Vacuum plasma spraying of tantalum and niobium (Englisch)
- Neue Suche nach: Lugscheider, E.
- Neue Suche nach: Eschnauer, H.
- Neue Suche nach: Häuser, B.
- Neue Suche nach: Jäger, D.
- Neue Suche nach: Lugscheider, E.
- Neue Suche nach: Eschnauer, H.
- Neue Suche nach: Häuser, B.
- Neue Suche nach: Jäger, D.
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
;
3
, 6
;
2469-2474
;
1985
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Vacuum plasma spraying of tantalum and niobium
-
Weitere Titelangaben:Vacuum plasma spraying
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Beteiligte:Lugscheider, E. ( Autor:in ) / Eschnauer, H. ( Autor:in ) / Häuser, B. ( Autor:in ) / Jäger, D. ( Autor:in )
-
Erschienen in:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films ; 3, 6 ; 2469-2474
-
Verlag:
- Neue Suche nach: American Vacuum Society
-
Erscheinungsdatum:01.11.1985
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Format / Umfang:6 pages
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ISSN:
-
DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 3, Ausgabe 6
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Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
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The growth of thin oxides on a‐Si and a‐Si:H in an O2 plasmaCollins, R. W. / Tuckerman, C. J. / Huang, C.‐Y. / Windischmann, H. et al. | 1985
- 2082
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On the nature of oxides on InP surfacesHollinger, G. / Bergignat, E. / Joseph, J. / Robach, Y. et al. | 1985
- 2089
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A computer model for postdeposition annealing of porous thin filmsMüller, Karl‐Heinz et al. | 1985
- 2093
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Deposition of conducting thin films of organometallic monomers by plasma polymerizationSadhir, R. K. / Saunders, H. E. et al. | 1985
- 2098
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Transition metal containing plasma polymersMorosoff, N. / Haque, R. / Clymer, S. D. / Crumbliss, A. L. et al. | 1985
- 2102
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Secondary ion mass spectrometry/digital imaging for the three‐dimensional chemical characterization of solid state devicesBryan, S. R. / Woodward, W. S. / Linton, R. W. / Griffis, D. P. et al. | 1985
- 2108
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Auger electron spectroscopy and sputter/Auger analyses of thin films of SiCxMorgen, P. / Seaward, K. L. / Barbee, T. W. et al. | 1985
- 2116
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Surface analysis of TiC coated graphite limiters exposed to JIPPT‐IIKamada, K. / Hori, Y. / Sugiyama, N. / Akaishi, K. / Noda, N. / Tanahashi, S. / Fujita, J. / Yamaguchi, S. / Fujimori, N. / Doi, A. et al. | 1985
- 2121
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Stress modification of WSi2.2 films by concurrent low energy ion bombardment during alloy evaporationYee, D. S. / Floro, J. / Mikalsen, D. J. / Cuomo, J. J. / Ahn, K. Y. / Smith, D. A. et al. | 1985
- 2129
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High rate reactive magnetron sputtered tungsten carbide filmsSrivastava, P. K. / Vankar, V. D. / Chopra, K. L. et al. | 1985
- 2135
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Magnetic field effects in the plasma‐enhanced chemical vapor deposition of boron nitrideYuzuriha, T. H. / Mlynko, W. E. / Hess, D. W. et al. | 1985
- 2141
-
Effects of charge neutralization on ion‐beam‐deposited boron nitride filmsHalverson, Ward / Quinto, Dennis T. et al. | 1985
- 2147
-
Primary Ar+ ion bombardment effect on Ni–Fe film composition formed by ion beam sputteringNagai, Yasuhiro / Nishimura, Chikara / Toshima, Tomoyuki et al. | 1985
- 2152
-
Elevated‐temperature sputtering of Ni–Au alloys: Surface and subsurface composition modifications measured by ion scattering spectroscopyLam, N. Q. / Hoff, H. A. / Régnier, P. G. et al. | 1985
- 2161
-
Effect of ion bombardment during deposition on the x‐ray microstructure of thin silver filmsHuang, T. C. / Lim, G. / Parmigiani, F. / Kay, E. et al. | 1985
- 2167
-
Planarization by radio‐frequency bias sputtering of aluminum as studied experimentally and by computer simulationBader, H. P. / Lardon, M. A. et al. | 1985
- 2172
-
Laser‐induced desorption from a temperature‐regulated substrateMercier, Jacques S. / Cool, Terrill A. et al. | 1985
- 2177
-
A differential pressure‐rise method for measuring the net outgassing rates of a solid material and for estimating its characteristic values as a gas sourceYoshimura, Nagamitsu et al. | 1985
- 2184
-
Frequency dependence of a quartz oscillator on gas pressureKokubun, K. / Hirata, M. / Ono, M. / Murakami, H. / Toda, Y. et al. | 1985
- 2188
-
Thermal outgassing from aluminum alloy vacuum chambersChen, J. R. / Narushima, K. / Ishimaru, H. et al. | 1985
- 2192
-
Ion current modulation of a residual gas analyzerWatanabe, F. / Ishimaru, H. et al. | 1985
- 2196
-
Mercury vapor streaming effect in McLeod gaugesSharma, J. K. N. / Sharma, D. R. et al. | 1985
- 2200
-
A large aluminum alloy molecular beam epitaxy chamber with an ultimate pressure of 7.5×10−12 TorrChen, J. R. / Narushima, K. / Miyamoto, M. / Ishimaru, H. et al. | 1985
- 2205
-
Absolute densities of reaction products from plasma etching of quartzvan Veldhuizen, E. M. / Bisschops, Th. / van Vliembergen, E. J. W. / van Wolput, J. H. M. C. et al. | 1985
- 2208
-
An effective background removal technique for inelastic electron tunneling spectraGajda, G. J. / Weinberg, W. H. et al. | 1985
- 2211
-
Continuous dynode electron multiplier using lead zirconate titanate ceramicDixit, A. V. / Bhoraskar, S. V. et al. | 1985
- 2212
-
A quantitative appraisal of the backstreaming of forepump oil vaporLewin, G. et al. | 1985
- 2214
-
The use of anhydrous WO3 layers to record the position of 5–15 keV H+2 beamsWalck, Scott / Buonaquisti, A. D. et al. | 1985
- 2215
-
Behavior of Ga atoms on a tungsten surfaceKim, Hyunwoo / Okuno, Kimo et al. | 1985
- 2218
-
Tent‐type bakeout ovenHess, B. V. / Felter, T. E. et al. | 1985
- 2233
-
Performance of titanium nitride diffusion barriers in aluminum–titanium metallization schemes for integrated circuitsSuni, I. / Blomberg, M. / Saarilahti, J. et al. | 1985
- 2237
-
Ion‐implanted, electron‐beam annealed TiN films as diffusion barriers for Al on Si shallow junctionsArmigliato, A. / Finetti, M. / Garrido, J. / Guerri, S. / Ostoja, P. / Scorzoni, A. et al. | 1985
- 2242
-
Diffusion of nickel through titanium nitride filmsNowak, W. B. / Keukelaar, R. / Wang, W. / Nyaiesh, A. R. et al. | 1985
- 2246
-
Sputtered W–N diffusion barriersKattelus, H. P. / Kolawa, E. / Affolter, K. / Nicolet, M‐A. et al. | 1985
- 2255
-
TiB2 and ZrB2 diffusion barriers in GaAs Ohmic contact technologyShappirio, J. / Finnegan, J. / Lux, R. / Fox, D. / Kwiatkowski, J. / Kattelus, H. P. / Nicolet, M‐A. et al. | 1985
- 2259
-
Electrical characteristics of fast radiatively processed titanium silicides thin filmsWei, C. S. / Van der Spiegel, J. / Santiago, J. et al. | 1985
- 2264
-
Formation of TiSi2 and TiN during nitrogen annealing of magnetron sputtered Ti filmsAdams, E. D. / Ahn, K. Y. / Brodsky, S. B. et al. | 1985
- 2268
-
Structure and properties of coevaporated WSix filmsAhn, K. Y. / Herd, S. R. / Baglin, J. E. E. / Han, J. U. et al. | 1985
- 2272
-
Effects of biased cosputtering on resistivity and step coverage in tungsten silicide filmsChoi, K. W. / Ahn, K. Y. et al. | 1985
- 2278
-
Laser‐induced chemical vapor deposition of titanium silicide filmsWest, G. A. / Beeson, K. W. / Gupta, A. et al. | 1985
- 2283
-
Summary Abstract: Structural and electrical characterization of reactively sputtered Pt–Si filmsBudhani, R. C. / O’Brien, B. P. / Doerr, H. J. / Deshpandey, C. V. / Bunshah, R. F. et al. | 1985
- 2284
-
Formation and electrical properties of Hf Si2 grown thermally from evaporated Hf and Si filmsSo, F. C. T. / Lien, C.‐D. / Nicolet, M‐A. et al. | 1985
- 2289
-
Characterization of electron‐beam deposited tungsten films on sapphire and siliconSouk, J. H. / O’Hanlon, J. F. / Angillelo, J. et al. | 1985
- 2293
-
The effect of substrate temperature on topography related defect formation in evaporated aluminum based thin filmsRyan, James G. / Douse, Richard / Hahn, Loren / Luciano, Michael et al. | 1985
- 2298
-
Selective deposition of tungsten—prediction of selectivityCarlsson, Jan‐Otto / Boman, Mats et al. | 1985
- 2303
-
Contact resistance behavior of titanium nitrideErnsberger, C. / Nickerson, J. / Miller, A. / Banks, D. et al. | 1985
- 2308
-
Electromigration in aluminum films prepared with a high rate magnetron sputtering cathodePark, Y. H. / Roessle, P. / Majewski, E. / Smith, J. F. et al. | 1985
- 2312
-
Laser‐induced gold deposition on a silicon substrateTamir, S. / Zahavi, J. et al. | 1985
- 2316
-
Ion beam mixing of Au–Ge and Au–Ge–Ni deposited on GaAsBhattacharya, R. S. / Rai, A. K. / Ezis, A. / Rashid, M. H. / Pronko, P. P. et al. | 1985
- 2320
-
Structural and electrical characteristics of vacuum‐evaporated erbium fluoride thin filmsRamanujam, R. / Radhakrishnan, M. / Balasubramanian, C. et al. | 1985
- 2323
-
Epitaxial growth of CeF3 and NdF3 on Si(111)Sinharoy, S. / Hoffman, R. A. / Farrow, R. F. C. / Rieger, J. H. et al. | 1985
- 2327
-
Summary Abstract: Characterization of ion beam deposited diamondlike carbon coating on semiconductorsKoeppe, P. V. / Kapoor, V. J. / Mirtich, M. J. / Banks, B. A. / Gulino, D. A. et al. | 1985
- 2329
-
Frictional and structural characterization of ion‐nitrided low and high chromium steelsSpalvins, Talivaldis et al. | 1985
- 2334
-
The influence of process conditions on the friction and wear of electrodeposited chromium coatingsGawne, D. T. / Despres, N. J. et al. | 1985
- 2340
-
Tribological properties of boron nitride synthesized by ion beam depositionMiyoshi, Kazuhisa / Buckley, Donald H. / Spalvins, Talivaldis et al. | 1985
- 2345
-
Summary Abstract: Wear resistant carbide–boride composite coatingsHolleck, H. / Kühl, Ch. / Schulz, H. et al. | 1985
- 2348
-
Rolling contact fatigue behavior of Cu and TiN coatings on bearing steel substratesHochman, R. F. / Erdemir, A. / Dolan, F. J. / Thom, R. L. et al. | 1985
- 2354
-
Developments in ionization assisted processesMatthews, A. et al. | 1985
- 2364
-
Process control with optical emission spectroscopy in triode ion platingSalmenoja, K. / Korhonen, A. S. / Sulonen, M. S. et al. | 1985
- 2368
-
Magnetically confined sputter source with high ion fluxWindow, B. / Sharples, F. / Savvides, N. et al. | 1985
- 2373
-
Plasma spray synthesis of TiB2–Fe coatingsChampagne, B. / Dallaire, S. et al. | 1985
- 2378
-
Structures and composition before and after annealing of coatings in the Cr–C binary system produced by reactive physical depositionCholvy, G. / Derep, J. L. et al. | 1985
- 2384
-
Summary Abstract: Hard coatings of carbon, boron nitride, and composites based on these materialsWeissmantel, C. et al. | 1985
- 2386
-
Diamondlike amorphous carbon films prepared by magnetron sputtering of graphiteSavvides, N. / Window, B. et al. | 1985
- 2391
-
Micromechanical investigations of amorphous hydrogenated carbon films on siliconPethica, J. B. / Koidl, P. / Gobrecht, J. / Schüler, C. et al. | 1985
- 2394
-
Adhesion of TiC and Ti(C,N) coatings on steelSteinmann, P. A. / Hintermann, H. E. et al. | 1985
- 2401
-
Techniques for evaluating mechanical properties of hard coatingsMehrotra, P. K. / Quinto, D. T. et al. | 1985
- 2406
-
Morphology and properties of sputtered HfN layers as a function of substrate temperature and sputtering atmosphereJehn, Hermann A. / Kopacz, Uwe / Hofmann, Siegfried et al. | 1985
- 2411
-
TiN coating adhesion studies using the scratch test methodValli, J. / Mäkelä, U. / Matthews, A. / Murawa, V. et al. | 1985
- 2415
-
Angular resolved x‐ray photoelectron spectroscopy study of reactively sputtered titanium nitrideErnsberger, C. / Nickerson, J. / Miller, A. E. / Moulder, J. et al. | 1985
- 2419
-
Ti–N phases formed by reactive ion platingMolarius, J. M. / Korhonen, A. S. / Ristolainen, E. O. et al. | 1985
- 2426
-
Surface analysis of diffusion zones in multiple chemical vapor deposition coatingsMoore, R. L. / Salvati, L. / Sundberg, G. / Greenhut, V. et al. | 1985
- 2432
-
Summary Abstract: Grazing‐incidence x‐ray methods for the characterization of coatings and coating/substrate interfacesHeald, S. M. / Tranquada, J. M. / Chen, H. / Welch, D. O. et al. | 1985
- 2434
-
Friction and wear properties of TiC–Al2O3 composite and Al2O3/TiC layered coatingsMemarian, H. / Budhani, R. C. / Karim, A. A. / Doerr, H. J. / Deshpandey, C. V. / Bunshah, R. F. / Doi, A. et al. | 1985
- 2439
-
Computational design of wear coatingsKramer, Bruce M. / Judd, Patrick K. et al. | 1985
- 2445
-
Microstructural study of TiN‐coated threading tapsVuorinen, S. / Niemi, E. / Korhonen, A. S. et al. | 1985
- 2450
-
Fabrication of ceramic substrate‐reinforced and free forms by mandrel plasma spraying metal–ceramic compositesQuentmeyer, R. J. / McDonald, G. / Hendricks, R. C. et al. | 1985
- 2456
-
Film and interstitial formation of metals in plasma‐sprayed ceramicsHendricks, R. C. / McDonald, G. / Mullen, R. L. et al. | 1985
- 2459
-
A comparison of low‐pressure arc and low‐pressure plasma sprayed titanium coatingsSteffens, H.‐D. / Ertürk, E. / Busse, K.‐H. et al. | 1985
- 2464
-
Plasma spray deposition efficienciesWuest, G. / Keller, S. / Nicoll, A. R. / Donnelly, A. et al. | 1985
- 2469
-
Vacuum plasma spraying of tantalum and niobiumLugscheider, E. / Eschnauer, H. / Häuser, B. / Jäger, D. et al. | 1985
- 2475
-
Transmission electron microscopy characterization of plasma sprayed TiC coatingsFournier, D. / Saint‐Jacques, R. G. / Brunet, C. / Dallaire, S. et al. | 1985
- 2479
-
Tungsten carbide phase transformation during the plasma spray processTu, D. / Chang, S. / Chao, C. / Lin, C. et al. | 1985
- 2483
-
Plasma sprayed WC–Co coatings: Influence of spray conditions (atmospheric and low pressure plasma spraying) on the crystal structure, porosity, and hardnessVinayo, M. E. / Kassabji, F. / Guyonnet, J. / Fauchais, P. et al. | 1985
- 2490
-
On plasma sprayed WSi2 and Cr3C2–Ni coatingsKnotek, O. / Elsing, R. / Heintz, H.‐R. et al. | 1985
- 2494
-
Structure‐thermal properties—relationship in plasma sprayed zirconia coatingsPawlowski, Lech / Lombard, Didier / Fauchais, Pierre et al. | 1985
- 2501
-
Summary Abstract: Quantitative phase analysis of partially stabilized zirconia −8.5% yttria by a random fitting least chi‐squared methodSone, Ichiro / Sisson, R. D. / Biederman, R. R. et al. | 1985
- 2503
-
Behavior of plasma‐sprayed TiC coatings under electron beam thermal shocksBrunet, C. / Dallaire, S. / St‐Jacques, R. G. et al. | 1985
- 2506
-
An acceleration method for measuring the adherence of plasma‐sprayed coatings at elevated temperaturesBrown, S. D. / Ferber, M. K. et al. | 1985
- 2509
-
Coating requirements in gas turbine enginesMeetham, G. W. et al. | 1985
- 2516
-
Flame rig testing of thermal barrier coatings and correlation with engine resultsJohner, G. / Schweitzer, K. K. et al. | 1985
- 2525
-
Summary Abstract: Performance evaluation of coatings for jet engine turbine blades by servicelike testsSchweitzer, K. K. / Johner, G. et al. | 1985
- 2526
-
Experience with MCrAl and thermal barrier coatings produced via inert gas shrouded plasma depositionTaylor, T. A. / Overs, M. P. / Gill, B. J. / Tucker, R. C. et al. | 1985
- 2532
-
Performance comparison of plasma spray and physical vapor deposition BC23 coatings in the LM2500Wortman, David J. et al. | 1985
- 2537
-
Hot corrosion behavior of low pressure plasma sprayed NiCoCrAlY+Ta coatings on nickel base superalloysFrances, M. / Steinmetz, P. / Steinmetz, J. / Duret, C. / Mevrel, R. et al. | 1985
- 2545
-
Resistance of tantalum and columbium coatings to propellant gas erosionGrabatin, H. / Schlett, V. / Stuke, H. / Weiss, H. et al. | 1985
- 2551
-
Pretreatment effects on the morphology and properties of aluminum oxide thermally grown on NiCoCrAlYPrakash, S. / Budhani, R. C. / Doerr, H. J. / Deshpandey, C. V. / Bunshah, R. F. et al. | 1985
- 2557
-
Surface morphology of platinum modified aluminide coatingsBoone, D. H. / Deb, P. / Purvis, L. I. / Rigney, D. V. et al. | 1985
- 2564
-
Scanning electron microscope analysis of the microstructure of aluminide diffusion coatings on Ni–Cr alloysdeLanerolle, Nimal / Siegle, L. L. et al. | 1985
- 2569
-
The use of ion implantation techniques to study protective oxide scale adherence effectsSmeggil, J. G. / Paradis, E. L. / Shuskus, A. J. / Bornstein, N. S. et al. | 1985
- 2574
-
Role of dispersed oxides in reducing substrate/coating interdiffusionLuthra, Krishan L. et al. | 1985
- 2578
-
Platinum aluminide coating structural effects on hot corrosion resistance at 900 °CDeb, P. / Boone, D. H. / Streiff, R. et al. | 1985
- 2582
-
Thermal and sputtered aluminum oxide coatings for high temperature electrical insulationKreider, Kenneth G. / Semancik, Stephen et al. | 1985
- 2588
-
A wavy versus straight interface in the explosive welding of aluminum to steelSzecket, A. / Inal, O. T. / Vigueras, D. J. / Rocco, J. et al. | 1985
- 2594
-
Summary Abstract: Structural analysis of ultrathin epitaxial filmsFeldman, L. C. et al. | 1985
- 2596
-
Interfacial sharpnesses and thicknesses of layers in a GaAs0.2P0.8/GaP strained‐layer superlattice measured by Auger sputter profilingChamberlain, M. B. / Wallace, W. O. et al. | 1985
- 2600
-
Determination of film stresses during sputter deposition using an in situ probeHoffman, D. W. / Kukla, C. M. et al. | 1985
- 2605
-
Explosive welding of Ti–6Al–4V to mild‐steel substratesInal, O. T. / Szecket, A. / Vigueras, D. J. / Pak, H‐r. et al. | 1985
- 2610
-
Summary Abstract: Nucleation and growth studies in polycrystalline films by ultrahigh vacuum in situ transmission electron microscopyBarna, P. B. et al. | 1985
- 2612
-
Preparation and characterization of beryllium coatingsDua, A. K. / Agarwala, R. P. / Desai, P. B. et al. | 1985
- 2618
-
Metastable solid solutions in vapor deposited Cu–Cr, Cu–Mo, and Cu–W thin filmsDirks, A. G. / van den Broek, J. J. et al. | 1985
- 2623
-
A transmission electron microscopy study of rf‐ and dc‐magnetron‐sputtered thin film chromium and chromium–platinum coatingsFishkis, M. R. / Sisson, R. D. / Biederman, R. R. et al. | 1985
- 2627
-
Summary Abstract: Mechanisms of polymerization in discharges of fluorocarbonsd’Agostino, Riccardo et al. | 1985
- 2629
-
29Si nuclear magnetic resonance study of plasma‐polymerized hexamethyldisiloxaneAssink, R. A. / Hays, A. K. / Bild, R. W. / Hawkins, B. L. et al. | 1985
- 2634
-
Synthesis and characterization of zinc thin films formed in a glow dischargeJames, W. J. / Tseng, Pei‐Li et al. | 1985
- 2639
-
Characterization of plasma deposited halocarbon polymer films containing small gold particlesMartinů, L. / Biederman, H. et al. | 1985
- 2643
-
Comparison of microwave and lower frequency plasmas for thin film deposition and etchingWertheimer, M. R. / Moisan, M. et al. | 1985
- 2650
-
Effect of an intermediate tungsten layer on thermal properties of TiC coatings ion plated onto molybdenumFukutomi, M. / Fujitsuka, M. / Shikama, T. / Okada, M. et al. | 1985
- 2655
-
Summary Abstract: Metallic and metalloceramic coating by thermal decompositionMcDonald, G. / Hendricks, R. C. et al. | 1985
- 2657
-
Diffusion chromium coating of iron magnetic circuit parts for relaysJenko, M. / Kveder, A. / Tavzes, R. / Kansky, E. et al. | 1985
- 2661
-
Fabrication of electrically conductive metal oxide coatings by reactive ion platingHock, V. F. / Stephenson, L. D. / Givens, J. H. / Rigsbee, J. M. et al. | 1985
- 2665
-
Production of large vaporized metal clusters and their applications to functional metallurgical coatingsTakaoka, Hiroshi / Yamada, Isao / Takagi, Toshinori et al. | 1985
- 2670
-
Wear improvement of surgical titanium alloys by ion implantationSioshansi, Piran / Oliver, Richard W. / Matthews, Frank D. et al. | 1985
- 2675
-
Summary Abstract: Ion beam enhancement of vapor deposited coatingsKant, R. A. / Sartwell, B. D. et al. | 1985
- 2677
-
Summary Abstract: The effect of Fe and Ce ion implantation on the high temperature deformation behavior of a 2124 aluminum alloyJata, K. V. / Hubler, G. K. et al. | 1985
- 2680
-
Corrosion behavior of amorphous Ni based alloy coatings fabricated by ion beam mixingBhattacharya, R. S. / Rai, A. K. / Raffoul, C. N. / Pronko, P. P. / Khobaib, M. et al. | 1985
- 2684
-
Ion implantation and ion assisted coating of metalsDearnaley, G. / Goode, P. D. / Minter, F. J. / Peacock, A. T. / Waddell, C. N. et al. | 1985
- 2691
-
Summary Abstract: Nitrogen ion implantation for wear applications: A reviewHirvonen, J. K. et al. | 1985
- 2693
-
Summary Abstract: Modification of metals by low energy ions during thin film depositionHarper, J. M. E. / Cuomo, J. J. et al. | 1985
- 2694
-
Modification of the grain size of sputtered copper with additions of oxygen, krypton, silver, or yttriumMoss, R. W. / Merz, M. D. et al. | 1985
- 2700
-
Summary Abstract: Properties of ion plated oxide filmsPulker, H. K. / Haag, W. / Bühler, M. / Moll, E. et al. | 1985
- 2702
-
Summary Abstract: Reactive dual ion beam sputtering of oxide filmsScaglione, S. / Emiliani, G. et al. | 1985
- 2704
-
Additive thin film technology for hybrid circuit fabricationKrokoszinski, H.‐J. / Oetzmann, H. / Gernoth, H. / Schmidt, C. et al. | 1985