-thick silicon oxide gate films grown at using modified reactive ion beam deposition with pyrolytic-gas passivation (Englisch)
- Neue Suche nach: Yamada, Hiroshi
- Neue Suche nach: Yamada, Hiroshi
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
;
25
, 2
;
340-346
;
2007
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:-thick silicon oxide gate films grown at using modified reactive ion beam deposition with pyrolytic-gas passivation
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Weitere Titelangaben:-thick silicon oxide gate films
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Beteiligte:Yamada, Hiroshi ( Autor:in )
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Erschienen in:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films ; 25, 2 ; 340-346
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Verlag:
- Neue Suche nach: American Vacuum Society
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Erscheinungsdatum:01.03.2007
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Format / Umfang:7 pages
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ISSN:
-
DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 25, Ausgabe 2
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