Mechanistic feature-scale profile simulation of low-pressure chemical vapor deposition by tetraethoxysilane pyrolysis (Englisch)
- Neue Suche nach: Labun, Andrew H.
- Neue Suche nach: Moffat, Harry K.
- Neue Suche nach: Cale, Timothy S.
- Neue Suche nach: Labun, Andrew H.
- Neue Suche nach: Moffat, Harry K.
- Neue Suche nach: Cale, Timothy S.
In:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
;
18
, 1
;
267-278
;
2000
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Mechanistic feature-scale profile simulation of low-pressure chemical vapor deposition by tetraethoxysilane pyrolysis
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Beteiligte:
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Erschienen in:
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Verlag:
- Neue Suche nach: American Vacuum Society
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Erscheinungsdatum:01.01.2000
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Format / Umfang:12 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 18, Ausgabe 1
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