Anisotropic etching of β-Ga2O3 using hot phosphoric acid (Englisch)
- Neue Suche nach: Zhang, Yuewei
- Neue Suche nach: Mauze, Akhil
- Neue Suche nach: Speck, James S.
- Neue Suche nach: Zhang, Yuewei
- Neue Suche nach: Mauze, Akhil
- Neue Suche nach: Speck, James S.
In:
Applied Physics Letters
;
115
, 1
;
5
;
2019
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Anisotropic etching of β-Ga2O3 using hot phosphoric acid
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Beteiligte:
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Erschienen in:Applied Physics Letters ; 115, 1 ; 5
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Verlag:
- Neue Suche nach: AIP Publishing LLC
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Erscheinungsdatum:01.07.2019
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Format / Umfang:5 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 115, Ausgabe 1
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