Relative lability of gold-oxide thin films in contact with air, solvents, or electrolyte solutions (Englisch)
- Neue Suche nach: Cook, Kevin M.
- Neue Suche nach: Ferguson, Gregory S.
- Neue Suche nach: Cook, Kevin M.
- Neue Suche nach: Ferguson, Gregory S.
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
;
31
, 2
;
5
;
2013
- Aufsatz (Zeitschrift) / Elektronische Ressource
-
Titel:Relative lability of gold-oxide thin films in contact with air, solvents, or electrolyte solutions
-
Weitere Titelangaben:Relative lability of gold-oxide thin films
-
Beteiligte:Cook, Kevin M. ( Autor:in ) / Ferguson, Gregory S. ( Autor:in )
-
Erschienen in:
-
Verlag:
- Neue Suche nach: American Vacuum Society
-
Erscheinungsdatum:01.03.2013
-
Format / Umfang:5 pages
-
ISSN:
-
DOI:
-
Medientyp:Aufsatz (Zeitschrift)
-
Format:Elektronische Ressource
-
Sprache:Englisch
-
Schlagwörter:
-
Datenquelle:
Inhaltsverzeichnis – Band 31, Ausgabe 2
Zeige alle Jahrgänge und Ausgaben
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 010601
-
Interface layer in hafnia/Si films as a function of ALD cyclesMani-Gonzalez, P.-G. / Vazquez-Lepe, M.-O. / Espinosa-Magana, F. / Herrera-Gomez, A. et al. | 2013
- 011301
-
Modeling of inductively coupled plasma Ar/Cl~2N~2 plasma discharge: Effect of N~2 on the plasma propertiesChanson, R. / Rhallabi, A. / Fernandez, M.C. / Cardinaud, C. / Landesman, J.P. et al. | 2013
- 011302
-
Can surface cracks and unipolar arcs explain breakdown and gradient limits?Insepov, Z. / Norem, J. et al. | 2013
- 011303
-
Reorganization of graphite surfaces into carbon micro- and nanoparticles under high flux hydrogen plasma bombardmentBystrov, K. / van der Vegt, L. / De Temmerman, G. / Arnas, C. / Marot, L. et al. | 2013
- 011501
-
Low emissivity high-temperature tantalum thin film coatings for silicon devicesRinnerbauer, V. / Senkevich, J.J. / Joannopoulos, J.D. / Soljacic, M. / Celanovic, I. / Harl, R.R. / Rogers, B.R. et al. | 2013
- 011502
-
Effects of the gas ambient in thermal activation of Mg-doped p-GaN on Hall effect and photoluminescenceLu, W. / Aplin, D. / Clawson, A.R. / Yu, P.K.L. et al. | 2013
- 011503
-
Influence of inert gases on the reactive high power pulsed magnetron sputtering process of carbon-nitride thin filmsSchmidt, S. / Czigany, Z. / Greczynski, G. / Jensen, J. / Hultman, L. et al. | 2013
- 011504
-
Photoluminescence characterization of polythiophene films incorporated with highly functional molecules such as metallophthalocyanineKobe, H. / Ohnaka, K. / Kato, H. / Takemura, S. / Shimada, K. / Hiramatsu, T. / Matsui, K. et al. | 2013
- 013001
-
Direct comparison of spectroscopic data with cluster calculations of plutonium dioxide and uranium dioxideTobin, J.G. / Yu, S.-W. / Chung, B.W. / Ryzhkov, M.V. / Mirmelstein, A. et al. | 2013
- 013201
-
Magnetically coupled ultrahigh vacuum manipulator with a sample grabberKim, S.H. / de Lozanne, A. et al. | 2013
-
Structural, surface, and thermomechanical properties of intrinsic and argon implanted tetrahedral amorphous carbon 021502Motta, Edison F et al. | 2013
-
Three dimensional reciprocal space measurement by x-ray diffraction using linear and area detectors: Applications to texture and defects determination in oriented thin films and nanoprecipitates 021505Gaudet, Simon et al. | 2013
-
Photovoltaics and Energy - Effects of rapid thermal annealing on electrical, optical, and structural properties of Ni-doped In203 anodes for bulk heterojunction organic solar cells 021201Kim, Jun Ho et al. | 2013
-
Sample-morphology effects on x-ray photoelectron peak intensities 021402Powell, Cedric J et al. | 2013
-
Surface reconstruction at the initial Ge adsorption stage on Si(114)-2 × 1Duvjir, Ganbat / Kim, Hidong / Dugerjav, Otgonbayar / Li, Huiting / Motlak, Moaaed / Arvisbaatar, Amarmunkh / Seo, Jae M. et al. | 2013
-
Height distribution of atomic force microscopy images as a tool for atomic layer deposition characterizationKolanek, K. / Tallarida, M. / Schmeisser, D. et al. | 2013
-
Low temperature deposition of Ga~2O~3 thin films using trimethylgallium and oxygen plasmaDonmez, I. / Ozgit-Akgun, C. / Biyikli, N. et al. | 2013
-
Atomic layer deposition of anatase TiO~2 on porous electrodes for dye-sensitized solar cellsDirnstorfer, I. / Mahne, H. / Mikolajick, T. / Knaut, M. / Albert, M. / Dubnack, K. et al. | 2013
-
Aluminum-doped zinc oxide formed by atomic layer deposition for use as anodes in organic light emitting diodesGong, S.C. / Choi, Y.-J. / Kim, H. / Park, C.-S. / Park, H.-H. / Jang, J.G. / Chang, H.J. / Yeom, G.Y. et al. | 2013
-
Excitation of radiative polaritons by polarized broadband infrared radiation in thin oxide films deposited by atomic layer depositionVincent-Johnson, A.J. / Masters, A.E. / Hu, X. / Scarel, G. et al. | 2013
-
Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer depositionJung, T.-H. / Park, J.-S. / Kim, D.-H. / Jeong, Y. / Park, S.-G. / Kwon, J.-D. et al. | 2013
-
Blistering of atomic layer deposition Al~2O~3 layers grown on silicon and its effect on metal-insulator-semiconductor structuresBeldarrain, O. / Duch, M. / Zabala, M. / Rafi, J.M. / Gonzalez, M.B. / Campabadal, F. et al. | 2013
-
Characterization of low temperature deposited atomic layer deposition TiO~2 for MEMS applicationsHuang, Y. / Pandraud, G. / Sarro, P.M. et al. | 2013
-
Stability and annealing of alucones and alucone alloysGhazaryan, L. / Kley, E.-B. / Tunnermann, A. / Szeghalmi, A.V. et al. | 2013
-
Characterization of metal oxide layers grown on CVD graphene 021506Matsubayashi, Akitomo et al. | 2013
-
Effects of substrate doping on Gd2O3(100)/Si(100) heterostructure 021509Sitaputra, Wattaka et al. | 2013
-
Separation of hot electron current component induced by hydrogen oxidation on resistively heated Pt/n-GaP Schottky nanostructuresHashemian, Mohammad A. / Dasari, Suhas K. / Karpov, Eduard G. et al. | 2013
-
Noninvasive, real-time measurements of plasma parameters via optical emission spectroscopyWang, Shicong / Wendt, Amy E. / Boffard, John B. / Lin, Chun C. / Radovanov, Svetlana / Persing, Harold et al. | 2013
-
Interfaces - On the significance of thermoelectric and thermionic emission currents induced by chemical reactions catalyzed on nanofilm metal-semiconductor heterostructures 021101Nedrygailov, Ievgen I et al. | 2013
-
Electrical characterization of atomic-layer-deposited hafnium oxide films from hafnium tetrakis(dimethylamide) and water/ozone: Effects of growth temperature, oxygen source, and postdeposition annealingGarcia, H. / Castan, H. / Duenas, S. / Bailon, L. / Campabadal, F. / Beldarrain, O. / Zabala, M. / Gonzalez, M.B. / Rafi, J.M. et al. | 2013
-
Atomic layer deposition of zinc sulfide with Zn(TMHD)~2Short, A. / Jewell, L. / Doshay, S. / Church, C. / Keiber, T. / Bridges, F. / Carter, S. / Alers, G. et al. | 2013
-
Interfacial chemistry of hydrofluoric acid-treated In~0~.~5~3Ga~0~.~4~7As(100) during atomic layer deposition of aluminum oxideGranados-Alpizar, B. / Li Lie, F. / Muscat, A.J. et al. | 2013
-
Study on the etching characteristics of amorphous carbon layer in oxygen plasma with carbonyl sulfideKim, Jong Kyu / Cho, Sung Il / Kim, Nam Gun / Jhon, Myung S. / Min, Kyung Suk / Kim, Chan Kyu / Yeom, Geun Young et al. | 2013
-
Three dimensional reciprocal space measurement by x-ray diffraction using linear and area detectors: Applications to texture and defects determination in oriented thin films and nanoprecipitatesGaudet, Simon / De Keyser, Koen / Lambert-Milot, Samuel / Jordan-Sweet, Jean / Detavernier, Christophe / Lavoie, Christian / Desjardins, Patrick et al. | 2013
-
Material dependence of argon cluster ion sputter yield in polymers: Method and measurements of relative sputter yields for 19 polymers 020605Cumpson, Peter J et al. | 2013
-
Surfaces - Competing reactions during metalorganic deposition: Ligand-exchange versus direct reaction with the substrate surface 021401Lin, Jia-Ming et al. | 2013
-
Structural, surface, and thermomechanical properties of intrinsic and argon implanted tetrahedral amorphous carbonMotta, Edison F. / Viana, Gustavo A. / Silva, Douglas S. / Côrtes, Andresa D. S. / Freire, Fernando L. / Marques, Francisco C. et al. | 2013
-
On the change of preferential growth orientation in chemical vapor deposition of titanium carbide by aromatic hydrocarbon precursorsPedersen, Henrik / Lin, Ching-Chi / Ojamäe, Lars et al. | 2013
-
Electrical conductivity and photoresistance of atomic layer deposited Al-doped ZnO filmsMundle, R.M. / Terry, H.S. / Santiago, K. / Shaw, D. / Bahoura, M. / Pradhan, A.K. / Dasari, K. / Palai, R. et al. | 2013
-
Ytterbium oxide formation at the graphene-SiC interface studied by photoemission 020606Watcharinyanon, Somsakul et al. | 2013
-
CUMULATIVE AUTHOR INDEX A15| 2013
-
Origin of defects on targets used to make extreme ultraviolet mask blanksYu, He / Andruczyk, Daniel / Ruzic, David N. / Jindal, Vibhu / Kearney, Patrick et al. | 2013
-
Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growthProfijt, H.B. / van de Sanden, M.C.M. / Kessels, W.M.M. et al. | 2013
-
Characterization of atomic layer deposition HfO~2, Al~2O~3, and plasma-enhanced chemical vapor deposition Si~3N~4 as metal-insulator-metal capacitor dielectric for GaAs HBT technologyYota, J. / Shen, H. / Ramanathan, R. et al. | 2013
-
Epitaxial strontium titanate films grown by atomic layer deposition on SrTiO~3-buffered Si(001) substratesMcDaniel, M.D. / Posadas, A. / Ngo, T.Q. / Dhamdhere, A. / Smith, D.J. / Demkov, A.A. / Ekerdt, J.G. et al. | 2013
-
Gallium nitride MIS-HEMT using atomic layer deposited Al~2O~3 as gate dielectricLossy, R. / Gargouri, H. / Arens, M. / Wurfl, J. et al. | 2013
-
Atomic layer deposition of cobalt oxide thin films using cyclopentadienylcobalt dicarbonyl and ozone at low temperaturesHan, B. / Choi, K.H. / Park, J.M. / Park, J.W. / Jung, J. / Lee, W.-J. et al. | 2013
-
Ytterbium oxide formation at the graphene–SiC interface studied by photoemissionWatcharinyanon, Somsakul / Johansson, Leif I. / Xia, Chao / Virojanadara, Chariya et al. | 2013
-
On the significance of thermoelectric and thermionic emission currents induced by chemical reactions catalyzed on nanofilm metal–semiconductor heterostructuresNedrygailov, Ievgen I. / Karpov, Eduard G. / Hasselbrink, Eckart / Diesing, Detlef et al. | 2013
-
Atomic layer deposition of TiN for the fabrication of nanomechanical resonatorsNelson-Fitzpatrick, Nathan / Guthy, Csaba / Poshtiban, Somayyeh / Finley, Eric / Harris, Kenneth D. / Worfolk, Brian J. / Evoy, Stephane et al. | 2013
-
Characterization of metal oxide layers grown on CVD grapheneMatsubayashi, Akitomo / Abel, Joseph / Prasad Sinha, Dhiraj / Ung Lee, Ji / LaBella, Vincent P. et al. | 2013
-
Atomic layer deposition of Al-doped ZnO thin filmsTynell, T. / Yamauchi, H. / Karppinen, M. / Okazaki, R. / Terasaki, I. et al. | 2013
-
On the kinetics of spatial atomic layer depositionPoodt, P. / van Lieshout, J. / Illiberi, A. / Knaapen, R. / Roozeboom, F. / van Asten, A. et al. | 2013
-
Combining dynamic and static depth profiling in low energy ion scatteringVeen, R.t. / Fartmann, M. / Kersting, R. / Hagenhoff, B. et al. | 2013
-
Structural properties of as deposited and annealed ZrO~2 influenced by atomic layer deposition, substrate, and dopingWeinreich, W. / Wilde, L. / Muller, J. / Sundqvist, J. / Erben, E. / Heitmann, J. / Lemberger, M. / Bauer, A.J. et al. | 2013
-
Low-temperature (Samal, N. / Du, H. / Luberoff, R. / Chetry, K. / Bubber, R. / Hayes, A. / Devasahayam, A. et al. | 2013
-
Chemical reactions at CdS heterojunctions with CuInSe2Aquino, Angel / Rockett, Angus et al. | 2013
-
Effects of substrate doping on Gd2O3(100)/Si(100) heterostructureSitaputra, Wattaka / Tsu, Raphael et al. | 2013
-
Letters - X-ray photoelectron spectroscopic study on interlace bonding between Pt and Zn- and O-terminated ZnO 020601Yoshitake, Michiko et al. | 2013
-
Separation of hot electron current component induced by hydrogen oxidation on resistively heated Pt/n-GaP Schottky nanostructures 020603Hashemian, Mohammad A et al. | 2013
-
Relative lability of gold-oxide thin films in contact with air, solvents, or electrolyte solutions 021508Cook, Kevin M et al. | 2013
-
Chemical reactions at CdS heterojunctions with CulnSe2 021202Aquino, Angel et al. | 2013
-
Atomically precise surface engineering of silicon CCDs for enhanced UV quantum efficiencyGreer, F. / Hamden, E. / Jacquot, B.C. / Hoenk, M.E. / Jones, T.J. / Dickie, M.R. / Monacos, S.P. / Nikzad, S. et al. | 2013
-
TEMAZ/O~3 atomic layer deposition process with doubled growth rate and optimized interface properties in metal-insulator-metal capacitorsWeinreich, W. / Tauchnitz, T. / Polakowski, P. / Drescher, M. / Riedel, S. / Sundqvist, J. / Seidel, K. / Shiazi, M. / Elliott, S.D. / Ohsiek, S. et al. | 2013
-
Atomic layer deposition onto carbon fiber: From single layer deposition via multilayer structure to metal oxide microtubesKnohl, S. / Roy, A.K. / Goedel, W.A. / Schulze, S. / Hietschold, M. et al. | 2013
-
Comprehensive comparison of structural, electrical, and reliability characteristics of HfO~2 gate dielectric with H~2O or O~3 oxidantCheng, Y.-L. / Chang, Y.-L. / Hsieh, C.-Y. / Lin, J.-R. et al. | 2013
-
Relative lability of gold-oxide thin films in contact with air, solvents, or electrolyte solutionsCook, Kevin M. / Ferguson, Gregory S. et al. | 2013
-
Atomic layer deposition of Al~2O~3 and Al~xTi~1~-~xO~y thin films on N~2O plasma pretreated carbon materialsMarkeev, A.M. / Chernikova, A.G. / Chouprik, A.A. / Zaitsev, S.A. / Ovchinnikov, D.V. / Althues, H. / Dorfler, S. et al. | 2013
-
Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H~2O plasma and O~2 plasma as oxidantKawamura, Y. / Hattori, N. / Miyatake, N. / Uraoka, Y. et al. | 2013
-
Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositionsRoy, A.K. / Deduytsche, D. / Detavernier, C. et al. | 2013
-
Nanoscale topographic pattern formation on Kr+-bombarded germanium surfaces 021405Perkinson, Joy C et al. | 2013
-
Thin Films - Modulation of Ni valence in p-type NiO films via substitution of Ni by Cu 021501Chen, Wei-Yu et al. | 2013
-
Atomic layer deposition of TiN for the fabrication of nanomechanical resonators 021503Nelson-Fitzpatrick, Nathan et al. | 2013
-
Origin of defects on targets used to make extreme ultraviolet mask blanks 021403Yu, He et al. | 2013
-
Surface reconstruction at the initial Ge adsorption stage on Si(114)-2 × 1 021404Duvjir, Ganbat et al. | 2013
-
High temperature growth of Ag phases on Ge(111) 020602Mullet, Cory H et al. | 2013
-
Ion flux and ion distribution function measurements in synchronously pulsed inductively coupled plasmas 020604Brihoum, Melisa et al. | 2013
-
High temperature growth of Ag phases on Ge(111)Mullet, Cory H. / Chiang, Shirley et al. | 2013
-
Material dependence of argon cluster ion sputter yield in polymers: Method and measurements of relative sputter yields for 19 polymersa)Cumpson, Peter J. / Portoles, Jose F. / Sano, Naoko et al. | 2013
-
Effects of rapid thermal annealing on electrical, optical, and structural properties of Ni-doped In2O3 anodes for bulk heterojunction organic solar cellsHo Kim, Jun / Seong, Tae-Yeon / Kim, Han-Ki et al. | 2013
-
Low ion energy RF reactor using an array of plasmas through a grounded gridChesaux, Michaël / Howling, Alan A. / Hollenstein, Christoph / Dominé, Didier / Kroll, Ulrich et al. | 2013
-
Chemistry of Cu(acac)~2 on Ni(110) and Cu(110) surfaces: Implications for atomic layer deposition processesMa, Q. / Zaera, F. et al. | 2013
-
Copper deposition on TiO~2 from copper(II)hexafluoroacetylacetonateRayner, D.G. / Mulley, J.S. / Bennett, R.A. et al. | 2013
-
Physical and electrical characteristics of atomic-layer deposition-HfO~2 films deposited on Si substrates having different silanol Si-OH densitiesMolina, J. / Zuniga, C. / Calleja, W. / Rosales, P. / Torres, A. / Herrera-Gomez, A. et al. | 2013
-
Shop Notes - Simple Si(l 11) surface preparation by thin wafer cleavage 023201Paul, William et al. | 2013
-
Ion conduction in nanoscale yttria-stabilized zirconia fabricated by atomic layer deposition with various doping ratesSon, K.S. / Bae, K. / Kim, J.W. / Ha, J.S. / Shim, J.H. et al. | 2013
-
Evaluating Al~2O~3 gas diffusion barriers grown directly on Ca films using atomic layer deposition techniquesBertrand, J.A. / George, S.M. et al. | 2013
-
New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma dopingThomas, M.A. / Armstrong, J.C. / Cui, J. et al. | 2013
-
Sample-morphology effects on x-ray photoelectron peak intensitiesPowell, Cedric J. / Tougaard, Sven / Werner, Wolfgang S. M. / Smekal, Werner et al. | 2013
-
Nanoscale topographic pattern formation on Kr+-bombarded germanium surfacesPerkinson, Joy C. / Madi, Charbel S. / Aziz, Michael J. et al. | 2013
-
Modulation of Ni valence in p-type NiO films via substitution of Ni by CuChen, Wei-Yu / Jeng, Jiann-Shing / Huang, Kuo-Lun / Chen, Jen-Sue et al. | 2013
-
Growth and structure of ZnO thin films on polar (√3 × √3)R30° reconstructed and unreconstructed MgO(111) surfaces by atomic layer depositionPradhan, Kallol / Lyman, Paul F. et al. | 2013
-
X-ray photoelectron spectroscopy study on the chemistry involved in tin oxide film growth during chemical vapor deposition processesMannie, G.J.A. / Gerritsen, G. / Abbenhuis, H.C.L. / van Deelen, J. / Niemantsverdriet, J.W. / Thune, P.C. et al. | 2013
-
Hf~xZr~1~-~xO~2 compositional control using co-injection atomic layer depositionConsiglio, S. / Tapily, K. / Clark, R.D. / Nakamura, G. / Wajda, C.S. / Leusink, G.J. et al. | 2013
-
Atomic layer deposition of zinc indium sulfide films: Mechanistic studies and evidence of surface exchange reactions and diffusion processesGenevee, P. / Donsanti, F. / Schneider, N. / Lincot, D. et al. | 2013
-
Atomic layer deposition of ZnO on Cu-nanoclusters for methanol synthesisZhang, Z. / Patterson, M. / Ren, M. / Wang, Y. / Flake, J.C. / Sprunger, P.T. / Kurtz, R.L. et al. | 2013
-
Noninvasive, real-time measurements of plasma parameters via optical emission spectroscopy 021303Wang, Shicong et al. | 2013
-
Competing reactions during metalorganic deposition: Ligand-exchange versus direct reaction with the substrate surfaceLin, Jia-Ming / Teplyakov, Andrew V. / Rodríguez-Reyes, Juan Carlos F. et al. | 2013
-
Simple Si(111) surface preparation by thin wafer cleavagePaul, William / Miyahara, Yoichi / Grütter, Peter H. et al. | 2013
-
Growth and structure of ZnO thin films on polar (√ 3 × √3)R3° reconstructed and unreconstructed MgO(111) surfaces by atomic layer deposition 021504Pradhan, Kallol et al. | 2013
-
On the change of preferential growth orientation in chemical vapor deposition of titanium carbide by aromatic hydrocarbon precursors 021507Pedersen, Henrik et al. | 2013
-
Plasma Science and Technology - Study on the etching characteristics of amorphous carbon layer in oxygen plasma with carbonyl sulfide 021301Kim, Jong Kyu et al. | 2013
-
Low ion energy RF reactor using an array of plasmas through a grounded grid 021302Chesaux, Michaël et al. | 2013
-
X-ray photoelectron spectroscopic study on interface bonding between Pt and Zn- and O-terminated ZnOYoshitake, Michiko / Blumentrit, Petr / Nemsak, Slavomir et al. | 2013
-
Ion flux and ion distribution function measurements in synchronously pulsed inductively coupled plasmasBrihoum, Melisa / Cunge, Gilles / Darnon, Maxime / Gahan, David / Joubert, Olivier / Braithwaite, Nicholas St. J. et al. | 2013
-
Atomic layer deposition of Ti-HfO~2 dielectricsWerner, M. / King, P.J. / Hindley, S. / Romani, S. / Mather, S. / Chalker, P.R. / Williams, P.A. / van den Berg, J.A. et al. | 2013
-
Crystal AIN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer depositionLei, W. / Chen, Q. et al. | 2013
-
Effect of the amido Ti precursors on the atomic layer deposition of TiN with NH~3Cho, G. / Rhee, S.-W. et al. | 2013
-
Atomic layer deposition of epitaxial TiO~2 II on c-sapphireTarre, A. / Moldre, K. / Niilisk, A. / Mandar, H. / Aarik, J. / Rosental, A. et al. | 2013
-
Atomic layer deposition of Ga-doped ZnO transparent conducting oxide substrates for CdTe-based photovoltaicsChalker, P.R. / Marshall, P.A. / Romani, S. / Roberts, J.W. / Irvine, S.J.C. / Lamb, D.A. / Clayton, A.J. / Williams, P.A. et al. | 2013
-
Atomic layer deposition of aluminum-doped zinc oxide films for the light harvesting enhancement of a nanostructured silicon solar cellChen, S.-H. / Chan, S.-H. / Chen, C.-K. / Tseng, S.-Z. / Hsu, C.-H. / Cho, W.-H. et al. | 2013
-
Probing the properties of atomic layer deposited ZrO~2 films on p-Germanium substratesKerasidou, A.P. / Botzakaki, M.A. / Xanthopoulos, N. / Kennou, S. / Ladas, S. / Georga, S.N. / Krontiras, C.A. et al. | 2013
-
Low-temperature atomic layer deposition of Al~2O~3 on blown polyethylene films with plasma-treated surfacesLee, G.B. / Son, K.S. / Park, S.W. / Shim, J.H. / Choi, B.-H. et al. | 2013
-
Preparation and phase structures of Zn-Ti-O ternary compounds by atomic layer depositionQian, X. / Gao, M.-Y. / Cao, Y.-Q. / Guo, B.-L. / Li, A.-D. et al. | 2013