Application of porcelain enamel as an ultra-high-vacuum-compatible electrical insulator (Englisch)
- Neue Suche nach: Biscardi, C.
- Neue Suche nach: Hseuh, H.
- Neue Suche nach: Mapes, M.
- Neue Suche nach: Biscardi, C.
- Neue Suche nach: Hseuh, H.
- Neue Suche nach: Mapes, M.
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
;
18
, 4
;
1751-1754
;
2000
- Aufsatz (Zeitschrift) / Elektronische Ressource
-
Titel:Application of porcelain enamel as an ultra-high-vacuum-compatible electrical insulator
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Beteiligte:
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Erschienen in:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films ; 18, 4 ; 1751-1754
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Verlag:
- Neue Suche nach: American Vacuum Society
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Erscheinungsdatum:01.07.2000
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Format / Umfang:4 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:ACCELERATORS , VACUUM SYSTEMS , ELECTRICAL INSULATORS , BNL , PORCELAIN , ENAMELS , COATINGS , porcelain
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Datenquelle:
Inhaltsverzeichnis – Band 18, Ausgabe 4
Zeige alle Jahrgänge und Ausgaben
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
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- 1282
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PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Manufacturing Science and Technology - Ultra-Clean Society and Contamination Free Manufacturing - Generation of positively charged particles at an anode and transport to device wafers in a real radio frequency plasma etching chamber for tungsten etch-back processMoriya, Tsuyoshi et al. | 2000
- 1287
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PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Manufacturing Science and Technology - Interconnect and Integration - Multizone uniformity control of a chemical mechanical polishing process utilizing a pre- and postmeasurement strategyChemali, Chadi El et al. | 2000
- 1287
-
Manufacturing Science and Technology - Interconnect and Integration| 2000
- 1287
-
Multizone uniformity control of a chemical mechanical polishing process utilizing a pre- and postmeasurement strategyEl Chemali, Chadi / Moyne, James / Khan, Kareemullah / Nadeau, Rock / Smith, Paul / Colt, John / Chapple-Sokol, Jonathan / Parikh, Tarun et al. | 2000
- 1297
-
Manufacturing Science and Technology - Metrology I| 2000
- 1297
-
Demonstration of broadband radio frequency sensing: Empirical polysilicon etch rate estimation in a Lam 9400 etch toolGarvin, Craig / Grizzle, J. W. et al. | 2000
- 1297
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Manufacturing Science and Technology - Metrology I - Demonstration of broadband radio frequency sensing: Empirical polysilicon etch rate estimation in a Lam 9400 etch toolGarvin, Craig et al. | 2000
- 1303
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PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Manufacturing Science and Technology - Metrology I - Real time control of plasma deposited optical filters by multiwavelength ellipsometryHeitz, T. et al. | 2000
- 1303
-
Real time control of plasma deposited optical filters by multiwavelength ellipsometryHeitz, T. / Hofrichter, A. / Bulkin, P. / Drevillon, B. et al. | 2000
- 1308
-
Manufacturing Science and Technology - Manufacturing Science and Technology Poster Session| 2000
- 1308
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Manufacturing Science and Technology - Manufacturing Science and Technology Poster Session - Effects of trapped charges on Hg-Schottky capacitance-voltage measurements of n-type epitaxial silicon wafersWang, Q. et al. | 2000
- 1308
-
Effects of trapped charges on Hg-Schottky capacitance–voltage measurements of n-type epitaxial silicon wafersWang, Q. / Liu, D. / Virgo, J. T. / Yeh, J. / Hillard, R. J. et al. | 2000
- 1313
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PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Manufacturing Science and Technology - Manufacturing Science and Technology Poster Session - Plasma etch-back planarization coupled to chemical mechanical polishing for sub 0.18 mm shallow trench isolation technologySchiltz, André et al. | 2000
- 1313
-
Plasma etch-back planarization coupled to chemical mechanical polishing for sub 0.18 μm shallow trench isolation technologySchiltz, André / Palatini, Laëtitia / Paoli, Maryse / Rivoire, Maurice / Prola, Alain et al. | 2000
- 1321
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PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Nanometer-Scale Science and Technology - Nanotechnology - Experimental and theoretical results of room-temperature single-electron transistor formed by the atomic force microscope nano-oxidation processGotoh, Y. et al. | 2000
- 1321
-
Nanometer-Scale Science and Technology - Nanotechnology| 2000
- 1321
-
Experimental and theoretical results of room-temperature single-electron transistor formed by the atomic force microscope nano-oxidation processGotoh, Y. / Matsumoto, K. / Maeda, T. / Cooper, E. B. / Manalis, S. R. / Fang, H. / Minne, S. C. / Hunt, T. / Dai, H. / Harris, J. et al. | 2000
- 1326
-
Fabrication of bismuth nanowires with a silver nanocrystal shadowmaskChoi, S. H. / Wang, K. L. / Leung, M. S. / Stupian, G. W. / Presser, N. / Morgan, B. A. / Robertson, R. E. / Abraham, M. / King, E. E. / Tueling, M. B. et al. | 2000
- 1326
-
Nanometer-Scale Science and Technology - Nanopatterning| 2000
- 1326
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Nanometer-Scale Science and Technology - Nanopatterning - Fabrication of bismuth nanowires with a silver nanocrystal shadowmaskChoi, S.H. et al. | 2000
- 1329
-
Fabrication of metal nanowire using carbon nanotube as a maskYun, Wan Soo / Kim, Jinhee / Park, Kang-Ho / Ha, Jeong Sook / Ko, Young-Jo / Park, Kyoungwan / Kim, Seong Keun / Doh, Yong-Joo / Lee, Hu-Jong / Salvetat, Jean-Paul et al. | 2000
- 1329
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Nanometer-Scale Science and Technology - Nanopatterning - Fabrication of metal nanowire using carbon nanotube as a maskYun, Wan Soo et al. | 2000
- 1333
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Nanometer-Scale Science and Technology - Nanometer-Scale Science and Technology Poster Session - Fabrication of a nanosize metal aperture for a near field scanning optical microscopy sensor using photoresist removal and sputtering techniquesJung, M.Y. et al. | 2000
- 1333
-
Nanometer-Scale Science and Technology - Nanometer-Scale Science and Technology Poster Session| 2000
- 1333
-
Fabrication of a nanosize metal aperture for a near field scanning optical microscopy sensor using photoresist removal and sputtering techniquesJung, M. Y. / Lyo, I. W. / Kim, D. W. / Choi, S. S. et al. | 2000
- 1338
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Nanometer-Scale Science and Technology - Nanometer-Scale Science and Technology Poster Session - Nondestructive one-dimensional scanning capacitance microscope dopant profile determination method and its application to three-dimensional dopant profilesKang, Eu-Seok et al. | 2000
- 1338
-
Nondestructive one-dimensional scanning capacitance microscope dopant profile determination method and its application to three-dimensional dopant profilesKang, Eu-Seok / Kang, Jeong-Won / Hwang, Ho-Jung / Lee, Jun-Ha et al. | 2000
- 1345
-
Nanometer-Scale Science and Technology I - Nanoscale Tribology and Adhesion| 2000
- 1345
-
Scanning probe microscopy tip–sample interactions in primary alcohols of varying chain lengthRalich, R. M. / Wu, Y. / Ramsier, R. D. / Henriksen, P. N. et al. | 2000
- 1345
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Nanometer-Scale Science and Technology I - Nanoscale Tribology and Adhesion - Scanning probe microscopy tip-sample interactions in primary alcohols of varying chain lengthRalich, R.M. et al. | 2000
- 1349
-
Nanometer-Scale Science and Technology II - Molecular Electronics| 2000
- 1349
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Nanometer-Scale Science and Technology II - Molecular Electronics - Isolating, imaging, and electrically characterizing individual organic molecules on the Si(100) surface with the scanning tunneling microscopeHersam, M.C. et al. | 2000
- 1349
-
Isolating, imaging, and electrically characterizing individual organic molecules on the Si(100) surface with the scanning tunneling microscopeHersam, M. C. / Guisinger, N. P. / Lyding, J. W. et al. | 2000
- 1354
-
Plasma Science and Technology - Plasma Science and Technology Poster Session| 2000
- 1354
-
Etching characteristics of film with plasmaSeo, Jung-Woo / Lee, Do-Haing / Lee, Won-Jae / Yu, Byoung-Gon / Kwon, Kwang-Ho / Yeom, Geun-Young / Chang, Eui-Goo / Kim, Chang-Il et al. | 2000
- 1354
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Etching characteristics of SrBi2Ta2O9 film with Ar-CHF3 plasmaSeo, Jung-Woo et al. | 2000
- 1359
-
Optical emission studies and neutral stream characterization of a surface reflection materials processing sourceTang, Xianmin / Manos, Dennis M. et al. | 2000
- 1359
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Optical emission studies and neutral stream characterization of a surface reflection materials processing sourceTang, Xianmin et al. | 2000
- 1366
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Estimation of surface kinetic parameters and two-dimensional simulation of InP pattern features during CH4-H2 plasma etchingRhallabi, A. et al. | 2000
- 1366
-
Estimation of surface kinetic parameters and two-dimensional simulation of InP pattern features during plasma etchingRhallabi, A. / Houlet, L. / Turban, G. et al. | 2000
- 1373
-
Effects of addition on gas in inductively coupled plasmas for lead zirconate titanate etchingAn, Tae-Hyun / Park, Joon-Yong / Yeom, Geun-Young / Chang, Eui-Goo / Kim, Chang-Il et al. | 2000
- 1373
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Effects of BCl3 Addition on Ar-Cl2 gas in inductively coupled plasmas for lead zirconate titanate etchingAn, Tae-Hyun et al. | 2000
- 1377
-
Roles of gas in etching of platinum by inductively coupled plasmasRyu, Jae-Heung / Kim, Nam-Hoon / Kim, Hyeon-Soo / Yeom, Geun-Young / Chang, Eui-Goo / Kim, Chang-Il et al. | 2000
- 1377
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Roles of N2 gas in etching of platinum by inductively coupled Ar-Cl2-N2 plasmasRyu, Jae-Heung et al. | 2000
- 1381
-
Etching mechanism of films in high density plasmaKim, Seung-Bum / Lee, Yong-Hyuk / Kim, Tae-Hyung / Yeom, Geun-Young / Kim, Chang-Il et al. | 2000
- 1381
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Etching mechanism of (Ba, Sr)TiO3 films in high density Cl2-BCl3-Ar plasmaKim, Seung-Bum et al. | 2000
- 1385
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Deceleration of silicon etch rate at high aspect ratiosKiihamäki, J. et al. | 2000
- 1385
-
Deceleration of silicon etch rate at high aspect ratiosKiihamäki, J. et al. | 2000
- 1390
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Magnetized inductively coupled plasma etching of GaN in Cl2-BCl3 PlasmasLee, Y.H. et al. | 2000
- 1390
-
Magnetized inductively coupled plasma etching of GaN in plasmasLee, Y. H. / Sung, Y. J. / Yeom, G. Y. / Lee, J. W. / Kim, T. I. et al. | 2000
- 1395
-
Plasma Science and Technology - Plasma Diagnostics II| 2000
- 1395
-
Diagnostic of rf discharge plasma by Thomson scattering with gated intensified charge coupled device detectorsMoshkalyov, S. A. / Thompson, C. / Morrow, T. / Graham, W. G. et al. | 2000
- 1395
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology - Plasma Diagnostics II - Diagnostic of rf discharge plasma by Thomson scattering with gated intensified charge coupled device detectorsMoshkalyov, S.A. et al. | 2000
- 1401
-
Plasma Science and Technology - Dielectric Etching| 2000
- 1401
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology - Dielectric Etching - Plasma enhanced chemical vapor deposition Si-rich silicon oxynitride films for advanced self-aligned contact oxide etching in sub-0.25 mm ultralarge scale integration technology and beyondKim, Jeong-Ho et al. | 2000
- 1401
-
Plasma enhanced chemical vapor deposition Si-rich silicon oxynitride films for advanced self-aligned contact oxide etching in sub-0.25 μm ultralarge scale integration technology and beyondKim, Jeong-Ho / Yu, Jae-Seon / Ku, Ja-Chun / Ryu, Choon-Kun / Oh, Su-Jin / Kim, Si-Bum / Kim, Jin-Woong / Hwang, Jeong-Mo / Lee, Su-Youb / Kouichiro, Inazawa et al. | 2000
- 1411
-
Plasma Science and Technology I - High Fidelity Pattern Transfer| 2000
- 1411
-
Transfer etching of bilayer resists in oxygen-based plasmasMahorowala, A. P. / Babich, K. / Lin, Q. / Medeiros, D. R. / Petrillo, K. / Simons, J. / Angelopoulos, M. / Sooriyakumaran, R. / Hofer, D. / Reynolds, G. W. et al. | 2000
- 1411
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology I - High Fidelity Pattern Transfer - Transfer etching of bilayer resists in oxygen-based plasmasMahorowala, A.P. et al. | 2000
- 1420
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology I - High Fidelity Pattern Transfer - Integration of metal masking and etching for deep submicron patterningGabriel, Calvin T. et al. | 2000
- 1420
-
Integration of metal masking and etching for deep submicron patterningGabriel, Calvin T. / Kim, Robert Y. / Baker, Daniel C. et al. | 2000
- 1425
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology I - High Fidelity Pattern Transfer - Reactive ion etch of 150 nm Al lines for interconnections in dynamic random access memoryStojakovic, G. et al. | 2000
- 1425
-
Reactive ion etch of 150 nm Al lines for interconnections in dynamic random access memoryStojakovic, G. / Ning, X. J. et al. | 2000
- 1431
-
Plasma Science and Technology II - Pulsed Plasmas| 2000
- 1431
-
Characterization of process-induced charging damage in scaled-down devices and reliability improvement using time-modulated plasmaNoguchi, Ko / Samukawa, Seiji / Ohtake, Hiroto / Mukai, Tomonori et al. | 2000
- 1431
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology II - Pulsed Plasmas - Characterization of process-induced charging damage in scaled-down devices and reliability improvement using time-modulated plasmaNoguchi, Ko et al. | 2000
- 1437
-
Surface Science - Surface Science Poster Session| 2000
- 1437
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science - Surface Science Poster Session - Insertion process and electrical conduction of conjugated molecules in n-alkanethiol self-assembled monolayers on Au(111)Ishida, Takao et al. | 2000
- 1437
-
Insertion process and electrical conduction of conjugated molecules in n-alkanethiol self-assembled monolayers on Au(111)Ishida, Takao / Mizutani, Wataru / Tokumoto, Hiroshi / Choi, Nami / Akiba, Uichi / Fujihira, Masamichi et al. | 2000
- 1443
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science - Surface Science Poster Session - Decomposition of 1,3-butadiene on Ru(001): Evidence for a (CH)4 metallacycleWeiss, Michael J. et al. | 2000
- 1443
-
Decomposition of 1,3-butadiene on Ru(001): Evidence for a metallacycleWeiss, Michael J. / Hagedorn, Christopher J. / Weinberg, W. Henry et al. | 2000
- 1448
-
Study of boron effects on the reaction of Co and at various temperaturesHuang, H. J. / Chen, K. M. / Chang, C. Y. / Huang, T. Y. / Chang, T. C. / Chen, L. P. / Huang, G. W. et al. | 2000
- 1448
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science - Surface Science Poster Session - Study of boron effects on the reaction of Co and Si1 - xGex at various temperaturesHuang, H.J. et al. | 2000
- 1455
-
The adsorption and desorption of CO on the W(111) surfaceLee, S. Y. / Kim, Y.-D. / Yang, T. S. / Boo, J.-H. / Park, S. C. / Lee, S. B. / Park, C. Y. / Kwak, H. T. et al. | 2000
- 1455
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science - Surface Science Poster Session - The adsorption and desorption of CO on the W(111) surfaceLee, S.Y. et al. | 2000
- 1460
-
Surface structure of MnO/Rh(100) studied by scanning tunneling microscopy and low-energy electron diffractionNishimura, H. / Tashiro, T. / Fujitani, T. / Nakamura, J. et al. | 2000
- 1460
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science - Surface Science Poster Session - Surface structure of MnO-Rh(100) studied by scanning tunneling microscopy and low-energy electron diffractionNishimura, H. et al. | 2000
- 1464
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science - Surface Science Poster Session - In situ study of the formation of SiC thin films on Si(III) surfaces with 1,3-disilabutene: Adsorption properties and initial deposition characteristicsYoon, H.G. et al. | 2000
- 1464
-
In situ study of the formation of SiC thin films on Si(111) surfaces with 1,3-disilabutane: Adsorption properties and initial deposition characteristicsYoon, H. G. / Boo, J.-H. / Liu, W. L. / Lee, S.-B. / Park, S.-C. / Kang, H. / Kim, Y. et al. | 2000
- 1469
-
Site preferences of oxygen and boron atoms during dissociative reaction of molecules onto the Si(111)-7×7 surfaceKaikoh, T. / Miyake, K. / Li, Y. J. / Morita, R. / Yamashita, M. / Shigekawa, H. et al. | 2000
- 1469
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science - Surface Science Poster Session - Site preferences of oxygen and boron atoms during dissociative reaction of HBO2 molecules onto the Si(111)-7X7 surfaceKaikoh, T. et al. | 2000
- 1473
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science - Surface Science Poster Session - Cesium-induced structural transformation from the Si(113)3X2 to the 3X1 surfaceHwang, C.C. et al. | 2000
- 1473
-
Cesium-induced structural transformation from the to the surfaceHwang, C. C. / An, K. S. / Kim, S. H. / Kim, Y. K. / Park, C. Y. / Kwon, S. N. / Song, H. S. / Jung, K. H. / Kinoshita, T. / Kakizaki, A. et al. | 2000
- 1478
-
Cyclic voltammetry, x-ray photoelectron spectroscopy, secondary-ion-mass spectrometry, and ion-scattering spectrometry examination of zirconium passive film breakdown in the presence of sulfateSchennach, R. / Mamun, A. / Kunamneni, N. / Cocke, D. L. et al. | 2000
- 1478
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science - Surface Science Poster Session - Cyclic voltammetry, x-ray photoelectron spectroscopy, secondary-ion-mass spectrometry, and ion-scattering spectrometry examination of zirconium passive film breakdown in the presence of sulfateSchennach, R. et al. | 2000
- 1484
-
Ultrahigh vacuum compatible matrix assisted laser desorption/ionization time-of-flight mass spectrometerPorter, T. L. / Hermann, S. et al. | 2000
- 1484
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science - Surface Science Poster Session - Ultrahigh vacuum compatible matrix assisted laser desorption-ionization time-of-flight mass spectrometerPorter, T.L. et al. | 2000
- 1488
-
Surface Science I - Surface Structure| 2000
- 1488
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science I - Surface Structure - Na- and Li-induced Ge(111)3X1 reconstruction: Different electronic configurations revealed by scanning tunneling microscopy imagesLee, Geunseop et al. | 2000
- 1488
-
Na- and Li-induced Ge(111)3×1 reconstruction: Different electronic configurations revealed by scanning tunneling microscopy imagesLee, Geunseop / Kim, Jonggeol / Mai, H. / Chizhov, Ilya / Willis, R. F. et al. | 2000
- 1492
-
Reflection high-energy electron diffraction and scanning tunneling microscopy study of InP(001) surface reconstructionsLaBella, V. P. / Ding, Z. / Bullock, D. W. / Emery, C. / Thibado, P. M. et al. | 2000
- 1492
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science I - Surface Structure - Reflection high-energy electron diffraction and scanning tunneling microscopy study of InP(001) surface reconstructionsLaBella, V.P. et al. | 2000
- 1497
-
Reactions of gas-phase atomic hydrogen and deuterium with chemically modified Ir(111) surfacesHagedorn, Christopher J. / Weiss, Michael J. / Weinberg, W. Henry et al. | 2000
- 1497
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science II - Catalysis on Metals - Reactions of gas-phase atomic hydrogen and deuterium with chemically modified Ir(111) surfacesHagedorn, Christopher J. et al. | 2000
- 1497
-
Surface Science II - Catalysis on Metals| 2000
- 1503
-
Surface Science II - Reactions on Metals| 2000
- 1503
-
Reaction between NO and CO on rhodium (100): How lateral interactions lead to auto-accelerating kineticsHopstaken, M. J. P. / Niemantsverdriet, J. W. et al. | 2000
- 1503
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science II - Reactions on Metals - Reaction between NO and CO on rhodium (100): How lateral interactions lead to auto-accelerating kineticsHopstaken, M.J.P. et al. | 2000
- 1509
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science II - Reactions on Metals - Coverage dependence of activation barriers: Nitrogen on Ru(0001)Diekhöner, L. et al. | 2000
- 1509
-
Coverage dependence of activation barriers: Nitrogen on Ru(0001)Diekhöner, L. / Mortensen, H. / Baurichter, A. / Luntz, A. C. et al. | 2000
- 1514
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science II - Model Catalysts - Microreactor for studies of low surface area model catalysts made by electron-beam lithographyJohansson, Stefan et al. | 2000
- 1514
-
Surface Science II - Model Catalysts| 2000
- 1514
-
Microreactor for studies of low surface area model catalysts made by electron-beam lithographyJohansson, Stefan / Fridell, Erik / Kasemo, Bengt et al. | 2000
- 1520
-
Water adsorption structures on flat and stepped Ru(0001) surfacesHoffmann, Wolfgang / Benndorf, Carsten et al. | 2000
- 1520
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science III - Water-Surface Interactions - Water adsorption structures on flat and stepped Ru(0001) surfacesHoffmann, Wolfgang et al. | 2000
- 1520
-
Surface Science III - Water-Surface Interactions| 2000
- 1526
-
Surface Science III - Diffusion on Surfaces| 2000
- 1526
-
Monte Carlo derived diffusion parameters for Ga on the GaAs(001)- surface: A molecular beam epitaxy–scanning tunneling microscopy studyLaBella, V. P. / Bullock, D. W. / Ding, Z. / Emery, C. / Harter, W. G. / Thibado, P. M. et al. | 2000
- 1526
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science III - Diffusion on Surfaces - Monte Carlo derived diffusion parameters for Ga on the GaAs(001)-(2X4) surface: A molecular beam opitaxy-scanning tunneling microscopy studyLaBella, V.P. et al. | 2000
- 1532
-
CUMULATIVE AUTHOR INDEX| 2000
- 1532
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - CUMULATIVE AUTHOR INDEX| 2000
- 1533
-
Ionized sputter deposition using an extremely high plasma density pulsed magnetron dischargeMacák, Karol / Kouznetsov, Vladimir / Schneider, Jochen / Helmersson, Ulf / Petrov, Ivan et al. | 2000
- 1533
-
PART II - Thin Films - Fundamentals and Applications of Ionized PVD - Ionized sputter deposition using an extremely high plasma density pulsed magnetron dischargeMacák, Karol et al. | 2000
- 1533
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Thin Films - Fundamentals and Applications of Ionized PVD| 2000
- 1538
-
PART II - Thin Films - Fundamentals and Applications of Ionized PVD - Origin and evolution of sculptured thin filmsMessier, Russell et al. | 2000
- 1538
-
Origin and evolution of sculptured thin filmsMessier, Russell / Venugopal, Vijayakumar C. / Sunal, Paul D. et al. | 2000
- 1546
-
PART II - Thin Films - Fundamentals and Applications of Ionized PVD - Ionized physical-vapor deposition using a hollow-cathode magnetron source for advanced metallizationKlawuhn, E. et al. | 2000
- 1546
-
Ionized physical-vapor deposition using a hollow-cathode magnetron source for advanced metallizationKlawuhn, E. / D’Couto, G. C. / Ashtiani, K. A. / Rymer, P. / Biberger, M. A. / Levy, K. B. et al. | 2000
- 1550
-
Effects of copper seedlayer deposition method for electroplatingCooney, E. C. / Strippe, D. C. / Korejwa, J. W. et al. | 2000
- 1550
-
PART II - Thin Films - Fundamentals and Applications of Ionized PVD - Effects of copper seedlayer deposition method for electroplatingCooney III, E.C. et al. | 2000
- 1555
-
PART II - Thin Films - Fundamentals and Applications of Ionized PVD - Steel coating by self-induced ion plating, a new high throughput metallization ion plating techniqueBrande, P.Vanden et al. | 2000
- 1555
-
Steel coating by self-induced ion plating, a new high throughput metallization ion plating techniqueBrande, P. Vanden / Weymeersch, A. et al. | 2000
- 1561
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Thin Films - Thin Film Poster Session| 2000
- 1561
-
PART II - Thin Films - Thin Film Poster Session - Effect of HCl catalyst in the formation of flat structures of Ta(sub 2)O5 thin films by sol-gel techniqueCantalini, C. et al. | 2000
- 1561
-
Effect of HCl catalyst in the formation of flat structures of thin films by sol-gel techniqueCantalini, C. / Pelino, M. / Phani, R. A. / Passacantando, M. / Picozzi, P. / Santucci, S. et al. | 2000
- 1567
-
Mechanical properties and residual stress in AlN films prepared by ion beam assisted depositionWatanabe, Yoshihisa / Kitazawa, Nobuaki / Nakamura, Yoshikazu / Li, Chunliang / Sekino, Tohru / Niihara, Koichi et al. | 2000
- 1567
-
PART II - Thin Films - Thin Film Poster Session - Mechanical properties and residual stress in AIN films prepared by ion beam assisted depositionWatanabe, Yoshihisa et al. | 2000
- 1571
-
Oxidation and chemical state analysis of polycrystalline magnetron sputtered (Ti, Al)N films at ambient and liquid temperaturesSeal, S. / Kale, A. / Sundaram, K. B. / Jimenez, D. et al. | 2000
- 1571
-
PART II - Thin Films - Thin Film Poster Session - Oxidation and chemical state analysis of polycrystalline magnetron sputtered (Ti, Al)N films at ambient and liquid N2 temperaturesSeal, S. et al. | 2000
- 1579
-
PART II - Thin Films - Thin Film Poster Session - Improved light stability of colored Si02 coatings containing organic and metalorganic dye moleculesDiaz-Flores, L.L. et al. | 2000
- 1579
-
Improved light stability of colored coatings containing organic and metalorganic dye moleculesDı́az-Flores, L. L. / Pérez-Bueno, J. J. / Ramı́rez-Bon, R. / Espinoza-Beltrán, F. J. / Vorobiev, Y. V. / González-Hernández, J. et al. | 2000
- 1584
-
PART II - Thin Films - Thin Film Poster Session - Origin of electrical property distribution on the surface of ZnO:Al films prepared by magnetron sputteringMinami, Tadatsugu et al. | 2000
- 1584
-
Origin of electrical property distribution on the surface of ZnO:Al films prepared by magnetron sputteringMinami, Tadatsugu / Miyata, Toshihiro / Yamamoto, Takashi / Toda, Hidenobu et al. | 2000
- 1590
-
PART II - Thin Films - Thin Film Poster Session - Low-temperature growth of Ti(C,N) thin films on D2 steel and Si(100) substrates by plasma-enhanced metalorganic chemical vapor depositionBoo, Jin-Hyo et al. | 2000
- 1590
-
Low-temperature growth of Ti(C,N) thin films on D2 steel and Si(100) substrates by plasma-enhanced metalorganic chemical vapor depositionBoo, Jin-Hyo / Heo, Cheol Ho / Cho, Yong Ki / Han, Jeon-Geon et al. | 2000
- 1595
-
PART II - Thin Films - Thin Film Poster Session - Study on the characteristics of TiN thin film deposited by the atomic layer chemical vapor deposition methodJeon, Hyeongtag et al. | 2000
- 1595
-
Study on the characteristics of TiN thin film deposited by the atomic layer chemical vapor deposition methodJeon, Hyeongtag / Lee, June-Woo / Kim, Young-Do / Kim, Deok-Soo / Yi, Kyoung-Soo et al. | 2000
- 1599
-
PART II - Thin Films - Thin Film Poster Session - Alternative procedure for the fabrication of close-spaced sublimated CdTe solar cellsMoutinho, H.R. et al. | 2000
- 1599
-
Alternative procedure for the fabrication of close-spaced sublimated CdTe solar cellsMoutinho, H. R. / Dhere, R. G. / Ballif, C. / Al-Jassim, M. M. / Kazmerski, L. L. et al. | 2000
- 1604
-
CdS/CdTe interface analysis by transmission electron microscopyDhere, R. G. / Al-Jassim, M. M. / Yan, Y. / Jones, K. M. / Moutinho, H. R. / Gessert, T. A. / Sheldon, P. / Kazmerski, L. L. et al. | 2000
- 1604
-
PART II - Thin Films - Thin Film Poster Session - CdS-CdTe interface analysis by transmission electron microscopyDhere, R.G. et al. | 2000
- 1609
-
PART II - Thin Films - Thin Film Poster Session - Synthesis of highly oriented piezoelectric AIN films by reactive sputter depositionEngelmark, F. et al. | 2000
- 1609
-
Synthesis of highly oriented piezoelectric AlN films by reactive sputter depositionEngelmark, F. / Fucntes, G. / Katardjiev, I. V. / Harsta, A. / Smith, U. / Berg, S. et al. | 2000
- 1613
-
PART II - Thin Films - Thin Film Poster Session - Surface morphology analysis in correlation with crystallinity of CeO2(110) layers on Si(100) substratesInoue, T. et al. | 2000
- 1613
-
Surface morphology analysis in correlation with crystallinity of layers on Si(100) substratesInoue, T. / Nakamura, T. / Nihei, S. / Kamata, S. / Sakamoto, N. / Yamamoto, Y. et al. | 2000
- 1619
-
PART II - Thin Films - Thin Film Poster Session - X-ray photoelectron spectroscopy and Auger electron spectroscopy investigation on the oxidation resistance of plasma-treated copper leadframesWong, A.S.W. et al. | 2000
- 1619
-
X-ray photoelectron spectroscopy and Auger electron spectroscopy investigation on the oxidation resistance of plasma-treated copper leadframesWong, A. S. W. / Krishnan, R. Gopal / Sarkar, G. et al. | 2000
- 1632
-
PART II - Thin Films - Thin Film Poster Session - Optimization of the reflectivity of magnetron sputter deposited silver filmsVergöhl, M. et al. | 2000
- 1632
-
Optimization of the reflectivity of magnetron sputter deposited silver filmsVergöhl, M. / Malkomes, N. / Szyszka, B. / Neumann, F. / Matthée, T. / Bräuer, G. et al. | 2000
- 1638
-
PART II - Thin Films - Thin Film Poster Session - Preparation and characterization of rf-sputtered SrTiO3 thin filmsRadhakrishnan, K. et al. | 2000
- 1638
-
Preparation and characterization of rf-sputtered thin filmsRadhakrishnan, K. / Tan, C. L. / Zheng, H. Q. / Ng, G. I. et al. | 2000
- 1642
-
PART II - Thin Films - Advanced Thin Film Formation Chemistry - Organic films prepared by polymer sputteringBiederman, Hynek et al. | 2000
- 1642
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Thin Films - Advanced Thin Film Formation Chemistry| 2000
- 1642
-
Organic films prepared by polymer sputteringBiederman, Hynek et al. | 2000
- 1649
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Thin Films - Fundamentals of Si and Dielectrics PVD| 2000
- 1649
-
PART II - Thin Films - Fundamentals of Si and Dielectrics PVD - Preparation of Co and CoNx thin films by unbalanced radio frequency magnetron sputteringTanaka, T. et al. | 2000
- 1649
-
Preparation of Co and thin films by unbalanced radio frequency magnetron sputteringTanaka, T. / Kawabata, K. / Kitabatake, A. et al. | 2000
- 1653
-
Chemical vapor deposition of alpha aluminum oxide for high-temperature aerospace sensorsNiska, Raymond H. / Constant, Alan P. / Witt, Tony / Gregory, Otto J. et al. | 2000
- 1653
-
PART II - Thin Films - Fundamentals of Si and Dielectrics PVD - Chemical vapor deposition of alpha aluminum oxide for high-temperature aerospace sensorsNiska, Raymond H. et al. | 2000
- 1659
-
Phase development of radio-frequency magnetron sputter-deposited (90/10) thin filmsLee, Jeon-Kook / Park, Dongkyun / Cheong, Deok-Soo / Park, Jong-Wan / Park, Chul Soon et al. | 2000
- 1659
-
PART II - Thin Films - Fundamentals of Si and Dielectrics PVD - Phase development of radio-frequency magnetron sputter-deposited Pb(Mg1-3Nb2-3)O3-PbTiO3 (90-10) thin filmsLee, Jeon-Kook et al. | 2000
- 1663
-
PART II - Thin Films - Transparent Conductive Oxides - Electrical properties and surface morphology of heteroepitaxial-grown tin-doped indium oxide thin films deposited by molecular-beam epitaxyTaga, Naoaki et al. | 2000
- 1663
-
Electrical properties and surface morphology of heteroepitaxial-grown tin-doped indium oxide thin films deposited by molecular-beam epitaxyTaga, Naoaki / Shigesato, Yuzo / Kamei, Masayuki et al. | 2000
- 1663
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Thin Films - Transparent Conductive Oxides| 2000
- 1668
-
PART II - Thin Films - Transparent Conductive Oxides - Influence of the target-substrate distance on the properties of indium tin oxide films prepared by radio frequency reactive magnetron sputteringMeng, Li-Jian et al. | 2000
- 1668
-
Influence of the target-substrate distance on the properties of indium tin oxide films prepared by radio frequency reactive magnetron sputteringMeng, Li-Jian / dos Santos, M. P. et al. | 2000
- 1672
-
PART II - Thin Films - Transparent Conductive Oxides - p-type transparent conducting In2O3-Ag2O thin films prepared by reactive electron beam evaporation techniqueAsbalter, J. et al. | 2000
- 1672
-
p-type transparent conducting thin films prepared by reactive electron beam evaporation techniqueAsbalter, J. / Subrahmanyam, A. et al. | 2000
- 1677
-
PART II - Thin Films - Transparent Conductive Oxides - Mott-Schottky analysis of thin ZnO filmsWindisch Jr, Charles F. et al. | 2000
- 1677
-
Mott–Schottky analysis of thin ZnO filmsWindisch, Charles F. / Exarhos, Gregory J. et al. | 2000
- 1681
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Thin Films - Ex-Situ Characterization| 2000
- 1681
-
PART II - Thin Films - Ex-Situ Characterization - Structural determination of wear debris generated from sliding wear tests on ceramic coatings using Raman microscopyConstable, C.P. et al. | 2000
- 1681
-
Structural determination of wear debris generated from sliding wear tests on ceramic coatings using Raman microscopyConstable, C. P. / Yarwood, J. / Hovsepian, P. / Donohue, L. A. / Lewis, D. B. / Münz, W.-D. et al. | 2000
- 1690
-
PART II - Thin Films - Ex-Situ Characterization - Effect of rapid thermal annealing temperature on the formation of CoSi studied by x-ray photoelectron spectroscopy and micro-Raman spectroscopyZhao, Jin et al. | 2000
- 1690
-
Effect of rapid thermal annealing temperature on the formation of CoSi studied by x-ray photoelectron spectroscopy and micro-Raman spectroscopyZhao, Jin / Ballast, Lynette K. / Hossain, Tim Z. / Trostel, Rebecca E. / Bridgman, William C. et al. | 2000
- 1694
-
PART II - Thin Films - Ex-Situ Characterization - Temperature dependence of structure and electrical properties of germanium-antimony-tellurium thin filmGonzález-Hernández, J. et al. | 2000
- 1694
-
Temperature dependence of structure and electrical properties of germanium–antimony–tellurium thin filmGonzález-Hernández, J. / Prokhorov, E. / Vorobiev, Yu. et al. | 2000
- 1701
-
In-situ characterization of thin films by the focused ion beamChoi, S. H. / Li, R. / Pak, M. / Wang, K. L. / Leung, M. S. / Stupian, G. W. / Presser, N. et al. | 2000
- 1701
-
PART II - Thin Films - In-Situ Characterization and Material Process Imaging - In-situ characterization of thin films by the focused ion beamChoi, S.H. et al. | 2000
- 1701
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Thin Films - In-Situ Characterization and Material Process Imaging| 2000
- 1704
-
PART II - Thin Films - In-Situ Characterization and Material Process Imaging - Integrated measurement of Ti and TiN thickness and optical constants using reflectance data through a vacuum chamber windowTabet, Milad F. et al. | 2000
- 1704
-
Integrated measurement of Ti and TiN thickness and optical constants using reflectance data through a vacuum chamber windowTabet, Milad F. / Kelkar, Umesh / McGahan, William A. et al. | 2000
- 1709
-
PART II - Thin Films - In-Situ Characterization and Material Process Imaging - Stabilization of high-deposition-rate reactive magnetron sputtering of oxides by in situ spectroscopic ellipsometry and plasma diagnosticsVergöhl, M. et al. | 2000
- 1709
-
Stabilization of high-deposition-rate reactive magnetron sputtering of oxides by in situ spectroscopic ellipsometry and plasma diagnosticsVergöhl, M. / Hunsche, B. / Malkomes, N. / Matthée, T. / Szyszka, B. et al. | 2000
- 1713
-
PART II - Vacuum Metallurgy - Vacuum Metallurgy Poster Session - Growth of SiC thin films on graphite for oxidation-protective coatingBoo, J.-H. et al. | 2000
- 1713
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Vacuum Metallurgy - Vacuum Metallurgy Poster Session| 2000
- 1713
-
Growth of SiC thin films on graphite for oxidation-protective coatingBoo, J.-H. / Kim, M. C. / Lee, S.-B. / Park, S.-J. / Han, J.-G. et al. | 2000
- 1718
-
PART II - Vacuum Metallurgy - Advanced Surface Treatments and Coatings - Enhanced adhesion through local epitaxy of transition-metal nitride coatings on ferritic steel promoted by metal ion etching in a combined cathodic arc-unbalanced magnetron deposition systemSchönjahn, C. et al. | 2000
- 1718
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Vacuum Metallurgy - Advanced Surface Treatments and Coatings| 2000
- 1718
-
Enhanced adhesion through local epitaxy of transition-metal nitride coatings on ferritic steel promoted by metal ion etching in a combined cathodic arc/unbalanced magnetron deposition systemSchönjahn, C. / Donohue, L. A. / Lewis, D. B. / Münz, W.-D. / Twesten, R. D. / Petrov, I. et al. | 2000
- 1724
-
PART II - Vacuum Technology - Total and Partial Pressure Gauging - Compact wide-range cold-cathode gaugesKendall, B.R.F. et al. | 2000
- 1724
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Vacuum Technology - Total and Partial Pressure Gauging| 2000
- 1724
-
Compact wide-range cold-cathode gaugesKendall, B. R. F. / Drubetsky, E. et al. | 2000
- 1730
-
PART II - Vacuum Technology - Total and Partial Pressure Gauging - New enhanced performance low-pressure capacitance manometerGrudzien, C.P. et al. | 2000
- 1730
-
New enhanced performance low-pressure capacitance manometerGrudzien, C. P. / Lischer, D. J. et al. | 2000
- 1736
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Vacuum Technology - Vacuum Contributions to the Semiconductor Industry (1950-1975)| 2000
- 1736
-
Evolution of integrated-circuit vacuum processes: 1959–1975Waits, Robert K. et al. | 2000
- 1736
-
PART II - Vacuum Technology - Vacuum Contributions to the Semiconductor Industry (1950-1975) - Evolution of integrated-circuit vacuum processes: 1959-1975Waits, Robert K. et al. | 2000
- 1746
-
PART II - Vacuum Technology - Vacuum Contributions to the Semiconductor Industry (1950-1975) - History of industrial and commercial ion implantation 1906-1978Yarling, C.B. et al. | 2000
- 1746
-
History of industrial and commercial ion implantation 1906–1978Yarling, C. B. et al. | 2000
- 1751
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Vacuum Technology - Vacuum Technology Poster Session| 2000
- 1751
-
Application of porcelain enamel as an ultra-high-vacuum-compatible electrical insulatorBiscardi, C. / Hseuh, H. / Mapes, M. et al. | 2000
- 1751
-
PART II - Vacuum Technology - Vacuum Technology Poster Session - Application of porcelain enamel as an ultra-high-vacuum-compatible electrical insulatorBiscardi, C. et al. | 2000
- 1755
-
Fundamental functions of a new type of leak detector using oxygen-ion conductorTatenuma, K. / Noguchi, T. / Uchida, K. / Saeki, H. / Ando, A. / Momose, T. et al. | 2000
- 1755
-
PART II - Vacuum Technology - Vacuum Technology Poster Session - Fundamental functions of a new type of leak detector using oxygen-ion conductorTatenuma, K. et al. | 2000
- 1758
-
PART II - Vacuum Technology - Vacuum Pumping Systems - Review of pumping by thermal molecular pressureHobson, J.P. et al. | 2000
- 1758
-
Review of pumping by thermal molecular pressureHobson, J. P. / Salzman, D. B. et al. | 2000
- 1758
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Vacuum Technology - Vacuum Pumping Systems| 2000
- 1766
-
PART II - Vacuum Technology - Vacuum Pumping Systems - Inner pressure measurement of turbo molecular pumpCheng, H.-P. et al. | 2000
- 1766
-
Inner pressure measurement of turbo molecular pumpCheng, H.-P. / Jou, R.-Y. / Lin, J.-C. / Chen, C.-J. / Huang, W.-H. et al. | 2000
- 1772
-
Measurement of axial pressure distribution on a rotor of a helical grooved molecular drag pumpSawada, T. / Sugiyama, W. / Takano, K. et al. | 2000
- 1772
-
PART II - Vacuum Technology - Vacuum Pumping Systems - Measurement of axial pressure distribution on a rotor of a helical grooved molecular drag pumpSawada, T. et al. | 2000
- 1777
-
PART II - Vacuum Technology - Vacuum Pumping Systems - Dry vacuum pumps for semiconductor processes: Guidelines for primary pump selectionLessard, Philip A. et al. | 2000
- 1777
-
Dry vacuum pumps for semiconductor processes: Guidelines for primary pump selectionLessard, Philip A. et al. | 2000
- 1782
-
PART II - Vacuum Technology - Dry Pumping Systems - Dry vacuum pumps: A method for the evaluation of the degree of dryDavis, R.P. et al. | 2000
- 1782
-
Dry vacuum pumps: A method for the evaluation of the degree of dryDavis, R. P. / Abreu, R. A. / Chew, A. D. et al. | 2000
- 1782
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Vacuum Technology - Dry Pumping Systems| 2000
- 1789
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Vacuum Technology - Outgassing, Leaks, and Mass Flow Controllers| 2000
- 1789
-
PART II - Vacuum Technology - Outgassing, Leaks, and Mass Flow Controllers - Experiments with a thin-walled stainless-steel vacuum chamberNemanic, Vincenc et al. | 2000
- 1789
-
Experiments with a thin-walled stainless-steel vacuum chamberNemanič, Vincenc / Šetina, Janez et al. | 2000
- 1794
-
PART II - Vacuum Technology - Outgassing, Leaks, and Mass Flow Controllers - Laser Interferometer Gravitational-Wave Observatory beam tube component and module leak testingCarpenter, W.A. et al. | 2000
- 1794
-
Laser Interferometer Gravitational-Wave Observatory beam tube component and module leak testingCarpenter, W. A. / Shaw, P. B. / Jones, L. / Weiss, R. et al. | 2000
- 1800
-
Decay rate of photoresist outgassing from ion implantationPerel, A. S. / Horsky, T. N. et al. | 2000
- 1800
-
PART II - Vacuum Technology - Outgassing, Leaks, and Mass Flow Controllers - Decay rate of photoresist outgassing from ion implantationPerel, A.S. et al. | 2000
- 1804
-
PART II - Applied Surface Science-Magnetic Interfaces and Nanostructures-Vacuum Metallurgy - Magnetic Recording: Chemical Integration and Tribology - Evolution of the corrosion process on thin-film mediaYing, JiFeng et al. | 2000
- 1804
-
Evolution of the corrosion process on thin-film mediaYing, JiFeng / Anoikin, Tatiana / Martner, Cecilia et al. | 2000
- 1804
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Applied Surface Science-Magnetic Interfaces and Nanostructures-Vacuum Metallurgy - Magnetic Recording: Chemical Integration and Tribology| 2000
- 1809
-
Tribochemistry of monodispersed ZDOL with hydrogenated carbon overcoatsChen, Chao-Yuan / Bogy, David B. / Bhatia, C. Singh et al. | 2000
- 1809
-
PART II - Applied Surface Science-Magnetic Interfaces and Nanostructures-Vacuum Metallurgy - Magnetic Recording: Chemical Integration and Tribology - Tribochemistry of monodispersed ZDOL with hydrogenated carbon overcoatsChen, Chao-Yuan et al. | 2000
- 1818
-
PART II - Flat Panel Displays-Vacuum Technology - Field Emission Displays and Vacuum Packaging Issues - New field-emission device with improved vacuum featuresMammana, V.P. et al. | 2000
- 1818
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Flat Panel Displays-Vacuum Technology - Field Emission Displays and Vacuum Packaging Issues| 2000
- 1818
-
New field-emission device with improved vacuum featuresMammana, V. P. / Degasperi, F. T. / Monteiro, O. R. / Vuolo, J. H. / Salvadori, M. C. / Brown, I. G. et al. | 2000
- 1823
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Flat Panel Displays-Organic Electronic Materials-Electronic Materials and Processing - Thin Film Transistor Materials and Devices| 2000
- 1823
-
Excimer laser processing for a-Si and poly-Si thin film transistors for imager applicationsLu, J. P. / Mei, P. / Fulks, R. T. / Rahn, J. / Ho, J. / Wang, Y. / Boyce, J. B. / Street, R. A. et al. | 2000
- 1823
-
PART II - Flat Panel Display-Organic Electronic Materials-Electronic Materials and Processing - Thin Film Transistor Materials and Devices - Excimer laser processing for a-Si and poly-Si thin film transistors for imager applicationsLu, J.P. et al. | 2000
- 1830
-
PART II - Magnetic Interfaces and Nanostructures-Electronic Materials and Processing - Spin-Dependent Tunneling and Transport - Pinhole decoration in magnetic tunnel junctionsAllen, D. et al. | 2000
- 1830
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Magnetic Interfaces and Nanostructures-Electronic Materials and Processing - Spin-Dependent Tunneling and Transport| 2000
- 1830
-
Pinhole decoration in magnetic tunnel junctionsAllen, D. / Schad, R. / Zangari, G. / Zana, I. / Yang, D. / Tondra, M. C. / Wang, D. et al. | 2000
- 1834
-
PART II - Magnetic Interfaces and Nanostructures-Electronic Materials and Processing - Spin-Dependent Tunneling and Transport - Characterization and analysis of a novel hybrid magnetoelectronic device for magnetic field sensingSchaadt, D.M. et al. | 2000
- 1834
-
Characterization and analysis of a novel hybrid magnetoelectronic device for magnetic field sensingSchaadt, D. M. / Yu, E. T. / Sankar, S. / Berkowitz, A. E. et al. | 2000
- 1838
-
PART II - Magnetic Interfaces and Nanostructures-Nanometer-Scale Science and Technology - Patterned or Self-Assembled Magnetic Nanostructures - Periodic magnetic microstructures by glancing angle depositionDick, B. et al. | 2000
- 1838
-
Periodic magnetic microstructures by glancing angle depositionDick, B. / Brett, M. J. / Smy, T. J. / Freeman, M. R. / Malac, M. / Egerton, R. F. et al. | 2000
- 1838
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Magnetic Interfaces and Nanostructures-Nanometer-Scale Science and Technology - Patterned or Self-Assembled Magnetic Nanostructures| 2000
- 1845
-
PART II - Magnetic Interfaces and Nanostructures-Nanometer-Scale Science and Technology - Patterned or Self-Assembled Magnetic Nanostructures - Variable temperature and ex situ spin-polarized low-energy electron microscopeTober, E.D. et al. | 2000
- 1845
-
Variable temperature and ex situ spin-polarized low-energy electron microscopeTober, E. D. / Witte, G. / Poppa, H. et al. | 2000
- 1848
-
Cryogenic etching of deep narrow trenches in siliconAachboun, S. / Ranson, P. / Hilbert, C. / Boufnichel, M. et al. | 2000
- 1848
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Micro-Electro-Mechanical Systems-Magnetic Interfaces and Nanostructures - Processing and Integration Technology| 2000
- 1848
-
PART II - Micro-Electro-Mechanical Systems-Magnetic Interfaces and Nanostructures - Processing and Integration Technology - Cryogenic etching of deep narrow trenches in siliconAachboun, S. et al. | 2000
- 1853
-
PART II - Micro-Electro-Mechanical Systems-Magnetic Interfaces and Nanostructures - Processing and Integration Technology - Polycrystalline silicon thin films with hydrofluoric acid permeability for underlying oxide etching and vacuum encapsulationKageyama, Y. et al. | 2000
- 1853
-
Polycrystalline silicon thin films with hydrofluoric acid permeability for underlying oxide etching and vacuum encapsulationKageyama, Y. / Tsuchiya, T. / Funabashi, H. / Sakata, J. et al. | 2000
- 1859
-
PART II - Manufacturing Science and Technology-Plasma Science and Technology - Diagnostics and Processes in Etching - Etching of organic low dielectric constant material SiLKTM on the Lam Research Corporation 4520XLETMJanowiak, C. et al. | 2000
- 1859
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Manufacturing Science and Technology-Plasma Science and Technology - Diagnostics and Processes in Etching| 2000
- 1859
-
Etching of organic low dielectric constant material SiLK™ on the Lam Research Corporation 4520XLE™Janowiak, C. / Ellingboe, S. / Morey, I. et al. | 2000
- 1864
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Emerging Opportunities and Issues in Nanotubes and Nanoelectrics-Nanometer-Scale Science and Technology-Electronic Materials and Processing-Manufacturing Science and Technology - Emerging Opportunities and Issues in Nanotubes and Nanoelectrics-Nanometer-Scale Science and Technology-Electronic Materials and Processing-Manufacturing Science and Technology Poster Session| 2000
- 1864
-
PART II - Emerging Opportunities and Issues in Nanotubes and Nanoelectrics-Nanometer-Scale Science and Technology-Electronic Materials and Processing-Manufacturing Science and Technology - Emerging Opportunities and Issues in Nanotubes and Nanoelectrics-Nanometer-Scale Science and Technology-Electronic Materials and Processing-Manufacturing Science and Technology Poster Session - Growth of carbon nanotubes by microwave plasma-enhanced chemical vapor deposition at low temperatureChoi, Young Chul et al. | 2000
- 1864
-
Growth of carbon nanotubes by microwave plasma-enhanced chemical vapor deposition at low temperatureChoi, Young Chul / Bae, Dong Jae / Lee, Young Hee / Lee, Byung Soo / Park, Gyeong-Su / Choi, Won Bong / Lee, Nae Sung / Kim, Jong Min et al. | 2000
- 1869
-
PART II - Organic Electronic Materials-Electronic Materials and Processing-Applied Surface Science - Organic Thin Film Growth - Influence of copper phthalocynanine on the charge injection and growth modes for organic light emitting diodesForsythe, E.W. et al. | 2000
- 1869
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Organic Electronic Materials-Electronic Materials and Processing-Applied Surface Science - Organic Thin Film Growth| 2000
- 1869
-
Influence of copper phthalocynanine on the charge injection and growth modes for organic light emitting diodesForsythe, E. W. / Abkowitz, M. A. / Gao, Yongli / Tang, C. W. et al. | 2000
- 1875
-
PART II - Organic Electronic Materials-Electronic Materials and Processing-Applied Surface Science - Organic Thin Film Growth - Growth and characterization of poly(arylamine) thin films prepared by vapor depositionSzulczewski, G.J. et al. | 2000
- 1875
-
Growth and characterization of poly(arylamine) thin films prepared by vapor depositionSzulczewski, G. J. / Selby, T. D. / Kim, K.-Y. / Hassenzahl, J. D. / Blackstock, S. C. et al. | 2000
- 1881
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PART II - Plasma Science and Technology-Surface Science - Ion-Surface Interactions II - Desorption species from fluorocarbon film by Ar+ ion beam bombardmentHayashi, M. et al. | 2000
- 1881
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Desorption species from fluorocarbon film by ion beam bombardmentHayashi, M. / Karahashi, K. et al. | 2000
- 1881
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PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Plasma Science and Technology-Surface Science - Ion-Surface Interactions II| 2000
- 1887
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Reactions of maleic anhydride over (001) single crystal surfacesWilson, J. N. / Titheridge, D. J. / Kieu, L. / Idriss, H. et al. | 2000
- 1887
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PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Surface Science I-Electronic Materials and Processing - Chemistry on Oxides| 2000
- 1887
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PART II - Surface Science I-Electronic Materials and Processing - Chemistry on Oxides - Reactions of maleic anhydride over TiO2 (001) single crystal surfacesWilson, J.N. et al. | 2000
- 1893
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PART II - Surface Science I-Electronic Materials and Processing - Chemistry on Oxides - Interaction of HCOOH with stoichiometric and reduced SrTiO 3)(100) surfacesWang, Li-Qiong et al. | 2000
- 1893
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Interaction of HCOOH with stoichiometric and reduced surfacesWang, Li-Qiong / Ferris, K. F. / Herman, G. S. / Engelhard, M. H. et al. | 2000
- 1900
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PART II - Surface Science I-Electronic Materials and Processing - Chemistry on Oxides - Reactions of acetic acid on UO2(111) single crystal surfacesChong, S.V. et al. | 2000
- 1900
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Reactions of acetic acid on single crystal surfacesChong, S. V. / Idriss, H. et al. | 2000
- 1906
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PART II - Surface Science I-Electronic Materials and Processing - Chemistry on Oxides - Surface reduction of Cr-V2O3 by COToledano, David S. et al. | 2000
- 1906
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Surface reduction of by COToledano, David S. / Henrich, Victor E. / Metcalf, Patricia et al. | 2000
- 1915
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Optimized structural properties of wurtzite GaN on SiC(0001) grown by molecular beam epitaxyRamachandran, V. / Feenstra, R. M. / Sarney, W. L. / Salamanca-Riba, L. / Greve, D. W. et al. | 2000
- 1915
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PART II - Surface Science I-Electronic Materials and Processing - Nitrides and Compound Semiconductors - Optimized structural properties of wurtzite GaN on SiC(0001) grown by molecular beam epitaxyRamachandran, V. et al. | 2000