Limits of residual stress in Cr films sputter deposited on biased substrates (Englisch)
Nationallizenz
- Neue Suche nach: Misra, A.
- Neue Suche nach: Nastasi, M.
- Neue Suche nach: Misra, A.
- Neue Suche nach: Nastasi, M.
In:
Applied Physics Letters
;
75
, 20
;
3123-3125
;
1999
- Aufsatz (Zeitschrift) / Elektronische Ressource
-
Titel:Limits of residual stress in Cr films sputter deposited on biased substrates
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Beteiligte:Misra, A. ( Autor:in ) / Nastasi, M. ( Autor:in )
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Erschienen in:Applied Physics Letters ; 75, 20 ; 3123-3125
-
Verlag:
- Neue Suche nach: American Institute of Physics
-
Erscheinungsdatum:15.11.1999
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ISSN:
-
DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
-
Datenquelle:
Inhaltsverzeichnis – Band 75, Ausgabe 20
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