelow, I. W. / Herzinger, C. M. / Tiwald, T. E. / Woollam, J. A. / Wagner, Th. et al. | 2000
- 3264
-
Scanning probe metrology in the presence of surface chargeGriffith, J. E. / Kneedler, E. M. / Ningen, S. / Berghaus, A. / Bryson, C. E. / Pau, S. / Houge, E. / Shofner, T. et al. | 2000
- 3268
-
Two-dimensional spatial-phase-locked electron-beam lithography via sparse samplingHastings, J. T. / Zhang, Feng / Finlayson, M. A. / Goodberlet, J. G. / Smith, Henry I. et al. | 2000
- 3272
-
Microcomb design and fabrication for high accuracy optical assemblyChen, Carl G. / Heilmann, Ralf K. / Konkola, Paul T. / Mongrard, Olivier / Monnelly, Glen P. / Schattenburg, Mark L. et al. | 2000
- 3277
-
Relativistic corrections in displacement measuring interferometryHeilmann, Ralf K. / Konkola, Paul T. / Chen, Carl G. / Schattenburg, Mark L. et al. | 2000
- 3282
-
Beam steering system and spatial filtering applied to interference lithographyKonkola, Paul T. / Chen, Carl G. / Heilmann, Ralf K. / Schattenburg, Mark L. et al. | 2000
- 3287
-
Characterization of field stitching in electron-beam lithography using moiré metrologyMurphy, T. E. / Mondol, Mark K. / Smith, Henry I. et al. | 2000
- 3292
-
Surface and line-edge roughness in solution and plasma developed negative tone resists: Experiment and simulationPatsis, G. P. / Tserepi, A. / Raptis, I. / Glezos, N. / Gogolides, E. / Valamontes, E. S. et al. | 2000
- 3297
-
Energy transfer between electrons and photoresist: Its relation to resolutionHan, Geng / Cerrina, Franco et al. | 2000
- 3303
-
Comparison of resist collapse properties for deep ultraviolet and 193 nm resist platformsCao, Heidi B. / Nealey, Paul F. / Domke, Wolf-Dieter et al. | 2000
- 3308
-
Supercritical drying for water-rinsed resist systemsNamatsu, Hideo et al. | 2000
- 3313
-
Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapseGoldfarb, Darı́o L. / de Pablo, Juan J. / Nealey, Paul F. / Simons, John P. / Moreau, Wayne M. / Angelopoulos, Marie et al. | 2000
- 3318
-
Enhancement of resist resolution and sensitivity via applied electric fieldCheng, Mosong / Croffie, Ebo / Yuan, Lei / Neureuther, Andrew et al. | 2000
- 3323
-
Optimized bilayer hexamethyldisiloxane film as bottom antireflective coating for both KrF and ArF lithographiesLin, C. H. / Wang, L. A. / Chen, H. L. et al. | 2000
- 3328
-
Vacuum ultraviolet spectra of fluorocompounds for 157 nm lithographyToriumi, Minoru / Satou, Isao / Itani, Toshiro et al. | 2000
- 3332
-
Polymer photochemistry at advanced optical wavelengthsFedynyshyn, Theodore H. / Kunz, Roderick R. / Sinta, Roger F. / Goodman, Russell B. / Doran, Scott P. et al. | 2000
- 3340
-
Modeling influence of structural changes in photoacid generators on 193 nm single layer resist imagingCroffie, Ebo / Yuan, Lei / Cheng, Mosong / Neureuther, Andrew / Houlihan, Frank / Cirelli, Ray / Watson, Pat / Nalamasu, Om / Gabor, Allen et al. | 2000
- 3345
-
Lithographic performance of thin dendritic polymer resistsWilliamson, Mike / Neureuther, Andy et al. | 2000
- 3349
-
Resist profile characteristics caused by photoelectron and Auger electron blur at the resist–tungsten substrate interface in 100 nm proximity x-ray lithographySeo, Younghun / Lee, Changhwan / Seo, Yongduk / Kim, Ohyun / Noh, Hyunpil / Kim, Heesang et al. | 2000
- 3354
-
Evaluation of alternative development process for high-aspect-ratio poly(methylmethacrylate) microstructures in deep x-ray lithographyMalek, Chantal Khan / Yajamanyam, Sasi et al. | 2000
- 3360
-
Lithography using ultrathin resist filmsPike, Christopher / Bell, Scott / Lyons, Chris / Plat, Marina / Levinson, Harry / Okoroanyanwu, Uzodinma et al. | 2000
- 3364
-
Outgassing of photoresist materials at extreme ultraviolet wavelengthsDentinger, Paul M. et al. | 2000
- 3371
-
Correlation between the chemical compositions and optical properties of embedded layer for attenuated phase-shifting mask in 193 nm and the modification of the method for measuring n and kLin, Cheng-ming / Loong, Wen-an et al. | 2000
- 3376
-
Scaling of and reaction rate with film thickness in photoresist: A thermal probe studyFryer, David S. / Nealey, Paul F. / de Pablo, Juan J. et al. | 2000
- 3381
-
Thin film instabilities and implications for ultrathin resist processesOkoroanyanwu, Uzodinma et al. | 2000
- 3388
-
Resolution limit of negative tone chemically amplified resist used for hybrid lithography: Influence of the molecular weightPain, L. / Higgins, C. / Scarfoglière, B. / Tedesco, S. / Dal’Zotto, B. / Gourgon, C. / Ribeiro, M. / Kusumoto, T. / Suetsugu, M. / Hanawa, R. et al. | 2000
- 3396
-
157 nm resist materials: Progress reportBrodsky, Colin / Byers, Jeff / Conley, Will / Hung, Raymond / Yamada, Shintaro / Patterson, Kyle / Somervell, Mark / Trinque, Brian / Tran, H. V. / Cho, Sungseo et al. | 2000
- 3402
-
Outgassing of photoresists in extreme ultraviolet lithographyChauhan, Maharshi M. / Nealey, Paul F. et al. | 2000
- 3408
-
1 kV resist technology for microcolumn-based electron-beam lithographyLee, K. Y. / Hsu, Y. / Le, P. / Tan, Z. C. H. / Chang, T. H. P. / Elian, K. et al. | 2000
- 3414
-
Nanoscale patterning of self-assembled monolayers with electronsGölzhäuser, A. / Geyer, W. / Stadler, V. / Eck, W. / Grunze, M. / Edinger, K. / Weimann, Th. / Hinze, P. et al. | 2000
- 3419
-
Hydrogen silsesquioxane/novolak bilayer resist for high aspect ratio nanoscale electron-beam lithographyvan Delft, Falco C. M. J. M. / Weterings, Jos P. / van Langen-Suurling, Anja K. / Romijn, Hans et al. | 2000
- 3424
-
High-purity, ultrahigh-resolution calixarene electron-beam negative resistManako, Shoko / Ochiai, Yukinori / Yamamoto, Hiromasa / Teshima, Takahiro / Fujita, Jun-ichi / Nomura, Eiichi et al. | 2000
- 3428
-
Calixarene G-line double resist process with 15 nm resolution and large area exposure capabilityKedzierski, Jakub / Anderson, Erik / Bokor, Jeffrey et al. | 2000
- 3431
-
Aqueous base development and acid diffusion length optimization in negative epoxy resist for electron beam lithographyGlezos, N. / Argitis, P. / Velessiotis, D. / Raptis, I. / Hatzakis, M. / Hudek, P. / Kostic, I. et al. | 2000
- 3435
-
Roughness study of a positive tone high performance SCALPEL resistOcola, L. E. / Orphanos, P. A. / Li, W.-Y. / Waskiewicz, W. / Novembre, A. E. / Sato, M. et al. | 2000
- 3441
-
Influence of developer and development conditions on the behavior of high molecular weight electron beam resistsHasko, D. G. / Yasin, Shazia / Mumtaz, A. et al. | 2000
- 3445
-
Evolutionary optimization of the electron-beam lithography process for gate fabrication of high electron mobility transistorsRobin, Franck / Orzati, Andrea / Homan, Otte J. / Bächtold, Werner et al. | 2000
- 3450
-
Mechanical properties and pattern collapse of chemically amplified photoresistsQue, Long / Gianchandani, Yogesh B. et al. | 2000
- 3453
-
Kinetics and crystal orientation dependence in high aspect ratio silicon dry etchingBlauw, M. A. / Zijlstra, T. / Bakker, R. A. / van der Drift, E. et al. | 2000
- 3462
-
High speed anisotropic dry etching of CoNbZr for next generation magnetic recordingAndriesse, M. S. P. / Zijlstra, T. / van der Drift, E. et al. | 2000
- 3467
-
Effects of reactive ion etching on the electrical characteristics of GaNRong, B. / Cheung, R. / Gao, W. / Alkaisi, M. M. / Reeves, R. J. et al. | 2000
- 3471
-
High resolution inductively coupled plasma etching of 30 nm lines and spaces in tungsten and siliconGoodyear, Andrew L. / Mackenzie, Sinclair / Olynick, Deirdre L. / Anderson, Erik H. et al. | 2000
- 3476
-
Micromask-induced surface defects inside Si trench isolationRho, Kyeonglan et al. | 2000
- 3481
-
Quantum interference in a vacuum nanotriodeDriskill-Smith, A. A. G. / Hasko, D. G. / Ahmed, H. et al. | 2000
- 3488
-
Comparative study of self-aligned and nonself-aligned SiGe modulation-doped field effect transistors with nanometer gate lengthsLu, Wu / Koester, Steven J. / Wang, Xie-Wen / Chu, Jack O. / Ma, Tso-Ping / Adesida, Ilesanmi et al. | 2000
- 3493
-
Fabrication technique for nanometer-scale InAs quantum devices: Observation of quantum interference in Aharonov–Bohm rings and Coulomb blockade in quantum dotsChang, T. H. / Chen, K. A. / Yang, C. H. / Yang, M. J. / Park, D. et al. | 2000
- 3497
-
Nanofabrication using structure controlled hydrogenated Si clusters deposited on Si surfacesKanayama, Toshihiko / Watanabe, Miyoko O. / Bolotov, Leonid / Uchida, Noriyuki et al. | 2000
- 3501
-
Nanofabrication techniques for lasers with two-dimensional photonic crystal mirrorsMoosburger, J. / Happ, Th. / Kamp, M. / Forchel, A. et al. | 2000
- 3505
-
Fabrication of three-dimensional photonic structures with submicrometer resolution by x-ray lithographyCuisin, C. / Chelnokov, A. / Lourtioz, J.-M. / Decanini, D. / Chen, Y. et al. | 2000
- 3510
-
Drilled alternating-layer structure for three-dimensional photonic crystals with a full band gapKuramochi, Eiichi / Notomi, Masaya / Tamamura, Toshiaki / Kawashima, Takayuki / Kawakami, Shojiro / Takahashi, Jun-ichi / Takahashi, Chiharu et al. | 2000
- 3514
-
Nanoheteroepitaxy: Nanofabrication route to improved epitaxial growthZubia, D. / Zaidi, S. H. / Hersee, S. D. / Brueck, S. R. J. et al. | 2000
- 3521
-
Fabrication of 30 nm T gates using as a supporting and definition layerChen, Y. / Edgar, D. / Li, X. / Macintyre, D. / Thoms, S. et al. | 2000
- 3525
-
Progress on nanostructuring with NanojetVoigt, J. / Shi, F. / Hudek, P. / Rangelow, I. W. / Edinger, K. et al. | 2000
- 3530
-
Combining advanced lithographic techniques and self-assembly of thin films of diblock copolymers to produce templates for nanofabricationPeters, Richard D. / Yang, Xiao M. / Wang, Qiang / de Pablo, Juan J. / Nealey, Paul F. et al. | 2000
- 3535
-
Oxide nanodots and ultrathin layers fabricated on silicon using nonfocused multicharged ion beamsBorsoni, G. / Gros-Jean, M. / Korwin-Pawlowski, M. L. / Laffitte, R. / Le Roux, V. / Vallier, L. et al. | 2000
- 3539
-
Optimization of a lithographic and ion beam etching process for nanostructuring magnetoresistive thin film stacksWalsh, Michael E. / Hao, Yaowu / Ross, C. A. / Smith, Henry I. et al. | 2000
- 3544
-
Field emission cathode array with self-aligned gate electrode fabricated by silicon micromachiningBarth, W. / Debski, T. / Shi, F. / Hudek, P. / Kostic, I. / Rangelow, I. W. / Biehl, S. / Iwert, T. / Grabiec, P. / Studzinska, K. et al. | 2000
- 3549
-
Actuation and internal friction of torsional nanomechanical silicon resonatorsOlkhovets, A. / Evoy, S. / Carr, D. W. / Parpia, J. M. / Craighead, H. G. et al. | 2000
- 3552
-
Novel alignment system for imprint lithographyWhite, D. L. / Wood, O. R. et al. | 2000
- 3557
-
Nanoimprint lithography at the 6 in. wafer scaleHeidari, Babak / Maximov, Ivan / Montelius, Lars et al. | 2000
- 3561
-
Fabrication of quantum point contacts by imprint lithography and transport studiesMartini, Ingo / Kuhn, Silke / Kamp, Martin / Worschech, Lukas / Forchel, Alfred / Eisert, Dominik / Koeth, Johannes / Sijbesma, Rint et al. | 2000
- 3564
-
Quantitative analysis of the molding of nanostructuresSchift, H. / David, C. / Gobrecht, J. / D’ Amore, A. / Simoneta, D. / Kaiser, W. / Gabriel, M. et al. | 2000
- 3569
-
Electron-beam fabrication of nonplanar templates for contact printingRhee, K. W. / Shirey, L. M. / Isaacson, P. I. / Kornegay, C. F. / Dressick, W. J. / Chen, M.-S. / Brandow, S. L. et al. | 2000
- 3572
-
Step and flash imprint lithography: Template surface treatment and defect analysisBailey, T. / Choi, B. J. / Colburn, M. / Meissl, M. / Shaya, S. / Ekerdt, J. G. / Sreenivasan, S. V. / Willson, C. G. et al. | 2000
- 3578
-
Comparison of infrared frequency selective surfaces fabricated by direct-write electron-beam and bilayer nanoimprint lithographiesPuscasu, Irina / Boreman, G. / Tiberio, R. C. / Spencer, D. / Krchnavek, R. R. et al. | 2000
- 3582
-
Master replication into thermosetting polymers for nanoimprintingSchulz, H. / Lyebyedyev, D. / Scheer, H.-C. / Pfeiffer, K. / Bleidiessel, G. / Grützner, G. / Ahopelto, J. et al. | 2000
- 3586
-
Directed assembly of carbon nanotube electronic circuits by selective area chemical vapor deposition on prepatterned catalyst electrode structuresWei, Y. Y. / Fan, X. / Eres, Gyula et al. | 2000
- 3590
-
Real time pattern changing in atomic beam holography using phase shift by Stark effectFujita, J. / Mitake, S. / Shimizu, F. et al. | 2000
- 3594
-
Lithographically defined nano and micro sensors using “float coating” of resist and electron beam lithographyZhou, H. / Chong, B. K. / Stopford, P. / Mills, G. / Midha, A. / Donaldson, L. / Weaver, J. M. R. et al. | 2000
- 3600
-
Microcalorimetry applications of a surface micromachined bolometer-type thermal probeLi, Mo-Huang / Gianchandani, Yogesh B. et al. | 2000
- 3604
-
Novel multibridge-structured piezoelectric microdevice for scanning force microscopyChu, J. / Wang, Z. / Maeda, R. / Kataoka, K. / Itoh, T. / Suga, T. et al. | 2000
- 3608
-
Fabrication of diffractive optical elements for an integrated compact optical microelectromechanical system laser scannerWendt, J. R. / Krygowski, T. W. / Vawter, G. A. / Blum, O. / Sweatt, W. C. / Warren, M. E. / Reyes, D. et al. | 2000