(1̄1̄1̄) CdTe surface structure: A study by reflection high energy electron diffraction, x‐ray photoelectron spectroscopy, and x‐ray photoelectron diffraction (Englisch)
- Neue Suche nach: Duszak, R.
- Neue Suche nach: Tatarenko, S.
- Neue Suche nach: Cibert, J.
- Neue Suche nach: Saminadayar, K.
- Neue Suche nach: Deshayes, C.
- Neue Suche nach: Duszak, R.
- Neue Suche nach: Tatarenko, S.
- Neue Suche nach: Cibert, J.
- Neue Suche nach: Saminadayar, K.
- Neue Suche nach: Deshayes, C.
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
;
9
, 6
;
3025-3030
;
1991
- Aufsatz (Zeitschrift) / Elektronische Ressource
-
Titel:(1̄1̄1̄) CdTe surface structure: A study by reflection high energy electron diffraction, x‐ray photoelectron spectroscopy, and x‐ray photoelectron diffraction
-
Weitere Titelangaben:(1̄1̄1̄) CdTe surface structure
-
Beteiligte:Duszak, R. ( Autor:in ) / Tatarenko, S. ( Autor:in ) / Cibert, J. ( Autor:in ) / Saminadayar, K. ( Autor:in ) / Deshayes, C. ( Autor:in )
-
Erschienen in:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films ; 9, 6 ; 3025-3030
-
Verlag:
- Neue Suche nach: American Vacuum Society
-
Erscheinungsdatum:01.11.1991
-
Format / Umfang:6 pages
-
ISSN:
-
DOI:
-
Medientyp:Aufsatz (Zeitschrift)
-
Format:Elektronische Ressource
-
Sprache:Englisch
-
Schlagwörter:
-
Datenquelle:
Inhaltsverzeichnis – Band 9, Ausgabe 6
Zeige alle Jahrgänge und Ausgaben
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 2843
-
Recommended practices for the calibration and use of capacitance diaphragm gages as transfer standardsHyland, Richard W. / Shaffer, Richard L. et al. | 1991
- 2864
-
High mass resolution surface imaging with a time‐of‐flight secondary ion mass spectroscopy scanning microprobeSchwieters, J. / Cramer, H.‐G. / Heller, T. / Jürgens, U. / Niehuis, E. / Zehnpfenning, J. / Benninghoven, A. et al. | 1991
- 2872
-
Kinetics of thermal decomposition of triethylgallium, trimethylgallium, and trimethylindium adsorbed on GaAs(100)McCaulley, J. A. / Shul, R. J. / Donnelly, V. M. et al. | 1991
- 2887
-
Products of pulsed laser induced thermal decomposition of triethylgallium and trimethylgallium adsorbed on GaAs(100)Donnelly, V. M. et al. | 1991
- 2887
-
Products of pulsed laser induced thermal decomposition of triethylgallium and triethylgallium adsorbed on GaAs(100)Donnelly, V.M. et al. | 1991
- 2895
-
Trimethylgallium dissociative chemisorption on gallium‐rich GaAs(100) surfacesCreighton, J. Randall et al. | 1991
- 2900
-
X‐ray photoelectron spectroscopy studies of contamination and cleaning of surfaces exposed to a fluorocarbon plasmaErmolieff, A. / Marthon, S. / Bertin, F. / Pierre, F. / Daviet, J. F. / Peccoud, L. et al. | 1991
- 2907
-
Ni/quartz adhesion enhancement: Comparison of Ar+ and Si+ ion mixingGaluska, A. A. et al. | 1991
- 2916
-
Surface reactions in the decomposition of dimethylzinc on Si(100)‐2×1Rueter, M. A. / Vohs, J. M. et al. | 1991
- 2923
-
Laser induced photodesorption of SiCl from Si(100) monitored by time of flight and time resolved reflectivityBoulmer, J. / Bourguignon, B. / Budin, J.‐P. / Débarre, D. / Desmur, A. et al. | 1991
- 2928
-
Structural and chemical effects of low energy ion bombardment of PMDA‐ODA surfacesSengupta, Kabul S. / Birnbaum, Howard K. et al. | 1991
- 2936
-
Surface chemistry and thickness‐dependent optical properties of films of oxidized Ni/Cr on polyimideDraeger, Norman A. et al. | 1991
- 2941
-
X‐ray photoelectron spectroscopy study of the formation of the merocyanine/aluminum interfaceZhang, Yadi / Huang, Songyu et al. | 1991
- 2948
-
Fourier transform infrared studies of polyimide and poly(methyl‐methacrylate) surfaces during downstream microwave plasma etchingLeu, Jihperng / Jensen, Klavs F. et al. | 1991
- 2963
-
Oxygen induced adhesion degradation at metal/polyimide interfaceShih, Da‐Yuan / Klymko, Nancy / Flitsch, Richard / Paraszczak, Jurij / Nunes, Sharon et al. | 1991
- 2975
-
Dual‐frequency N2 and NH3 plasma modification of polyethylene and polyimideKlemberg‐Sapieha, J. E. / Küttel, O. M. / Martinu, L. / Wertheimer, M. R. et al. | 1991
- 2982
-
Application of factor analysis to Auger crater‐edge profilingGatts, C. / Losch, W. et al. | 1991
- 2986
-
X‐ray photoelectron spectroscopy study of the atomic structure change of amorphous carbon films annealed in vacuumWu, X. M. / Fang, C. S. Ares / Yang, G. R. / Hill, I. / Lu, T.‐M. et al. | 1991
- 2991
-
Comparative study of the preparation of negative electron affinity GaAs photocathodes with O2 and with NF3Ciccacci, Franco / Chiaia, Gualtiero et al. | 1991
- 2996
-
Thermal desorption of InSb surface oxidesKlem, J. F. / Tsao, J. Y. / Reno, J. L. / Datye, A. / Chadda, S. et al. | 1991
- 2999
-
Measurements of catalytic efficiency of surfaces for the removal of atomic oxygen using NO*2 continuumWickramanayaka, Sunil / Meikle, S. / Kobayashi, T. / Hosokawa, N. / Hatanaka, Y. et al. | 1991
- 3003
-
Mechanisms and kinetics of Si atomic‐layer epitaxy on Si(001)2×1 from Si2H6Lubben, D. / Tsu, R. / Bramblett, T. R. / Greene, J. E. et al. | 1991
- 3012
-
Nucleation of diamond on silicon, SiAlON, and graphite substrates coated with an a‐C:H layerDubray, J. J. / Pantano, C. G. / Meloncelli, M. / Bertran, E. et al. | 1991
- 3019
-
Synthesis of Pd–Te intermetallic compound films on 2H–MoS2(0001) by molecular beam epitaxyYata, Masanori / Nakamura, Keikichi / Ogawa, Keiichi et al. | 1991
- 3025
-
(1̄1̄1̄) CdTe surface structure: A study by reflection high energy electron diffraction, x‐ray photoelectron spectroscopy, and x‐ray photoelectron diffractionDuszak, R. / Tatarenko, S. / Cibert, J. / Saminadayar, K. / Deshayes, C. et al. | 1991
- 3031
-
ZnSexTe1−x films grown by pulsed laser depositionAydinli, A. / Puente, G. Contreras / Bhat, A. / Compaan, A. / Chan, Alan et al. | 1991
- 3036
-
Titanium oxide formation by dynamic ion beam mixingMiyake, S. / Kobayashi, T. / Satou, M. / Fujimoto, F. et al. | 1991
- 3041
-
Organometallic chemical vapor deposition of SnO2 single crystal and polycrystalline filmsVetrone, Jim / Chung, Yip‐Wah et al. | 1991
- 3048
-
Optical properties of ion assisted deposited CeO2 filmsAl‐Robaee, Mansour S. / Krishna, M. Ghanashyam / Rao, K. Narasimha / Mohan, S. et al. | 1991
- 3054
-
Deposition and properties of yttria‐stabilized zirconia thin films using reactive direct current magnetron sputteringThiele, E. S. / Wang, L. S. / Mason, T. O. / Barnett, S. A. et al. | 1991
- 3061
-
A new electron beam evaporation source for Si molecular beam epitaxy controlled by a quadrupole mass spectrometerPeter, G. / Koller, A. / Vazquez, S. et al. | 1991
- 3064
-
Relative sensitivity factors for positive atomic and molecular ions sputtered from Si and GaAsStevie, F. A. / Wilson, R. G. et al. | 1991
- 3071
-
Electron cyclotron resonance plasma chemical vapor deposition of large area uniform silicon nitride filmsShapoval, S. Y. / Petrashov, V. T. / Popov, O. A. / Yoder, M. D. / Maciel, P. D. / Lok, C. K. C. et al. | 1991
- 3078
-
Electron trapping and chemical composition in radio frequency glow discharge a‐SiN:HVarhue, W. J. / Manglore, R. B. / Pandelisev, K. A. / Pastel, P. W. et al. | 1991
- 3084
-
Modeling of sputtering and redeposition in focused‐ion‐beam trench millingIshitani, Tohru / Ohnishi, Tsuyoshi et al. | 1991
- 3090
-
Control of ion energy and flux in a dual radio frequency excitation magnetron sputtering dischargeLöwe, Hans‐Dirk / Goto, Haruhiro H. / Ohmi, Tadahiro et al. | 1991
- 3100
-
Optimization studies on magnetic field geometry for planar magnetron sputtering targetsRao, G. Mohan / Mohan, S. et al. | 1991
- 3105
-
An investigation of cluster formation in an ionized cluster beam deposition sourceMcEachern, R. L. / Brown, W. L. / Jarrold, M. F. / Sosnowski, M. / Takaoka, G. / Usui, H. / Yamada, I. et al. | 1991
- 3113
-
The effects of substrate bias on plasma parameters in an electron cyclotron resonance plasma reactorCaughman, John B. O. / Holber, William M. et al. | 1991
- 3119
-
On the low‐pressure mode transition in electron cyclotron heated plasmasDandl, R. A. / Guest, G. E. et al. | 1991
- 3126
-
Error reduction in monodirectional ion millingCarter, G. / Nobes, M. J. / Katardjiev, I. V. et al. | 1991
- 3134
-
Outgassing characteristics and composition analysis of aluminum alloy extrudate under electron beam irradiationKonno, Osamu / Ohi, Tsutomu et al. | 1991
- 3142
-
Characterization of the resolving power of a double multilayer monochromator in the energy range of 600–900 eVPuik, E. J. / van Dorssen, G. E. / van der Wiel, M. J. / Verhoeven, J. / van der Laan, G. / Padmore, H. A. et al. | 1991
- 3149
-
Absence of molecular deuterium dissociation during room‐temperature permeation into polystyrene inertially confined fusion target shellsHonig, A. / Alexander, N. / Fan, Q. / Gram, R. Q. / Kim, H. et al. | 1991
- 3153
-
Leak calibration by the ΔPΔV and pressure difference techniquesBasford, James A. et al. | 1991
- 3159
-
Theory of free‐molecular flow under the drag conditionsLiu, N. / Zhu, Y. / Wang, X. Z. / Pang, S. J. et al. | 1991
- 3165
-
A two‐pyrometer method of measuring substrate temperaturesInoue, M. / Ozaki, Y. / Tsuchikawa, H. et al. | 1991
- 3169
-
Growth of ultrathin Ni layers on Ni(100): Infrared spectroscopy of adsorbed carbon monoxide as a structural probeBermudez, V. M. et al. | 1991
- 3173
-
Resonance frequency of a photothermal vibration for a polyethylene thin plate in medium vacuum regionInaba, S. / Hane, K. et al. | 1991
- 3175
-
Improved thickness uniformity in molecular beam epitaxial growth of GaAs using a tilted conical insert crucibleSpringThorpe, A. J. / Majeed, A. / Miner, C. J. / Wasilewski, Z. R. / Aers, G. C. et al. | 1991
- 3178
-
Ion impact etch anisotropy downstream from diffusion plasma sourcesGoeckner, M. J. / Goree, J. / Sheridan, T. E. et al. | 1991
- 3181
-
High temperature Knudsen cell with graphite heating elementTaylor, A. P. / Yang, K. / Schowalter, L. J. et al. | 1991
- 3183
-
Erratum: Determination of electrode/substrate surface temperatures through the solid–liquid transition of metals/eutectics in capacitively coupled radio frequency‐plasma chemical vapor deposition reactors [J. Vac. Sci. Technol. A 8, 3954 (1990)]Shinohara, M. / Tashiro, H. / Saio, K. / Arai, K. / Takayama, K. et al. | 1991